TW424135B - Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer - Google Patents
Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer Download PDFInfo
- Publication number
- TW424135B TW424135B TW089103985A TW89103985A TW424135B TW 424135 B TW424135 B TW 424135B TW 089103985 A TW089103985 A TW 089103985A TW 89103985 A TW89103985 A TW 89103985A TW 424135 B TW424135 B TW 424135B
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- Prior art keywords
- interferometer
- refractive index
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- 238000000034 method Methods 0.000 title claims abstract description 57
- 238000005259 measurement Methods 0.000 claims abstract description 73
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/301,301 US6417927B2 (en) | 1999-04-28 | 1999-04-28 | Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW424135B true TW424135B (en) | 2001-03-01 |
Family
ID=23162792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089103985A TW424135B (en) | 1999-04-28 | 2000-03-06 | Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6417927B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1194731A4 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4510937B2 (cg-RX-API-DMAC7.html) |
| TW (1) | TW424135B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2000065302A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6842256B2 (en) * | 2001-11-15 | 2005-01-11 | Zygo Corporation | Compensating for effects of variations in gas refractivity in interferometers |
| WO2003048681A1 (en) * | 2001-12-03 | 2003-06-12 | Zygo Corporation | Compensating for effects of non-isotropics gas mixtures in interferometers |
| TWI259898B (en) * | 2002-01-24 | 2006-08-11 | Zygo Corp | Method and apparatus for compensation of time-varying optical properties of gas in interferometry |
| US7268888B2 (en) * | 2002-11-04 | 2007-09-11 | Zygo Corporation | Compensation of refractivity perturbations in an interferometer path |
| TWI304157B (en) * | 2002-11-27 | 2008-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| WO2004053425A1 (en) * | 2002-12-12 | 2004-06-24 | Zygo Corporation | In-process correction of stage mirror deformations during a photolithography exposure cycle |
| US7327465B2 (en) * | 2003-06-19 | 2008-02-05 | Zygo Corporation | Compensation for effects of beam misalignments in interferometer metrology systems |
| JP2007526450A (ja) * | 2003-06-19 | 2007-09-13 | ザイゴ コーポレーション | 平面ミラー干渉計測定システムにおけるビーム・ミスアライメントの幾何学的な影響に対する補償 |
| US7180603B2 (en) * | 2003-06-26 | 2007-02-20 | Zygo Corporation | Reduction of thermal non-cyclic error effects in interferometers |
| DE10334350B3 (de) * | 2003-07-25 | 2005-02-03 | Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Arbeit, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt | Verfahren zur Bestimung der Brechzahl bei interferometrischen Längenmessungen und Interferometeranordnung hierfür |
| WO2005067579A2 (en) * | 2004-01-06 | 2005-07-28 | Zygo Corporation | Multi-axis interferometers and methods and systems using multi-axis interferometers |
| JP2005249794A (ja) * | 2004-03-03 | 2005-09-15 | Zygo Corp | 干渉計および干渉計を使用するシステム |
| US7375823B2 (en) * | 2004-04-22 | 2008-05-20 | Zygo Corporation | Interferometry systems and methods of using interferometry systems |
| JP2007534941A (ja) * | 2004-04-22 | 2007-11-29 | ザイゴ コーポレーション | 光学干渉計システムおよび光学干渉計システムを用いる方法 |
| WO2006014406A2 (en) | 2004-06-30 | 2006-02-09 | Zygo Corporation | Interferometric optical assemblies and systems including interferometric optical assemblies |
| US7489407B2 (en) * | 2004-10-06 | 2009-02-10 | Zygo Corporation | Error correction in interferometry systems |
| US7433049B2 (en) * | 2005-03-18 | 2008-10-07 | Zygo Corporation | Multi-axis interferometer with procedure and data processing for mirror mapping |
| US20060242669A1 (en) * | 2005-04-20 | 2006-10-26 | Jupiter Systems | Display node for use in an audiovisual signal routing and distribution system |
| US7826063B2 (en) | 2005-04-29 | 2010-11-02 | Zygo Corporation | Compensation of effects of atmospheric perturbations in optical metrology |
| US7271917B2 (en) * | 2005-05-03 | 2007-09-18 | Asml Netherlands B.V. | Lithographic apparatus, position quantity detection system and method |
| WO2008051232A2 (en) * | 2006-10-25 | 2008-05-02 | Zygo Corporation | Compensation of effects of atmospheric perturbations in optical metrology |
| JP5276595B2 (ja) | 2006-11-15 | 2013-08-28 | ザイゴ コーポレーション | リソグラフィツールにおいて使用される距離測定干渉計及びエンコーダ測定システム |
| US7894075B2 (en) | 2006-12-11 | 2011-02-22 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
| WO2008073454A2 (en) | 2006-12-11 | 2008-06-19 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
| DE102007055665A1 (de) * | 2007-11-21 | 2009-05-28 | Dr. Johannes Heidenhain Gmbh | Interferometeranordnung und Verfahren zu deren Betrieb |
| JP5361230B2 (ja) * | 2008-03-26 | 2013-12-04 | 株式会社ミツトヨ | ２波長レーザ干渉計評価校正方法、評価校正装置および評価校正システム |
| JP5245740B2 (ja) * | 2008-11-13 | 2013-07-24 | 株式会社ニコン | 露光装置及び露光方法 |
| US8004688B2 (en) | 2008-11-26 | 2011-08-23 | Zygo Corporation | Scan error correction in low coherence scanning interferometry |
| US8107084B2 (en) * | 2009-01-30 | 2012-01-31 | Zygo Corporation | Interference microscope with scan motion detection using fringe motion in monitor patterns |
| JP5489658B2 (ja) * | 2009-11-05 | 2014-05-14 | キヤノン株式会社 | 計測装置 |
| JP5602538B2 (ja) * | 2010-03-03 | 2014-10-08 | キヤノン株式会社 | 光波干渉計測装置 |
| JP5602537B2 (ja) * | 2010-08-19 | 2014-10-08 | キヤノン株式会社 | 光波干渉計測装置 |
| JP5704897B2 (ja) * | 2010-11-11 | 2015-04-22 | キヤノン株式会社 | 干渉計測方法および干渉計測装置 |
| CN102033053B (zh) * | 2010-11-12 | 2012-06-20 | 浙江理工大学 | 基于激光合成波长干涉的空气折射率测量方法及装置 |
| US10356072B2 (en) * | 2015-06-04 | 2019-07-16 | Ricoh Company, Ltd. | Data process system, data process apparatus, and data protection method |
| JP6686201B2 (ja) * | 2019-03-22 | 2020-04-22 | 株式会社東京精密 | 距離測定装置、および距離測定方法 |
| JP7494066B2 (ja) * | 2020-09-14 | 2024-06-03 | キヤノン株式会社 | 露光装置、及び物品の製造方法 |
| CN115077424B (zh) * | 2022-07-15 | 2022-11-04 | 南昌昂坤半导体设备有限公司 | 一种实时晶圆片表面曲率检测装置及方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2569269A1 (fr) * | 1984-08-16 | 1986-02-21 | Bouveau Jean Luc | Laser a interferometre incorpore pour metrologie ou lecture continue de longueurs, vitesses, angles et indices de refraction |
| US4733967A (en) | 1987-03-19 | 1988-03-29 | Zygo Corporation | Apparatus for the measurement of the refractive index of a gas |
| JPH0198902A (ja) | 1987-10-12 | 1989-04-17 | Res Dev Corp Of Japan | 光波干渉測長装置 |
| US4813783A (en) | 1987-11-03 | 1989-03-21 | Carl-Zeiss-Stiftung | Interferometer system for making length or angle measurements |
| JPH03252507A (ja) * | 1990-03-02 | 1991-11-11 | Hitachi Ltd | レーザ干渉測長装置およびそれを用いた位置決め方法 |
| EP0508583B1 (en) * | 1991-03-08 | 1997-09-17 | Renishaw Transducer Systems Limited | Absolute gas refractometer |
| JPH0634318A (ja) * | 1992-07-14 | 1994-02-08 | Nikon Corp | 干渉計測装置 |
| US5404222A (en) | 1994-01-14 | 1995-04-04 | Sparta, Inc. | Interferametric measuring system with air turbulence compensation |
| US5838485A (en) * | 1996-08-20 | 1998-11-17 | Zygo Corporation | Superheterodyne interferometer and method for compensating the refractive index of air using electronic frequency multiplication |
| US5764362A (en) | 1996-08-20 | 1998-06-09 | Zygo Corporation | Superheterodyne method and apparatus for measuring the refractive index of air using multiple-pass interferometry |
| US5991033A (en) * | 1996-09-20 | 1999-11-23 | Sparta, Inc. | Interferometer with air turbulence compensation |
| US5748313A (en) * | 1996-11-14 | 1998-05-05 | Hewlett-Packard Company | Signal-to-noise ratio of second harmonic interferometers |
| WO1999018424A1 (en) * | 1997-10-02 | 1999-04-15 | Zygo Corporation | Interferometric method and apparatus |
| US6014216A (en) * | 1999-01-08 | 2000-01-11 | Hewlett-Packard Company | Architecture for air-turbulence-compensated dual-wavelength heterodyne interferometer |
-
1999
- 1999-04-28 US US09/301,301 patent/US6417927B2/en not_active Expired - Lifetime
-
2000
- 2000-03-06 TW TW089103985A patent/TW424135B/zh not_active IP Right Cessation
- 2000-03-07 EP EP00913773A patent/EP1194731A4/en not_active Withdrawn
- 2000-03-07 JP JP2000613997A patent/JP4510937B2/ja not_active Expired - Fee Related
- 2000-03-07 WO PCT/US2000/005859 patent/WO2000065302A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2000065302A1 (en) | 2000-11-02 |
| US20020001086A1 (en) | 2002-01-03 |
| US6417927B2 (en) | 2002-07-09 |
| EP1194731A4 (en) | 2006-09-27 |
| EP1194731A1 (en) | 2002-04-10 |
| JP2002543372A (ja) | 2002-12-17 |
| JP4510937B2 (ja) | 2010-07-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |