JP4606159B2 - 基板処理装置、基板処理方法、コンピュータプログラム及び記憶媒体 - Google Patents

基板処理装置、基板処理方法、コンピュータプログラム及び記憶媒体 Download PDF

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JP4606159B2
JP4606159B2 JP2004381538A JP2004381538A JP4606159B2 JP 4606159 B2 JP4606159 B2 JP 4606159B2 JP 2004381538 A JP2004381538 A JP 2004381538A JP 2004381538 A JP2004381538 A JP 2004381538A JP 4606159 B2 JP4606159 B2 JP 4606159B2
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JP2005317913A5 (enExample
JP2005317913A (ja
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真喜夫 東
亮 宮田
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Tokyo Electron Ltd
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JP2004381538A 2004-03-31 2004-12-28 基板処理装置、基板処理方法、コンピュータプログラム及び記憶媒体 Expired - Lifetime JP4606159B2 (ja)

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JP2004381538A JP4606159B2 (ja) 2004-03-31 2004-12-28 基板処理装置、基板処理方法、コンピュータプログラム及び記憶媒体

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JP2004381538A JP4606159B2 (ja) 2004-03-31 2004-12-28 基板処理装置、基板処理方法、コンピュータプログラム及び記憶媒体

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JP2005317913A5 JP2005317913A5 (enExample) 2007-01-25
JP4606159B2 true JP4606159B2 (ja) 2011-01-05

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008072016A (ja) 2006-09-15 2008-03-27 Tokyo Electron Ltd 液処理装置、液処理方法及び記憶媒体
JP2010045190A (ja) * 2008-08-12 2010-02-25 Tokyo Electron Ltd 加熱システム、塗布、現像装置及び塗布、現像方法並びに記憶媒体
JP5469015B2 (ja) * 2009-09-30 2014-04-09 東京エレクトロン株式会社 基板処理装置および基板搬送方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3684056B2 (ja) * 1996-11-15 2005-08-17 株式会社日立国際電気 半導体製造装置の基板搬送制御方法
JP3862596B2 (ja) * 2002-05-01 2006-12-27 東京エレクトロン株式会社 基板処理方法
JP4233285B2 (ja) * 2002-08-23 2009-03-04 大日本スクリーン製造株式会社 基板処理装置

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