JP4545797B2 - 有機発光ダイオード蒸着工程用のマルチノズルるつぼ装置 - Google Patents
有機発光ダイオード蒸着工程用のマルチノズルるつぼ装置 Download PDFInfo
- Publication number
- JP4545797B2 JP4545797B2 JP2007535591A JP2007535591A JP4545797B2 JP 4545797 B2 JP4545797 B2 JP 4545797B2 JP 2007535591 A JP2007535591 A JP 2007535591A JP 2007535591 A JP2007535591 A JP 2007535591A JP 4545797 B2 JP4545797 B2 JP 4545797B2
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- crucible
- deposition process
- oled
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
前記複数個のノズルは、前記マルチノズル部の円筒形の周縁部に沿って配置され、それぞれ、前記るつぼの内部と通じており、
前記各ノズルは、中心軸が前記マルチノズル部の中心軸に対して斜めになっており、且つ、出口に向かうほど径が増加する円錐形のノズルであることを特徴とする。
Claims (5)
- 複数個のノズルを有し、下部が開口されたマルチノズル部と、上部が開口され、一つの円筒形で形成されて、前記マルチノズル部と結合されるるつぼと、から構成される、OLED蒸着工程用のマルチノズルるつぼ装置であって、
前記複数個のノズルは、前記マルチノズル部の円筒形の周縁部に沿って配置され、それぞれ、前記るつぼの内部と通じており、
前記各ノズルは、中心軸が前記マルチノズル部の中心軸に対して斜めになっており、且つ、出口に向かうほど径が増加する円錐形のノズルであることを特徴とする、OLED蒸着工程用のマルチノズルるつぼ装置。 - 前記るつぼの内部には、上部中央に向けて円筒形の突出部が備えられることを特徴とする、請求項1に記載のOLED蒸着工程用のマルチノズルるつぼ装置。
- 前記るつぼの底には、前記るつぼの中央に向けて、温度測定用の線材を固定する円筒形の固定溝が備えられることを特徴とする、請求項1または2に記載のOLED蒸着工程用のマルチノズルるつぼ装置。
- 前記マルチノズル部の特定のノズルは、ノズル栓によって塞がれることを特徴とする、請求項1〜3のいずれかに記載のOLED蒸着工程用のマルチノズルるつぼ装置。
- 前記マルチノズル部の周縁部のノズル同士間には、溝が形成されることを特徴とする、請求項1〜4のいずれかに記載のOLED蒸着工程用のマルチノズルるつぼ装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040080960A KR100651258B1 (ko) | 2004-10-11 | 2004-10-11 | 유기 박막 증착 공정용 멀티 노즐 도가니 장치 |
PCT/KR2005/000249 WO2006041239A1 (en) | 2004-10-11 | 2005-01-28 | Multi-nozzle crucible assembly for oled deposition process |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008516389A JP2008516389A (ja) | 2008-05-15 |
JP4545797B2 true JP4545797B2 (ja) | 2010-09-15 |
Family
ID=36148515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007535591A Expired - Fee Related JP4545797B2 (ja) | 2004-10-11 | 2005-01-28 | 有機発光ダイオード蒸着工程用のマルチノズルるつぼ装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4545797B2 (ja) |
KR (1) | KR100651258B1 (ja) |
WO (1) | WO2006041239A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100980729B1 (ko) * | 2006-07-03 | 2010-09-07 | 주식회사 야스 | 증착 공정용 다중 노즐 증발원 |
KR100878295B1 (ko) * | 2006-12-27 | 2009-01-13 | 세메스 주식회사 | 박막 증착용 면 증발장치 및 이를 구비하는 박막 증착 장치 |
KR100805323B1 (ko) * | 2006-12-28 | 2008-02-20 | 세메스 주식회사 | 유기 박막 증착 장치 |
JP5247239B2 (ja) * | 2008-05-22 | 2013-07-24 | 日立造船株式会社 | 真空蒸着装置の放出部構造 |
US8506715B2 (en) | 2010-12-23 | 2013-08-13 | United Technologies Corporation | Coating deposition apparatus and method therefor |
KR102218677B1 (ko) * | 2014-01-03 | 2021-02-23 | 삼성디스플레이 주식회사 | 증착원 |
SG10201608496UA (en) | 2016-10-11 | 2018-05-30 | Au Optronics Corp | Crucible |
CN107805784B (zh) * | 2017-12-08 | 2018-12-21 | 泉州市派腾新材料科技有限公司 | 一种oled蒸镀设备 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55160422A (en) * | 1979-05-31 | 1980-12-13 | Matsushita Electric Ind Co Ltd | Method and device for thin film growth |
JPS613990A (ja) * | 1984-06-18 | 1986-01-09 | 株式会社神戸製鋼所 | ウオ−キングビ−ム型加熱炉におけるスケ−ル排出装置 |
JPH03294474A (ja) * | 1990-04-11 | 1991-12-25 | Mitsubishi Electric Corp | 膜形成装置 |
JP2603296Y2 (ja) * | 1992-08-21 | 2000-03-06 | 日新電機株式会社 | 半導体製造装置用サセプター |
JP4312289B2 (ja) * | 1999-01-28 | 2009-08-12 | キヤノンアネルバ株式会社 | 有機薄膜形成装置 |
DE59914510D1 (de) * | 1999-03-29 | 2007-11-08 | Antec Solar Energy Ag | Vorrichtung und Verfahren zur Beschichtung von Substraten durch Aufdampfen mittels eines PVD-Verfahrens |
JP2001294852A (ja) * | 2000-04-14 | 2001-10-23 | Tdk Corp | 蛍光体とその製造方法、薄膜の製造装置、およびel素子 |
ATE497028T1 (de) * | 2000-06-22 | 2011-02-15 | Panasonic Elec Works Co Ltd | Vorrichtung und verfahren zum vakuum-ausdampfen |
KR100461283B1 (ko) * | 2000-12-30 | 2004-12-14 | 현대엘씨디주식회사 | 유기전기발광소자 제조장치용 유기물증발보트구조 |
JP2003222472A (ja) * | 2002-01-30 | 2003-08-08 | Toyota Industries Corp | ルツボ |
KR100358727B1 (ko) * | 2002-04-01 | 2002-10-31 | 에이엔 에스 주식회사 | 기상유기물 증착방법과 이를 이용한 기상유기물 증착장치 |
-
2004
- 2004-10-11 KR KR1020040080960A patent/KR100651258B1/ko not_active IP Right Cessation
-
2005
- 2005-01-28 WO PCT/KR2005/000249 patent/WO2006041239A1/en active Application Filing
- 2005-01-28 JP JP2007535591A patent/JP4545797B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20060031965A (ko) | 2006-04-14 |
KR100651258B1 (ko) | 2006-11-29 |
JP2008516389A (ja) | 2008-05-15 |
WO2006041239A1 (en) | 2006-04-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4545797B2 (ja) | 有機発光ダイオード蒸着工程用のマルチノズルるつぼ装置 | |
KR100980729B1 (ko) | 증착 공정용 다중 노즐 증발원 | |
KR101200693B1 (ko) | 대면적 유기박막 제작용 선형 다점 도가니 장치 | |
KR100579406B1 (ko) | 수직 이동형 유기물 증착 장치 | |
KR100532657B1 (ko) | 다증발원을 이용한 동시증착에서 균일하게 혼합된 박막의증착을 위한 증발 영역조절장치 | |
WO2018018926A1 (en) | Evaporator, evaporation coating apparatus and evaporation coating method | |
JP2003160855A (ja) | 薄膜形成装置 | |
JP2009228091A (ja) | 蒸着装置 | |
CN109385605A (zh) | 蒸发源装置及其控制方法 | |
JP4478113B2 (ja) | 加熱容器支持台及びそれを備えた蒸着装置 | |
TWI447246B (zh) | 真空蒸鍍裝置 | |
KR20110024223A (ko) | 증발 장치 및 이를 포함하는 진공 증착 장치 | |
KR20080036294A (ko) | 증착 공정용 원추형 다중 노즐 증발원 | |
KR100656181B1 (ko) | 유기 el소자의 연속 증착 시스템 | |
KR20170059318A (ko) | 혼합 유기물 기체의 단일 증발원 | |
KR101422533B1 (ko) | 믹싱 영역이 포함된 선형 증발원 | |
KR101432079B1 (ko) | 유기물 피딩 장치 | |
KR100624767B1 (ko) | 유기물의 연속증착장치 | |
KR102218677B1 (ko) | 증착원 | |
KR20030075461A (ko) | 유기 반도체 소자 박막 제작을 위한 선형 증발원 | |
KR100829736B1 (ko) | 진공 증착장치의 가열용기 | |
KR20050077417A (ko) | 대면적 유기박막 증착 공정용 다점 증발원 | |
KR101200641B1 (ko) | 대면적 유기발광소자 제작용 증발원 정렬방법 | |
KR20000054211A (ko) | 진공증착장치의 가열용기 | |
KR100994454B1 (ko) | 증발 장치 및 이를 구비하는 진공 증착 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091104 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100203 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100210 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100303 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100310 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100402 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100409 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100506 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100601 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100630 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130709 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |