JP4520460B2 - セルフクリーニング触媒化学蒸着装置及びそのクリーニング方法 - Google Patents

セルフクリーニング触媒化学蒸着装置及びそのクリーニング方法 Download PDF

Info

Publication number
JP4520460B2
JP4520460B2 JP2006510810A JP2006510810A JP4520460B2 JP 4520460 B2 JP4520460 B2 JP 4520460B2 JP 2006510810 A JP2006510810 A JP 2006510810A JP 2006510810 A JP2006510810 A JP 2006510810A JP 4520460 B2 JP4520460 B2 JP 4520460B2
Authority
JP
Japan
Prior art keywords
gas
cleaning
vapor deposition
chemical vapor
deposition apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2006510810A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2005086210A1 (ja
Inventor
牧子 北添
修司 大園
博巳 伊藤
一也 斎藤
伸 浅利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of JPWO2005086210A1 publication Critical patent/JPWO2005086210A1/ja
Application granted granted Critical
Publication of JP4520460B2 publication Critical patent/JP4520460B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
JP2006510810A 2004-03-10 2005-03-10 セルフクリーニング触媒化学蒸着装置及びそのクリーニング方法 Expired - Lifetime JP4520460B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004067174 2004-03-10
JP2004067174 2004-03-10
PCT/JP2005/004205 WO2005086210A1 (ja) 2004-03-10 2005-03-10 セルフクリーニング触媒化学蒸着装置及びそのクリーニング方法

Publications (2)

Publication Number Publication Date
JPWO2005086210A1 JPWO2005086210A1 (ja) 2008-01-24
JP4520460B2 true JP4520460B2 (ja) 2010-08-04

Family

ID=34918384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006510810A Expired - Lifetime JP4520460B2 (ja) 2004-03-10 2005-03-10 セルフクリーニング触媒化学蒸着装置及びそのクリーニング方法

Country Status (5)

Country Link
US (2) US20070209677A1 (show.php)
JP (1) JP4520460B2 (show.php)
CN (1) CN100530546C (show.php)
TW (1) TW200533780A (show.php)
WO (1) WO2005086210A1 (show.php)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5016810B2 (ja) * 2005-11-30 2012-09-05 株式会社アルバック 触媒線化学気相成長装置、この装置を用いた化学気相成長方法及びこの装置のセルフクリーニング方法
US7504643B2 (en) * 2005-12-22 2009-03-17 Asml Netherlands B.V. Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
US7495239B2 (en) * 2005-12-22 2009-02-24 Asml Netherlands B.V. Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
JP5586199B2 (ja) * 2009-10-02 2014-09-10 三洋電機株式会社 触媒ｃｖｄ装置、膜の形成方法及び太陽電池の製造方法
US10606180B2 (en) * 2017-03-08 2020-03-31 Asml Netherlands B.V. EUV cleaning systems and methods thereof for an extreme ultraviolet light source
US10784091B2 (en) 2017-09-29 2020-09-22 Taiwan Semiconductor Manufacturing Co., Ltd. Process and related device for removing by-product on semiconductor processing chamber sidewalls
CN114369812A (zh) * 2021-12-15 2022-04-19 北京博纳晶科科技有限公司 一种化学气相沉积设备的清洁方法
CN116924623B (zh) * 2023-08-14 2024-06-11 衡阳凯新特种材料科技有限公司 一种特种材料生产线用污水处理装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4781803A (en) * 1985-02-26 1988-11-01 The Standard Oil Company Electrolytic processes employing platinum based amorphous metal alloy oxygen anodes
US5185074A (en) * 1988-08-15 1993-02-09 Idemitsu Kosan Co., Ltd. Process for producing color filter
US5012868A (en) * 1989-03-14 1991-05-07 Uentech Corporation Corrosion inhibition method and apparatus for downhole electrical heating in mineral fluid wells
JPH05270982A (ja) * 1992-03-27 1993-10-19 Idemitsu Petrochem Co Ltd ダイヤモンド膜の製造方法
US5451754A (en) * 1993-10-27 1995-09-19 Xerox Corporation Corona generating device
US6271498B1 (en) * 1997-06-23 2001-08-07 Nissin Electric Co., Ltd Apparatus for vaporizing liquid raw material and method of cleaning CVD apparatus
US6079426A (en) * 1997-07-02 2000-06-27 Applied Materials, Inc. Method and apparatus for determining the endpoint in a plasma cleaning process
US20030164225A1 (en) * 1998-04-20 2003-09-04 Tadashi Sawayama Processing apparatus, exhaust processing process and plasma processing
JP4459329B2 (ja) * 1999-08-05 2010-04-28 キヤノンアネルバ株式会社 付着膜の除去方法及び除去装置
JP2001345280A (ja) * 2000-03-28 2001-12-14 Hideki Matsumura 化学蒸着方法及び化学蒸着装置
US20050109627A1 (en) * 2003-10-10 2005-05-26 Applied Materials, Inc. Methods and chemistry for providing initial conformal electrochemical deposition of copper in sub-micron features
JP2002008997A (ja) * 2000-06-23 2002-01-11 Hitachi Kokusai Electric Inc 半導体装置の製造方法及びその装置
EP1258914B1 (en) * 2000-09-14 2006-11-22 Japan as represented by President of Japan Advanced Institute of Science and Technology Heating element cvd device
JP4435395B2 (ja) * 2000-09-14 2010-03-17 キヤノンアネルバ株式会社 発熱体ｃｖｄ装置
US6569257B1 (en) * 2000-11-09 2003-05-27 Applied Materials Inc. Method for cleaning a process chamber
JP2002246310A (ja) * 2001-02-14 2002-08-30 Sony Corp 半導体薄膜の形成方法及び半導体装置の製造方法、これらの方法の実施に使用する装置、並びに電気光学装置
US6562201B2 (en) * 2001-06-08 2003-05-13 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion
JP3787816B2 (ja) * 2002-10-04 2006-06-21 キヤノンアネルバ株式会社 発熱体ｃｖｄ装置

Also Published As

Publication number Publication date
US20070209677A1 (en) 2007-09-13
US20120145184A1 (en) 2012-06-14
CN1943014A (zh) 2007-04-04
CN100530546C (zh) 2009-08-19
TW200533780A (en) 2005-10-16
JPWO2005086210A1 (ja) 2008-01-24
TWI374944B (show.php) 2012-10-21
WO2005086210A1 (ja) 2005-09-15

Similar Documents

Publication Publication Date Title
JP6956288B2 (ja) 基板処理方法、プラズマ処理装置、及びエッチングガス組成物
KR102459129B1 (ko) 기판 처리 방법 및 플라즈마 처리 장치
JP6737899B2 (ja) プラズマ処理チャンバでのインシトゥチャンバ洗浄効率向上のためのプラズマ処理プロセス
JP4791637B2 (ja) Ｃｖｄ装置とこれを用いた処理方法
US20120145184A1 (en) Self-cleaning catalytic chemical vapor deposition apparatus and cleaning method thereof
JP2021090039A (ja) 基板処理方法及びプラズマ処理装置
TW201546899A (zh) 電漿處理裝置之清潔方法
WO2022055876A1 (en) Systems and methods for aluminum-containing film removal
KR100628607B1 (ko) 클리닝방법,성막장치및성막방법
KR20220150845A (ko) 기판 처리 방법 및 플라즈마 처리 장치
JP2002198356A (ja) プラズマ処理装置
KR20220011582A (ko) 플라즈마 처리 방법 및 플라즈마 처리 장치
US20200294773A1 (en) Plasma processing method and plasma processing apparatus
KR100825250B1 (ko) 자가-클리닝 촉매 화학 증착 장치 및 그 클리닝 방법
KR100362906B1 (ko) 고체 표면, 기판 및 반도체 제조 장치의 처리 방법 및이들을 이용한 반도체 장치의 제조 방법
JP5016810B2 (ja) 触媒線化学気相成長装置、この装置を用いた化学気相成長方法及びこの装置のセルフクリーニング方法
JP5004565B2 (ja) 薄膜作製装置
JP3801548B2 (ja) 金属膜作製装置のクリーニング方法
TW202510000A (zh) 融合氧化矽管的電漿清潔方法
JP2004273616A (ja) 処理装置クリーニング方法

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100112

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100315

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100406

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100413

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100511

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100520

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130528

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4520460

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term