JP4644361B2 - フレキソ印刷版に用いる光退色性化合物 - Google Patents

フレキソ印刷版に用いる光退色性化合物 Download PDF

Info

Publication number
JP4644361B2
JP4644361B2 JP2000373512A JP2000373512A JP4644361B2 JP 4644361 B2 JP4644361 B2 JP 4644361B2 JP 2000373512 A JP2000373512 A JP 2000373512A JP 2000373512 A JP2000373512 A JP 2000373512A JP 4644361 B2 JP4644361 B2 JP 4644361B2
Authority
JP
Japan
Prior art keywords
layer
photopolymerizable
compounds
photobleachable
flexographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000373512A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001209174A5 (enExample
JP2001209174A (ja
Inventor
キン チェン ラップ
アンドリュー チェン ラップ−タック
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2001209174A publication Critical patent/JP2001209174A/ja
Publication of JP2001209174A5 publication Critical patent/JP2001209174A5/ja
Application granted granted Critical
Publication of JP4644361B2 publication Critical patent/JP4644361B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145Infrared

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2000373512A 1999-12-07 2000-12-07 フレキソ印刷版に用いる光退色性化合物 Expired - Fee Related JP4644361B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US16943799P 1999-12-07 1999-12-07
US61905200A 2000-07-18 2000-07-18
US60/169437 2000-07-18
US09/619052 2000-07-18

Publications (3)

Publication Number Publication Date
JP2001209174A JP2001209174A (ja) 2001-08-03
JP2001209174A5 JP2001209174A5 (enExample) 2008-01-24
JP4644361B2 true JP4644361B2 (ja) 2011-03-02

Family

ID=26865050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000373512A Expired - Fee Related JP4644361B2 (ja) 1999-12-07 2000-12-07 フレキソ印刷版に用いる光退色性化合物

Country Status (4)

Country Link
US (1) US6864039B2 (enExample)
EP (1) EP1107063B1 (enExample)
JP (1) JP4644361B2 (enExample)
DE (1) DE60043974D1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8505451B2 (en) 2004-05-07 2013-08-13 Day International, Inc. Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing
US7125650B2 (en) * 2004-07-20 2006-10-24 Roberts David H Method for bump exposing relief image printing plates
JP4797683B2 (ja) * 2005-02-21 2011-10-19 東レ株式会社 ネガ型感光性ペーストおよびその製造方法、パターンの形成方法ならびに平面ディスプレイ用パネルの製造方法。
US7432197B2 (en) 2006-01-27 2008-10-07 Micron Technology, Inc. Methods of patterning photoresist, and methods of forming semiconductor constructions
US8252514B2 (en) 2006-03-14 2012-08-28 Day International, Inc. Flexographic printing plate assembly
US8187794B2 (en) 2007-04-23 2012-05-29 Eastman Kodak Company Ablatable elements for making flexographic printing plates
US7799504B2 (en) * 2007-06-05 2010-09-21 Eastman Kodak Company Mask film to form relief images and method of use
US20080318153A1 (en) * 2007-06-19 2008-12-25 Qimonda Ag Photosensitive layer stack
JP5116623B2 (ja) * 2008-09-29 2013-01-09 旭化成イーマテリアルズ株式会社 円筒状印刷原版成形装置
JP5117344B2 (ja) * 2008-09-29 2013-01-16 旭化成イーマテリアルズ株式会社 円筒状印刷原版の製造方法
JP5116622B2 (ja) * 2008-09-29 2013-01-09 旭化成イーマテリアルズ株式会社 レーザー彫刻用円筒状印刷原版の製造方法
US8871431B2 (en) 2011-08-08 2014-10-28 Timothy Gotsick Laminated flexographic printing sleeves and methods of making the same
JP2014048517A (ja) * 2012-08-31 2014-03-17 Asahi Kasei E-Materials Corp フレキソ印刷版用構成体及びフレキソ印刷版
US8945813B2 (en) 2013-04-18 2015-02-03 Eastman Kodak Company Mask forming imageable material and use
US10025183B2 (en) * 2014-01-22 2018-07-17 Macdermid Graphics Solutions, Llc Photosensitive resin composition
JP6397194B2 (ja) * 2014-02-21 2018-09-26 旭化成株式会社 印刷版用感光性樹脂組成物、印刷版用感光性樹脂構成体、及び印刷版
US9217928B1 (en) * 2014-08-13 2015-12-22 Macdermid Printing Solutions, Llc Clean flexographic printing plates and method of making the same
US11046092B2 (en) 2019-02-13 2021-06-29 Macdermid Graphics Solutions Llc Photopolymer film with UV filtering
JP2024515533A (ja) * 2021-04-01 2024-04-10 テレサーキッツ コーポレーション 断続的に光漂白されたマスク並びにその製造方法及び部品転写のための使用方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5911619B2 (ja) 1973-09-27 1984-03-16 富士写真フイルム株式会社 スチリルおよびブタジエニル染料の製法
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
US4394437A (en) 1981-09-24 1983-07-19 International Business Machines Corporation Process for increasing resolution of photolithographic images
US4460675A (en) 1982-01-21 1984-07-17 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
US4427759A (en) * 1982-01-21 1984-01-24 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
JPS58181041A (ja) * 1982-04-16 1983-10-22 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
US4705729A (en) 1984-11-19 1987-11-10 Hewlett-Packard Company Method for photochemically enhancing resolution in photolithography processes
US4578344A (en) 1984-12-20 1986-03-25 General Electric Company Photolithographic method using a two-layer photoresist and photobleachable film
US4661433A (en) 1984-12-31 1987-04-28 General Electric Company Storage stable aryl nitrone compositions
EP0225676B1 (en) * 1985-12-09 1994-07-06 Nippon Paint Co., Ltd. Photosensitive resin base printing material
JPS62287234A (ja) * 1986-06-06 1987-12-14 Nippon Paint Co Ltd 感光性樹脂版材
JPS63121039A (ja) 1986-11-11 1988-05-25 Nippon Kayaku Co Ltd ホトレジスト用消色性組成物
EP0280197A3 (en) 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
DE3833650A1 (de) 1988-10-04 1990-04-05 Basf Ag Kontinuierliches verfahren zur herstellung eines lichtempfindlichen aufzeichnungselements
CA2023112C (en) * 1989-08-11 2000-09-26 Jun Yamaguchi Light- and heat-sensitive recording material
US5153105A (en) 1990-06-18 1992-10-06 Minnesota Mining And Manufacturing Company Thermally developable light sensitive imageable layers containing photobleachable dyes
US5015556A (en) 1990-07-26 1991-05-14 Minnesota Mining And Manufacturing Company Flexographic printing plate process
JP2977265B2 (ja) * 1990-11-19 1999-11-15 旭化成工業株式会社 感光性エラストマー構成体
JPH0683044A (ja) * 1992-07-06 1994-03-25 Asahi Chem Ind Co Ltd 段ボール印刷用版
US5719009A (en) 1992-08-07 1998-02-17 E. I. Du Pont De Nemours And Company Laser ablatable photosensitive elements utilized to make flexographic printing plates
US5506086A (en) 1995-05-01 1996-04-09 E. I. Du Pont De Nemours And Company Process for making a flexographic printing plate
JPH11171909A (ja) * 1997-12-12 1999-06-29 Brother Ind Ltd 光重合性組成物及び記録用シート

Also Published As

Publication number Publication date
EP1107063A1 (en) 2001-06-13
EP1107063B1 (en) 2010-03-10
US20030219681A1 (en) 2003-11-27
US6864039B2 (en) 2005-03-08
JP2001209174A (ja) 2001-08-03
DE60043974D1 (de) 2010-04-22

Similar Documents

Publication Publication Date Title
JP4644361B2 (ja) フレキソ印刷版に用いる光退色性化合物
JP2773981B2 (ja) フレキソ印刷板を調製するために使用される感光性印刷要素およびフレキソ印刷板の作製方法
JP2773847B2 (ja) 赤外線感受性層を使用するレリーフ画像を製造するための方法及び要素
CA1184077A (en) Process for preparing an overcoated photopolymer printing plate
EP1239329B2 (en) A process for making a flexographic printing plate and a photosensitive element for use in the process
US4460675A (en) Process for preparing an overcoated photopolymer printing plate
CN1278186C (zh) 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件
JP4223226B2 (ja) フレキソ印刷版用光重合性エレメントおよびそのエレメントから前記版を調製する方法
JPH0148530B2 (enExample)
JPH0447299B2 (enExample)
JP2977265B2 (ja) 感光性エラストマー構成体
JPS6242259B2 (enExample)
JP4387025B2 (ja) 光重合性記録要素およびフレキソ印刷版作製方法
JP2635461B2 (ja) 溶媒耐性が改善された感光性エラストマー部材
EP0504824B1 (en) Photosensitive printing element
JP4065350B2 (ja) カラープルーフ製造用低酸素感受性光重合性混合物
JP2008522203A (ja) フレキソ印刷版の製造方法及びこの目的に適したフレキソ印刷要素
JP2023153095A (ja) 印刷版原版及びその印刷版
JPS6332176B2 (enExample)
JP2002268228A (ja) 画像形成性が改良されたフレキソ版用感光性樹脂構成体
JPH09211851A (ja) 画像形成材料およびその画像形成方法
JPH0212247A (ja) 転写画像形成方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071129

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071129

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20071129

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100630

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100702

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101004

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101130

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101206

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131210

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees