JP4667965B2 - 光ビーム測定装置 - Google Patents
光ビーム測定装置 Download PDFInfo
- Publication number
- JP4667965B2 JP4667965B2 JP2005166624A JP2005166624A JP4667965B2 JP 4667965 B2 JP4667965 B2 JP 4667965B2 JP 2005166624 A JP2005166624 A JP 2005166624A JP 2005166624 A JP2005166624 A JP 2005166624A JP 4667965 B2 JP4667965 B2 JP 4667965B2
- Authority
- JP
- Japan
- Prior art keywords
- light beam
- wavefront
- spot
- imaging
- test
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000003384 imaging method Methods 0.000 claims description 57
- 230000003287 optical effect Effects 0.000 claims description 55
- 238000000926 separation method Methods 0.000 claims description 53
- 238000005259 measurement Methods 0.000 claims description 50
- 238000009826 distribution Methods 0.000 claims description 36
- 238000007493 shaping process Methods 0.000 claims description 33
- 238000004458 analytical method Methods 0.000 claims description 30
- 238000004364 calculation method Methods 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 3
- 238000010835 comparative analysis Methods 0.000 claims 1
- 230000010363 phase shift Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 238000010191 image analysis Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/293—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means
- G02B6/29346—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means operating by wave or beam interference
- G02B6/29349—Michelson or Michelson/Gires-Tournois configuration, i.e. based on splitting and interferometrically combining relatively delayed signals at a single beamsplitter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Optical Head (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005166624A JP4667965B2 (ja) | 2005-06-07 | 2005-06-07 | 光ビーム測定装置 |
CNB2006100886997A CN100565142C (zh) | 2005-06-07 | 2006-06-01 | 光束测量装置 |
TW095119510A TWI287619B (en) | 2005-06-07 | 2006-06-02 | A light beam measurement device |
KR1020060050712A KR100769214B1 (ko) | 2005-06-07 | 2006-06-07 | 광빔 측정장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005166624A JP4667965B2 (ja) | 2005-06-07 | 2005-06-07 | 光ビーム測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006343121A JP2006343121A (ja) | 2006-12-21 |
JP4667965B2 true JP4667965B2 (ja) | 2011-04-13 |
Family
ID=37509768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005166624A Expired - Fee Related JP4667965B2 (ja) | 2005-06-07 | 2005-06-07 | 光ビーム測定装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4667965B2 (zh) |
KR (1) | KR100769214B1 (zh) |
CN (1) | CN100565142C (zh) |
TW (1) | TWI287619B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100903264B1 (ko) * | 2007-04-30 | 2009-06-17 | 광주과학기술원 | 파면 수차 측정 장치 및 방법 |
JP2009069041A (ja) | 2007-09-14 | 2009-04-02 | Fujinon Corp | 光ピックアップ用波面測定装置 |
JP5139832B2 (ja) * | 2008-02-14 | 2013-02-06 | 浜松ホトニクス株式会社 | 観察装置 |
TWI393919B (zh) * | 2008-11-27 | 2013-04-21 | Ind Tech Res Inst | 光束整形器 |
CN110044849B (zh) * | 2019-05-24 | 2021-08-17 | 易思维(杭州)科技有限公司 | 半封闭腔体内部缺陷检测装置 |
TWI729403B (zh) * | 2019-05-31 | 2021-06-01 | 致茂電子股份有限公司 | 光電元件特性測量裝置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05340839A (ja) * | 1992-06-10 | 1993-12-24 | Olympus Optical Co Ltd | 簡易干渉計 |
JP2000097616A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 干渉計 |
JP2001215105A (ja) * | 2000-02-02 | 2001-08-10 | Nikon Corp | 干渉計、形状測定装置及び露光装置、並びに形状測定方法及び露光方法 |
JP2003177006A (ja) * | 1995-04-07 | 2003-06-27 | Discovision Assoc | 試験経路ミラーを制御するためマイクロミラー及び圧電変換器を有する干渉計を含む光学システム |
JP2004045326A (ja) * | 2002-07-15 | 2004-02-12 | Konica Minolta Holdings Inc | 干渉計装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2693791B2 (ja) * | 1988-10-25 | 1997-12-24 | 三菱電機株式会社 | 欠陥検査装置 |
IL100655A (en) * | 1991-02-08 | 1994-11-28 | Hughes Aircraft Co | Profile gauge for interferometric laser |
-
2005
- 2005-06-07 JP JP2005166624A patent/JP4667965B2/ja not_active Expired - Fee Related
-
2006
- 2006-06-01 CN CNB2006100886997A patent/CN100565142C/zh not_active Expired - Fee Related
- 2006-06-02 TW TW095119510A patent/TWI287619B/zh not_active IP Right Cessation
- 2006-06-07 KR KR1020060050712A patent/KR100769214B1/ko not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05340839A (ja) * | 1992-06-10 | 1993-12-24 | Olympus Optical Co Ltd | 簡易干渉計 |
JP2003177006A (ja) * | 1995-04-07 | 2003-06-27 | Discovision Assoc | 試験経路ミラーを制御するためマイクロミラー及び圧電変換器を有する干渉計を含む光学システム |
JP2000097616A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 干渉計 |
JP2001215105A (ja) * | 2000-02-02 | 2001-08-10 | Nikon Corp | 干渉計、形状測定装置及び露光装置、並びに形状測定方法及び露光方法 |
JP2004045326A (ja) * | 2002-07-15 | 2004-02-12 | Konica Minolta Holdings Inc | 干渉計装置 |
Also Published As
Publication number | Publication date |
---|---|
CN1877270A (zh) | 2006-12-13 |
CN100565142C (zh) | 2009-12-02 |
TW200706830A (en) | 2007-02-16 |
KR20060127803A (ko) | 2006-12-13 |
TWI287619B (en) | 2007-10-01 |
KR100769214B1 (ko) | 2007-10-22 |
JP2006343121A (ja) | 2006-12-21 |
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