JP4649088B2 - 断熱且つプラズマ加熱される小型ガス分配プレートアレイを備えたプラズマリアクター用冷却天井 - Google Patents

断熱且つプラズマ加熱される小型ガス分配プレートアレイを備えたプラズマリアクター用冷却天井 Download PDF

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Publication number
JP4649088B2
JP4649088B2 JP2001545338A JP2001545338A JP4649088B2 JP 4649088 B2 JP4649088 B2 JP 4649088B2 JP 2001545338 A JP2001545338 A JP 2001545338A JP 2001545338 A JP2001545338 A JP 2001545338A JP 4649088 B2 JP4649088 B2 JP 4649088B2
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gas distribution
distribution plate
plasma
ceiling
gas
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JP2001545338A
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Japanese (ja)
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JP2003517198A5 (https=
JP2003517198A (ja
Inventor
ハミド ヌールバッシュ
マイケル ウェルチ
サイマック サリミアン
ポール ラッシャー
ホンチン シャン
カウシック ヴァイデャ
ジム カーデュッシ
エヴァンス リー
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2001545338A 1999-12-14 2000-12-11 断熱且つプラズマ加熱される小型ガス分配プレートアレイを備えたプラズマリアクター用冷却天井 Expired - Fee Related JP4649088B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/461,682 US6432259B1 (en) 1999-12-14 1999-12-14 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
US09/461,682 1999-12-14
PCT/US2000/042751 WO2001045135A2 (en) 1999-12-14 2000-12-11 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates

Publications (3)

Publication Number Publication Date
JP2003517198A JP2003517198A (ja) 2003-05-20
JP2003517198A5 JP2003517198A5 (https=) 2008-02-07
JP4649088B2 true JP4649088B2 (ja) 2011-03-09

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JP2001545338A Expired - Fee Related JP4649088B2 (ja) 1999-12-14 2000-12-11 断熱且つプラズマ加熱される小型ガス分配プレートアレイを備えたプラズマリアクター用冷却天井

Country Status (3)

Country Link
US (1) US6432259B1 (https=)
JP (1) JP4649088B2 (https=)
WO (1) WO2001045135A2 (https=)

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JP6503730B2 (ja) * 2014-12-22 2019-04-24 東京エレクトロン株式会社 成膜装置
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CN114623317B (zh) * 2020-12-11 2023-03-31 上海微电子装备（集团）股份有限公司 周期性结构、隔热装置和晶圆键合装置
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Also Published As

Publication number Publication date
US6432259B1 (en) 2002-08-13
WO2001045135A3 (en) 2002-03-14
WO2001045135A9 (en) 2002-08-15
WO2001045135A2 (en) 2001-06-21
JP2003517198A (ja) 2003-05-20

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