JP4594314B2 - ＳｉＯ蒸着材、ＳｉＯ原料用Ｓｉ粉末およびＳｉＯの製造方法 - Google Patents

ＳｉＯ蒸着材、ＳｉＯ原料用Ｓｉ粉末およびＳｉＯの製造方法 Download PDF

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Publication number
JP4594314B2
JP4594314B2 JP2006531640A JP2006531640A JP4594314B2 JP 4594314 B2 JP4594314 B2 JP 4594314B2 JP 2006531640 A JP2006531640 A JP 2006531640A JP 2006531640 A JP2006531640 A JP 2006531640A JP 4594314 B2 JP4594314 B2 JP 4594314B2
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sio
vapor deposition
hydrogen gas
powder
raw material
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JPWO2006025194A1 (ja
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信吾 木崎
和雄 西岡
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Osaka Titanium Technologies Co Ltd
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Osaka Titanium Technologies Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
JP2006531640A 2004-09-01 2005-08-09 ＳｉＯ蒸着材、ＳｉＯ原料用Ｓｉ粉末およびＳｉＯの製造方法 Expired - Fee Related JP4594314B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004253733 2004-09-01
JP2004253733 2004-09-01
PCT/JP2005/014552 WO2006025194A1 (fr) 2004-09-01 2005-08-09 MATIÈRE DE DÉPÔT DE SiO, POUDRE DE Si SERVANT DE MATIÈRE PREMIÈRE POUR DU SiO ET PROCÉDÉ SERVANT À PRODUIRE DU SiO

Publications (2)

Publication Number Publication Date
JPWO2006025194A1 JPWO2006025194A1 (ja) 2008-05-08
JP4594314B2 true JP4594314B2 (ja) 2010-12-08

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JP2006531640A Expired - Fee Related JP4594314B2 (ja) 2004-09-01 2005-08-09 ＳｉＯ蒸着材、ＳｉＯ原料用Ｓｉ粉末およびＳｉＯの製造方法

Country Status (5)

Country Link
US (1) US20070259113A1 (fr)
EP (1) EP1792874A4 (fr)
JP (1) JP4594314B2 (fr)
CN (1) CN101014534B (fr)
WO (1) WO2006025194A1 (fr)

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JP4374330B2 (ja) * 2005-06-16 2009-12-02 株式会社大阪チタニウムテクノロジーズ 一酸化珪素系蒸着材料及びその製造方法
US20080215076A1 (en) * 2005-11-14 2008-09-04 Sentinel Group, Llc Gastro-intestinal therapeutic device and method
US7947377B2 (en) * 2007-06-20 2011-05-24 Dai Nippon Printing Co., Ltd. Powder mixture to be made into evaporation source material for use in ion plating, evaporation source material for use in ion plating and method of producing the same, and gas barrier sheet and method of producing the same
JP4809926B2 (ja) * 2009-10-22 2011-11-09 株式会社大阪チタニウムテクノロジーズ リチウムイオン二次電池用負極活物質
JP5379026B2 (ja) * 2010-01-07 2013-12-25 信越化学工業株式会社 非水電解質二次電池負極材用珪素酸化物及び非水電解質二次電池負極材用珪素酸化物の製造方法並びにリチウムイオン二次電池及び電気化学キャパシタ
US9601228B2 (en) 2011-05-16 2017-03-21 Envia Systems, Inc. Silicon oxide based high capacity anode materials for lithium ion batteries
US10553871B2 (en) 2012-05-04 2020-02-04 Zenlabs Energy, Inc. Battery cell engineering and design to reach high energy
US9780358B2 (en) 2012-05-04 2017-10-03 Zenlabs Energy, Inc. Battery designs with high capacity anode materials and cathode materials
US10020491B2 (en) 2013-04-16 2018-07-10 Zenlabs Energy, Inc. Silicon-based active materials for lithium ion batteries and synthesis with solution processing
US10886526B2 (en) 2013-06-13 2021-01-05 Zenlabs Energy, Inc. Silicon-silicon oxide-carbon composites for lithium battery electrodes and methods for forming the composites
US11476494B2 (en) 2013-08-16 2022-10-18 Zenlabs Energy, Inc. Lithium ion batteries with high capacity anode active material and good cycling for consumer electronics
DE102014007354B4 (de) * 2014-05-19 2019-05-29 Viridis.iQ GmbH Verfahren zum Aufbereiten von Rückständen aus der mechanischen Bearbeitung von Siliziumprodukten
CN106744985B (zh) * 2016-12-30 2019-01-08 天津惠利科技股份有限公司 一氧化硅纳米材料及其制备方法
CN108793169A (zh) * 2017-03-27 2018-11-13 储晞 一种回收利用金刚线切割硅料副产硅泥的方法装置和系统
US11094925B2 (en) 2017-12-22 2021-08-17 Zenlabs Energy, Inc. Electrodes with silicon oxide active materials for lithium ion cells achieving high capacity, high energy density and long cycle life performance
WO2022059316A1 (fr) * 2020-09-16 2022-03-24 株式会社大阪チタニウムテクノロジーズ Matériau générateur de monoxyde de silicium gazeux et procédé de génération continue de monoxyde de silicium gazeux

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60251117A (ja) * 1983-12-30 1985-12-11 フアウエ−ベ−・フラツホグラスコンビナ−ト・トルガウ 極度に高い蒸発速度の蒸発物質
JPS6227318A (ja) * 1985-07-29 1987-02-05 Kawasaki Steel Corp Ｓｉｏ微粉末の製造方法およびその装置
JP2003192326A (ja) * 2001-12-26 2003-07-09 Shin Etsu Chem Co Ltd 多孔質酸化珪素粉末及びその製造方法
WO2006011290A1 (fr) * 2004-07-29 2006-02-02 Sumitomo Titanium Corporation POUDRE DE SiO POUR BATTERIE SECONDAIRE ET SON PROCÉDÉ DE FABRICATION

Family Cites Families (9)

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Publication number Priority date Publication date Assignee Title
JP3191320B2 (ja) * 1991-05-30 2001-07-23 東洋紡績株式会社 プラスチック被覆用材料および被覆プラスチックフィルム
JPH0925111A (ja) * 1995-07-10 1997-01-28 Shin Etsu Chem Co Ltd 低酸素けい素造粒物、その製造方法および窒化けい素の製造方法
US5985229A (en) * 1995-09-21 1999-11-16 Toagosei Co., Ltd. Solid silica derivative and process for producing the same
JP3760498B2 (ja) * 1996-01-24 2006-03-29 東亞合成株式会社 Ｓｉ−Ｈ結合含有シリカ誘導体微粒子およびその製造方法
US6083644A (en) * 1996-11-29 2000-07-04 Seiko Instruments Inc. Non-aqueous electrolyte secondary battery
JP3865033B2 (ja) * 2000-02-04 2007-01-10 信越化学工業株式会社 酸化珪素粉末の連続製造方法及び連続製造装置
EP1318207A4 (fr) * 2000-08-31 2006-08-16 Sumitomo Titanium Corp Materiau de depot par evaporation sous vide de monoxyde de silicium, son procede de production, la matiere premiere pour sa production et appareil de production
JP3488419B2 (ja) * 2000-08-31 2004-01-19 住友チタニウム株式会社 一酸化けい素蒸着材料の製造方法
DE10353995A1 (de) * 2003-11-19 2005-06-09 Degussa Ag Nanoskaliges, kristallines Siliciumpulver

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60251117A (ja) * 1983-12-30 1985-12-11 フアウエ−ベ−・フラツホグラスコンビナ−ト・トルガウ 極度に高い蒸発速度の蒸発物質
JPS6227318A (ja) * 1985-07-29 1987-02-05 Kawasaki Steel Corp Ｓｉｏ微粉末の製造方法およびその装置
JP2003192326A (ja) * 2001-12-26 2003-07-09 Shin Etsu Chem Co Ltd 多孔質酸化珪素粉末及びその製造方法
WO2006011290A1 (fr) * 2004-07-29 2006-02-02 Sumitomo Titanium Corporation POUDRE DE SiO POUR BATTERIE SECONDAIRE ET SON PROCÉDÉ DE FABRICATION

Also Published As

Publication number Publication date
EP1792874A4 (fr) 2009-07-22
JPWO2006025194A1 (ja) 2008-05-08
WO2006025194A1 (fr) 2006-03-09
EP1792874A1 (fr) 2007-06-06
US20070259113A1 (en) 2007-11-08
CN101014534A (zh) 2007-08-08
CN101014534B (zh) 2011-05-18

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