JP4496202B2 - ノズルおよび液体回収方法 - Google Patents
ノズルおよび液体回収方法 Download PDFInfo
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- JP4496202B2 JP4496202B2 JP2006318491A JP2006318491A JP4496202B2 JP 4496202 B2 JP4496202 B2 JP 4496202B2 JP 2006318491 A JP2006318491 A JP 2006318491A JP 2006318491 A JP2006318491 A JP 2006318491A JP 4496202 B2 JP4496202 B2 JP 4496202B2
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Description
200 : 筒部
300 : 底部
310 : 端面
312 : 外縁
320 : 貫通孔
322 : 開口
400 : 試料
500 : 液体
Claims (3)
- 先端から押出した液体で試料表面を掃引し、掃引後の液体を吸引して回収するためのノズルであって、
掃引する液体及び掃引後の液体を収容する筒部と、
液体で試料表面を掃引するときに当該液体を保持する、外縁が先端方向に突き出た凹面の端面と、
前記端面において外縁近くまで偏心して設けられ、前記筒部に連通し、前記筒部から掃引する液体を押し出すとともに、掃引後の液体を前記筒部に吸引する開口と、
を有することを特徴とするノズル。 - ノズルの先端から押出した液体で試料表面を掃引し、掃引後の液体をノズルで吸引して回収する方法であって、
前記ノズルとして、請求項1に記載されたノズルを用いることを特徴とする液体回収方法。 - 掃引後の液体の吸引を、前記ノズルを前記開口の偏心方向とは反対方向に試料表面に沿って相対的に移動させながら行う
ことを特徴とする請求項2に記載の液体回収方法。
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JP2006318491A JP4496202B2 (ja) | 2006-11-27 | 2006-11-27 | ノズルおよび液体回収方法 |
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JP2006318491A JP4496202B2 (ja) | 2006-11-27 | 2006-11-27 | ノズルおよび液体回収方法 |
Publications (2)
Publication Number | Publication Date |
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JP2008132401A JP2008132401A (ja) | 2008-06-12 |
JP4496202B2 true JP4496202B2 (ja) | 2010-07-07 |
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JP2006318491A Active JP4496202B2 (ja) | 2006-11-27 | 2006-11-27 | ノズルおよび液体回収方法 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5546516B2 (ja) * | 2011-09-22 | 2014-07-09 | 富士フイルム株式会社 | 塗布装置及び塗布方法 |
JP5971289B2 (ja) | 2014-08-20 | 2016-08-17 | 株式会社 イアス | 基板局所の自動分析装置及び分析方法 |
JP7228600B2 (ja) * | 2018-05-04 | 2023-02-24 | アプライド マテリアルズ インコーポレイテッド | 処理チャンバのためのナノ粒子測定 |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02229428A (ja) * | 1988-07-11 | 1990-09-12 | Toshiba Corp | 半導体処理装置 |
JPH05283498A (ja) * | 1991-11-12 | 1993-10-29 | Matsushita Electric Ind Co Ltd | 半導体基板表面不純物回収装置およびその使用方法 |
JPH091024A (ja) * | 1995-06-20 | 1997-01-07 | Nec Corp | ディスペンサ装置 |
JPH09148212A (ja) * | 1995-11-28 | 1997-06-06 | Dainippon Screen Mfg Co Ltd | 薬液吐出ノズル |
JP2000019084A (ja) * | 1998-07-01 | 2000-01-21 | Toshiba Ceramics Co Ltd | シリコンウェーハ表面分析用液滴供給・回収装置 |
JP2000061378A (ja) * | 1998-08-24 | 2000-02-29 | Matsushita Electric Ind Co Ltd | 溶剤吐出ノズルユニット |
JP2001196432A (ja) * | 2000-01-07 | 2001-07-19 | Tama Kagaku Kogyo Kk | 半導体ウエハ表面の不純物測定方法及びそのための不純物回収装置 |
US20020134406A1 (en) * | 2001-03-21 | 2002-09-26 | Samsung Electronics Co., Ltd. | Apparatus and method for collecting metallic impurity on a semiconductor wafer |
JP2003344243A (ja) * | 2002-05-30 | 2003-12-03 | Nisso Engineering Co Ltd | ウエハ検査前処理方法及び処理装置 |
JP2004170222A (ja) * | 2002-11-20 | 2004-06-17 | Technos:Kk | スキャン・回収兼用ノズル |
JP2005326365A (ja) * | 2004-05-17 | 2005-11-24 | Sigma Meltec Ltd | 試験液量計測装置 |
JP2006013234A (ja) * | 2004-06-28 | 2006-01-12 | Komatsu Electronic Metals Co Ltd | 半導体ウェーハの薬液回収方法および装置 |
JP2007311408A (ja) * | 2006-05-16 | 2007-11-29 | Toshiba Corp | 基板処理装置及び基板処理方法 |
-
2006
- 2006-11-27 JP JP2006318491A patent/JP4496202B2/ja active Active
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02229428A (ja) * | 1988-07-11 | 1990-09-12 | Toshiba Corp | 半導体処理装置 |
JPH05283498A (ja) * | 1991-11-12 | 1993-10-29 | Matsushita Electric Ind Co Ltd | 半導体基板表面不純物回収装置およびその使用方法 |
JPH091024A (ja) * | 1995-06-20 | 1997-01-07 | Nec Corp | ディスペンサ装置 |
JPH09148212A (ja) * | 1995-11-28 | 1997-06-06 | Dainippon Screen Mfg Co Ltd | 薬液吐出ノズル |
JP2000019084A (ja) * | 1998-07-01 | 2000-01-21 | Toshiba Ceramics Co Ltd | シリコンウェーハ表面分析用液滴供給・回収装置 |
JP2000061378A (ja) * | 1998-08-24 | 2000-02-29 | Matsushita Electric Ind Co Ltd | 溶剤吐出ノズルユニット |
JP2001196432A (ja) * | 2000-01-07 | 2001-07-19 | Tama Kagaku Kogyo Kk | 半導体ウエハ表面の不純物測定方法及びそのための不純物回収装置 |
US20020134406A1 (en) * | 2001-03-21 | 2002-09-26 | Samsung Electronics Co., Ltd. | Apparatus and method for collecting metallic impurity on a semiconductor wafer |
JP2003344243A (ja) * | 2002-05-30 | 2003-12-03 | Nisso Engineering Co Ltd | ウエハ検査前処理方法及び処理装置 |
JP2004170222A (ja) * | 2002-11-20 | 2004-06-17 | Technos:Kk | スキャン・回収兼用ノズル |
JP2005326365A (ja) * | 2004-05-17 | 2005-11-24 | Sigma Meltec Ltd | 試験液量計測装置 |
JP2006013234A (ja) * | 2004-06-28 | 2006-01-12 | Komatsu Electronic Metals Co Ltd | 半導体ウェーハの薬液回収方法および装置 |
JP2007311408A (ja) * | 2006-05-16 | 2007-11-29 | Toshiba Corp | 基板処理装置及び基板処理方法 |
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