JP4324957B2 - 照明光学装置、露光装置および露光方法 - Google Patents

照明光学装置、露光装置および露光方法 Download PDF

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Publication number
JP4324957B2
JP4324957B2 JP2003144198A JP2003144198A JP4324957B2 JP 4324957 B2 JP4324957 B2 JP 4324957B2 JP 2003144198 A JP2003144198 A JP 2003144198A JP 2003144198 A JP2003144198 A JP 2003144198A JP 4324957 B2 JP4324957 B2 JP 4324957B2
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Japan
Prior art keywords
fly
eye
eye member
light source
eye lens
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Expired - Fee Related
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JP2003144198A
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English (en)
Japanese (ja)
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JP2004056103A (ja
JP2004056103A5 (cg-RX-API-DMAC7.html
Inventor
裕久 田中
光紀 豊田
修 谷津
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Nikon Corp
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Nikon Corp
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Priority to JP2003144198A priority Critical patent/JP4324957B2/ja
Priority to EP03011173A priority patent/EP1367442A3/en
Priority to KR1020030033594A priority patent/KR101009793B1/ko
Priority to US10/445,022 priority patent/US6913373B2/en
Publication of JP2004056103A publication Critical patent/JP2004056103A/ja
Publication of JP2004056103A5 publication Critical patent/JP2004056103A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Projection Apparatus (AREA)
JP2003144198A 2002-05-27 2003-05-22 照明光学装置、露光装置および露光方法 Expired - Fee Related JP4324957B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003144198A JP4324957B2 (ja) 2002-05-27 2003-05-22 照明光学装置、露光装置および露光方法
EP03011173A EP1367442A3 (en) 2002-05-27 2003-05-27 Illumination device
KR1020030033594A KR101009793B1 (ko) 2002-05-27 2003-05-27 플라이 아이 렌즈, 조명 광학 장치, 노광 장치 및 노광 방법
US10/445,022 US6913373B2 (en) 2002-05-27 2003-05-27 Optical illumination device, exposure device and exposure method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002152634 2002-05-27
JP2003144198A JP4324957B2 (ja) 2002-05-27 2003-05-22 照明光学装置、露光装置および露光方法

Publications (3)

Publication Number Publication Date
JP2004056103A JP2004056103A (ja) 2004-02-19
JP2004056103A5 JP2004056103A5 (cg-RX-API-DMAC7.html) 2008-02-28
JP4324957B2 true JP4324957B2 (ja) 2009-09-02

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JP2003144198A Expired - Fee Related JP4324957B2 (ja) 2002-05-27 2003-05-22 照明光学装置、露光装置および露光方法

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Country Link
US (1) US6913373B2 (cg-RX-API-DMAC7.html)
EP (1) EP1367442A3 (cg-RX-API-DMAC7.html)
JP (1) JP4324957B2 (cg-RX-API-DMAC7.html)
KR (1) KR101009793B1 (cg-RX-API-DMAC7.html)

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US20040036977A1 (en) 2004-02-26
KR101009793B1 (ko) 2011-01-19
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