JP4574211B2 - 光源装置、当該光源装置を有する露光装置 - Google Patents

光源装置、当該光源装置を有する露光装置 Download PDF

Info

Publication number
JP4574211B2
JP4574211B2 JP2004123502A JP2004123502A JP4574211B2 JP 4574211 B2 JP4574211 B2 JP 4574211B2 JP 2004123502 A JP2004123502 A JP 2004123502A JP 2004123502 A JP2004123502 A JP 2004123502A JP 4574211 B2 JP4574211 B2 JP 4574211B2
Authority
JP
Japan
Prior art keywords
light
target
light source
condensing point
source device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004123502A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005310453A5 (enExample
JP2005310453A (ja
Inventor
隆行 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004123502A priority Critical patent/JP4574211B2/ja
Priority to EP05252408A priority patent/EP1589792B1/en
Priority to US11/109,078 priority patent/US7348582B2/en
Publication of JP2005310453A publication Critical patent/JP2005310453A/ja
Publication of JP2005310453A5 publication Critical patent/JP2005310453A5/ja
Application granted granted Critical
Publication of JP4574211B2 publication Critical patent/JP4574211B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Plasma Technology (AREA)
JP2004123502A 2004-04-19 2004-04-19 光源装置、当該光源装置を有する露光装置 Expired - Fee Related JP4574211B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004123502A JP4574211B2 (ja) 2004-04-19 2004-04-19 光源装置、当該光源装置を有する露光装置
EP05252408A EP1589792B1 (en) 2004-04-19 2005-04-18 Light source apparatus and exposure apparatus having the same
US11/109,078 US7348582B2 (en) 2004-04-19 2005-04-18 Light source apparatus and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004123502A JP4574211B2 (ja) 2004-04-19 2004-04-19 光源装置、当該光源装置を有する露光装置

Publications (3)

Publication Number Publication Date
JP2005310453A JP2005310453A (ja) 2005-11-04
JP2005310453A5 JP2005310453A5 (enExample) 2007-05-31
JP4574211B2 true JP4574211B2 (ja) 2010-11-04

Family

ID=34940888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004123502A Expired - Fee Related JP4574211B2 (ja) 2004-04-19 2004-04-19 光源装置、当該光源装置を有する露光装置

Country Status (3)

Country Link
US (1) US7348582B2 (enExample)
EP (1) EP1589792B1 (enExample)
JP (1) JP4574211B2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4878108B2 (ja) * 2004-07-14 2012-02-15 キヤノン株式会社 露光装置、デバイス製造方法、および測定装置
JP2006128342A (ja) * 2004-10-28 2006-05-18 Canon Inc 露光装置、光源装置及びデバイス製造方法
JP5301165B2 (ja) * 2005-02-25 2013-09-25 サイマー インコーポレイテッド レーザ生成プラズマｅｕｖ光源
KR101370203B1 (ko) * 2005-11-10 2014-03-05 칼 짜이스 에스엠테 게엠베하 광원의 요동을 측정하기 위한 시스템을 구비한 ｅｕｖ 조명시스템
JP2008041742A (ja) * 2006-08-02 2008-02-21 Ushio Inc 極端紫外光光源装置
NL2003192A1 (nl) * 2008-07-30 2010-02-02 Asml Netherlands Bv Alignment of collector device in lithographic apparatus.
ATE536567T1 (de) * 2008-08-14 2011-12-15 Asml Netherlands Bv Strahlungsquelle und verfahren zur strahlungserzeugung
US8445876B2 (en) * 2008-10-24 2013-05-21 Gigaphoton Inc. Extreme ultraviolet light source apparatus
FR2939529A1 (fr) * 2008-12-04 2010-06-11 Ecole Polytech Dispositif optique de controle de l'orientation et de la position d'une surface en mouvement par mesure interferometrique et source secondaire generee par interaction laser-matiere comprenant un tel dispositif
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
JP5308973B2 (ja) 2009-09-16 2013-10-09 富士フイルム株式会社 医用画像情報表示装置および方法並びにプログラム
JP5802410B2 (ja) * 2010-03-29 2015-10-28 ギガフォトン株式会社 極端紫外光生成装置
DE102010050947B4 (de) 2010-11-10 2017-07-13 Ushio Denki Kabushiki Kaisha Verfahren und Anordnung zur Stabilisierung des Quellortes der Erzeugung extrem ultravioletter (EUV-)Strahlung auf Basis eines Entladungsplasmas
US9000405B2 (en) * 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
JP6339816B2 (ja) * 2014-02-10 2018-06-06 株式会社Ｆｕｊｉ プラズマ処理判断システム
JPWO2015166524A1 (ja) * 2014-04-28 2017-04-20 ギガフォトン株式会社 極端紫外光生成装置
WO2016013102A1 (ja) * 2014-07-25 2016-01-28 ギガフォトン株式会社 極端紫外光生成装置
WO2017042881A1 (ja) 2015-09-08 2017-03-16 ギガフォトン株式会社 極端紫外光生成装置
WO2017126065A1 (ja) * 2016-01-20 2017-07-27 ギガフォトン株式会社 極端紫外光生成装置
WO2017163315A1 (ja) * 2016-03-22 2017-09-28 ギガフォトン株式会社 ドロップレットタイミングセンサ
JP7641257B2 (ja) * 2022-08-31 2025-03-06 レーザーテック株式会社 位置検出装置及び位置検出方法
JP7657877B1 (ja) 2023-09-25 2025-04-07 レーザーテック株式会社 光源装置、検査装置、露光装置、光源制御方法、検査方法及び露光方法
JP7657878B1 (ja) 2023-09-25 2025-04-07 レーザーテック株式会社 光源装置、検査装置、露光装置、光源制御方法、検査方法及び露光方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000056099A (ja) 1998-08-13 2000-02-25 Nikon Corp Ｘ線照射装置及びｘ線発生位置検出器
JP4273574B2 (ja) * 1999-05-27 2009-06-03 株式会社ニコン Ｘ線発生装置及びこれを有するｘ線露光装置及びｘ線の発生方法
US6324255B1 (en) * 1998-08-13 2001-11-27 Nikon Technologies, Inc. X-ray irradiation apparatus and x-ray exposure apparatus
US6792076B2 (en) * 2002-05-28 2004-09-14 Northrop Grumman Corporation Target steering system for EUV droplet generators
JP2004128105A (ja) * 2002-10-01 2004-04-22 Nikon Corp Ｘ線発生装置及び露光装置
DE10339495B4 (de) * 2002-10-08 2007-10-04 Xtreme Technologies Gmbh Anordnung zur optischen Detektion eines bewegten Targetstromes für eine gepulste energiestrahlgepumpte Strahlungserzeugung
DE10314849B3 (de) * 2003-03-28 2004-12-30 Xtreme Technologies Gmbh Anordnung zur Stabilisierung der Strahlungsemission eines Plasmas
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
EP1730764A4 (en) * 2004-03-17 2010-08-18 Cymer Inc LPP EUV LIGHT SOURCE
JP4878108B2 (ja) * 2004-07-14 2012-02-15 キヤノン株式会社 露光装置、デバイス製造方法、および測定装置

Also Published As

Publication number Publication date
EP1589792A3 (en) 2008-10-29
US7348582B2 (en) 2008-03-25
EP1589792B1 (en) 2013-01-23
EP1589792A2 (en) 2005-10-26
JP2005310453A (ja) 2005-11-04
US20060192156A1 (en) 2006-08-31

Similar Documents

Publication Publication Date Title
JP4574211B2 (ja) 光源装置、当該光源装置を有する露光装置
JP5571316B2 (ja) 複数の位置調整装置を備えるリソグラフィ装置、及び位置調整測定方法
CN102612667B (zh) 光刻设备以及器件制造方法
JP3984428B2 (ja) リソグラフィ投影装置、マスクテーブル及びデバイス製造方法
US20070229788A1 (en) Exposure apparatus and device manufacturing method
JP2002353099A (ja) 位置検出方法及び装置及び露光装置及びデバイス製造方法
JP2005235959A (ja) 光発生装置及び露光装置
JPH10135123A (ja) 投影露光装置及びそれを用いた半導体デバイスの製造方法
US7276710B2 (en) Light source unit and exposure apparatus having the same
JPH11317349A (ja) 投影露光装置及びそれを用いたデバイスの製造方法
US20010023918A1 (en) Alignment apparatus, alignment method, exposure apparatus and exposure method
JP4724470B2 (ja) 露光方法
US7130024B2 (en) Exposure apparatus
JPH1022213A (ja) 位置検出装置及びそれを用いたデバイスの製造方法
JP2005302825A (ja) 露光装置
JP4208532B2 (ja) 光学素子の透過率を測定する方法
JP2009164355A (ja) 走査露光装置およびデバイス製造方法
JP2002083760A (ja) Ｘ線投影露光装置およびｘ線投影露光方法および半導体デバイス
JP5653182B2 (ja) 露光方法、露光装置及びデバイス製造方法
JP2000031031A (ja) 位置検出装置及びそれを用いたデバイスの製造方法
JP2008124308A (ja) 露光方法及び露光装置、それを用いたデバイス製造方法
JP2009105349A (ja) 露光装置及びデバイス製造方法
JP2006073905A (ja) 光学系及び当該光学系の調整方法、露光装置、並びにデバイス製造方法
JP2006128439A (ja) 露光装置及びデバイス製造方法
JP2001203147A (ja) マーク検知装置、露光装置、デバイス、マーク検知方法及び露光方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070411

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070411

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100413

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100614

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100810

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100818

R150 Certificate of patent or registration of utility model

Ref document number: 4574211

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130827

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees