JP4531612B2 - 基板処理装置および基板処理方法 - Google Patents

基板処理装置および基板処理方法 Download PDF

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Publication number
JP4531612B2
JP4531612B2 JP2005103202A JP2005103202A JP4531612B2 JP 4531612 B2 JP4531612 B2 JP 4531612B2 JP 2005103202 A JP2005103202 A JP 2005103202A JP 2005103202 A JP2005103202 A JP 2005103202A JP 4531612 B2 JP4531612 B2 JP 4531612B2
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Japan
Prior art keywords
substrate
guide
processing liquid
holding means
guide part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2005103202A
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English (en)
Japanese (ja)
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JP2006286832A (ja
JP2006286832A5 (enExample
Inventor
武司 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2005103202A priority Critical patent/JP4531612B2/ja
Priority to KR1020060026380A priority patent/KR100752246B1/ko
Priority to US11/396,700 priority patent/US8313609B2/en
Publication of JP2006286832A publication Critical patent/JP2006286832A/ja
Publication of JP2006286832A5 publication Critical patent/JP2006286832A5/ja
Application granted granted Critical
Publication of JP4531612B2 publication Critical patent/JP4531612B2/ja
Priority to US13/545,685 priority patent/US8545668B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2005103202A 2005-03-31 2005-03-31 基板処理装置および基板処理方法 Expired - Lifetime JP4531612B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005103202A JP4531612B2 (ja) 2005-03-31 2005-03-31 基板処理装置および基板処理方法
KR1020060026380A KR100752246B1 (ko) 2005-03-31 2006-03-23 기판처리장치 및 기판처리방법
US11/396,700 US8313609B2 (en) 2005-03-31 2006-03-31 Substrate processing apparatus and substrate processing method
US13/545,685 US8545668B2 (en) 2005-03-31 2012-07-10 Substrate processing apparatus and substrate processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005103202A JP4531612B2 (ja) 2005-03-31 2005-03-31 基板処理装置および基板処理方法

Publications (3)

Publication Number Publication Date
JP2006286832A JP2006286832A (ja) 2006-10-19
JP2006286832A5 JP2006286832A5 (enExample) 2008-05-08
JP4531612B2 true JP4531612B2 (ja) 2010-08-25

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JP2005103202A Expired - Lifetime JP4531612B2 (ja) 2005-03-31 2005-03-31 基板処理装置および基板処理方法

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JP (1) JP4531612B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009520362A (ja) * 2005-12-16 2009-05-21 ソリッド ステイト イクイップメント コーポレイション 化学的分離の装置及び方法
KR100912702B1 (ko) * 2007-09-18 2009-08-19 세메스 주식회사 기판 처리 장치 및 방법
JP5390874B2 (ja) * 2009-01-28 2014-01-15 大日本スクリーン製造株式会社 基板処理装置
JP5242632B2 (ja) 2010-06-03 2013-07-24 東京エレクトロン株式会社 基板液処理装置
KR101592058B1 (ko) 2010-06-03 2016-02-05 도쿄엘렉트론가부시키가이샤 기판 액처리 장치
JP5309118B2 (ja) 2010-12-17 2013-10-09 東京エレクトロン株式会社 基板液処理装置
JP5375871B2 (ja) 2011-04-18 2013-12-25 東京エレクトロン株式会社 液処理装置、液処理方法、コンピュータプログラムを格納した記憶媒体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3963605B2 (ja) * 1999-03-04 2007-08-22 住友精密工業株式会社 回転式基板処理装置
JP2004031400A (ja) * 2002-06-21 2004-01-29 Sipec Corp 基板処理装置及びその処理方法
JP2004265912A (ja) * 2003-02-03 2004-09-24 Personal Creation Ltd 基板の処理装置

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JP2006286832A (ja) 2006-10-19

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