JP4472305B2 - パターン検査装置および方法 - Google Patents

パターン検査装置および方法 Download PDF

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Publication number
JP4472305B2
JP4472305B2 JP2003360974A JP2003360974A JP4472305B2 JP 4472305 B2 JP4472305 B2 JP 4472305B2 JP 2003360974 A JP2003360974 A JP 2003360974A JP 2003360974 A JP2003360974 A JP 2003360974A JP 4472305 B2 JP4472305 B2 JP 4472305B2
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pattern
edge
image
inspection
inspection target
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JP2004163420A5 (enExample
JP2004163420A (ja
Inventor
正 北村
和文 久保田
昌宏 山本
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株式会社ナノジオメトリ研究所
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  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2003360974A 2002-10-22 2003-10-21 パターン検査装置および方法 Expired - Fee Related JP4472305B2 (ja)

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JP2003360974A JP4472305B2 (ja) 2002-10-22 2003-10-21 パターン検査装置および方法

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JP2002307406 2002-10-22
JP2003360974A JP4472305B2 (ja) 2002-10-22 2003-10-21 パターン検査装置および方法

Related Child Applications (1)

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JP2009261499A Division JP5037590B2 (ja) 2002-10-22 2009-11-17 パターン検査装置および方法

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JP2004163420A JP2004163420A (ja) 2004-06-10
JP2004163420A5 JP2004163420A5 (enExample) 2006-11-24
JP4472305B2 true JP4472305B2 (ja) 2010-06-02

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9316492B2 (en) 2014-08-08 2016-04-19 International Business Machines Corporation Reducing the impact of charged particle beams in critical dimension analysis

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7831369B2 (en) * 2005-11-16 2010-11-09 Gm Global Technology Operations, Inc. Method and apparatus for vehicle and engine operation
US8041103B2 (en) * 2005-11-18 2011-10-18 Kla-Tencor Technologies Corp. Methods and systems for determining a position of inspection data in design data space
JP2007192594A (ja) * 2006-01-17 2007-08-02 Horon:Kk パターン画像取得方法およびパターン画像取得装置
JP2007192595A (ja) * 2006-01-17 2007-08-02 Horon:Kk 検査方法および検査装置
WO2007094439A1 (ja) 2006-02-17 2007-08-23 Hitachi High-Technologies Corporation 試料寸法検査・測定方法、及び試料寸法検査・測定装置
JP4943304B2 (ja) * 2006-12-05 2012-05-30 株式会社 Ｎｇｒ パターン検査装置および方法
JP5153212B2 (ja) * 2007-06-07 2013-02-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5474312B2 (ja) * 2007-06-20 2014-04-16 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及びその制御方法
US8071943B2 (en) * 2009-02-04 2011-12-06 Advantest Corp. Mask inspection apparatus and image creation method
US20120092482A1 (en) * 2009-04-03 2012-04-19 Shinichi Shinoda Method and device for creating composite image
JP2011137901A (ja) * 2009-12-28 2011-07-14 Hitachi High-Technologies Corp パターン計測条件設定装置
JP5809997B2 (ja) 2012-02-14 2015-11-11 株式会社日立ハイテクノロジーズ 半導体計測装置及びコンピュータープログラム
JP6063630B2 (ja) 2012-03-19 2017-01-18 株式会社日立ハイテクノロジーズ パターン計測装置、及び半導体計測システム
KR101749440B1 (ko) 2013-02-20 2017-06-20 가부시키가이샤 히다치 하이테크놀로지즈 패턴 측정 장치 및 반도체 계측 시스템
JP2017096625A (ja) 2014-02-21 2017-06-01 株式会社日立ハイテクノロジーズ パターン測定装置、及びコンピュータープログラム
JP6548542B2 (ja) 2015-09-29 2019-07-24 株式会社ホロン Ｓｅｍ画像取得装置およびｓｅｍ画像取得方法
JP6759034B2 (ja) 2016-09-29 2020-09-23 株式会社日立ハイテク パターン評価装置及びコンピュータープログラム
JP7386619B2 (ja) * 2019-05-09 2023-11-27 株式会社ニューフレアテクノロジー 電子ビーム検査方法及び電子ビーム検査装置
JP7409988B2 (ja) * 2020-07-29 2024-01-09 株式会社ニューフレアテクノロジー パターン検査装置及び輪郭線同士のアライメント量取得方法
CN113296369B (zh) * 2021-05-14 2022-09-23 长鑫存储技术有限公司 用于光学临近修正的图形量测方法及装置
JP7750823B2 (ja) * 2022-12-27 2025-10-07 株式会社ニューフレアテクノロジー 検査装置及び検査画像の生成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0660815B2 (ja) * 1987-02-27 1994-08-10 株式会社日立製作所 荷電粒子ビームによるパターン欠陥検査方法およびその装置
JPH03235949A (ja) * 1990-02-13 1991-10-21 Nec Corp マスク検査方法
JPH09265931A (ja) * 1996-03-29 1997-10-07 Toshiba Corp 画像取得装置及び方法
JPH09312318A (ja) * 1996-05-21 1997-12-02 Hitachi Ltd パタ−ン欠陥検査装置
JP3524853B2 (ja) * 1999-08-26 2004-05-10 株式会社ナノジオメトリ研究所 パターン検査装置、パターン検査方法および記録媒体
JP2002031525A (ja) * 2000-07-14 2002-01-31 Seiko Instruments Inc 半導体ウエハのパターン形状評価方法及び装置
JP4199939B2 (ja) * 2001-04-27 2008-12-24 株式会社日立製作所 半導体検査システム
JP4510327B2 (ja) * 2001-05-29 2010-07-21 エスアイアイ・ナノテクノロジー株式会社 Ｃａｄ情報に基くレイヤ合わせずれ評価方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9316492B2 (en) 2014-08-08 2016-04-19 International Business Machines Corporation Reducing the impact of charged particle beams in critical dimension analysis

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JP2004163420A (ja) 2004-06-10

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