JP4659029B2 - オメガ−ハロアルキルジアルキルシランの製造方法 - Google Patents

オメガ−ハロアルキルジアルキルシランの製造方法 Download PDF

Info

Publication number
JP4659029B2
JP4659029B2 JP2007515992A JP2007515992A JP4659029B2 JP 4659029 B2 JP4659029 B2 JP 4659029B2 JP 2007515992 A JP2007515992 A JP 2007515992A JP 2007515992 A JP2007515992 A JP 2007515992A JP 4659029 B2 JP4659029 B2 JP 4659029B2
Authority
JP
Japan
Prior art keywords
hal
formula
diiridium
residue
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007515992A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008502660A (ja
JP2008502660A5 (https=
Inventor
ラムダニ カメル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhone Poulenc Chimie SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhone Poulenc Chimie SA filed Critical Rhone Poulenc Chimie SA
Publication of JP2008502660A publication Critical patent/JP2008502660A/ja
Publication of JP2008502660A5 publication Critical patent/JP2008502660A5/ja
Application granted granted Critical
Publication of JP4659029B2 publication Critical patent/JP4659029B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/14—Preparation thereof from optionally substituted halogenated silanes and hydrocarbons hydrosilylation reactions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2007515992A 2004-06-16 2005-06-14 オメガ−ハロアルキルジアルキルシランの製造方法 Expired - Fee Related JP4659029B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0406502A FR2871802B1 (fr) 2004-06-16 2004-06-16 Procede de preparation d'un omega-halogenoalkyl dialylhalogenosilane
PCT/FR2005/001469 WO2006003323A1 (fr) 2004-06-16 2005-06-14 Procede de preparation d'un omega-halogenoalkyl dialkylhalogenosilane

Publications (3)

Publication Number Publication Date
JP2008502660A JP2008502660A (ja) 2008-01-31
JP2008502660A5 JP2008502660A5 (https=) 2010-07-08
JP4659029B2 true JP4659029B2 (ja) 2011-03-30

Family

ID=34949303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007515992A Expired - Fee Related JP4659029B2 (ja) 2004-06-16 2005-06-14 オメガ−ハロアルキルジアルキルシランの製造方法

Country Status (8)

Country Link
US (1) US7741504B2 (https=)
EP (1) EP1756122B1 (https=)
JP (1) JP4659029B2 (https=)
CN (1) CN1980941A (https=)
AT (1) ATE438651T1 (https=)
DE (1) DE602005015847D1 (https=)
FR (1) FR2871802B1 (https=)
WO (1) WO2006003323A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109912636B (zh) * 2019-04-11 2020-04-07 苏州金宏气体股份有限公司 一种高纯正硅酸乙酯的生产方法
JP7794330B2 (ja) * 2022-10-25 2026-01-06 信越化学工業株式会社 （メタ）アクリロキシ基を有する有機ケイ素化合物の製造方法およびアクリロキシ基を有する有機ケイ素化合物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3856081B2 (ja) * 2000-05-15 2006-12-13 信越化学工業株式会社 ハロプロピルジメチルクロロシラン化合物の製造方法
DE10053037C1 (de) * 2000-10-26 2002-01-17 Consortium Elektrochem Ind Herstellung von Organosilanen
FR2833265B1 (fr) * 2001-12-06 2006-02-10 Rhodia Chimie Sa Procede d'obtention de monoorganoxysilane polysulfures
FR2843392B1 (fr) * 2002-08-09 2004-09-10 Rhodia Chimie Sa Procede de preparation d'halogenoalkyldialkylchlorosilane

Also Published As

Publication number Publication date
CN1980941A (zh) 2007-06-13
US20080287700A1 (en) 2008-11-20
WO2006003323A1 (fr) 2006-01-12
FR2871802A1 (fr) 2005-12-23
JP2008502660A (ja) 2008-01-31
EP1756122B1 (fr) 2009-08-05
ATE438651T1 (de) 2009-08-15
FR2871802B1 (fr) 2006-07-21
US7741504B2 (en) 2010-06-22
EP1756122A1 (fr) 2007-02-28
DE602005015847D1 (de) 2009-09-17

Similar Documents

Publication Publication Date Title
JP5726294B2 (ja) ジオルガノジハロシランの調製方法
JP2606924B2 (ja) アミノプロピルシラン化合物の製造方法
JP5654490B2 (ja) 高沸点廃棄物の再生プロセス
JP2000095785A (ja) 高収率ヒドロシリル化方法
US20080045737A1 (en) Continuous Preparation of Organosilanes
JP6125646B2 (ja) ハロゲン化シラヒドロカルビレンの調製方法
JP5792828B2 (ja) トリハロシランを作製する方法
JP3786986B2 (ja) ベントガス流中の塩化物の回収法
JP4659029B2 (ja) オメガ−ハロアルキルジアルキルシランの製造方法
JP6040254B2 (ja) ジオルガノジハロシランの調製方法
US7307180B2 (en) Method of preparing halogenoalkyldialkyl chlorosilane
KR20110107349A (ko) 오가노할로하이드로실란의 제조 공정
CN103261208A (zh) 制备二有机二卤代硅烷的方法
EP2032588B1 (en) Method for preparation of alkoxysilanes having reduced halide content
JP2005511700A (ja) ポリスルフィドモノオルガノオキシシランの製造法
KR100517429B1 (ko) 유기 금속 화학 증착용 액체 전구체를 정제하는데 사용되는 물과 산성수의 용도
JP4120034B2 (ja) ハロオルガノシラン化合物の製造方法
JPH0344079B2 (https=)
JP5402808B2 (ja) ハロシリル化鎖状炭化水素の製造方法
JPH02235887A (ja) アルコキシシラン中の塩素含有物質の除去方法
JP2008502660A5 (https=)
JP2002205995A (ja) 含フッ素有機ケイ素化合物の製造法
JPH0741488A (ja) 長鎖ｎ−アルキル基含有シランの製造方法
FR2843391A1 (fr) Procede de preparation d'halogenoalkyldialkylchlorosilane

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100201

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100216

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100513

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20100513

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100727

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101025

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101214

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101224

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140107

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees