JP4587320B2 - 微小構造体、マイクロマシン、およびこれらの作製方法 - Google Patents

微小構造体、マイクロマシン、およびこれらの作製方法 Download PDF

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Publication number
JP4587320B2
JP4587320B2 JP2006166440A JP2006166440A JP4587320B2 JP 4587320 B2 JP4587320 B2 JP 4587320B2 JP 2006166440 A JP2006166440 A JP 2006166440A JP 2006166440 A JP2006166440 A JP 2006166440A JP 4587320 B2 JP4587320 B2 JP 4587320B2
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Prior art keywords
layer
frame
sidewall structure
insulating substrate
microstructure
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JP2006166440A
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Japanese (ja)
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JP2007038394A (ja
JP2007038394A5 (enrdf_load_stackoverflow
Inventor
真弓 山口
小波 泉
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of JP2007038394A5 publication Critical patent/JP2007038394A5/ja
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  • Micromachines (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
JP2006166440A 2005-06-30 2006-06-15 微小構造体、マイクロマシン、およびこれらの作製方法 Expired - Fee Related JP4587320B2 (ja)

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JP2006166440A JP4587320B2 (ja) 2005-06-30 2006-06-15 微小構造体、マイクロマシン、およびこれらの作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005193154 2005-06-30
JP2006166440A JP4587320B2 (ja) 2005-06-30 2006-06-15 微小構造体、マイクロマシン、およびこれらの作製方法

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JP2007038394A JP2007038394A (ja) 2007-02-15
JP2007038394A5 JP2007038394A5 (enrdf_load_stackoverflow) 2007-04-05
JP4587320B2 true JP4587320B2 (ja) 2010-11-24

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7999335B2 (en) * 2007-12-05 2011-08-16 Semiconductor Energy Laboratory Co., Ltd. Micromachine and method for manufacturing the same
JP6341959B2 (ja) 2016-05-27 2018-06-13 浜松ホトニクス株式会社 ファブリペロー干渉フィルタの製造方法
TWI717519B (zh) 2016-05-27 2021-02-01 日商濱松赫德尼古斯股份有限公司 法布立-培若干涉濾光器之製造方法
CN118091929A (zh) * 2016-08-24 2024-05-28 浜松光子学株式会社 法布里-珀罗干涉滤光器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5808331A (en) * 1995-09-05 1998-09-15 Motorola, Inc. Monolithic semiconductor device having a microstructure and a transistor
JP3975574B2 (ja) * 1998-09-09 2007-09-12 株式会社デンソー モノリシックマイクロ波集積回路の製造方法
JP2002174721A (ja) * 2000-12-06 2002-06-21 Yokogawa Electric Corp ファブリペローフィルタ
JP2002214548A (ja) * 2001-01-15 2002-07-31 Sony Corp 三次元構造体およびその製造方法
JP2002214549A (ja) * 2001-01-18 2002-07-31 Ricoh Co Ltd 光変調装置及びその光変調装置の製造方法並びにその光変調装置を具備する画像形成装置及びその光変調装置を具備する画像投影表示装置
JP2003340795A (ja) * 2002-05-20 2003-12-02 Sony Corp 静電駆動型ｍｅｍｓ素子とその製造方法、光学ｍｅｍｓ素子、光変調素子、ｇｌｖデバイス及びレーザディスプレイ
US7653371B2 (en) * 2004-09-27 2010-01-26 Qualcomm Mems Technologies, Inc. Selectable capacitance circuit

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JP2007038394A (ja) 2007-02-15

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