JP4644006B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP4644006B2 JP4644006B2 JP2005057294A JP2005057294A JP4644006B2 JP 4644006 B2 JP4644006 B2 JP 4644006B2 JP 2005057294 A JP2005057294 A JP 2005057294A JP 2005057294 A JP2005057294 A JP 2005057294A JP 4644006 B2 JP4644006 B2 JP 4644006B2
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- Prior art keywords
- diffusion layer
- layer
- substrate
- semiconductor device
- guard ring
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- 239000004065 semiconductor Substances 0.000 title claims description 90
- 239000000758 substrate Substances 0.000 claims description 149
- 238000009792 diffusion process Methods 0.000 claims description 141
- 238000002955 isolation Methods 0.000 claims description 24
- 101100489717 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) GND2 gene Proteins 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000007257 malfunction Effects 0.000 description 7
- 101100489713 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) GND1 gene Proteins 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000644 propagated effect Effects 0.000 description 3
- 230000001902 propagating effect Effects 0.000 description 3
- 102100036285 25-hydroxyvitamin D-1 alpha hydroxylase, mitochondrial Human genes 0.000 description 2
- 101000875403 Homo sapiens 25-hydroxyvitamin D-1 alpha hydroxylase, mitochondrial Proteins 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/765—Making of isolation regions between components by field effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Element Separation (AREA)
- Semiconductor Integrated Circuits (AREA)
Description
J.Raskin, et. al. "Substrate Crosstalk Reduction Using SOITechnology" IEEE Trans. Electron devices,dec.1997 vol.44, No.12pp.2252-2261
Trench Isolation、以下、STI層)114が設けられている。このP型ウェル層112dは、第1の拡散層115のP型ウェル層112aと一体に形成され、P型ウェル層112を構成している。
支持基板、絶縁層およびSOI層が順に積層されてなるSOI基板と、
前記SOI基板の一領域に設けられた素子部と、
前記SOI基板の前記素子部の周囲に設けられたガードリング領域と、を備え、
前記素子部の前記SOI層中に設けられた第1の拡散層と、
前記ガードリング領域の前記SOI層中に設けられた第2の拡散層とが、電気的に接続され、
前記第1の拡散層と前記第2の拡散層との間の領域において、前記SOI層中に前記絶縁層に到達しない素子分離膜が設けられ、
前記素子分離膜と前記絶縁層との間に、前記第1の拡散層と前記第2の拡散層とを電気的に接続する第3の拡散層が設けられ、
前記第1、第2および第3の拡散層は、P型拡散層であり、前記第2の拡散層はグラウンド電位に固定され、
前記第1の拡散層が、前記グランド電位とは電気的に接続されていない他のグランド電位に固定されていることを特徴とする半導体装置が提供される。
2,4 素子部
6 素子分離領域
8 ガードリング領域
10 支持基板
11 BOX層
12 SOI層
14 STI層
15 第1の拡散層
16a,16b,16d P型ウェル層
16c 第3の拡散層
18 P+型拡散層
17a,17b N型ウェル
17c 第3の拡散層
19 N+型拡散層
22 基板コンタクト
24 コンタクト
26 第2の拡散層(ガードリング)
100,200 半導体装置
102,104 素子部
106 素子分離領域
108 ガードリング領域
110 支持基板
112 P型ウェル層
114 STI層
115 第1の拡散層
116 P+型拡散層
118 基板コンタクト
120 コンタクト
122 第2の拡散層(ガードリング)
Claims (3)
- 支持基板、絶縁層およびSOI層が順に積層されてなるSOI基板と、
前記SOI基板の一領域に設けられた素子部と、
前記SOI基板の前記素子部の周囲に設けられたガードリング領域と、を備え、
前記素子部の前記SOI層中に設けられた第1の拡散層と、
前記ガードリング領域の前記SOI層中に設けられた第2の拡散層とが、電気的に接続され、
前記第1の拡散層と前記第2の拡散層との間の領域において、前記SOI層中に前記絶縁層に到達しない素子分離膜が設けられ、
前記素子分離膜と前記絶縁層との間に、前記第1の拡散層と前記第2の拡散層とを電気的に接続する第3の拡散層が設けられ、
前記第1、第2および第3の拡散層は、P型拡散層であり、前記第2の拡散層はグラウンド電位に固定され、
前記第1の拡散層が、前記グランド電位とは電気的に接続されていない他のグランド電位に固定されていることを特徴とする半導体装置。 - 前記第2の拡散層が、前記第1の拡散層の周囲を囲むように形成されていることを特徴とする請求項1に記載の半導体装置。
- 前記第2の拡散層は、前記素子部と、前記素子部と異なる他の素子部との間に設けられていることを特徴とする請求項1または2に記載の半導体装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005057294A JP4644006B2 (ja) | 2005-03-02 | 2005-03-02 | 半導体装置 |
US11/362,132 US7432551B2 (en) | 2005-03-02 | 2006-02-27 | SOI semiconductor device including a guard ring region |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005057294A JP4644006B2 (ja) | 2005-03-02 | 2005-03-02 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006245196A JP2006245196A (ja) | 2006-09-14 |
JP4644006B2 true JP4644006B2 (ja) | 2011-03-02 |
Family
ID=36943301
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005057294A Expired - Fee Related JP4644006B2 (ja) | 2005-03-02 | 2005-03-02 | 半導体装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7432551B2 (ja) |
JP (1) | JP4644006B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080217727A1 (en) * | 2007-03-11 | 2008-09-11 | Skyworks Solutions, Inc. | Radio frequency isolation for SOI transistors |
US10615252B2 (en) | 2018-08-06 | 2020-04-07 | Nxp Usa, Inc. | Device isolation |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001015589A (ja) * | 1999-06-30 | 2001-01-19 | Denso Corp | 半導体装置 |
JP2001345428A (ja) * | 2000-03-27 | 2001-12-14 | Toshiba Corp | 半導体装置とその製造方法 |
JP2003017704A (ja) * | 2001-06-29 | 2003-01-17 | Denso Corp | 半導体装置 |
JP2004103611A (ja) * | 2002-09-04 | 2004-04-02 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2005158959A (ja) * | 2003-11-25 | 2005-06-16 | Denso Corp | 半導体装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6355537B1 (en) * | 1999-02-23 | 2002-03-12 | Silicon Wave, Inc. | Method of providing radio frequency isolation of device mesas using guard ring regions within an integrated circuit device |
US6429502B1 (en) * | 2000-08-22 | 2002-08-06 | Silicon Wave, Inc. | Multi-chambered trench isolated guard ring region for providing RF isolation |
JP2004153175A (ja) * | 2002-10-31 | 2004-05-27 | Nec Electronics Corp | 半導体集積回路及びその半導体基板 |
JP2004207271A (ja) * | 2002-12-20 | 2004-07-22 | Nec Electronics Corp | Soi基板及び半導体集積回路装置 |
JP4615229B2 (ja) * | 2004-02-27 | 2011-01-19 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
-
2005
- 2005-03-02 JP JP2005057294A patent/JP4644006B2/ja not_active Expired - Fee Related
-
2006
- 2006-02-27 US US11/362,132 patent/US7432551B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001015589A (ja) * | 1999-06-30 | 2001-01-19 | Denso Corp | 半導体装置 |
JP2001345428A (ja) * | 2000-03-27 | 2001-12-14 | Toshiba Corp | 半導体装置とその製造方法 |
JP2003017704A (ja) * | 2001-06-29 | 2003-01-17 | Denso Corp | 半導体装置 |
JP2004103611A (ja) * | 2002-09-04 | 2004-04-02 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2005158959A (ja) * | 2003-11-25 | 2005-06-16 | Denso Corp | 半導体装置 |
Also Published As
Publication number | Publication date |
---|---|
US7432551B2 (en) | 2008-10-07 |
US20060197127A1 (en) | 2006-09-07 |
JP2006245196A (ja) | 2006-09-14 |
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