JP4671579B2 - Ａｇ合金反射膜およびその製造方法 - Google Patents

Ａｇ合金反射膜およびその製造方法 Download PDF

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Publication number
JP4671579B2
JP4671579B2 JP2002363648A JP2002363648A JP4671579B2 JP 4671579 B2 JP4671579 B2 JP 4671579B2 JP 2002363648 A JP2002363648 A JP 2002363648A JP 2002363648 A JP2002363648 A JP 2002363648A JP 4671579 B2 JP4671579 B2 JP 4671579B2
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Japan
Prior art keywords
film
alloy
reflective film
gas
sputtering
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Expired - Lifetime
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JP2002363648A
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English (en)
Japanese (ja)
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JP2004197117A (ja
JP2004197117A5 (enExample
Inventor
禎之 浮島
典明 谷
日出夫 竹井
暁 石橋
衛平 柴
豊 金
正三 神原
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Ulvac Inc
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Ulvac Inc
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Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2002363648A priority Critical patent/JP4671579B2/ja
Priority to TW092135255A priority patent/TW200419003A/zh
Priority to KR1020030091353A priority patent/KR101101732B1/ko
Publication of JP2004197117A publication Critical patent/JP2004197117A/ja
Publication of JP2004197117A5 publication Critical patent/JP2004197117A5/ja
Application granted granted Critical
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
JP2002363648A 2002-12-16 2002-12-16 Ａｇ合金反射膜およびその製造方法 Expired - Lifetime JP4671579B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002363648A JP4671579B2 (ja) 2002-12-16 2002-12-16 Ａｇ合金反射膜およびその製造方法
TW092135255A TW200419003A (en) 2002-12-16 2003-12-12 Method for producing silver alloy reflective film, sputtering target, and silver alloy film
KR1020030091353A KR101101732B1 (ko) 2002-12-16 2003-12-15 은 합금 박막, 스퍼터링 타겟 및 은 합금 박막 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002363648A JP4671579B2 (ja) 2002-12-16 2002-12-16 Ａｇ合金反射膜およびその製造方法

Publications (3)

Publication Number Publication Date
JP2004197117A JP2004197117A (ja) 2004-07-15
JP2004197117A5 JP2004197117A5 (enExample) 2005-04-07
JP4671579B2 true JP4671579B2 (ja) 2011-04-20

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ID=32761736

Family Applications (1)

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JP2002363648A Expired - Lifetime JP4671579B2 (ja) 2002-12-16 2002-12-16 Ａｇ合金反射膜およびその製造方法

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JP (1) JP4671579B2 (enExample)
KR (1) KR101101732B1 (enExample)
TW (1) TW200419003A (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4714477B2 (ja) * 2004-02-19 2011-06-29 アルバック成膜株式会社 Ａｇ合金膜及びその製造方法
JP2006098856A (ja) * 2004-09-30 2006-04-13 Ulvac Japan Ltd Ａｇ系反射膜およびその作製方法
JP4918994B2 (ja) * 2005-05-30 2012-04-18 住友電気工業株式会社 金属被膜の形成方法および金属配線
JP5116218B2 (ja) * 2005-06-02 2013-01-09 株式会社アルバック 分散液、分散液の製造方法
JP2007273744A (ja) * 2006-03-31 2007-10-18 Stanley Electric Co Ltd Ｌｅｄ用共晶基板及びその製造方法
KR100841367B1 (ko) * 2006-08-28 2008-06-26 삼성에스디아이 주식회사 유기전계 발광표시장치의 제조방법
JP4176136B2 (ja) * 2006-09-21 2008-11-05 株式会社神戸製鋼所 Ａｇ合金薄膜
WO2008035617A1 (en) * 2006-09-21 2008-03-27 Kabushiki Kaisha Kobe Seiko Sho Ag ALLOY THIN FILM, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF THE Ag ALLOY THIN FILM
US7951442B2 (en) 2006-11-17 2011-05-31 Tanaka Kikinzoku Kogyo K.K. Thin film for reflection film or for semi-transparent reflection film, sputtering target and optical recording medium
JPWO2009154137A1 (ja) * 2008-06-17 2011-12-01 株式会社アルバック 太陽電池およびその製造方法
JP2013105546A (ja) * 2011-11-10 2013-05-30 Ulvac Japan Ltd 有機ｅｌ表示装置、ｌｅｄ装置、太陽電池、反射膜
JP5806653B2 (ja) * 2011-12-27 2015-11-10 株式会社神戸製鋼所 反射電極用Ａｇ合金膜、反射電極、およびＡｇ合金スパッタリングターゲット
WO2014054587A1 (ja) * 2012-10-01 2014-04-10 日産自動車株式会社 インライン式コーティング装置、インライン式コーティング方法、およびセパレータ
KR20160112377A (ko) 2015-03-19 2016-09-28 희성금속 주식회사 스퍼터링 타겟 및 이의 제조방법
KR101688920B1 (ko) 2016-11-01 2016-12-22 희성금속 주식회사 도전성 막 형성용 은 합금 조성물 및 이의 제조 방법
KR101710196B1 (ko) 2016-11-04 2017-02-24 희성금속 주식회사 도전성 막 형성용 은 합금 조성물 및 이의 제조 방법
KR101959865B1 (ko) 2016-11-18 2019-03-20 엘티메탈 주식회사 도전성 막 형성용 은 합금 조성물 및 이의 제조 방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04372738A (ja) * 1991-06-21 1992-12-25 Tdk Corp 光記録媒体
JPH0843839A (ja) * 1994-07-27 1996-02-16 Toppan Printing Co Ltd 反射型液晶表示装置及びその製造方法
JPH08146208A (ja) * 1994-11-25 1996-06-07 Matsushita Electric Works Ltd 反射鏡およびその製造方法
JPH0930124A (ja) * 1995-05-12 1997-02-04 Ricoh Co Ltd 光情報記録媒体及びその製造方法
JPH09108654A (ja) * 1995-10-16 1997-04-28 Nisshin Steel Co Ltd 浄水用活性炭
JP4615701B2 (ja) * 1999-12-07 2011-01-19 株式会社フルヤ金属 高耐熱性反射膜を用いた積層体
JP3957259B2 (ja) * 2000-04-12 2007-08-15 株式会社神戸製鋼所 光情報記録媒体用反射層および光情報記録媒体
JP3365762B2 (ja) * 2000-04-28 2003-01-14 株式会社神戸製鋼所 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット
US7465424B2 (en) * 2001-03-16 2008-12-16 Ishifuku Metal Industry Co., Ltd. Sputtering target material
JP2004002929A (ja) * 2001-08-03 2004-01-08 Furuya Kinzoku:Kk 銀合金、スパッタリングターゲット、反射型ｌｃｄ用反射板、反射配線電極、薄膜、その製造方法、光学記録媒体、電磁波遮蔽体、電子部品用金属材料、配線材料、電子部品、電子機器、金属膜の加工方法、電子光学部品、積層体及び建材ガラス

Also Published As

Publication number Publication date
TW200419003A (en) 2004-10-01
TWI338054B (enExample) 2011-03-01
JP2004197117A (ja) 2004-07-15
KR20040055604A (ko) 2004-06-26
KR101101732B1 (ko) 2012-01-05

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