JP4620420B2 - 有機電子発光素子の薄膜蒸着用マスクフレーム組立て体、及び、それを利用した薄膜蒸着方法 - Google Patents
有機電子発光素子の薄膜蒸着用マスクフレーム組立て体、及び、それを利用した薄膜蒸着方法 Download PDFInfo
- Publication number
- JP4620420B2 JP4620420B2 JP2004284965A JP2004284965A JP4620420B2 JP 4620420 B2 JP4620420 B2 JP 4620420B2 JP 2004284965 A JP2004284965 A JP 2004284965A JP 2004284965 A JP2004284965 A JP 2004284965A JP 4620420 B2 JP4620420 B2 JP 4620420B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- icon
- thin film
- film deposition
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000427 thin-film deposition Methods 0.000 title claims description 13
- 238000007736 thin film deposition technique Methods 0.000 title claims description 4
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000007740 vapor deposition Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Description
22 マスクフレーム
23 パターン
26、27 開口
31 アイコンマスク
32 アイコンパターン
33 クリッピング地点
35 スリット
36 ストリップ
Claims (3)
- 複数の単位セルに対応するパターンが形成されたメインマスクと、
前記メインマスクに形成された開口に対応して前記メインマスク上に重畳されて配置され、特定のキャラクタを表す所定の形状のアイコンパターンが形成されたアイコンマスクと、
前記メインマスクに対応する開口が形成されており、前記メインマスク及びアイコンマスクが結合されるマスクフレームと、
を具備することを特徴とする有機電子発光素子の薄膜蒸着用マスクフレーム組立て体。 - 前記メインマスクは前記マスクフレームに接合され、前記アイコンマスクは前記マスクフレームに解除可能に結合されることを特徴とする請求項1に記載の有機電子発光素子の薄膜蒸着用マスクフレーム組立て体。
- 単位セルに対応するパターンと前記パターンの一方の側に形成された開口を有し、マスクフレームに接合されたメインマスクを準備する段階と、
特定のキャラクタを表す所定の形状のアイコンパターンを有するアイコンマスクを、前記メインマスクの開口に重畳配置されるように、前記マスクフレームに対して解除可能に結合させる段階と、
前記メインマスクとアイコンマスクとを具備するマスクフレーム組立て体を真空チャンバ内に設置し、前記マスクフレームの一方の側に基板を密着させた状態で有機物形成物質を蒸発させて前記基板に蒸着させる段階と、
を具備することを特徴とする有機電子発光素子の薄膜蒸着用マスクフレーム組立て体を利用した薄膜蒸着方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030068989A KR100889764B1 (ko) | 2003-10-04 | 2003-10-04 | 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체및, 그것을 이용한 박막 증착 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005116526A JP2005116526A (ja) | 2005-04-28 |
JP4620420B2 true JP4620420B2 (ja) | 2011-01-26 |
Family
ID=34386733
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004284965A Active JP4620420B2 (ja) | 2003-10-04 | 2004-09-29 | 有機電子発光素子の薄膜蒸着用マスクフレーム組立て体、及び、それを利用した薄膜蒸着方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20050072359A1 (ja) |
JP (1) | JP4620420B2 (ja) |
KR (1) | KR100889764B1 (ja) |
CN (1) | CN100481577C (ja) |
Families Citing this family (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100683779B1 (ko) * | 2005-05-28 | 2007-02-15 | 삼성에스디아이 주식회사 | 마스크 제조용 포토마스크 및 이를 이용한 마스크 프레임어셈블리의 제작방법 |
KR101281909B1 (ko) * | 2006-06-30 | 2013-07-03 | 엘지디스플레이 주식회사 | 박막 증착 장치 |
WO2009125882A1 (en) * | 2008-04-10 | 2009-10-15 | Soonchunhyang University Industry Academy Cooperation Foundation | Manufacturing large size organic light emitting displays |
WO2009128569A1 (en) * | 2008-04-14 | 2009-10-22 | Soonchunhyang University Industry Academy Cooperation Foundation | Apparatuses for manufacturing large size display panels |
TWI472639B (zh) | 2009-05-22 | 2015-02-11 | Samsung Display Co Ltd | 薄膜沉積設備 |
JP5623786B2 (ja) | 2009-05-22 | 2014-11-12 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 薄膜蒸着装置 |
KR101117719B1 (ko) * | 2009-06-24 | 2012-03-08 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
KR20110014442A (ko) | 2009-08-05 | 2011-02-11 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
JP5328726B2 (ja) | 2009-08-25 | 2013-10-30 | 三星ディスプレイ株式會社 | 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 |
JP5677785B2 (ja) | 2009-08-27 | 2015-02-25 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法 |
US20110052795A1 (en) * | 2009-09-01 | 2011-03-03 | Samsung Mobile Display Co., Ltd. | Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
US8876975B2 (en) | 2009-10-19 | 2014-11-04 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
KR101030030B1 (ko) * | 2009-12-11 | 2011-04-20 | 삼성모바일디스플레이주식회사 | 마스크 조립체 |
KR101084184B1 (ko) | 2010-01-11 | 2011-11-17 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
KR101174875B1 (ko) | 2010-01-14 | 2012-08-17 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101274718B1 (ko) * | 2010-01-28 | 2013-06-12 | 엘지디스플레이 주식회사 | 증착마스크 및 그를 포함하는 마스크 어셈블리 |
KR101193186B1 (ko) | 2010-02-01 | 2012-10-19 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101156441B1 (ko) | 2010-03-11 | 2012-06-18 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
KR101202348B1 (ko) | 2010-04-06 | 2012-11-16 | 삼성디스플레이 주식회사 | 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
US8894458B2 (en) | 2010-04-28 | 2014-11-25 | Samsung Display Co., Ltd. | Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method |
KR101223723B1 (ko) | 2010-07-07 | 2013-01-18 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101723506B1 (ko) | 2010-10-22 | 2017-04-19 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101738531B1 (ko) | 2010-10-22 | 2017-05-23 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR20120045865A (ko) | 2010-11-01 | 2012-05-09 | 삼성모바일디스플레이주식회사 | 유기층 증착 장치 |
KR20120065789A (ko) | 2010-12-13 | 2012-06-21 | 삼성모바일디스플레이주식회사 | 유기층 증착 장치 |
KR101760897B1 (ko) | 2011-01-12 | 2017-07-25 | 삼성디스플레이 주식회사 | 증착원 및 이를 구비하는 유기막 증착 장치 |
KR101813549B1 (ko) * | 2011-05-06 | 2018-01-02 | 삼성디스플레이 주식회사 | 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치 |
KR101852517B1 (ko) | 2011-05-25 | 2018-04-27 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101840654B1 (ko) | 2011-05-25 | 2018-03-22 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101857249B1 (ko) | 2011-05-27 | 2018-05-14 | 삼성디스플레이 주식회사 | 패터닝 슬릿 시트 어셈블리, 유기막 증착 장치, 유기 발광 표시장치제조 방법 및 유기 발광 표시 장치 |
KR20130004830A (ko) | 2011-07-04 | 2013-01-14 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
KR101826068B1 (ko) | 2011-07-04 | 2018-02-07 | 삼성디스플레이 주식회사 | 유기층 증착 장치 |
KR102015872B1 (ko) | 2012-06-22 | 2019-10-22 | 삼성디스플레이 주식회사 | 유기층 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR102079170B1 (ko) * | 2013-04-09 | 2020-02-20 | 삼성디스플레이 주식회사 | 증착 장치 및 그에 적용되는 마스크 조립체 |
KR102081284B1 (ko) | 2013-04-18 | 2020-02-26 | 삼성디스플레이 주식회사 | 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치 |
KR102352280B1 (ko) * | 2015-04-28 | 2022-01-18 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체 제조 장치 및 이를 이용한 마스크 프레임 조립체 제조 방법 |
KR102544244B1 (ko) * | 2016-07-19 | 2023-06-19 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체 |
KR20180062486A (ko) * | 2016-11-30 | 2018-06-11 | 엘지디스플레이 주식회사 | 증착용 마스크 및 그 제조방법 |
CN106816554A (zh) | 2017-01-24 | 2017-06-09 | 京东方科技集团股份有限公司 | 蒸镀掩膜版及制作方法、oled显示基板及蒸镀方法 |
CN106868454A (zh) * | 2017-03-10 | 2017-06-20 | 南京攀诺德自动化设备有限公司 | 一种减小蒸镀掩膜板变形的方法 |
CN110950301B (zh) * | 2018-09-27 | 2023-04-07 | 哈尔滨工业大学(威海) | 一种基于纳米线材料的柔性电极复杂图案的制备方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08176800A (ja) * | 1994-12-27 | 1996-07-09 | Daishinku Co | 成膜マスク装置 |
JP2001237073A (ja) * | 2000-02-24 | 2001-08-31 | Tohoku Pioneer Corp | 多面取り用メタルマスク及びその製造方法 |
JP2001254169A (ja) * | 2000-03-13 | 2001-09-18 | Optonix Seimitsu:Kk | 蒸着用金属マスクおよび蒸着用金属マスク製造方法 |
JP2001273976A (ja) * | 2000-03-28 | 2001-10-05 | Tohoku Pioneer Corp | 有機エレクトロルミネセンス表示パネル、その製造方法、及びその成膜装置 |
JP2003027212A (ja) * | 2001-07-23 | 2003-01-29 | Sony Corp | パターン成膜装置およびパターン成膜方法 |
JP2003068454A (ja) * | 2001-08-24 | 2003-03-07 | Dainippon Printing Co Ltd | 有機el素子製造に用いる真空蒸着用多面付けマスク装置 |
JP2003217850A (ja) * | 2001-12-05 | 2003-07-31 | Samsung Nec Mobile Display Co Ltd | 有機elデバイスの薄膜蒸着用マスクフレーム組立体 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3894487A (en) * | 1973-12-10 | 1975-07-15 | Miller Screen & Design Inc | Method and apparatus for screen printing fixed and variable indicia |
JP3504421B2 (ja) * | 1996-03-12 | 2004-03-08 | 株式会社ルネサステクノロジ | 半導体装置 |
WO1999020080A1 (fr) * | 1997-10-15 | 1999-04-22 | Toray Industries, Inc. | Procede de fabrication d'un dispositif electroluminescent organique |
US6592933B2 (en) * | 1997-10-15 | 2003-07-15 | Toray Industries, Inc. | Process for manufacturing organic electroluminescent device |
US7396558B2 (en) * | 2001-01-31 | 2008-07-08 | Toray Industries, Inc. | Integrated mask and method and apparatus for manufacturing organic EL device using the same |
DE60228599D1 (de) * | 2001-08-24 | 2008-10-09 | Dainippon Printing Co Ltd | Maskeneinrichtung zur bildung mehrerer seiten für die vakuumablagerung |
JP3651432B2 (ja) * | 2001-09-25 | 2005-05-25 | セイコーエプソン株式会社 | マスク及びその製造方法並びにエレクトロルミネッセンス装置の製造方法 |
US6878208B2 (en) * | 2002-04-26 | 2005-04-12 | Tohoku Pioneer Corporation | Mask for vacuum deposition and organic EL display manufactured by using the same |
US6729927B2 (en) * | 2002-08-01 | 2004-05-04 | Eastman Kodak Company | Method and apparatus for making a shadow mask array |
JP4173722B2 (ja) * | 2002-11-29 | 2008-10-29 | 三星エスディアイ株式会社 | 蒸着マスク、これを利用した有機el素子の製造方法及び有機el素子 |
KR100534580B1 (ko) * | 2003-03-27 | 2005-12-07 | 삼성에스디아이 주식회사 | 표시장치용 증착 마스크 및 그의 제조방법 |
-
2003
- 2003-10-04 KR KR1020030068989A patent/KR100889764B1/ko active IP Right Grant
-
2004
- 2004-09-29 JP JP2004284965A patent/JP4620420B2/ja active Active
- 2004-09-30 CN CNB2004100874628A patent/CN100481577C/zh active Active
- 2004-10-04 US US10/956,030 patent/US20050072359A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08176800A (ja) * | 1994-12-27 | 1996-07-09 | Daishinku Co | 成膜マスク装置 |
JP2001237073A (ja) * | 2000-02-24 | 2001-08-31 | Tohoku Pioneer Corp | 多面取り用メタルマスク及びその製造方法 |
JP2001254169A (ja) * | 2000-03-13 | 2001-09-18 | Optonix Seimitsu:Kk | 蒸着用金属マスクおよび蒸着用金属マスク製造方法 |
JP2001273976A (ja) * | 2000-03-28 | 2001-10-05 | Tohoku Pioneer Corp | 有機エレクトロルミネセンス表示パネル、その製造方法、及びその成膜装置 |
JP2003027212A (ja) * | 2001-07-23 | 2003-01-29 | Sony Corp | パターン成膜装置およびパターン成膜方法 |
JP2003068454A (ja) * | 2001-08-24 | 2003-03-07 | Dainippon Printing Co Ltd | 有機el素子製造に用いる真空蒸着用多面付けマスク装置 |
JP2003217850A (ja) * | 2001-12-05 | 2003-07-31 | Samsung Nec Mobile Display Co Ltd | 有機elデバイスの薄膜蒸着用マスクフレーム組立体 |
Also Published As
Publication number | Publication date |
---|---|
US20050072359A1 (en) | 2005-04-07 |
CN1607868A (zh) | 2005-04-20 |
KR100889764B1 (ko) | 2009-03-20 |
CN100481577C (zh) | 2009-04-22 |
KR20050033086A (ko) | 2005-04-12 |
JP2005116526A (ja) | 2005-04-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4620420B2 (ja) | 有機電子発光素子の薄膜蒸着用マスクフレーム組立て体、及び、それを利用した薄膜蒸着方法 | |
JP3829148B2 (ja) | 有機elデバイスの薄膜蒸着用マスクフレーム組立体 | |
JP4444909B2 (ja) | マスク組立体及びそれを用いたマスクフレーム組立体 | |
JP4440563B2 (ja) | 有機電子発光素子の薄膜蒸着用マスクフレーム組立体 | |
TWI255666B (en) | Vapor deposition mask and organic EL display device manufacturing method | |
EP1802177A1 (en) | Organic electroluminescent device and manufacturing method thereof | |
JP4506214B2 (ja) | 有機電界発光装置およびその製造方法 | |
JP2004281339A (ja) | 成膜用マスク、有機elパネル、有機elパネルの製造方法 | |
KR20080060400A (ko) | 어레이 기판의 제조 방법 및 이를 이용한 유기 광 발생장치의 제조 방법 | |
CN111020477B (zh) | 一种掩膜装置、蒸镀方法及显示面板 | |
US10533246B2 (en) | Deposition mask, method for manufacturing the same, and touch panel | |
JPS62180989A (ja) | 薄膜elデバイスにおいて電極構造体をパタ−ン形成する為のマスク | |
JP2001043981A (ja) | 表示装置およびその製造方法 | |
JP2004214015A (ja) | 蒸着マスク、蒸着方法、有機elパネルの製造方法および有機el表示パネル | |
US6948994B2 (en) | Masks for forming strengthened electrodes of a light emission display panel | |
JP2001273976A (ja) | 有機エレクトロルミネセンス表示パネル、その製造方法、及びその成膜装置 | |
KR100275492B1 (ko) | 전방향 전기발광 평판 디스플레이 소자 및 그 제조 방법 | |
JPH0863274A (ja) | 入力パネル及びその製造方法 | |
KR100889421B1 (ko) | 플라즈마 디스플레이 패널 제조 방법 | |
KR102100296B1 (ko) | 분할 마스크 조립체 | |
EP0295329B1 (en) | Liquid crystal color display device | |
WO2020194632A1 (ja) | 蒸着マスクおよびその製造方法 | |
JP2002004045A (ja) | パターン形成装置、パターン形成方法、有機電界発光素子ディスプレイの製造装置及び製造方法 | |
JP2006120892A (ja) | 有機エレクトロルミネセンス表示パネル及びその製造方法 | |
JPH11297471A (ja) | 電界発光素子の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20050527 |
|
A072 | Dismissal of procedure [no reply to invitation to correct request for examination] |
Free format text: JAPANESE INTERMEDIATE CODE: A073 Effective date: 20060313 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20070322 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20070322 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070727 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20081208 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090225 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100216 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100223 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100706 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100729 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100928 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101028 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131105 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4620420 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131105 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131105 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |