JP4558176B2 - ハロゲン含有ガス処理方法及び処理装置 - Google Patents

ハロゲン含有ガス処理方法及び処理装置 Download PDF

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Publication number
JP4558176B2
JP4558176B2 JP2000350855A JP2000350855A JP4558176B2 JP 4558176 B2 JP4558176 B2 JP 4558176B2 JP 2000350855 A JP2000350855 A JP 2000350855A JP 2000350855 A JP2000350855 A JP 2000350855A JP 4558176 B2 JP4558176 B2 JP 4558176B2
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gas
halogen
containing gas
water vapor
concentration
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Japanese (ja)
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JP2002153729A (ja
JP2002153729A5 (enExample
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昌樹 葛本
昇 和田
雅史 土井
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
JP2000350855A 2000-11-17 2000-11-17 ハロゲン含有ガス処理方法及び処理装置 Expired - Fee Related JP4558176B2 (ja)

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JP2000350855A JP4558176B2 (ja) 2000-11-17 2000-11-17 ハロゲン含有ガス処理方法及び処理装置

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JP2000350855A JP4558176B2 (ja) 2000-11-17 2000-11-17 ハロゲン含有ガス処理方法及び処理装置

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JP2002153729A JP2002153729A (ja) 2002-05-28
JP2002153729A5 JP2002153729A5 (enExample) 2007-01-11
JP4558176B2 true JP4558176B2 (ja) 2010-10-06

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1913956A (zh) * 2004-01-29 2007-02-14 大阳日酸株式会社 废气处理方法以及废气处理装置
GB0416385D0 (en) * 2004-07-22 2004-08-25 Boc Group Plc Gas abatement
JP2007021290A (ja) * 2005-07-12 2007-02-01 Taiyo Nippon Sanso Corp 排ガスの処理方法および処理装置
JP2012213720A (ja) * 2011-03-31 2012-11-08 Azbil Corp ガス処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291624A (ja) * 1987-05-23 1988-11-29 Showa Denko Kk ガリウム・ヒ素ウェハ−のドライエッチング排ガスの処理方法
JPH09206555A (ja) * 1996-01-31 1997-08-12 Takuma Co Ltd 有機ハロゲン化合物の処理方法および処理装置
JPH11156156A (ja) * 1997-11-27 1999-06-15 Seiko Epson Corp ハロゲン系ガスの処理方法、処理装置および反応処理装置並びに半導体装置
JP2000009037A (ja) * 1998-06-18 2000-01-11 Fujitsu Ltd 排気装置及び排気方法

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