JP4448860B2 - ワークピースを保持する双極静電チャック - Google Patents
ワークピースを保持する双極静電チャック Download PDFInfo
- Publication number
- JP4448860B2 JP4448860B2 JP2007001072A JP2007001072A JP4448860B2 JP 4448860 B2 JP4448860 B2 JP 4448860B2 JP 2007001072 A JP2007001072 A JP 2007001072A JP 2007001072 A JP2007001072 A JP 2007001072A JP 4448860 B2 JP4448860 B2 JP 4448860B2
- Authority
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- Japan
- Prior art keywords
- chuck
- wafer
- support member
- bipolar electrostatic
- electrostatic chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/23—Chucks or sockets with magnetic or electrostatic means
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Jigs For Machine Tools (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
特に、本発明は、一対の埋め込まれた共面電極を有するチャック体を含む双極静電チャックである。さらに、このチャックは、チャック体の支持面上にある複数の支持部材を有するウェハ離間用マスクを備える。ウェハ離間用マスクは、チタン、チタン窒化物、ステンレス鋼等の導電性材料により製造される。この支持部材は、チャックの支持面に対して離間した関係でウェハ又は別のワークピースを保持する。ウェハの下側面とチャックの間の距離は、支持部材の厚さにより定められる。
離間用マスク材料は、支持面122上の汚染粒子がウェハに接触しないように、支持面上にウェハ108又はワークピースを保持する所定の厚さに堆積される。例えばその厚さは、2ミクロンである。
Claims (7)
- ワークピースを保持する双極静電チャックであって、
少なくとも2つの電極を備えた、支持表面をもつチャック体と、
前記チャック体の前記支持表面の上に設けられた導電性材料のウェハ離間用マスクと、
を備え、
前記ウェハ離間用マスクが、前記チャック体の前記支持表面の上方に離間して前記ワークピースを支持する複数の支持部材を備え、
前記複数の支持部材の少なくとも1つの支持部材が電源の1つの端子にワイヤで接続されることを特徴とする双極静電チャック。 - 前記電源の1つの端子にワイヤで接続される前記少なくとも1つの支持部材が、前記チャック体の縁に隣接して配置されることを特徴とする請求項1に記載の双極静電チャック。
- 前記電源の1つの端子にワイヤで接続される前記少なくとも1つの支持部材が、前記複数の支持部材のサブセットを含むことを特徴とする請求項2に記載の双極静電チャック。
- 前記サブセットに含まれる各支持部材が、前記チャック体の縁に隣接して配置され、縁に張り出しており、
前記サブセットにおける各支持部材の第1部分が前記ワークピースに接触し、前記サブセットにおける前記支持部材の第2部分が電気的に相互接続されることを特徴とする請求項3に記載の双極静電チャック。 - 前記複数の支持部材のサブセットにおける各支持部材が、相互接続トレースにより電気的に相互接続されることを特徴とする請求項4に記載の双極静電チャック。
- 前記電源の1つの端子にワイヤで接続される前記支持部材の少なくとも1つを、支持部材の少なくとも別の1つに電気的に接続する相互接続トレースを備えることを特徴とする請求項1に記載の双極静電チャック。
- ワークピースを保持する双極静電チャックであって、
少なくとも2つの電極を備えた、表面を有するチャック体と、
前記チャック体の前記表面の上に設けられた導電性材料のウェハ離間用マスクと、
を備え、
前記ウェハ離間用マスクが電源の1つの端子にワイヤで接続されることを特徴とする双極静電チャック。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/639,841 US5764471A (en) | 1996-05-08 | 1996-05-08 | Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11768697A Division JP3943188B2 (ja) | 1996-05-08 | 1997-05-08 | ワークピースを保持する装置および方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007165915A JP2007165915A (ja) | 2007-06-28 |
JP4448860B2 true JP4448860B2 (ja) | 2010-04-14 |
Family
ID=24565779
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11768697A Expired - Fee Related JP3943188B2 (ja) | 1996-05-08 | 1997-05-08 | ワークピースを保持する装置および方法 |
JP2007001072A Expired - Lifetime JP4448860B2 (ja) | 1996-05-08 | 2007-01-09 | ワークピースを保持する双極静電チャック |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11768697A Expired - Fee Related JP3943188B2 (ja) | 1996-05-08 | 1997-05-08 | ワークピースを保持する装置および方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US5764471A (ja) |
EP (1) | EP0806834A3 (ja) |
JP (2) | JP3943188B2 (ja) |
KR (1) | KR970077472A (ja) |
TW (1) | TW365039B (ja) |
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-
1996
- 1996-05-08 US US08/639,841 patent/US5764471A/en not_active Expired - Lifetime
- 1996-05-15 TW TW085105761A patent/TW365039B/zh active
-
1997
- 1997-04-25 EP EP97302865A patent/EP0806834A3/en not_active Withdrawn
- 1997-05-08 JP JP11768697A patent/JP3943188B2/ja not_active Expired - Fee Related
- 1997-05-08 KR KR1019970017574A patent/KR970077472A/ko not_active Application Discontinuation
-
1998
- 1998-06-05 US US09/092,600 patent/US5923521A/en not_active Expired - Lifetime
-
2007
- 2007-01-09 JP JP2007001072A patent/JP4448860B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0806834A3 (en) | 1998-11-25 |
KR970077472A (ko) | 1997-12-12 |
JP2007165915A (ja) | 2007-06-28 |
EP0806834A2 (en) | 1997-11-12 |
JP3943188B2 (ja) | 2007-07-11 |
US5923521A (en) | 1999-07-13 |
US5764471A (en) | 1998-06-09 |
JPH1098092A (ja) | 1998-04-14 |
TW365039B (en) | 1999-07-21 |
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