JP4494126B2 - 成膜装置および製造装置 - Google Patents

成膜装置および製造装置 Download PDF

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Publication number
JP4494126B2
JP4494126B2 JP2004235763A JP2004235763A JP4494126B2 JP 4494126 B2 JP4494126 B2 JP 4494126B2 JP 2004235763 A JP2004235763 A JP 2004235763A JP 2004235763 A JP2004235763 A JP 2004235763A JP 4494126 B2 JP4494126 B2 JP 4494126B2
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Japan
Prior art keywords
vapor deposition
heater
container
film
chamber
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Expired - Fee Related
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JP2004235763A
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Japanese (ja)
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JP2005097730A5 (enExample
JP2005097730A (ja
Inventor
宏樹 大原
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2004235763A priority Critical patent/JP4494126B2/ja
Publication of JP2005097730A publication Critical patent/JP2005097730A/ja
Publication of JP2005097730A5 publication Critical patent/JP2005097730A5/ja
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Publication of JP4494126B2 publication Critical patent/JP4494126B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2004235763A 2003-08-15 2004-08-13 成膜装置および製造装置 Expired - Fee Related JP4494126B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004235763A JP4494126B2 (ja) 2003-08-15 2004-08-13 成膜装置および製造装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003293837 2003-08-15
JP2004235763A JP4494126B2 (ja) 2003-08-15 2004-08-13 成膜装置および製造装置

Publications (3)

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JP2005097730A JP2005097730A (ja) 2005-04-14
JP2005097730A5 JP2005097730A5 (enExample) 2007-09-27
JP4494126B2 true JP4494126B2 (ja) 2010-06-30

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JP2004235763A Expired - Fee Related JP4494126B2 (ja) 2003-08-15 2004-08-13 成膜装置および製造装置

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JP (1) JP4494126B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5077919B2 (ja) * 2006-09-28 2012-11-21 独立行政法人物質・材料研究機構 真空蒸着装置
WO2009060739A1 (ja) 2007-11-05 2009-05-14 Ulvac, Inc. 蒸着源、有機ｅｌ素子の製造装置
KR100926437B1 (ko) * 2008-11-17 2009-11-13 에스엔유 프리시젼 주식회사 증착 물질 공급 장치 및 이를 구비한 기판 처리 장치
KR20120116720A (ko) * 2011-04-13 2012-10-23 에스엔유 프리시젼 주식회사 원료물질 공급장치
KR101174633B1 (ko) * 2011-05-12 2012-08-17 에스엔유 프리시젼 주식회사 원료물질 공급장치
JP5879594B2 (ja) * 2012-03-02 2016-03-08 株式会社昭和真空 成膜装置
KR101458528B1 (ko) 2012-12-21 2014-11-04 주식회사 선익시스템 증발원용 도가니 및 이를 구비한 증착장치
JP6605657B1 (ja) * 2018-05-24 2019-11-13 キヤノントッキ株式会社 成膜装置、成膜方法及び電子デバイスの製造方法
CN117044393A (zh) * 2021-04-08 2023-11-10 株式会社半导体能源研究所 发光器件的制造装置
JP7444843B2 (ja) * 2021-12-02 2024-03-06 キヤノントッキ株式会社 蒸着用坩堝及び蒸着装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2435997A (en) * 1943-11-06 1948-02-17 American Optical Corp Apparatus for vapor coating of large surfaces
JPS6032361U (ja) * 1983-08-10 1985-03-05 日本真空技術株式会社 真空蒸着装置に於けるるつぼ交換装置
JPS6425973A (en) * 1987-07-22 1989-01-27 Hitachi Ltd Vapor deposition device of thin film

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Publication number Publication date
JP2005097730A (ja) 2005-04-14

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