JP4677267B2 - 平面ステージ装置及び露光装置 - Google Patents

平面ステージ装置及び露光装置 Download PDF

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Publication number
JP4677267B2
JP4677267B2 JP2005107748A JP2005107748A JP4677267B2 JP 4677267 B2 JP4677267 B2 JP 4677267B2 JP 2005107748 A JP2005107748 A JP 2005107748A JP 2005107748 A JP2005107748 A JP 2005107748A JP 4677267 B2 JP4677267 B2 JP 4677267B2
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JP
Japan
Prior art keywords
mover
auxiliary
stage
planar
flat stage
Prior art date
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Expired - Fee Related
Application number
JP2005107748A
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English (en)
Japanese (ja)
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JP2006287122A5 (enExample
JP2006287122A (ja
Inventor
光夫 西村
伸茂 是永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005107748A priority Critical patent/JP4677267B2/ja
Publication of JP2006287122A publication Critical patent/JP2006287122A/ja
Publication of JP2006287122A5 publication Critical patent/JP2006287122A5/ja
Application granted granted Critical
Publication of JP4677267B2 publication Critical patent/JP4677267B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005107748A 2005-04-04 2005-04-04 平面ステージ装置及び露光装置 Expired - Fee Related JP4677267B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005107748A JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005107748A JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2006287122A JP2006287122A (ja) 2006-10-19
JP2006287122A5 JP2006287122A5 (enExample) 2008-05-22
JP4677267B2 true JP4677267B2 (ja) 2011-04-27

Family

ID=37408657

Family Applications (1)

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JP2005107748A Expired - Fee Related JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

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JP (1) JP4677267B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7538273B2 (en) 2006-08-08 2009-05-26 Asml Netherlands B.V. Cable connection to decrease the passing on of vibrations from a first object to a second object
WO2008078688A1 (ja) * 2006-12-27 2008-07-03 Nikon Corporation ステージ装置、露光装置、及びデバイスの製造方法
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
TWI547769B (zh) * 2007-12-28 2016-09-01 尼康股份有限公司 An exposure apparatus, a moving body driving system, a pattern forming apparatus, and an exposure method, and an element manufacturing method
JP2010080641A (ja) 2008-09-25 2010-04-08 Canon Inc ステージ装置、露光装置及びデバイス製造方法
US8598538B2 (en) * 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
EP2469339B1 (en) * 2010-12-21 2017-08-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN119620563A (zh) * 2017-07-14 2025-03-14 Asml荷兰有限公司 量测设备和衬底平台输送装置系统

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0697051B2 (ja) * 1986-12-02 1994-11-30 キヤノン株式会社 流体軸受用の流体流通機構
US5715064A (en) * 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JPH10223527A (ja) * 1996-12-06 1998-08-21 Nikon Corp 露光装置
US6262796B1 (en) * 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
JPH1138377A (ja) * 1997-07-23 1999-02-12 Canon Inc ステージ装置およびデバイス製造方法
TWI223734B (en) * 1999-12-21 2004-11-11 Asml Netherlands Bv Crash prevention in positioning apparatus for use in lithographic projection apparatus
US6437463B1 (en) * 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
US6842248B1 (en) * 2000-11-28 2005-01-11 Nikon Corporation System and method for calibrating mirrors of a stage assembly
JP2002198284A (ja) * 2000-12-25 2002-07-12 Nikon Corp ステージ装置および露光装置
JP2002280283A (ja) * 2001-03-16 2002-09-27 Canon Inc 基板処理装置
JP3971701B2 (ja) * 2001-11-30 2007-09-05 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
JP3676779B2 (ja) * 2001-12-11 2005-07-27 エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ リソグラフィ装置およびデバイスの製造方法
JP2003249443A (ja) * 2001-12-21 2003-09-05 Nikon Corp ステージ装置、ステージ位置管理方法、露光方法及び露光装置、並びにデバイス製造方法
JP3955555B2 (ja) * 2002-06-13 2007-08-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
TWI246114B (en) * 2002-09-24 2005-12-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
JP2005032917A (ja) * 2003-07-10 2005-02-03 Dainippon Printing Co Ltd 有機薄膜太陽電池の製造方法および転写シート
JP2005046941A (ja) * 2003-07-31 2005-02-24 Canon Inc ケーブル微動ユニット付きステージ装置
JP2005294468A (ja) * 2004-03-31 2005-10-20 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2006134921A (ja) * 2004-11-02 2006-05-25 Sendai Nikon:Kk 保持装置、ステージ装置、露光装置、及びデバイスの製造方法

Also Published As

Publication number Publication date
JP2006287122A (ja) 2006-10-19

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