JP4711244B2 - スパッタリングターゲット - Google Patents

スパッタリングターゲット Download PDF

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Publication number
JP4711244B2
JP4711244B2 JP2003394028A JP2003394028A JP4711244B2 JP 4711244 B2 JP4711244 B2 JP 4711244B2 JP 2003394028 A JP2003394028 A JP 2003394028A JP 2003394028 A JP2003394028 A JP 2003394028A JP 4711244 B2 JP4711244 B2 JP 4711244B2
Authority
JP
Japan
Prior art keywords
sputtering
recording medium
sputtering target
information recording
optical information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2003394028A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005154820A5 (enExample
JP2005154820A (ja
Inventor
英生 高見
政隆 矢作
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
Original Assignee
JX Nippon Mining and Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JX Nippon Mining and Metals Corp filed Critical JX Nippon Mining and Metals Corp
Priority to JP2003394028A priority Critical patent/JP4711244B2/ja
Priority to TW093132542A priority patent/TWI263686B/zh
Priority to CNB2004100962421A priority patent/CN100340698C/zh
Publication of JP2005154820A publication Critical patent/JP2005154820A/ja
Publication of JP2005154820A5 publication Critical patent/JP2005154820A5/ja
Application granted granted Critical
Publication of JP4711244B2 publication Critical patent/JP4711244B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Manufacturing Optical Record Carriers (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
JP2003394028A 2003-11-25 2003-11-25 スパッタリングターゲット Expired - Lifetime JP4711244B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003394028A JP4711244B2 (ja) 2003-11-25 2003-11-25 スパッタリングターゲット
TW093132542A TWI263686B (en) 2003-11-25 2004-10-27 Sputtering target, optical information recording medium and manufacturing method thereof
CNB2004100962421A CN100340698C (zh) 2003-11-25 2004-11-25 溅射靶及光信息记录介质及其制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003394028A JP4711244B2 (ja) 2003-11-25 2003-11-25 スパッタリングターゲット

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007296272A Division JP4745319B2 (ja) 2007-11-15 2007-11-15 光情報記録媒体

Publications (3)

Publication Number Publication Date
JP2005154820A JP2005154820A (ja) 2005-06-16
JP2005154820A5 JP2005154820A5 (enExample) 2007-01-11
JP4711244B2 true JP4711244B2 (ja) 2011-06-29

Family

ID=34720221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003394028A Expired - Lifetime JP4711244B2 (ja) 2003-11-25 2003-11-25 スパッタリングターゲット

Country Status (3)

Country Link
JP (1) JP4711244B2 (enExample)
CN (1) CN100340698C (enExample)
TW (1) TWI263686B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011168893A (ja) * 2011-04-07 2011-09-01 Jx Nippon Mining & Metals Corp 光情報記録媒体の保護膜
JP2011202281A (ja) * 2011-05-23 2011-10-13 Jx Nippon Mining & Metals Corp スパッタリングターゲットの製造方法及びスパッタリングターゲット

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080095303A (ko) * 2006-03-10 2008-10-28 가부시키가이샤 리코 광 기록 매체
JP4552950B2 (ja) * 2006-03-15 2010-09-29 住友金属鉱山株式会社 ターゲット用酸化物焼結体、その製造方法、それを用いた透明導電膜の製造方法、及び得られる透明導電膜
JP4788463B2 (ja) * 2006-04-25 2011-10-05 住友金属鉱山株式会社 酸化物焼結体、透明酸化物膜、ガスバリア性透明樹脂基板、ガスバリア性透明導電性樹脂基板およびフレキシブル表示素子
JPWO2007142330A1 (ja) 2006-06-08 2009-10-29 旭硝子株式会社 透明導電膜およびその製造方法、ならびにその製造に使用されるスパッタリングターゲット
JP5269501B2 (ja) * 2008-07-08 2013-08-21 出光興産株式会社 酸化物焼結体及びそれからなるスパッタリングターゲット
KR101671543B1 (ko) 2008-11-20 2016-11-01 이데미쓰 고산 가부시키가이샤 ＺｎＯ-ＳｎＯ₂-Ｉｎ₂Ｏ₃계 산화물 소결체 및 비정질 투명 도전막
JP5145513B2 (ja) 2008-12-12 2013-02-20 出光興産株式会社 複合酸化物焼結体及びそれからなるスパッタリングターゲット
JP2013507526A (ja) * 2009-10-15 2013-03-04 ユミコア エセ．アー． 酸化スズセラミックスパッタリングターゲットおよびその製造方法
JP6212869B2 (ja) 2012-02-06 2017-10-18 三菱マテリアル株式会社 酸化物スパッタリングターゲット
TW201422835A (zh) * 2012-12-03 2014-06-16 Solar Applied Mat Tech Corp 濺鍍靶材及導電金屬氧化物薄膜
WO2014168073A1 (ja) * 2013-04-08 2014-10-16 三菱マテリアル株式会社 酸化物スパッタリングターゲット、その製造方法及び光記録媒体用保護膜
JP6838558B2 (ja) * 2015-12-01 2021-03-03 ソニー株式会社 光記録媒体

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5026672A (en) * 1990-06-25 1991-06-25 Tektronix, Inc. Method of fabricating a sintered body containing tin oxide
CN1281544C (zh) * 1998-08-31 2006-10-25 出光兴产株式会社 透明导电膜用靶、透明导电材料、透明导电玻璃及透明导电薄膜
JP4559553B2 (ja) * 1999-03-05 2010-10-06 出光興産株式会社 スパッタリング、エレクトロンビーム、イオンプレーティング用焼結体、透明導電ガラス及び透明導電フィルム
US6423161B1 (en) * 1999-10-15 2002-07-23 Honeywell International Inc. High purity aluminum materials
JP4724330B2 (ja) * 2001-09-07 2011-07-13 株式会社アルバック 錫−アンチモン酸化物焼結体ターゲット及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011168893A (ja) * 2011-04-07 2011-09-01 Jx Nippon Mining & Metals Corp 光情報記録媒体の保護膜
JP2011202281A (ja) * 2011-05-23 2011-10-13 Jx Nippon Mining & Metals Corp スパッタリングターゲットの製造方法及びスパッタリングターゲット

Also Published As

Publication number Publication date
CN1621558A (zh) 2005-06-01
TW200517509A (en) 2005-06-01
CN100340698C (zh) 2007-10-03
TWI263686B (en) 2006-10-11
JP2005154820A (ja) 2005-06-16

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