JP4510937B2 - 屈折率変動を補償する干渉装置および方法 - Google Patents

屈折率変動を補償する干渉装置および方法 Download PDF

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JP4510937B2
JP4510937B2 JP2000613997A JP2000613997A JP4510937B2 JP 4510937 B2 JP4510937 B2 JP 4510937B2 JP 2000613997 A JP2000613997 A JP 2000613997A JP 2000613997 A JP2000613997 A JP 2000613997A JP 4510937 B2 JP4510937 B2 JP 4510937B2
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interferometer
refractive index
measurement
wafer
stage
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JP2002543372A5 (cg-RX-API-DMAC7.html
JP2002543372A (ja
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グルート， ピーター ジェイ． デ
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ザイゴ コーポレイション
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2000613997A 1999-04-28 2000-03-07 屈折率変動を補償する干渉装置および方法 Expired - Fee Related JP4510937B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/301,301 US6417927B2 (en) 1999-04-28 1999-04-28 Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
US09/301,301 1999-04-28
PCT/US2000/005859 WO2000065302A1 (en) 1999-04-28 2000-03-07 Interferometric apparatus and method that compensate refractive index fluctuations

Publications (3)

Publication Number Publication Date
JP2002543372A JP2002543372A (ja) 2002-12-17
JP2002543372A5 JP2002543372A5 (cg-RX-API-DMAC7.html) 2007-03-22
JP4510937B2 true JP4510937B2 (ja) 2010-07-28

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JP2000613997A Expired - Fee Related JP4510937B2 (ja) 1999-04-28 2000-03-07 屈折率変動を補償する干渉装置および方法

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Country Link
US (1) US6417927B2 (cg-RX-API-DMAC7.html)
EP (1) EP1194731A4 (cg-RX-API-DMAC7.html)
JP (1) JP4510937B2 (cg-RX-API-DMAC7.html)
TW (1) TW424135B (cg-RX-API-DMAC7.html)
WO (1) WO2000065302A1 (cg-RX-API-DMAC7.html)

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US6842256B2 (en) * 2001-11-15 2005-01-11 Zygo Corporation Compensating for effects of variations in gas refractivity in interferometers
WO2003048681A1 (en) * 2001-12-03 2003-06-12 Zygo Corporation Compensating for effects of non-isotropics gas mixtures in interferometers
TWI259898B (en) * 2002-01-24 2006-08-11 Zygo Corp Method and apparatus for compensation of time-varying optical properties of gas in interferometry
US7268888B2 (en) * 2002-11-04 2007-09-11 Zygo Corporation Compensation of refractivity perturbations in an interferometer path
TWI304157B (en) * 2002-11-27 2008-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2004053425A1 (en) * 2002-12-12 2004-06-24 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
US7327465B2 (en) * 2003-06-19 2008-02-05 Zygo Corporation Compensation for effects of beam misalignments in interferometer metrology systems
JP2007526450A (ja) * 2003-06-19 2007-09-13 ザイゴ　コーポレーション 平面ミラー干渉計測定システムにおけるビーム・ミスアライメントの幾何学的な影響に対する補償
US7180603B2 (en) * 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
DE10334350B3 (de) * 2003-07-25 2005-02-03 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Arbeit, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Verfahren zur Bestimung der Brechzahl bei interferometrischen Längenmessungen und Interferometeranordnung hierfür
WO2005067579A2 (en) * 2004-01-06 2005-07-28 Zygo Corporation Multi-axis interferometers and methods and systems using multi-axis interferometers
JP2005249794A (ja) * 2004-03-03 2005-09-15 Zygo Corp 干渉計および干渉計を使用するシステム
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems
JP2007534941A (ja) * 2004-04-22 2007-11-29 ザイゴ　コーポレーション 光学干渉計システムおよび光学干渉計システムを用いる方法
WO2006014406A2 (en) 2004-06-30 2006-02-09 Zygo Corporation Interferometric optical assemblies and systems including interferometric optical assemblies
US7489407B2 (en) * 2004-10-06 2009-02-10 Zygo Corporation Error correction in interferometry systems
US7433049B2 (en) * 2005-03-18 2008-10-07 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US20060242669A1 (en) * 2005-04-20 2006-10-26 Jupiter Systems Display node for use in an audiovisual signal routing and distribution system
US7826063B2 (en) 2005-04-29 2010-11-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
US7271917B2 (en) * 2005-05-03 2007-09-18 Asml Netherlands B.V. Lithographic apparatus, position quantity detection system and method
WO2008051232A2 (en) * 2006-10-25 2008-05-02 Zygo Corporation Compensation of effects of atmospheric perturbations in optical metrology
JP5276595B2 (ja) 2006-11-15 2013-08-28 ザイゴ コーポレーション リソグラフィツールにおいて使用される距離測定干渉計及びエンコーダ測定システム
US7894075B2 (en) 2006-12-11 2011-02-22 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
WO2008073454A2 (en) 2006-12-11 2008-06-19 Zygo Corporation Multiple-degree of freedom interferometer with compensation for gas effects
DE102007055665A1 (de) * 2007-11-21 2009-05-28 Dr. Johannes Heidenhain Gmbh Interferometeranordnung und Verfahren zu deren Betrieb
JP5361230B2 (ja) * 2008-03-26 2013-12-04 株式会社ミツトヨ ２波長レーザ干渉計評価校正方法、評価校正装置および評価校正システム
JP5245740B2 (ja) * 2008-11-13 2013-07-24 株式会社ニコン 露光装置及び露光方法
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
US8107084B2 (en) * 2009-01-30 2012-01-31 Zygo Corporation Interference microscope with scan motion detection using fringe motion in monitor patterns
JP5489658B2 (ja) * 2009-11-05 2014-05-14 キヤノン株式会社 計測装置
JP5602538B2 (ja) * 2010-03-03 2014-10-08 キヤノン株式会社 光波干渉計測装置
JP5602537B2 (ja) * 2010-08-19 2014-10-08 キヤノン株式会社 光波干渉計測装置
JP5704897B2 (ja) * 2010-11-11 2015-04-22 キヤノン株式会社 干渉計測方法および干渉計測装置
CN102033053B (zh) * 2010-11-12 2012-06-20 浙江理工大学 基于激光合成波长干涉的空气折射率测量方法及装置
US10356072B2 (en) * 2015-06-04 2019-07-16 Ricoh Company, Ltd. Data process system, data process apparatus, and data protection method
JP6686201B2 (ja) * 2019-03-22 2020-04-22 株式会社東京精密 距離測定装置、および距離測定方法
JP7494066B2 (ja) * 2020-09-14 2024-06-03 キヤノン株式会社 露光装置、及び物品の製造方法
CN115077424B (zh) * 2022-07-15 2022-11-04 南昌昂坤半导体设备有限公司 一种实时晶圆片表面曲率检测装置及方法

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JPH03252507A (ja) * 1990-03-02 1991-11-11 Hitachi Ltd レーザ干渉測長装置およびそれを用いた位置決め方法
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US5838485A (en) * 1996-08-20 1998-11-17 Zygo Corporation Superheterodyne interferometer and method for compensating the refractive index of air using electronic frequency multiplication
US5764362A (en) 1996-08-20 1998-06-09 Zygo Corporation Superheterodyne method and apparatus for measuring the refractive index of air using multiple-pass interferometry
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US6014216A (en) * 1999-01-08 2000-01-11 Hewlett-Packard Company Architecture for air-turbulence-compensated dual-wavelength heterodyne interferometer

Also Published As

Publication number Publication date
WO2000065302A1 (en) 2000-11-02
TW424135B (en) 2001-03-01
US20020001086A1 (en) 2002-01-03
US6417927B2 (en) 2002-07-09
EP1194731A4 (en) 2006-09-27
EP1194731A1 (en) 2002-04-10
JP2002543372A (ja) 2002-12-17

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