JP4425517B2 - フレキソ印刷版の製造方法および該方法に使用する感光性要素 - Google Patents

フレキソ印刷版の製造方法および該方法に使用する感光性要素 Download PDF

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Publication number
JP4425517B2
JP4425517B2 JP2002061097A JP2002061097A JP4425517B2 JP 4425517 B2 JP4425517 B2 JP 4425517B2 JP 2002061097 A JP2002061097 A JP 2002061097A JP 2002061097 A JP2002061097 A JP 2002061097A JP 4425517 B2 JP4425517 B2 JP 4425517B2
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JP
Japan
Prior art keywords
layer
heat
photopolymerizable
removable
binder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2002061097A
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English (en)
Japanese (ja)
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JP2002357907A (ja
JP2002357907A5 (enExample
Inventor
ニ ファン ロキシー
エー．ハックラー マーク
アール．カンナーパッティ アナンドクマー
ラング エイドリアン
ケイ．タイラー ブラッドリー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
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EI Du Pont de Nemours and Co
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Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2002357907A publication Critical patent/JP2002357907A/ja
Publication of JP2002357907A5 publication Critical patent/JP2002357907A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/055—Thermographic processes for producing printing formes, e.g. with a thermal print head
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
JP2002061097A 2001-03-06 2002-03-06 フレキソ印刷版の製造方法および該方法に使用する感光性要素 Expired - Lifetime JP4425517B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27366901P 2001-03-06 2001-03-06
US60/273,669 2001-03-06

Publications (3)

Publication Number Publication Date
JP2002357907A JP2002357907A (ja) 2002-12-13
JP2002357907A5 JP2002357907A5 (enExample) 2008-07-17
JP4425517B2 true JP4425517B2 (ja) 2010-03-03

Family

ID=23044919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002061097A Expired - Lifetime JP4425517B2 (ja) 2001-03-06 2002-03-06 フレキソ印刷版の製造方法および該方法に使用する感光性要素

Country Status (4)

Country Link
US (1) US6773859B2 (enExample)
EP (1) EP1239329B2 (enExample)
JP (1) JP4425517B2 (enExample)
CA (1) CA2374207C (enExample)

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EP1239329B1 (en) 2012-04-25
EP1239329B2 (en) 2020-10-07
CA2374207C (en) 2009-10-20
US6773859B2 (en) 2004-08-10
EP1239329A2 (en) 2002-09-11
US20030180655A1 (en) 2003-09-25
CA2374207A1 (en) 2002-09-06
EP1239329A3 (en) 2008-07-23

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