JP4408011B2 - レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法 - Google Patents

レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法 Download PDF

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Publication number
JP4408011B2
JP4408011B2 JP2002174158A JP2002174158A JP4408011B2 JP 4408011 B2 JP4408011 B2 JP 4408011B2 JP 2002174158 A JP2002174158 A JP 2002174158A JP 2002174158 A JP2002174158 A JP 2002174158A JP 4408011 B2 JP4408011 B2 JP 4408011B2
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laser
laser beam
substrate
film
curvature
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JP2003068668A5 (enExample
JP2003068668A (ja
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幸一郎 田中
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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  • Recrystallisation Techniques (AREA)
  • Lasers (AREA)
JP2002174158A 2001-06-15 2002-06-14 レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法 Expired - Fee Related JP4408011B2 (ja)

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JP2002174158A JP4408011B2 (ja) 2001-06-15 2002-06-14 レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法

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JP2001-181065 2001-06-15
JP2001181065 2001-06-15
JP2002174158A JP4408011B2 (ja) 2001-06-15 2002-06-14 レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法

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JP2003068668A JP2003068668A (ja) 2003-03-07
JP2003068668A5 JP2003068668A5 (enExample) 2005-10-13
JP4408011B2 true JP4408011B2 (ja) 2010-02-03

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210113479A (ko) * 2020-03-05 2021-09-16 삼성디스플레이 주식회사 실리콘 결정화 장치

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI295380B (en) * 2005-05-26 2008-04-01 Cymer Inc Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
JP4680850B2 (ja) 2005-11-16 2011-05-11 三星モバイルディスプレイ株式會社 薄膜トランジスタ及びその製造方法
JP2009252796A (ja) * 2008-04-01 2009-10-29 Semiconductor Energy Lab Co Ltd 半導体装置及びその作製方法
KR102516162B1 (ko) 2013-12-02 2023-03-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치 및 그 제조방법
JP6654037B2 (ja) * 2015-12-22 2020-02-26 株式会社オーディオテクニカ 照射装置と墨出器と照射方法
WO2019220666A1 (ja) * 2018-05-17 2019-11-21 信越エンジニアリング株式会社 ワーク分離装置及びワーク分離方法
JP7460377B2 (ja) * 2020-01-28 2024-04-02 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
CN111897134B (zh) * 2020-07-31 2022-02-25 西安炬光科技股份有限公司 一种光学模组和医疗激光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3966923B2 (ja) * 1995-07-31 2007-08-29 株式会社半導体エネルギー研究所 半導体作製方法および半導体装置の作製方法
JP3865803B2 (ja) * 1995-08-29 2007-01-10 株式会社半導体エネルギー研究所 光処理方法および半導体装置の作製方法
JPH09217173A (ja) * 1996-02-14 1997-08-19 Nissin Electric Co Ltd 基板保持装置およびそれへの基板装着方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210113479A (ko) * 2020-03-05 2021-09-16 삼성디스플레이 주식회사 실리콘 결정화 장치
KR102796148B1 (ko) * 2020-03-05 2025-04-17 삼성디스플레이 주식회사 실리콘 결정화 장치

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