JP4521621B2 - 半導体単結晶製造方法 - Google Patents
半導体単結晶製造方法 Download PDFInfo
- Publication number
- JP4521621B2 JP4521621B2 JP14388999A JP14388999A JP4521621B2 JP 4521621 B2 JP4521621 B2 JP 4521621B2 JP 14388999 A JP14388999 A JP 14388999A JP 14388999 A JP14388999 A JP 14388999A JP 4521621 B2 JP4521621 B2 JP 4521621B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- rod
- crystal rod
- pipe
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14388999A JP4521621B2 (ja) | 1999-05-24 | 1999-05-24 | 半導体単結晶製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14388999A JP4521621B2 (ja) | 1999-05-24 | 1999-05-24 | 半導体単結晶製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000327476A JP2000327476A (ja) | 2000-11-28 |
| JP2000327476A5 JP2000327476A5 (enExample) | 2006-06-01 |
| JP4521621B2 true JP4521621B2 (ja) | 2010-08-11 |
Family
ID=15349403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14388999A Expired - Lifetime JP4521621B2 (ja) | 1999-05-24 | 1999-05-24 | 半導体単結晶製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4521621B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104264220A (zh) * | 2014-07-02 | 2015-01-07 | 洛阳金诺机械工程有限公司 | 一种用产品料直接拉制硅芯的方法 |
| JP6863240B2 (ja) * | 2017-11-13 | 2021-04-21 | 株式会社Sumco | シリコン単結晶の製造装置および製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1644002A1 (de) * | 1967-04-15 | 1970-04-09 | Siemens Ag | Verfahren zum tiegelfreien Zonenschmelzen eines kristallinen Stabes,insbesondere Halbleiterstabes |
| DE2227750C3 (de) * | 1972-06-07 | 1980-08-28 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Vorrichtung zum tiegelfreien Zonenschmelzen eines stabförmigen Körpers aus kristallinem Material, insbesondere aus Halbleitermaterial |
| DE2438852C3 (de) * | 1974-08-13 | 1980-02-07 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen von homogen-dotierten Halbleitereinkristallstäben |
| JP2845086B2 (ja) * | 1993-04-07 | 1999-01-13 | 信越半導体株式会社 | 半導体単結晶成長装置 |
| JPH0940492A (ja) * | 1995-07-27 | 1997-02-10 | Hitachi Cable Ltd | 単結晶の製造方法及び製造装置 |
-
1999
- 1999-05-24 JP JP14388999A patent/JP4521621B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000327476A (ja) | 2000-11-28 |
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