JP4648680B2 - 膜状音響結合変成器 - Google Patents
膜状音響結合変成器 Download PDFInfo
- Publication number
- JP4648680B2 JP4648680B2 JP2004313995A JP2004313995A JP4648680B2 JP 4648680 B2 JP4648680 B2 JP 4648680B2 JP 2004313995 A JP2004313995 A JP 2004313995A JP 2004313995 A JP2004313995 A JP 2004313995A JP 4648680 B2 JP4648680 B2 JP 4648680B2
- Authority
- JP
- Japan
- Prior art keywords
- acoustic
- fbar
- fbars
- sbar
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000008878 coupling Effects 0.000 title claims description 130
- 238000010168 coupling process Methods 0.000 title claims description 130
- 238000005859 coupling reaction Methods 0.000 title claims description 130
- 239000012528 membrane Substances 0.000 title claims description 52
- 239000000463 material Substances 0.000 claims description 124
- 239000004642 Polyimide Substances 0.000 claims description 12
- 229920001721 polyimide Polymers 0.000 claims description 12
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 claims description 10
- 239000004033 plastic Substances 0.000 claims description 10
- 229920003023 plastic Polymers 0.000 claims description 10
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 88
- 239000000758 substrate Substances 0.000 description 46
- 239000010409 thin film Substances 0.000 description 27
- 238000004519 manufacturing process Methods 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 19
- 238000000034 method Methods 0.000 description 18
- 230000008569 process Effects 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 11
- 239000000945 filler Substances 0.000 description 11
- 229910052750 molybdenum Inorganic materials 0.000 description 11
- 239000011733 molybdenum Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 238000010292 electrical insulation Methods 0.000 description 7
- 238000002955 isolation Methods 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 230000004044 response Effects 0.000 description 5
- 238000004804 winding Methods 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229920000052 poly(p-xylylene) Polymers 0.000 description 4
- 239000003870 refractory metal Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 2
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 239000010979 ruby Substances 0.000 description 2
- 229910001750 ruby Inorganic materials 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000009021 linear effect Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/60—Electric coupling means therefor
- H03H9/605—Electric coupling means therefor consisting of a ladder configuration
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/132—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials characterized by a particular shape
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/583—Multiple crystal filters implemented with thin-film techniques comprising a plurality of piezoelectric layers acoustically coupled
- H03H9/584—Coupled Resonator Filters [CFR]
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/586—Means for mounting to a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/587—Air-gaps
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/60—Electric coupling means therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49175—Parallel arrangements
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/0023—Balance-unbalance or balance-balance networks
- H03H9/0095—Balance-unbalance or balance-balance networks using bulk acoustic wave devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Description
106 スタック形バルク音響変成器
110 膜状バルク音響共鳴器
112、114 平面電極
116 圧電層
120 膜状バルク音響共鳴器
130 音響デカップラ
132、134 第1の端子
136、138 第2の端子
161 ブラッグ構造
200 音響結合変成器
206 第1のスタック形バルク音響変成器
208 第2のスタック形バルク音響変成器
210 膜状バルク音響共鳴器
212、214 平面電極
216 圧電層
220 膜状バルク音響共鳴器
230 音響デカップラ
231 音響デカップリング材料の層
241 第1の電気回路
242 第2の電気回路
Claims (16)
- 向かい合った平面電極および該電極間にある圧電材料の層を有する、スタック状の対をなす膜状バルク音響共鳴器(FBAR)、および前記FBAR間に設けられた音響デカップラを、それぞれが具備する、第1のスタック形バルク音響共鳴器(SBAR)および第2のスタック形バルク音響共鳴器と、
前記第1のSBARのFBARの一方を前記第2のSBARのFBARの一方に接続する第1の電気回路と、
前記第1のSBARのFBARの他方を前記第2のSBARのFBARの他方に接続する第2の電気回路と、
を備え、
前記第1の電気回路が、前記第1のSBARの前記FBARの一方と前記第2のSBARの前記FBARの一方を(a)並列及び(b)逆直列の一方をなすように接続することと、
前記第2の電気回路が、前記第1のSBARの前記FBARの他方と前記第2のSBARの前記FBARの他方を(a)並列及び(b)逆直列の一方をなすように接続することを特徴とする、
音響結合変成器。 - 各音響デカップラが音響デカップリング材料の層を有することを特徴とする、請求項1に記載の音響結合変成器。
- 前記圧電材料が音響インピーダンスを有することと、
前記音響デカップリング材料が、前記圧電材料の音響インピーダンスと空気の音響インピーダンスの中間の音響インピーダンスを有することを特徴とする、
請求項2に記載の音響結合変成器。 - 前記音響デカップリング材料にプラスチックが含まれる、請求項3に記載の音響結合変成器。
- 前記プラスチックに、ポリイミドとポリ(パラキシレン)の一方が含まれる、請求項4に記載の音響結合変成器。
- 前記変成器が、中心周波数によって特性が決まる通過帯域を有することと、
前記音響デカップリング材料の層の公称厚さが、前記中心周波数に等しい周波数を有する音波の、前記音響デカップリング材料内における波長の4分の1の奇整数倍に等しいことを特徴とする、
請求項2ないし5のいずれかに記載の音響結合変成器。 - 各音響デカップラがブラッグ構造を有する、請求項1に記載の音響結合変成器。
- 向かい合った平面電極および該電極間にある圧電材料の層を有する、スタック状の対をなす膜状バルク音響共鳴器(FBAR)、および前記FBAR間に設けられた音響デカップラを具備するスタック形バルク音響共鳴器(SBAR)と、
前記FBARの一方の電極に電気的に接続された第1の端子と、
前記FBARの他方の電極に電気的に接続された第2の端子と、
を備える、音響結合変成器であって、
前記音響デカップラがブラッグ構造を有し、
前記ブラッグ構造は、2個の高音響インピーダンスブラッグ素子の間に挟まれた低音響インピーダンスブラッグ素子を備え、
前記低音響インピーダンスブラッグ素子は、波長が前記変成器の中心周波数に等しい音波の、SiO 2 内における波長の四分の三に等しい公称厚さを備え、
前記高音響インピーダンスブラッグ素子の一方は、前記FBARのうちの一方の前記電極のうちの一つと同じ材料を用いた層であり、前記FBARのうちの一方の前記電極のうちの一つとして働き、
前記高音響インピーダンスブラッグ素子の他方は、前記FBARのうちの他方の前記電極のうちの一つと同じ材料を用いた層であり、前記FBARのうちの他方の前記電極のうちの一つとして働き、
前記2つの高音響インピーダンスブラッグ素子は、波長が前記変成器の中心周波数に等しい音波の、それぞれの材料内における波長の四分の一に等しい公称厚さを備える、
音響結合変成器。 - 向かい合った平面電極および該電極間にある圧電材料の層を有する、スタック状の対をなす膜状バルク音響共鳴器(FBAR)、および前記FBAR間に設けられた音響デカップラを、それぞれが具備する、第1のスタック形バルク音響共鳴器(SBAR)および第2のスタック形バルク音響共鳴器と、
前記第1のSBARのFBARの一方を前記第2のSBARのFBARの一方に接続する第1の電気回路と、
前記第1のSBARのFBARの他方を前記第2のSBARのFBARの他方に接続する第2の電気回路と、
を備える、音響結合変成器であって、
前記音響デカップラがブラッグ構造を有し、
前記ブラッグ構造は、2個の高音響インピーダンスブラッグ素子の間に挟まれた低音響インピーダンスブラッグ素子を備え、
前記低音響インピーダンスブラッグ素子は、波長が前記変成器の中心周波数に等しい音波の、SiO 2 内における波長の四分の三に等しい公称厚さを備え、
前記高音響インピーダンスブラッグ素子の一方は、前記FBARのうちの一方の前記電極のうちの一つと同じ材料を用いた層であり、前記FBARのうちの一方の前記電極のうちの一つとして働き、
前記高音響インピーダンスブラッグ素子の他方は、前記FBARのうちの他方の前記電極のうちの一つと同じ材料を用いた層であり、前記FBARのうちの他方の前記電極のうちの一つとして働き、
前記2つの高音響インピーダンスブラッグ素子は、波長が前記変成器の中心周波数に等しい音波の、それぞれの材料内における波長の四分の一に等しい公称厚さを備える、
音響結合変成器。 - 前記第1の電気回路が、前記第1のSBARの前記FBARの一方と前記第2のSBARの前記FBARの一方を(a)直列及び(b)逆並列の一方をなすように接続することと、
前記第2の電気回路が、前記第1のSBARの前記FBARの他方と前記第2のSBARの前記FBARの他方を(a)直列及び(b)逆並列の一方をなすように接続することを特徴とする、
請求項9に記載の音響結合変成器。 - 前記第1の電気回路が、前記第1のSBARの前記FBARの一方と前記第2のSBARの前記FBARの一方を(a)並列及び(b)逆直列の一方をなすように接続することと、
前記第2の電気回路が、前記第1のSBARの前記FBARの他方と前記第2のSBARの前記FBARの他方を(a)並列及び(b)逆直列の一方をなすように接続することを特徴とする、
請求項9に記載の音響結合変成器。 - 各音響デカップラが音響デカップリング材料の層を有することを特徴とする、請求項8ないし11のいずれかに記載の音響結合変成器。
- 前記圧電材料が音響インピーダンスを有することと、
前記音響デカップリング材料が、前記圧電材料の音響インピーダンスと空気の音響インピーダンスの中間の音響インピーダンスを有することを特徴とする、
請求項12に記載の音響結合変成器。 - 前記音響デカップリング材料にプラスチックが含まれる、請求項13に記載の音響結合変成器。
- 前記プラスチックに、ポリイミドとポリ(パラキシレン)の一方が含まれる、請求項14に記載の音響結合変成器。
- 前記変成器が、中心周波数によって特性が決まる通過帯域を有することと、
前記音響デカップリング材料の層の公称厚さが、前記中心周波数に等しい周波数を有する音波の、前記音響デカップリング材料内における波長の4分の1の奇整数倍に等しいことを特徴とする、
請求項12ないし15のいずれかに記載の音響結合変成器。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/699,481 US6946928B2 (en) | 2003-10-30 | 2003-10-30 | Thin-film acoustically-coupled transformer |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005137001A JP2005137001A (ja) | 2005-05-26 |
JP4648680B2 true JP4648680B2 (ja) | 2011-03-09 |
Family
ID=34423456
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004313995A Expired - Fee Related JP4648680B2 (ja) | 2003-10-30 | 2004-10-28 | 膜状音響結合変成器 |
JP2006538339A Expired - Fee Related JP4796501B2 (ja) | 2003-10-30 | 2004-10-29 | コモンモード除去が増大された薄膜音響結合変成器 |
JP2006538279A Expired - Fee Related JP4701183B2 (ja) | 2003-10-30 | 2004-10-29 | 薄膜音響結合変成器におけるインピーダンス変換比の制御 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006538339A Expired - Fee Related JP4796501B2 (ja) | 2003-10-30 | 2004-10-29 | コモンモード除去が増大された薄膜音響結合変成器 |
JP2006538279A Expired - Fee Related JP4701183B2 (ja) | 2003-10-30 | 2004-10-29 | 薄膜音響結合変成器におけるインピーダンス変換比の制御 |
Country Status (7)
Country | Link |
---|---|
US (5) | US6946928B2 (ja) |
EP (1) | EP1528675B1 (ja) |
JP (3) | JP4648680B2 (ja) |
CN (5) | CN100555851C (ja) |
DE (3) | DE602004020435D1 (ja) |
GB (2) | GB2421379B (ja) |
WO (2) | WO2005043752A1 (ja) |
Families Citing this family (187)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100107389A1 (en) * | 2002-01-11 | 2010-05-06 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Method of fabricating an electrode for a bulk acoustic resonator |
US7044196B2 (en) * | 2003-01-31 | 2006-05-16 | Cooligy,Inc | Decoupled spring-loaded mounting apparatus and method of manufacturing thereof |
US7275292B2 (en) | 2003-03-07 | 2007-10-02 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Method for fabricating an acoustical resonator on a substrate |
FR2853473B1 (fr) * | 2003-04-01 | 2005-07-01 | St Microelectronics Sa | Composant electronique comprenant un resonateur et procede de fabrication |
DE10319554B4 (de) * | 2003-04-30 | 2018-05-09 | Snaptrack, Inc. | Mit akustischen Volumenwellen arbeitendes Bauelement mit gekoppelten Resonatoren |
US8766745B1 (en) | 2007-07-25 | 2014-07-01 | Hrl Laboratories, Llc | Quartz-based disk resonator gyro with ultra-thin conductive outer electrodes and method of making same |
US7994877B1 (en) * | 2008-11-10 | 2011-08-09 | Hrl Laboratories, Llc | MEMS-based quartz hybrid filters and a method of making the same |
US7362198B2 (en) * | 2003-10-30 | 2008-04-22 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd | Pass bandwidth control in decoupled stacked bulk acoustic resonator devices |
US7019605B2 (en) * | 2003-10-30 | 2006-03-28 | Larson Iii John D | Stacked bulk acoustic resonator band-pass filter with controllable pass bandwidth |
DE602004000851T2 (de) * | 2003-10-30 | 2007-05-16 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Akustisch gekoppelter Dünnschicht-Transformator mit zwei piezoelektrischen Elementen, welche entgegengesetzte C-Axen Orientierung besitzten |
US7242270B2 (en) * | 2003-10-30 | 2007-07-10 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Decoupled stacked bulk acoustic resonator-based band-pass filter |
US6946928B2 (en) * | 2003-10-30 | 2005-09-20 | Agilent Technologies, Inc. | Thin-film acoustically-coupled transformer |
US7332985B2 (en) * | 2003-10-30 | 2008-02-19 | Avago Technologies Wireless Ip (Singapore) Pte Ltd. | Cavity-less film bulk acoustic resonator (FBAR) devices |
JP4488167B2 (ja) * | 2003-12-18 | 2010-06-23 | Tdk株式会社 | フィルタ |
US7388454B2 (en) | 2004-10-01 | 2008-06-17 | Avago Technologies Wireless Ip Pte Ltd | Acoustic resonator performance enhancement using alternating frame structure |
US8981876B2 (en) | 2004-11-15 | 2015-03-17 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Piezoelectric resonator structures and electrical filters having frame elements |
US7202560B2 (en) | 2004-12-15 | 2007-04-10 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Wafer bonding of micro-electro mechanical systems to active circuitry |
US7791434B2 (en) | 2004-12-22 | 2010-09-07 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic resonator performance enhancement using selective metal etch and having a trench in the piezoelectric |
JP4622574B2 (ja) * | 2005-02-21 | 2011-02-02 | 株式会社デンソー | 超音波素子 |
US7427819B2 (en) * | 2005-03-04 | 2008-09-23 | Avago Wireless Ip Pte Ltd | Film-bulk acoustic wave resonator with motion plate and method |
US7369013B2 (en) | 2005-04-06 | 2008-05-06 | Avago Technologies Wireless Ip Pte Ltd | Acoustic resonator performance enhancement using filled recessed region |
US7436269B2 (en) * | 2005-04-18 | 2008-10-14 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustically coupled resonators and method of making the same |
US7934884B2 (en) * | 2005-04-27 | 2011-05-03 | Lockhart Industries, Inc. | Ring binder cover |
US7276892B2 (en) * | 2005-04-29 | 2007-10-02 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Resonator based spectrum analyzer and method |
US7562429B2 (en) * | 2005-06-20 | 2009-07-21 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Suspended device and method of making |
DE102005028927B4 (de) * | 2005-06-22 | 2007-02-15 | Infineon Technologies Ag | BAW-Vorrichtung |
US7443269B2 (en) | 2005-07-27 | 2008-10-28 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Method and apparatus for selectively blocking radio frequency (RF) signals in a radio frequency (RF) switching circuit |
US7185695B1 (en) * | 2005-09-01 | 2007-03-06 | United Technologies Corporation | Investment casting pattern manufacture |
FR2890490A1 (fr) * | 2005-09-05 | 2007-03-09 | St Microelectronics Sa | Support de resonateur acoustique et circuit integre correspondant |
US7868522B2 (en) | 2005-09-09 | 2011-01-11 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Adjusted frequency temperature coefficient resonator |
US8094704B2 (en) * | 2005-09-15 | 2012-01-10 | Avago Technologies Wiresless IP (Singapore) Pte. Ltd. | Detecting wireless channel status from acoustic discrimination of spectral content |
US7391286B2 (en) * | 2005-10-06 | 2008-06-24 | Avago Wireless Ip Pte Ltd | Impedance matching and parasitic capacitor resonance of FBAR resonators and coupled filters |
US20070085632A1 (en) * | 2005-10-18 | 2007-04-19 | Larson John D Iii | Acoustic galvanic isolator |
US7737807B2 (en) | 2005-10-18 | 2010-06-15 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating series-connected decoupled stacked bulk acoustic resonators |
US7425787B2 (en) * | 2005-10-18 | 2008-09-16 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating single insulated decoupled stacked bulk acoustic resonator with acoustically-resonant electrical insulator |
US7423503B2 (en) * | 2005-10-18 | 2008-09-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating film acoustically-coupled transformer |
US7675390B2 (en) | 2005-10-18 | 2010-03-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating single decoupled stacked bulk acoustic resonator |
US7525398B2 (en) | 2005-10-18 | 2009-04-28 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustically communicating data signals across an electrical isolation barrier |
US7463499B2 (en) * | 2005-10-31 | 2008-12-09 | Avago Technologies General Ip (Singapore) Pte Ltd. | AC-DC power converter |
US7561009B2 (en) * | 2005-11-30 | 2009-07-14 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Film bulk acoustic resonator (FBAR) devices with temperature compensation |
JP5103873B2 (ja) * | 2005-12-07 | 2012-12-19 | セイコーエプソン株式会社 | 静電型超音波トランスデューサの駆動制御方法、静電型超音波トランスデューサ、これを用いた超音波スピーカ、音声信号再生方法、超指向性音響システム及び表示装置 |
US7867636B2 (en) * | 2006-01-11 | 2011-01-11 | Murata Manufacturing Co., Ltd. | Transparent conductive film and method for manufacturing the same |
US7514844B2 (en) * | 2006-01-23 | 2009-04-07 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic data coupling system and method |
US7586392B2 (en) * | 2006-01-23 | 2009-09-08 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Dual path acoustic data coupling system and method |
US7612636B2 (en) * | 2006-01-30 | 2009-11-03 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Impedance transforming bulk acoustic wave baluns |
US20070210748A1 (en) * | 2006-03-09 | 2007-09-13 | Mark Unkrich | Power supply and electronic device having integrated power supply |
US20070210724A1 (en) * | 2006-03-09 | 2007-09-13 | Mark Unkrich | Power adapter and DC-DC converter having acoustic transformer |
US7746677B2 (en) | 2006-03-09 | 2010-06-29 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | AC-DC converter circuit and power supply |
US7479685B2 (en) * | 2006-03-10 | 2009-01-20 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Electronic device on substrate with cavity and mitigated parasitic leakage path |
US7629865B2 (en) * | 2006-05-31 | 2009-12-08 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Piezoelectric resonator structures and electrical filters |
US7586389B2 (en) * | 2006-06-19 | 2009-09-08 | Maxim Integrated Products, Inc. | Impedance transformation and filter using bulk acoustic wave technology |
US7598827B2 (en) | 2006-06-19 | 2009-10-06 | Maxim Integrated Products | Harmonic termination of power amplifiers using BAW filter output matching circuits |
DE102006032950B4 (de) * | 2006-07-17 | 2010-07-22 | Epcos Ag | Schaltung mit BAW-Resonatoren |
JP5036435B2 (ja) * | 2006-09-01 | 2012-09-26 | 太陽誘電株式会社 | 弾性波デバイス、フィルタおよび分波器 |
US7508286B2 (en) * | 2006-09-28 | 2009-03-24 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | HBAR oscillator and method of manufacture |
US20080202239A1 (en) * | 2007-02-28 | 2008-08-28 | Fazzio R Shane | Piezoelectric acceleration sensor |
CN100547396C (zh) * | 2007-05-08 | 2009-10-07 | 中国科学院上海微系统与信息技术研究所 | 一种应用于生物微质量检测的硅基压电薄膜传感器及制作方法 |
US7982363B2 (en) * | 2007-05-14 | 2011-07-19 | Cree, Inc. | Bulk acoustic device and method for fabricating |
US10266398B1 (en) | 2007-07-25 | 2019-04-23 | Hrl Laboratories, Llc | ALD metal coatings for high Q MEMS structures |
CN101548343A (zh) * | 2007-09-05 | 2009-09-30 | 株式会社村田制作所 | 透明导电膜及透明导电膜的制造方法 |
CN101384133B (zh) * | 2007-09-07 | 2011-11-16 | 富葵精密组件(深圳)有限公司 | 对位方法 |
US20090079514A1 (en) | 2007-09-24 | 2009-03-26 | Tiberiu Jamneala | Hybrid acoustic resonator-based filters |
US7791435B2 (en) | 2007-09-28 | 2010-09-07 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Single stack coupled resonators having differential output |
US7786826B2 (en) * | 2007-10-12 | 2010-08-31 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Apparatus with acoustically coupled BAW resonators and a method for matching impedances |
US8018303B2 (en) * | 2007-10-12 | 2011-09-13 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic wave device |
US8151640B1 (en) | 2008-02-05 | 2012-04-10 | Hrl Laboratories, Llc | MEMS on-chip inertial navigation system with error correction |
US7802356B1 (en) | 2008-02-21 | 2010-09-28 | Hrl Laboratories, Llc | Method of fabricating an ultra thin quartz resonator component |
US8179025B1 (en) | 2008-02-29 | 2012-05-15 | University Of Maryland College Park | Lead-free piezoceramic materials |
US7732977B2 (en) | 2008-04-30 | 2010-06-08 | Avago Technologies Wireless Ip (Singapore) | Transceiver circuit for film bulk acoustic resonator (FBAR) transducers |
US7855618B2 (en) | 2008-04-30 | 2010-12-21 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic resonator electrical impedance transformers |
JP5226409B2 (ja) | 2008-07-17 | 2013-07-03 | 太陽誘電株式会社 | 共振デバイス、通信モジュール、通信装置、共振デバイスの製造方法 |
JP5220503B2 (ja) * | 2008-07-23 | 2013-06-26 | 太陽誘電株式会社 | 弾性波デバイス |
FR2939986A1 (fr) * | 2008-12-12 | 2010-06-18 | St Microelectronics Sa | Circuit de filtrage comportant des resonateurs baw couples et autorisant une adaptation d'impedance |
CN102273073B (zh) | 2009-01-09 | 2014-01-01 | 太阳诱电株式会社 | 滤波元件、分波器以及电子装置 |
US8291559B2 (en) * | 2009-02-24 | 2012-10-23 | Epcos Ag | Process for adapting resonance frequency of a BAW resonator |
JP5578797B2 (ja) * | 2009-03-13 | 2014-08-27 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
DE102009014068B4 (de) * | 2009-03-20 | 2011-01-13 | Epcos Ag | Kompaktes, hochintegriertes elektrisches Modul mit Verschaltung aus BAW-Filter und Symmetrierschaltung und Herstellungsverfahren |
US8198958B1 (en) * | 2009-03-30 | 2012-06-12 | Triquint Semiconductor, Inc. | Power amplifier matching RF system and method using bulk acoustics wave device |
EP2237416A1 (en) * | 2009-03-30 | 2010-10-06 | Nxp B.V. | Device comprising an electroacoustic balun |
US8248185B2 (en) | 2009-06-24 | 2012-08-21 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic resonator structure comprising a bridge |
US8902023B2 (en) | 2009-06-24 | 2014-12-02 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator structure having an electrode with a cantilevered portion |
US8176607B1 (en) | 2009-10-08 | 2012-05-15 | Hrl Laboratories, Llc | Method of fabricating quartz resonators |
US8193877B2 (en) | 2009-11-30 | 2012-06-05 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Duplexer with negative phase shifting circuit |
JP5617523B2 (ja) * | 2009-12-08 | 2014-11-05 | 株式会社村田製作所 | 積層型圧電薄膜フィルタの製造方法 |
FR2954626B1 (fr) | 2009-12-23 | 2013-12-06 | Commissariat Energie Atomique | Resonateur acoustique comprenant un electret, et procede de fabrication de ce resonateur, application aux filtres commutables a resonateurs couples |
US8673121B2 (en) | 2010-01-22 | 2014-03-18 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Method of fabricating piezoelectric materials with opposite C-axis orientations |
US9679765B2 (en) | 2010-01-22 | 2017-06-13 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Method of fabricating rare-earth doped piezoelectric material with various amounts of dopants and a selected C-axis orientation |
US8796904B2 (en) | 2011-10-31 | 2014-08-05 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Bulk acoustic resonator comprising piezoelectric layer and inverse piezoelectric layer |
US9243316B2 (en) | 2010-01-22 | 2016-01-26 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Method of fabricating piezoelectric material with selected c-axis orientation |
DE102010005906A1 (de) * | 2010-01-27 | 2011-07-28 | Epcos Ag, 81669 | Piezoelektrisches Bauelement |
US8587391B2 (en) * | 2010-02-23 | 2013-11-19 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic coupling layer for coupled resonator filters and method of fabricating acoustic coupling layer |
US8508315B2 (en) * | 2010-02-23 | 2013-08-13 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustically coupled resonator filter with impedance transformation ratio controlled by resonant frequency difference between two coupled resonators |
US8283999B2 (en) * | 2010-02-23 | 2012-10-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic resonator structures comprising a single material acoustic coupling layer comprising inhomogeneous acoustic property |
JP5519326B2 (ja) * | 2010-02-25 | 2014-06-11 | 太陽誘電株式会社 | フィルタ、デュープレクサ、通信モジュール、通信装置 |
US8390397B2 (en) * | 2010-03-29 | 2013-03-05 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic resonator structure comprising hybrid electrodes |
US8912711B1 (en) | 2010-06-22 | 2014-12-16 | Hrl Laboratories, Llc | Thermal stress resistant resonator, and a method for fabricating same |
JP5187597B2 (ja) * | 2010-07-05 | 2013-04-24 | 株式会社村田製作所 | 弾性波素子 |
US8674789B2 (en) * | 2010-07-07 | 2014-03-18 | Wei Pang | Serially connected first and second coupled resonator filters configured to provide at least one feedback capacitor |
US8232845B2 (en) | 2010-09-27 | 2012-07-31 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Packaged device with acoustic resonator and electronic circuitry and method of making the same |
FR2966306B1 (fr) | 2010-10-15 | 2013-06-14 | Commissariat Energie Atomique | Filtre baw a couplage lateral utilisant des cristaux phononiques |
US9608589B2 (en) * | 2010-10-26 | 2017-03-28 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Method of forming acoustic resonator using intervening seed layer |
JP5643056B2 (ja) * | 2010-11-01 | 2014-12-17 | 太陽誘電株式会社 | 弾性波デバイス |
CN102056037B (zh) * | 2010-12-20 | 2014-08-13 | 张�浩 | 声耦合器件 |
CN102075161B (zh) * | 2011-01-20 | 2013-06-05 | 张�浩 | 声波器件及其制作方法 |
JP5360432B2 (ja) * | 2011-01-27 | 2013-12-04 | 株式会社村田製作所 | 圧電デバイス |
US8962443B2 (en) | 2011-01-31 | 2015-02-24 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Semiconductor device having an airbridge and method of fabricating the same |
US9048812B2 (en) | 2011-02-28 | 2015-06-02 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Bulk acoustic wave resonator comprising bridge formed within piezoelectric layer |
US9154112B2 (en) | 2011-02-28 | 2015-10-06 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Coupled resonator filter comprising a bridge |
US9425764B2 (en) | 2012-10-25 | 2016-08-23 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Accoustic resonator having composite electrodes with integrated lateral features |
US9203374B2 (en) | 2011-02-28 | 2015-12-01 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Film bulk acoustic resonator comprising a bridge |
US9083302B2 (en) | 2011-02-28 | 2015-07-14 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Stacked bulk acoustic resonator comprising a bridge and an acoustic reflector along a perimeter of the resonator |
US9148117B2 (en) | 2011-02-28 | 2015-09-29 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Coupled resonator filter comprising a bridge and frame elements |
US9136818B2 (en) | 2011-02-28 | 2015-09-15 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Stacked acoustic resonator comprising a bridge |
US9401692B2 (en) | 2012-10-29 | 2016-07-26 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator having collar structure |
US9444426B2 (en) | 2012-10-25 | 2016-09-13 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Accoustic resonator having integrated lateral feature and temperature compensation feature |
US8575820B2 (en) | 2011-03-29 | 2013-11-05 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Stacked bulk acoustic resonator |
US9490771B2 (en) | 2012-10-29 | 2016-11-08 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator comprising collar and frame |
US9490418B2 (en) | 2011-03-29 | 2016-11-08 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator comprising collar and acoustic reflector with temperature compensating layer |
US8551251B2 (en) * | 2011-04-28 | 2013-10-08 | Lam Research Ag | Ultrasonic treatment method and apparatus |
US8350445B1 (en) | 2011-06-16 | 2013-01-08 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic resonator comprising non-piezoelectric layer and bridge |
US9069005B2 (en) | 2011-06-17 | 2015-06-30 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Capacitance detector for accelerometer and gyroscope and accelerometer and gyroscope with capacitance detector |
US8922302B2 (en) | 2011-08-24 | 2014-12-30 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator formed on a pedestal |
US8649820B2 (en) | 2011-11-07 | 2014-02-11 | Blackberry Limited | Universal integrated circuit card apparatus and related methods |
CN102427094B (zh) * | 2011-11-10 | 2013-08-28 | 郭磊 | 一种半导体直流光电变压器 |
US9391226B2 (en) | 2011-11-10 | 2016-07-12 | Lei Guo | Semiconductor DC transformer |
CN102832287B (zh) * | 2011-11-10 | 2015-11-25 | 郭磊 | 一种半导体直流光电变压器 |
US8936199B2 (en) | 2012-04-13 | 2015-01-20 | Blackberry Limited | UICC apparatus and related methods |
USD703208S1 (en) | 2012-04-13 | 2014-04-22 | Blackberry Limited | UICC apparatus |
USD701864S1 (en) | 2012-04-23 | 2014-04-01 | Blackberry Limited | UICC apparatus |
US9804126B2 (en) * | 2012-09-04 | 2017-10-31 | Veeco Instruments Inc. | Apparatus and method for improved acoustical transformation |
WO2014050482A1 (ja) * | 2012-09-28 | 2014-04-03 | 株式会社村田製作所 | インピーダンス変換回路の設計方法 |
US9385684B2 (en) | 2012-10-23 | 2016-07-05 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator having guard ring |
JP6135184B2 (ja) | 2013-02-28 | 2017-05-31 | セイコーエプソン株式会社 | 超音波トランスデューサーデバイス、ヘッドユニット、プローブ及び超音波画像装置 |
JP6135185B2 (ja) | 2013-02-28 | 2017-05-31 | セイコーエプソン株式会社 | 超音波トランスデューサーデバイス、ヘッドユニット、プローブ、超音波画像装置及び電子機器 |
JP6185292B2 (ja) | 2013-06-10 | 2017-08-23 | 太陽誘電株式会社 | 弾性波デバイス |
US9599470B1 (en) | 2013-09-11 | 2017-03-21 | Hrl Laboratories, Llc | Dielectric high Q MEMS shell gyroscope structure |
US9977097B1 (en) | 2014-02-21 | 2018-05-22 | Hrl Laboratories, Llc | Micro-scale piezoelectric resonating magnetometer |
US9368564B2 (en) * | 2014-03-28 | 2016-06-14 | Qualcomm Incorporated | 3D pillar inductor |
US9991863B1 (en) | 2014-04-08 | 2018-06-05 | Hrl Laboratories, Llc | Rounded and curved integrated tethers for quartz resonators |
US9929714B2 (en) * | 2014-04-13 | 2018-03-27 | Texas Instruments Incorporated | Temperature compensated bulk acoustic wave resonator with a high coupling coefficient |
US10340885B2 (en) | 2014-05-08 | 2019-07-02 | Avago Technologies International Sales Pte. Limited | Bulk acoustic wave devices with temperature-compensating niobium alloy electrodes |
DE102015107569A1 (de) | 2014-05-15 | 2015-11-19 | Avago Technologies General Ip Pte. Ltd. | Verfahren zur Herstellung von mit Seltenerdelement dotiertem piezoelektrischen Material mit verschiedenen Mengen an Dotiermittel und einer ausgewählten C-Achsen Orientierung |
US10308505B1 (en) | 2014-08-11 | 2019-06-04 | Hrl Laboratories, Llc | Method and apparatus for the monolithic encapsulation of a micro-scale inertial navigation sensor suite |
US9698756B2 (en) | 2014-12-24 | 2017-07-04 | Qorvo Us, Inc. | Acoustic RF resonator parallel capacitance compensation |
US20160191015A1 (en) * | 2014-12-27 | 2016-06-30 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Split current bulk acoustic wave (baw) resonators |
US10031191B1 (en) | 2015-01-16 | 2018-07-24 | Hrl Laboratories, Llc | Piezoelectric magnetometer capable of sensing a magnetic field in multiple vectors |
US9915232B2 (en) * | 2015-02-23 | 2018-03-13 | Lao Khang | Throttle body neck for an intake manifold |
US9602076B1 (en) * | 2015-05-19 | 2017-03-21 | Qorvo Us, Inc. | Resonators with balancing capacitor |
EP3365669B8 (en) * | 2015-10-21 | 2024-03-13 | Qorvo Us, Inc. | Resonator structure with enhanced reflection of shear and longitudinal modes of acoustic vibrations |
TW201719963A (zh) * | 2015-11-24 | 2017-06-01 | Prosperity Dielectrics Co Ltd | 高頻傳輸線之阻抗匹配轉換器 |
US10175307B1 (en) | 2016-01-15 | 2019-01-08 | Hrl Laboratories, Llc | FM demodulation system for quartz MEMS magnetometer |
US20170288122A1 (en) * | 2016-03-29 | 2017-10-05 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Baw resonator having thin seed layer |
US10581156B2 (en) | 2016-05-04 | 2020-03-03 | Qorvo Us, Inc. | Compensation circuit to mitigate antenna-to-antenna coupling |
CN109314503B (zh) * | 2016-06-07 | 2022-08-12 | 株式会社村田制作所 | 弹性波装置及其制造方法 |
US10581403B2 (en) | 2016-07-11 | 2020-03-03 | Qorvo Us, Inc. | Device having a titanium-alloyed surface |
KR102066960B1 (ko) * | 2016-08-03 | 2020-01-16 | 삼성전기주식회사 | 박막 벌크 음향 공진기 및 이를 포함하는 필터 |
US11050412B2 (en) * | 2016-09-09 | 2021-06-29 | Qorvo Us, Inc. | Acoustic filter using acoustic coupling |
US10367470B2 (en) | 2016-10-19 | 2019-07-30 | Qorvo Us, Inc. | Wafer-level-packaged BAW devices with surface mount connection structures |
KR20180048244A (ko) * | 2016-10-31 | 2018-05-10 | 삼성전기주식회사 | 체적 음향 공진기를 포함하는 필터 |
JP6661521B2 (ja) * | 2016-12-05 | 2020-03-11 | 太陽誘電株式会社 | フィルタおよびマルチプレクサ |
US11165412B2 (en) | 2017-01-30 | 2021-11-02 | Qorvo Us, Inc. | Zero-output coupled resonator filter and related radio frequency filter circuit |
US11165413B2 (en) | 2017-01-30 | 2021-11-02 | Qorvo Us, Inc. | Coupled resonator structure |
CN107196618A (zh) * | 2017-02-16 | 2017-09-22 | 杭州左蓝微电子技术有限公司 | 薄膜体声波谐振器及其制备方法 |
US10256788B2 (en) | 2017-03-31 | 2019-04-09 | Avago Technologies International Sales Pte. Limited | Acoustic resonator including extended cavity |
US10873318B2 (en) | 2017-06-08 | 2020-12-22 | Qorvo Us, Inc. | Filter circuits having acoustic wave resonators in a transversal configuration |
US10686425B2 (en) | 2017-06-30 | 2020-06-16 | Texas Instruments Incorporated | Bulk acoustic wave resonators having convex surfaces, and methods of forming the same |
US10615772B2 (en) | 2017-06-30 | 2020-04-07 | Texas Instruments Incorporated | Acoustic wave resonators having Fresnel surfaces |
US10622966B2 (en) | 2017-07-26 | 2020-04-14 | Texas Instruments Incorporated | Bulk acoustic wave resonators having a phononic crystal acoustic mirror |
US10855251B2 (en) | 2017-08-08 | 2020-12-01 | Texas Instruments Incorporated | Unreleased plane acoustic wave resonators |
US10361676B2 (en) | 2017-09-29 | 2019-07-23 | Qorvo Us, Inc. | Baw filter structure with internal electrostatic shielding |
TW202208178A (zh) * | 2018-01-15 | 2022-03-01 | 美商羅門哈斯電子材料有限公司 | 聲波感測器及感測氣相分析物之方法 |
US11152913B2 (en) | 2018-03-28 | 2021-10-19 | Qorvo Us, Inc. | Bulk acoustic wave (BAW) resonator |
US10574184B2 (en) * | 2018-05-01 | 2020-02-25 | Texas Instruments Incorporated | Stacked-die bulk acoustic wave oscillator package |
KR102066962B1 (ko) * | 2018-05-04 | 2020-01-16 | 삼성전기주식회사 | 체적 음향 공진기를 포함하는 필터 |
CN109639251A (zh) * | 2018-12-10 | 2019-04-16 | 开元通信技术(厦门)有限公司 | 体声波谐振器及其制作方法、滤波器 |
CN111010110A (zh) * | 2019-03-12 | 2020-04-14 | 天津大学 | 考虑距离的薄膜封装的mems器件组件及电子设备 |
US11146247B2 (en) | 2019-07-25 | 2021-10-12 | Qorvo Us, Inc. | Stacked crystal filter structures |
CN111146327A (zh) * | 2019-12-25 | 2020-05-12 | 诺思(天津)微系统有限责任公司 | 单晶压电结构及其制造方法、单晶压电层叠结构的电子设备 |
US11757430B2 (en) | 2020-01-07 | 2023-09-12 | Qorvo Us, Inc. | Acoustic filter circuit for noise suppression outside resonance frequency |
US11146245B2 (en) | 2020-01-13 | 2021-10-12 | Qorvo Us, Inc. | Mode suppression in acoustic resonators |
US11146246B2 (en) | 2020-01-13 | 2021-10-12 | Qorvo Us, Inc. | Phase shift structures for acoustic resonators |
CN111669141B (zh) * | 2020-05-29 | 2021-11-02 | 见闻录(浙江)半导体有限公司 | 一种体声波谐振器的电极结构及制作工艺 |
CN111755591A (zh) * | 2020-06-22 | 2020-10-09 | 济南晶正电子科技有限公司 | 一种压电薄膜体及其制备方法、空腔型器件及其制备方法 |
CN112234949A (zh) * | 2020-10-29 | 2021-01-15 | 武汉大学 | 一种多频段可调谐的三维体声波谐振器 |
US11632097B2 (en) | 2020-11-04 | 2023-04-18 | Qorvo Us, Inc. | Coupled resonator filter device |
US11575363B2 (en) | 2021-01-19 | 2023-02-07 | Qorvo Us, Inc. | Hybrid bulk acoustic wave filter |
CN113541638A (zh) * | 2021-07-29 | 2021-10-22 | 绍兴汉天下微电子有限公司 | 滤波器及其制备方法、双工器 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003505905A (ja) * | 1999-07-19 | 2003-02-12 | ノキア コーポレイション | 共振子構造及びそのような共振子構造を有するフィルター |
US20030128081A1 (en) * | 2002-01-09 | 2003-07-10 | Nokia Corporation | Bulk acoustic wave resonator with two piezoelectric layers as balun in filters and duplexers |
Family Cites Families (155)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1307476A (fr) * | 1960-12-12 | 1962-10-26 | U S Sonics Corp | Amplificateur sélecteur de fréquences |
US3189851A (en) * | 1962-06-04 | 1965-06-15 | Sonus Corp | Piezoelectric filter |
US3321648A (en) * | 1964-06-04 | 1967-05-23 | Sonus Corp | Piezoelectric filter element |
GB1207974A (en) | 1966-11-17 | 1970-10-07 | Clevite Corp | Frequency selective apparatus including a piezoelectric device |
US3422371A (en) * | 1967-07-24 | 1969-01-14 | Sanders Associates Inc | Thin film piezoelectric oscillator |
US3826931A (en) | 1967-10-26 | 1974-07-30 | Hewlett Packard Co | Dual crystal resonator apparatus |
US3582839A (en) | 1968-06-06 | 1971-06-01 | Clevite Corp | Composite coupled-mode filter |
US3607761A (en) | 1968-12-09 | 1971-09-21 | Continental Oil Co | Soap bars containing salts of fatty acids derived from the guerbet reaction |
US3610969A (en) | 1970-02-06 | 1971-10-05 | Mallory & Co Inc P R | Monolithic piezoelectric resonator for use as filter or transformer |
US3845402A (en) | 1973-02-15 | 1974-10-29 | Edmac Ass Inc | Sonobuoy receiver system, floating coupler |
FR2380666A1 (fr) | 1977-02-14 | 1978-09-08 | Cii Honeywell Bull | Systeme de commande de decoupage pour convertisseur dans une alimentation electrique continue |
US4084217A (en) | 1977-04-19 | 1978-04-11 | Bbc Brown, Boveri & Company, Limited | Alternating-current fed power supply |
GB2033185B (en) | 1978-09-22 | 1983-05-18 | Secr Defence | Acoustic wave device with temperature stabilisation |
US4281299A (en) | 1979-11-23 | 1981-07-28 | Honeywell Inc. | Signal isolator |
ZA81781B (en) | 1980-02-13 | 1982-03-31 | Int Computers Ltd | Digital systems |
US4320365A (en) | 1980-11-03 | 1982-03-16 | United Technologies Corporation | Fundamental, longitudinal, thickness mode bulk wave resonator |
US4373177A (en) * | 1981-09-30 | 1983-02-08 | Sprague Electric Company | High temperature electrolytic capacitor |
JPS58137317A (ja) | 1982-02-09 | 1983-08-15 | Nec Corp | 圧電薄膜複合振動子 |
GB2137056B (en) | 1983-03-16 | 1986-09-03 | Standard Telephones Cables Ltd | Communications apparatus |
US4625138A (en) | 1984-10-24 | 1986-11-25 | The United States Of America As Represented By The Secretary Of The Army | Piezoelectric microwave resonator using lateral excitation |
US4719383A (en) | 1985-05-20 | 1988-01-12 | The United States Of America As Represented By The United States Department Of Energy | Piezoelectric shear wave resonator and method of making same |
SE465946B (sv) | 1986-09-11 | 1991-11-18 | Bengt Henoch | Anordning foer oeverfoering av elektrisk energi till elektrisk utrustning genom omagnetiska och elektriskt isolerande material |
JPH0626352B2 (ja) * | 1987-11-20 | 1994-04-06 | 日本電気エンジニアリング株式会社 | プログラマブル変調回路 |
US4906840A (en) | 1988-01-27 | 1990-03-06 | The Board Of Trustees Of Leland Stanford Jr., University | Integrated scanning tunneling microscope |
US4841429A (en) | 1988-03-24 | 1989-06-20 | Hughes Aircraft Company | Capacitive coupled power supplies |
US4836882A (en) | 1988-09-12 | 1989-06-06 | The United States Of America As Represented By The Secretary Of The Army | Method of making an acceleration hardened resonator |
JPH02108301A (ja) * | 1988-10-17 | 1990-04-20 | Mitsubishi Electric Corp | λ/4形スイッチ回路 |
US5118982A (en) | 1989-05-31 | 1992-06-02 | Nec Corporation | Thickness mode vibration piezoelectric transformer |
US5048036A (en) | 1989-09-18 | 1991-09-10 | Spectra Diode Laboratories, Inc. | Heterostructure laser with lattice mismatch |
US5048038A (en) | 1990-01-25 | 1991-09-10 | The United States Of America As Represented By The United States Department Of Energy | Ion-implanted planar-buried-heterostructure diode laser |
CA2043048C (en) | 1990-05-22 | 2000-10-03 | Hidejiro Kadowaki | Information recording apparatus |
US5241456A (en) | 1990-07-02 | 1993-08-31 | General Electric Company | Compact high density interconnect structure |
JP2995076B2 (ja) | 1990-07-24 | 1999-12-27 | 富士通株式会社 | 半導体装置 |
US5162691A (en) | 1991-01-22 | 1992-11-10 | The United States Of America As Represented By The Secretary Of The Army | Cantilevered air-gap type thin film piezoelectric resonator |
US5185589A (en) * | 1991-05-17 | 1993-02-09 | Westinghouse Electric Corp. | Microwave film bulk acoustic resonator and manifolded filter bank |
US5294898A (en) | 1992-01-29 | 1994-03-15 | Motorola, Inc. | Wide bandwidth bandpass filter comprising parallel connected piezoelectric resonators |
JPH065944A (ja) * | 1992-06-24 | 1994-01-14 | Nec Corp | 圧電磁器トランスフィルタとその駆動方法 |
US5382930A (en) | 1992-12-21 | 1995-01-17 | Trw Inc. | Monolithic multipole filters made of thin film stacked crystal filters |
US5384808A (en) | 1992-12-31 | 1995-01-24 | Apple Computer, Inc. | Method and apparatus for transmitting NRZ data signals across an isolation barrier disposed in an interface between adjacent devices on a bus |
US5448014A (en) | 1993-01-27 | 1995-09-05 | Trw Inc. | Mass simultaneous sealing and electrical connection of electronic devices |
US5465725A (en) | 1993-06-15 | 1995-11-14 | Hewlett Packard Company | Ultrasonic probe |
US5587620A (en) | 1993-12-21 | 1996-12-24 | Hewlett-Packard Company | Tunable thin film acoustic resonators and method for making the same |
US5594705A (en) | 1994-02-04 | 1997-01-14 | Dynamotive Canada Corporation | Acoustic transformer with non-piezoelectric core |
US5864261A (en) * | 1994-05-23 | 1999-01-26 | Iowa State University Research Foundation | Multiple layer acoustical structures for thin-film resonator based circuits and systems |
JPH0878786A (ja) | 1994-09-02 | 1996-03-22 | Mitsubishi Electric Corp | 歪量子井戸の構造 |
US5692279A (en) | 1995-08-17 | 1997-12-02 | Motorola | Method of making a monolithic thin film resonator lattice filter |
CN1183587C (zh) | 1996-04-08 | 2005-01-05 | 德克萨斯仪器股份有限公司 | 用于把两个集成电路直流上相互隔离的方法和设备 |
US5965679A (en) * | 1996-09-10 | 1999-10-12 | The Dow Chemical Company | Polyphenylene oligomers and polymers |
US5714917A (en) | 1996-10-02 | 1998-02-03 | Nokia Mobile Phones Limited | Device incorporating a tunable thin film bulk acoustic resonator for performing amplitude and phase modulation |
US5873154A (en) * | 1996-10-17 | 1999-02-23 | Nokia Mobile Phones Limited | Method for fabricating a resonator having an acoustic mirror |
US6087198A (en) | 1998-02-12 | 2000-07-11 | Texas Instruments Incorporated | Low cost packaging for thin-film resonators and thin-film resonator-based filters |
US5872493A (en) | 1997-03-13 | 1999-02-16 | Nokia Mobile Phones, Ltd. | Bulk acoustic wave (BAW) filter having a top portion that includes a protective acoustic mirror |
US5853601A (en) | 1997-04-03 | 1998-12-29 | Northrop Grumman Corporation | Top-via etch technique for forming dielectric membranes |
US6339048B1 (en) * | 1999-12-23 | 2002-01-15 | Elementis Specialties, Inc. | Oil and oil invert emulsion drilling fluids with improved anti-settling properties |
US6040962A (en) | 1997-05-14 | 2000-03-21 | Tdk Corporation | Magnetoresistive element with conductive films and magnetic domain films overlapping a central active area |
US5910756A (en) * | 1997-05-21 | 1999-06-08 | Nokia Mobile Phones Limited | Filters and duplexers utilizing thin film stacked crystal filter structures and thin film bulk acoustic wave resonators |
JP3378775B2 (ja) | 1997-07-07 | 2003-02-17 | 株式会社村田製作所 | 圧電共振子およびその周波数調整方法 |
US5982297A (en) | 1997-10-08 | 1999-11-09 | The Aerospace Corporation | Ultrasonic data communication system |
US6873065B2 (en) * | 1997-10-23 | 2005-03-29 | Analog Devices, Inc. | Non-optical signal isolator |
US6081171A (en) * | 1998-04-08 | 2000-06-27 | Nokia Mobile Phones Limited | Monolithic filters utilizing thin film bulk acoustic wave devices and minimum passive components for controlling the shape and width of a passband response |
US5936150A (en) | 1998-04-13 | 1999-08-10 | Rockwell Science Center, Llc | Thin film resonant chemical sensor with resonant acoustic isolator |
US5953479A (en) | 1998-05-07 | 1999-09-14 | The United States Of America As Represented By The Secretary Of The Army | Tilted valance-band quantum well double heterostructures for single step active and passive optical waveguide device monolithic integration |
US6286207B1 (en) * | 1998-05-08 | 2001-09-11 | Nec Corporation | Resin structure in which manufacturing cost is cheap and sufficient adhesive strength can be obtained and method of manufacturing it |
JPH11345406A (ja) | 1998-05-29 | 1999-12-14 | Sony Corp | マスクパターンの形成方法及び薄膜磁気ヘッドの製造方法 |
US6060818A (en) | 1998-06-02 | 2000-05-09 | Hewlett-Packard Company | SBAR structures and method of fabrication of SBAR.FBAR film processing techniques for the manufacturing of SBAR/BAR filters |
DE19826152A1 (de) | 1998-06-12 | 1999-12-16 | Thomson Brandt Gmbh | Anordnung mit einem Schaltnetzteil und einem Mikroprozessor |
US6150703A (en) | 1998-06-29 | 2000-11-21 | Trw Inc. | Lateral mode suppression in semiconductor bulk acoustic resonator (SBAR) devices using tapered electrodes, and electrodes edge damping materials |
US6252229B1 (en) | 1998-07-10 | 2001-06-26 | Boeing North American, Inc. | Sealed-cavity microstructure and microbolometer and associated fabrication methods |
US6090687A (en) * | 1998-07-29 | 2000-07-18 | Agilent Technolgies, Inc. | System and method for bonding and sealing microfabricated wafers to form a single structure having a vacuum chamber therein |
US6488444B2 (en) * | 1998-09-11 | 2002-12-03 | Jack Joseph Licata | Manhole protective pad |
US6229247B1 (en) | 1998-11-09 | 2001-05-08 | Face International Corp. | Multi-layer piezoelectric electrical energy transfer device |
CN1291369A (zh) | 1998-12-22 | 2001-04-11 | 精工爱普生株式会社 | 电力供给装置、电力接收装置、电力传输系统、电力传输方法、便携式机器和计时装置 |
FI113211B (fi) * | 1998-12-30 | 2004-03-15 | Nokia Corp | Balansoitu suodatinrakenne ja matkaviestinlaite |
US6215375B1 (en) * | 1999-03-30 | 2001-04-10 | Agilent Technologies, Inc. | Bulk acoustic wave resonator with improved lateral mode suppression |
JP3531522B2 (ja) | 1999-04-19 | 2004-05-31 | 株式会社村田製作所 | 圧電共振子 |
US6262637B1 (en) * | 1999-06-02 | 2001-07-17 | Agilent Technologies, Inc. | Duplexer incorporating thin-film bulk acoustic resonators (FBARs) |
DE19931297A1 (de) * | 1999-07-07 | 2001-01-11 | Philips Corp Intellectual Pty | Volumenwellen-Filter |
US6228675B1 (en) | 1999-07-23 | 2001-05-08 | Agilent Technologies, Inc. | Microcap wafer-level package with vias |
US6265246B1 (en) | 1999-07-23 | 2001-07-24 | Agilent Technologies, Inc. | Microcap wafer-level package |
JP4420538B2 (ja) | 1999-07-23 | 2010-02-24 | アバゴ・テクノロジーズ・ワイヤレス・アイピー(シンガポール)プライベート・リミテッド | ウェーハパッケージの製造方法 |
US6107721A (en) * | 1999-07-27 | 2000-08-22 | Tfr Technologies, Inc. | Piezoelectric resonators on a differentially offset reflector |
US6292336B1 (en) | 1999-09-30 | 2001-09-18 | Headway Technologies, Inc. | Giant magnetoresistive (GMR) sensor element with enhanced magnetoresistive (MR) coefficient |
US6307447B1 (en) | 1999-11-01 | 2001-10-23 | Agere Systems Guardian Corp. | Tuning mechanical resonators for electrical filter |
JP2001196883A (ja) | 1999-11-01 | 2001-07-19 | Murata Mfg Co Ltd | 圧電共振素子の周波数調整方法 |
US6441539B1 (en) | 1999-11-11 | 2002-08-27 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator |
JP2001244778A (ja) * | 1999-12-22 | 2001-09-07 | Toyo Commun Equip Co Ltd | 高周波圧電振動子 |
DE19962028A1 (de) * | 1999-12-22 | 2001-06-28 | Philips Corp Intellectual Pty | Filteranordnung |
EP1117017B1 (fr) * | 2000-01-10 | 2009-09-09 | ETA SA Manufacture Horlogère Suisse | Dispositif pour produire un signal ayant une fréquence sensiblement indépendante de la température |
US6521477B1 (en) * | 2000-02-02 | 2003-02-18 | Raytheon Company | Vacuum package fabrication of integrated circuit components |
US6479320B1 (en) | 2000-02-02 | 2002-11-12 | Raytheon Company | Vacuum package fabrication of microelectromechanical system devices with integrated circuit components |
US6466418B1 (en) | 2000-02-11 | 2002-10-15 | Headway Technologies, Inc. | Bottom spin valves with continuous spacer exchange (or hard) bias |
US6262600B1 (en) | 2000-02-14 | 2001-07-17 | Analog Devices, Inc. | Isolator for transmitting logic signals across an isolation barrier |
DE10007577C1 (de) | 2000-02-18 | 2001-09-13 | Infineon Technologies Ag | Piezoresonator |
US6441481B1 (en) * | 2000-04-10 | 2002-08-27 | Analog Devices, Inc. | Hermetically sealed microstructure package |
US6384697B1 (en) | 2000-05-08 | 2002-05-07 | Agilent Technologies, Inc. | Cavity spanning bottom electrode of a substrate-mounted bulk wave acoustic resonator |
US6420820B1 (en) | 2000-08-31 | 2002-07-16 | Agilent Technologies, Inc. | Acoustic wave resonator and method of operating the same to maintain resonance when subjected to temperature variations |
US6377137B1 (en) | 2000-09-11 | 2002-04-23 | Agilent Technologies, Inc. | Acoustic resonator filter with reduced electromagnetic influence due to die substrate thickness |
US6486751B1 (en) | 2000-09-26 | 2002-11-26 | Agere Systems Inc. | Increased bandwidth thin film resonator having a columnar structure |
US6530515B1 (en) | 2000-09-26 | 2003-03-11 | Amkor Technology, Inc. | Micromachine stacked flip chip package fabrication method |
US6542055B1 (en) | 2000-10-31 | 2003-04-01 | Agilent Technologies, Inc. | Integrated filter balun |
ATE295632T1 (de) | 2000-11-03 | 2005-05-15 | Paratek Microwave Inc | Verfahren zur kanalfrequenzzuteilung für hf- und mikrowellenduplexer |
US6515558B1 (en) | 2000-11-06 | 2003-02-04 | Nokia Mobile Phones Ltd | Thin-film bulk acoustic resonator with enhanced power handling capacity |
GB0029090D0 (en) * | 2000-11-29 | 2001-01-10 | Univ Cranfield | Improvements in or relating to filters |
US6550664B2 (en) * | 2000-12-09 | 2003-04-22 | Agilent Technologies, Inc. | Mounting film bulk acoustic resonators in microwave packages using flip chip bonding technology |
US6424237B1 (en) | 2000-12-21 | 2002-07-23 | Agilent Technologies, Inc. | Bulk acoustic resonator perimeter reflection system |
US6407649B1 (en) | 2001-01-05 | 2002-06-18 | Nokia Corporation | Monolithic FBAR duplexer and method of making the same |
US6518860B2 (en) | 2001-01-05 | 2003-02-11 | Nokia Mobile Phones Ltd | BAW filters having different center frequencies on a single substrate and a method for providing same |
US6512300B2 (en) * | 2001-01-10 | 2003-01-28 | Raytheon Company | Water level interconnection |
WO2002058233A1 (en) * | 2001-01-18 | 2002-07-25 | Infineon Technologies Ag | Filter devices and method for fabricating filter devices |
US6462631B2 (en) | 2001-02-14 | 2002-10-08 | Agilent Technologies, Inc. | Passband filter having an asymmetrical filter response |
US6714102B2 (en) * | 2001-03-01 | 2004-03-30 | Agilent Technologies, Inc. | Method of fabricating thin film bulk acoustic resonator (FBAR) and FBAR structure embodying the method |
US6566979B2 (en) * | 2001-03-05 | 2003-05-20 | Agilent Technologies, Inc. | Method of providing differential frequency adjusts in a thin film bulk acoustic resonator (FBAR) filter and apparatus embodying the method |
US6874211B2 (en) * | 2001-03-05 | 2005-04-05 | Agilent Technologies, Inc. | Method for producing thin film bulk acoustic resonators (FBARs) with different frequencies on the same substrate by subtracting method and apparatus embodying the method |
US6483229B2 (en) | 2001-03-05 | 2002-11-19 | Agilent Technologies, Inc. | Method of providing differential frequency adjusts in a thin film bulk acoustic resonator (FBAR) filter and apparatus embodying the method |
US6469597B2 (en) | 2001-03-05 | 2002-10-22 | Agilent Technologies, Inc. | Method of mass loading of thin film bulk acoustic resonators (FBAR) for creating resonators of different frequencies and apparatus embodying the method |
JP4058970B2 (ja) * | 2001-03-21 | 2008-03-12 | セイコーエプソン株式会社 | ニオブ酸カリウム圧電薄膜を有する表面弾性波素子、周波数フィルタ、発振器、電子回路、及び電子機器 |
US6472954B1 (en) | 2001-04-23 | 2002-10-29 | Agilent Technologies, Inc. | Controlled effective coupling coefficients for film bulk acoustic resonators |
US6476536B1 (en) | 2001-04-27 | 2002-11-05 | Nokia Corporation | Method of tuning BAW resonators |
US6489688B1 (en) | 2001-05-02 | 2002-12-03 | Zeevo, Inc. | Area efficient bond pad placement |
JP2005236337A (ja) * | 2001-05-11 | 2005-09-02 | Ube Ind Ltd | 薄膜音響共振器及びその製造方法 |
KR100398365B1 (ko) * | 2001-06-25 | 2003-09-19 | 삼성전기주식회사 | 폭방향 파동이 억제되는 박막 공진기 |
JP3903842B2 (ja) * | 2001-07-03 | 2007-04-11 | 株式会社村田製作所 | 圧電共振子、フィルタおよび電子通信機器 |
US6710681B2 (en) * | 2001-07-13 | 2004-03-23 | Agilent Technologies, Inc. | Thin film bulk acoustic resonator (FBAR) and inductor on a monolithic substrate and method of fabricating the same |
DE10147075A1 (de) | 2001-09-25 | 2003-04-30 | Infineon Technologies Ag | Piezoelektrisches Bauelement und Verfahren zu dessen Herstellung |
US6808955B2 (en) * | 2001-11-02 | 2004-10-26 | Intel Corporation | Method of fabricating an integrated circuit that seals a MEMS device within a cavity |
US6720844B1 (en) * | 2001-11-16 | 2004-04-13 | Tfr Technologies, Inc. | Coupled resonator bulk acoustic wave filter |
US6710508B2 (en) * | 2001-11-27 | 2004-03-23 | Agilent Technologies, Inc. | Method for adjusting and stabilizing the frequency of an acoustic resonator |
DE10160617A1 (de) * | 2001-12-11 | 2003-06-12 | Epcos Ag | Akustischer Spiegel mit verbesserter Reflexion |
US6873529B2 (en) * | 2002-02-26 | 2005-03-29 | Kyocera Corporation | High frequency module |
DE60300311T2 (de) * | 2002-03-15 | 2005-06-23 | Matsushita Electric Industrial Co., Ltd., Kadoma | Symmetrische Hochfrequenzvorrichtung mit einem Oberflächenwellenfilter. |
JP4039322B2 (ja) * | 2002-07-23 | 2008-01-30 | 株式会社村田製作所 | 圧電フィルタ、デュプレクサ、複合圧電共振器および通信装置、並びに、圧電フィルタの周波数調整方法 |
US6944432B2 (en) * | 2002-11-12 | 2005-09-13 | Nokia Corporation | Crystal-less oscillator transceiver |
FR2848036B1 (fr) * | 2002-11-28 | 2005-08-26 | St Microelectronics Sa | Support pour resonateur acoustique, resonateur acoustique et circuit integre correspondant |
JP3889351B2 (ja) * | 2002-12-11 | 2007-03-07 | Tdk株式会社 | デュプレクサ |
DE10258422A1 (de) * | 2002-12-13 | 2004-06-24 | Epcos Ag | Mit akustischen Volumenwellen arbeitendes Bauelement mit gekoppelten Resonatoren |
DE10301261B4 (de) * | 2003-01-15 | 2018-03-22 | Snaptrack, Inc. | Mit akustischen Volumenwellen arbeitendes Bauelement und Verfahren zur Herstellung |
EP1489740A3 (en) * | 2003-06-18 | 2006-06-28 | Matsushita Electric Industrial Co., Ltd. | Electronic component and method for manufacturing the same |
JP2005057332A (ja) * | 2003-08-04 | 2005-03-03 | Tdk Corp | フィルタ装置およびそれを用いた分波器 |
ATE515108T1 (de) * | 2003-09-12 | 2011-07-15 | Panasonic Corp | Abstimmbarer dünnschicht-volumenwellen-resonator, herstellungsmethode dafür, filter, mehrschichtiges zusammengesetztes elektronisches bauelement und kommunikationsvorrichtung |
JP2005117641A (ja) * | 2003-09-17 | 2005-04-28 | Matsushita Electric Ind Co Ltd | 圧電体共振器、それを用いたフィルタ及び共用器 |
US7332985B2 (en) * | 2003-10-30 | 2008-02-19 | Avago Technologies Wireless Ip (Singapore) Pte Ltd. | Cavity-less film bulk acoustic resonator (FBAR) devices |
US6946928B2 (en) * | 2003-10-30 | 2005-09-20 | Agilent Technologies, Inc. | Thin-film acoustically-coupled transformer |
US7362198B2 (en) * | 2003-10-30 | 2008-04-22 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd | Pass bandwidth control in decoupled stacked bulk acoustic resonator devices |
US7019605B2 (en) * | 2003-10-30 | 2006-03-28 | Larson Iii John D | Stacked bulk acoustic resonator band-pass filter with controllable pass bandwidth |
US7294919B2 (en) * | 2003-11-26 | 2007-11-13 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Device having a complaint element pressed between substrates |
US7615833B2 (en) * | 2004-07-13 | 2009-11-10 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Film bulk acoustic resonator package and method of fabricating same |
US7280007B2 (en) * | 2004-11-15 | 2007-10-09 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Thin film bulk acoustic resonator with a mass loaded perimeter |
US20060087199A1 (en) * | 2004-10-22 | 2006-04-27 | Larson John D Iii | Piezoelectric isolating transformer |
US7675390B2 (en) * | 2005-10-18 | 2010-03-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating single decoupled stacked bulk acoustic resonator |
US7525398B2 (en) * | 2005-10-18 | 2009-04-28 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustically communicating data signals across an electrical isolation barrier |
US7425787B2 (en) * | 2005-10-18 | 2008-09-16 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating single insulated decoupled stacked bulk acoustic resonator with acoustically-resonant electrical insulator |
US7423503B2 (en) * | 2005-10-18 | 2008-09-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating film acoustically-coupled transformer |
US7737807B2 (en) * | 2005-10-18 | 2010-06-15 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Acoustic galvanic isolator incorporating series-connected decoupled stacked bulk acoustic resonators |
US20070085632A1 (en) * | 2005-10-18 | 2007-04-19 | Larson John D Iii | Acoustic galvanic isolator |
US7600371B2 (en) * | 2005-10-18 | 2009-10-13 | The Boeing Company | Thrust reversers including support members for inhibiting deflection |
-
2003
- 2003-10-30 US US10/699,481 patent/US6946928B2/en not_active Expired - Lifetime
-
2004
- 2004-04-29 US US10/836,653 patent/US6987433B2/en not_active Expired - Lifetime
- 2004-04-29 US US10/836,663 patent/US7091649B2/en not_active Expired - Lifetime
- 2004-06-22 DE DE602004020435T patent/DE602004020435D1/de not_active Expired - Lifetime
- 2004-06-22 EP EP04014570A patent/EP1528675B1/en not_active Expired - Fee Related
- 2004-10-13 US US10/965,474 patent/US7173504B2/en not_active Expired - Lifetime
- 2004-10-13 US US10/965,586 patent/US7388455B2/en not_active Expired - Lifetime
- 2004-10-28 JP JP2004313995A patent/JP4648680B2/ja not_active Expired - Fee Related
- 2004-10-29 GB GB0605767A patent/GB2421379B/en not_active Expired - Fee Related
- 2004-10-29 JP JP2006538339A patent/JP4796501B2/ja not_active Expired - Fee Related
- 2004-10-29 JP JP2006538279A patent/JP4701183B2/ja not_active Expired - Fee Related
- 2004-10-29 DE DE112004002035T patent/DE112004002035B4/de not_active Expired - Fee Related
- 2004-10-29 WO PCT/US2004/036089 patent/WO2005043752A1/en active Application Filing
- 2004-10-29 CN CNB2004800299925A patent/CN100555851C/zh not_active Expired - Fee Related
- 2004-10-29 CN CNB2004800308892A patent/CN100555854C/zh not_active Expired - Fee Related
- 2004-10-29 CN CN2004800324503A patent/CN1883115B/zh not_active Expired - Fee Related
- 2004-10-29 DE DE112004002038T patent/DE112004002038B4/de not_active Expired - Fee Related
- 2004-10-29 CN CNB2004800309240A patent/CN100555856C/zh not_active Expired - Fee Related
- 2004-10-29 CN CNB2004800308939A patent/CN100555855C/zh not_active Expired - Fee Related
- 2004-10-29 WO PCT/US2004/035906 patent/WO2005046052A1/en active Application Filing
- 2004-10-29 GB GB0605770A patent/GB2422059B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003505905A (ja) * | 1999-07-19 | 2003-02-12 | ノキア コーポレイション | 共振子構造及びそのような共振子構造を有するフィルター |
US20030128081A1 (en) * | 2002-01-09 | 2003-07-10 | Nokia Corporation | Bulk acoustic wave resonator with two piezoelectric layers as balun in filters and duplexers |
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4648680B2 (ja) | 膜状音響結合変成器 | |
JP4754803B2 (ja) | 逆方向のc軸圧電素子を備えた音響結合変成器 | |
JP4754802B2 (ja) | 逆方向のc軸圧電材料を備えた音響結合変成器 | |
JP4800957B2 (ja) | 薄膜音響結合変成器 | |
US20060284707A1 (en) | Suspended device and method of making | |
JP5047594B2 (ja) | 温度補償型薄膜バルク音響共振器デバイス | |
JP4676440B2 (ja) | パッケージを単純化した圧電薄膜共振器(fbar)デバイス | |
US7019605B2 (en) | Stacked bulk acoustic resonator band-pass filter with controllable pass bandwidth |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20070328 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20070404 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20071015 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071022 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100723 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100730 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101029 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101203 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101210 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131217 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4648680 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131217 Year of fee payment: 3 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D02 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131217 Year of fee payment: 3 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D02 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R370 | Written measure of declining of transfer procedure |
Free format text: JAPANESE INTERMEDIATE CODE: R370 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |