JP4710435B2 - 微小共振器、バンドパスフィルタ、半導体装置、並びに通信装置 - Google Patents

微小共振器、バンドパスフィルタ、半導体装置、並びに通信装置 Download PDF

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Publication number
JP4710435B2
JP4710435B2 JP2005190269A JP2005190269A JP4710435B2 JP 4710435 B2 JP4710435 B2 JP 4710435B2 JP 2005190269 A JP2005190269 A JP 2005190269A JP 2005190269 A JP2005190269 A JP 2005190269A JP 4710435 B2 JP4710435 B2 JP 4710435B2
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Japan
Prior art keywords
microresonator
filter
signal
electrode
input
Prior art date
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Expired - Lifetime
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JP2005190269A
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English (en)
Japanese (ja)
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JP2007013447A (ja
JP2007013447A5 (enExample
Inventor
伸也 盛田
隆 木下
均洋 田中
正裕 多田
俊 御手洗
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Sony Corp
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Sony Corp
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Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2005190269A priority Critical patent/JP4710435B2/ja
Priority to US11/425,080 priority patent/US7489212B2/en
Publication of JP2007013447A publication Critical patent/JP2007013447A/ja
Publication of JP2007013447A5 publication Critical patent/JP2007013447A5/ja
Application granted granted Critical
Publication of JP4710435B2 publication Critical patent/JP4710435B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • H03H3/0073Integration with other electronic structures
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H9/02433Means for compensation or elimination of undesired effects
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/24Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H03H9/2447Beam resonators
    • H03H9/2463Clamped-clamped beam resonators
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H2009/02488Vibration modes
    • H03H2009/02511Vertical, i.e. perpendicular to the substrate plane

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
JP2005190269A 2005-06-29 2005-06-29 微小共振器、バンドパスフィルタ、半導体装置、並びに通信装置 Expired - Lifetime JP4710435B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005190269A JP4710435B2 (ja) 2005-06-29 2005-06-29 微小共振器、バンドパスフィルタ、半導体装置、並びに通信装置
US11/425,080 US7489212B2 (en) 2005-06-29 2006-06-19 Microresonator, band-pass filter, semiconductor device, and communication apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005190269A JP4710435B2 (ja) 2005-06-29 2005-06-29 微小共振器、バンドパスフィルタ、半導体装置、並びに通信装置

Publications (3)

Publication Number Publication Date
JP2007013447A JP2007013447A (ja) 2007-01-18
JP2007013447A5 JP2007013447A5 (enExample) 2008-06-26
JP4710435B2 true JP4710435B2 (ja) 2011-06-29

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ID=37588735

Family Applications (1)

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JP2005190269A Expired - Lifetime JP4710435B2 (ja) 2005-06-29 2005-06-29 微小共振器、バンドパスフィルタ、半導体装置、並びに通信装置

Country Status (2)

Country Link
US (1) US7489212B2 (enExample)
JP (1) JP4710435B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4206904B2 (ja) * 2003-11-06 2009-01-14 ソニー株式会社 Mems共振器
EP1976015B1 (en) * 2007-03-26 2014-09-10 Semiconductor Energy Laboratory Co., Ltd. Switching element, method for manufacturing the same, and display device including switching element
FR2939581B1 (fr) * 2008-12-09 2010-11-26 Commissariat Energie Atomique Reseau de resonateurs couples, filtre passe-bande et oscillateur.
JP2010280035A (ja) * 2009-06-04 2010-12-16 Toshiba Corp Memsデバイスとその製造方法
JP6724394B2 (ja) * 2016-02-02 2020-07-15 セイコーエプソン株式会社 発振モジュール、電子機器及び移動体
KR102236099B1 (ko) * 2019-10-25 2021-04-05 삼성전기주식회사 멀티 터치의 위치 식별이 가능한 터치 센싱 장치 및 전자 기기
TWI779534B (zh) * 2020-03-25 2022-10-01 昇佳電子股份有限公司 電容感測電路

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6557419B1 (en) * 1996-12-31 2003-05-06 Honeywell International Inc. Zero TCF thin film resonator
US6211598B1 (en) * 1999-09-13 2001-04-03 Jds Uniphase Inc. In-plane MEMS thermal actuator and associated fabrication methods
US6262464B1 (en) * 2000-06-19 2001-07-17 International Business Machines Corporation Encapsulated MEMS brand-pass filter for integrated circuits
US6987432B2 (en) * 2003-04-16 2006-01-17 Robert Bosch Gmbh Temperature compensation for silicon MEMS resonator
JP4341288B2 (ja) 2003-04-21 2009-10-07 ソニー株式会社 Mems型共振器及びその製造方法、並びにフィルタ
KR100485702B1 (ko) * 2003-05-29 2005-04-28 삼성전자주식회사 지지대를 갖는 박막 벌크 음향 공진기 및 그 제조방법
JP4415616B2 (ja) * 2003-09-11 2010-02-17 ソニー株式会社 マイクロマシン
JP4586404B2 (ja) * 2004-04-28 2010-11-24 ソニー株式会社 フィルタ装置及び送受信機

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Publication number Publication date
US20070001784A1 (en) 2007-01-04
JP2007013447A (ja) 2007-01-18
US7489212B2 (en) 2009-02-10

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