JP4563814B2 - アニオン重合又は制御ラジカル重合によるヒドロキシ−ビニル芳香族ポリマー又はコポリマーの製造方法 - Google Patents

アニオン重合又は制御ラジカル重合によるヒドロキシ−ビニル芳香族ポリマー又はコポリマーの製造方法 Download PDF

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Publication number
JP4563814B2
JP4563814B2 JP2004551039A JP2004551039A JP4563814B2 JP 4563814 B2 JP4563814 B2 JP 4563814B2 JP 2004551039 A JP2004551039 A JP 2004551039A JP 2004551039 A JP2004551039 A JP 2004551039A JP 4563814 B2 JP4563814 B2 JP 4563814B2
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Japan
Prior art keywords
alkyl
group
phenyl
formula
hydrogen
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Japanese (ja)
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JP2006506480A5 (https=
JP2006506480A (ja
Inventor
和彦 国本
ネスヴァドバ，ペーター
クラーマー，アンドレアス
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BASF Schweiz AG
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Ciba Holding AG
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/22—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
JP2004551039A 2002-11-14 2003-11-05 アニオン重合又は制御ラジカル重合によるヒドロキシ−ビニル芳香族ポリマー又はコポリマーの製造方法 Expired - Fee Related JP4563814B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405980 2002-11-14
PCT/EP2003/050793 WO2004044017A1 (en) 2002-11-14 2003-11-05 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization

Publications (3)

Publication Number Publication Date
JP2006506480A JP2006506480A (ja) 2006-02-23
JP2006506480A5 JP2006506480A5 (https=) 2006-12-07
JP4563814B2 true JP4563814B2 (ja) 2010-10-13

Family

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Family Applications (1)

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JP2004551039A Expired - Fee Related JP4563814B2 (ja) 2002-11-14 2003-11-05 アニオン重合又は制御ラジカル重合によるヒドロキシ−ビニル芳香族ポリマー又はコポリマーの製造方法

Country Status (10)

Country Link
US (1) US7385009B2 (https=)
EP (1) EP1572758B1 (https=)
JP (1) JP4563814B2 (https=)
KR (1) KR101043904B1 (https=)
CN (1) CN100363390C (https=)
AT (1) ATE367406T1 (https=)
AU (1) AU2003301974A1 (https=)
DE (1) DE60315070T2 (https=)
TW (1) TW200415151A (https=)
WO (1) WO2004044017A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5359752B2 (ja) * 2009-09-30 2013-12-04 日本ゼオン株式会社 重合トナーの製造方法
JP5205485B2 (ja) * 2011-02-21 2013-06-05 富士フイルム株式会社 レジスト膜、該レジスト膜を用いたレジスト塗布マスクブランクス及びレジストパターン形成方法、並びに、化学増幅型レジスト組成物
JP5453358B2 (ja) * 2011-07-26 2014-03-26 富士フイルム株式会社 化学増幅型レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
JP5982277B2 (ja) * 2012-12-21 2016-08-31 群栄化学工業株式会社 硬化性樹脂の製造方法
HUE066094T2 (hu) * 2016-04-05 2024-07-28 Albemarle Corp Szénhidrogénnel oldható só-hidrid katalizátor hidrogénnel közvetített só-hidrid alapú anionos láncátviteli polimerizációhoz és az ebbõl elõállított polimereloszlási készítmények és az elõállításához szükséges folyamat
DE102016221346A1 (de) * 2016-10-28 2018-05-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung eines Polymerisates durch Nitroxyl-kontrollierte Polymerisation sowie Polymerisat
JP7334683B2 (ja) * 2019-08-02 2023-08-29 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
EP4061859A1 (en) * 2019-11-22 2022-09-28 Stichting voor de Technische Wetenschappen Macromolecular compositions for binding small molecules

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3031421B2 (ja) * 1990-11-28 2000-04-10 信越化学工業株式会社 化学増幅ポジ型レジスト材
JPH0665325A (ja) * 1992-08-19 1994-03-08 Shin Etsu Chem Co Ltd 単分散性共重合体の製造方法
US6107425A (en) * 1998-02-06 2000-08-22 Shipley Company, L.L.C. Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists
JPH11255820A (ja) * 1998-03-12 1999-09-21 Mitsui Chem Inc 狭分散性のポリ（ｐ−ヒドロキシスチレン）の製造方法
JP4126760B2 (ja) * 1998-07-09 2008-07-30 住友化学株式会社 狭分散性重合体の製造方法、狭分散性重合体及びそれのレジストへの適用
JP4198351B2 (ja) * 2000-12-07 2008-12-17 信越化学工業株式会社 高分子化合物の製造方法及び該高分子化合物を用いたレジスト材料
WO2003022895A1 (en) * 2001-09-10 2003-03-20 Ciba Specialty Chemicals Holding Inc. Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization
US7256332B2 (en) * 2006-01-31 2007-08-14 Pioneer Hi-Bred International, Inc. Hybrid maize plant and seed 39A94

Also Published As

Publication number Publication date
WO2004044017A1 (en) 2004-05-27
DE60315070D1 (de) 2007-08-30
TW200415151A (en) 2004-08-16
EP1572758A1 (en) 2005-09-14
US7385009B2 (en) 2008-06-10
CN1711290A (zh) 2005-12-21
ATE367406T1 (de) 2007-08-15
JP2006506480A (ja) 2006-02-23
EP1572758B1 (en) 2007-07-18
KR20050086569A (ko) 2005-08-30
US20060041080A1 (en) 2006-02-23
DE60315070T2 (de) 2008-03-20
CN100363390C (zh) 2008-01-23
KR101043904B1 (ko) 2011-06-29
AU2003301974A1 (en) 2004-06-03

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