JP4305982B2 - 半導体発光素子の製造方法 - Google Patents
半導体発光素子の製造方法 Download PDFInfo
- Publication number
- JP4305982B2 JP4305982B2 JP33635598A JP33635598A JP4305982B2 JP 4305982 B2 JP4305982 B2 JP 4305982B2 JP 33635598 A JP33635598 A JP 33635598A JP 33635598 A JP33635598 A JP 33635598A JP 4305982 B2 JP4305982 B2 JP 4305982B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- iii
- compound semiconductor
- gan
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33635598A JP4305982B2 (ja) | 1998-11-26 | 1998-11-26 | 半導体発光素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33635598A JP4305982B2 (ja) | 1998-11-26 | 1998-11-26 | 半導体発光素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000164512A JP2000164512A (ja) | 2000-06-16 |
| JP2000164512A5 JP2000164512A5 (enExample) | 2005-10-27 |
| JP4305982B2 true JP4305982B2 (ja) | 2009-07-29 |
Family
ID=18298280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33635598A Expired - Fee Related JP4305982B2 (ja) | 1998-11-26 | 1998-11-26 | 半導体発光素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4305982B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103824913A (zh) * | 2014-03-12 | 2014-05-28 | 合肥彩虹蓝光科技有限公司 | 一种Mg掺杂P型GaN外延生长方法 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004009130A1 (de) * | 2004-02-25 | 2005-09-15 | Aixtron Ag | Einlasssystem für einen MOCVD-Reaktor |
| KR100795547B1 (ko) | 2006-06-30 | 2008-01-21 | 서울옵토디바이스주식회사 | 질화물 반도체 발광 소자 |
| JPWO2008155958A1 (ja) * | 2007-06-15 | 2010-08-26 | ローム株式会社 | 半導体発光素子及び半導体発光素子の製造方法 |
| JP5306792B2 (ja) * | 2008-12-11 | 2013-10-02 | 大陽日酸株式会社 | 窒化ガリウム系化合物半導体の製造方法 |
| JP5232338B2 (ja) * | 2011-04-08 | 2013-07-10 | パナソニック株式会社 | 窒化物系半導体素子およびその製造方法 |
| JP5437533B2 (ja) * | 2011-04-12 | 2014-03-12 | パナソニック株式会社 | 窒化ガリウム系化合物半導体発光素子およびその製造方法 |
| JP5668647B2 (ja) | 2011-09-06 | 2015-02-12 | 豊田合成株式会社 | Iii族窒化物半導体発光素子およびその製造方法 |
| CN103236476B (zh) * | 2013-04-09 | 2016-04-20 | 湘能华磊光电股份有限公司 | 一种生长外延片及其制备方法 |
| US9917228B2 (en) | 2014-07-07 | 2018-03-13 | Sony Corporation | Semiconductor optical device |
| JP7169613B2 (ja) * | 2017-11-10 | 2022-11-11 | 学校法人 名城大学 | 窒化物半導体発光素子の製造方法 |
| CN114242572A (zh) * | 2021-12-22 | 2022-03-25 | 江苏第三代半导体研究院有限公司 | p型氮化物的制备方法、结构及半导体器件 |
-
1998
- 1998-11-26 JP JP33635598A patent/JP4305982B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103824913A (zh) * | 2014-03-12 | 2014-05-28 | 合肥彩虹蓝光科技有限公司 | 一种Mg掺杂P型GaN外延生长方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000164512A (ja) | 2000-06-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3688843B2 (ja) | 窒化物系半導体素子の製造方法 | |
| US6645295B1 (en) | Method for manufacturing group III nitride compound semiconductor and a light-emitting device using group III nitride compound semiconductor | |
| JP3470623B2 (ja) | 窒化物系iii−v族化合物半導体の成長方法、半導体装置の製造方法および半導体装置 | |
| US7714350B2 (en) | Gallium nitride based semiconductor device and method of manufacturing same | |
| JP2003229645A (ja) | 量子井戸構造およびそれを用いた半導体素子ならびに半導体素子の製造方法 | |
| JP4305982B2 (ja) | 半導体発光素子の製造方法 | |
| JP2001119106A (ja) | 窒化物半導体素子の製造方法 | |
| JPH1056236A (ja) | 3族窒化物半導体レーザ素子 | |
| JP2000332362A (ja) | 半導体装置および半導体発光素子 | |
| EP1343231A2 (en) | A group III nitride compound semiconductor laser | |
| JP3254931B2 (ja) | p型窒化ガリウム系化合物半導体の製造方法 | |
| KR20010076261A (ko) | 반도체 소자 및 그 제조 방법 | |
| JP3283802B2 (ja) | 選択成長法を用いた半導体層及びその成長方法、選択成長法を用いた窒化物系半導体層及びその成長方法、窒化物系半導体発光素子とその製造方法 | |
| JP2014179584A (ja) | 半導体装置及びこれの製造方法 | |
| CN102239574A (zh) | 制造发光元件的方法和发光元件 | |
| JP4103309B2 (ja) | p型窒化物半導体の製造方法 | |
| JPH10144962A (ja) | 半導体発光素子およびその製造方法 | |
| JP4444230B2 (ja) | 窒化ガリウム系半導体素子 | |
| US6235548B1 (en) | Method of fabricating nitride semiconductor laser | |
| JP2006100518A (ja) | 基板表面処理方法及びiii族窒化物系化合物半導体発光素子の製造方法。 | |
| JP2006245162A (ja) | 窒化物半導体発光素子 | |
| JP3403665B2 (ja) | 窒化ガリウム系化合物半導体発光素子 | |
| JPH11224859A (ja) | 窒化ガリウム系化合物半導体のドーピング方法および半導体素子の製造方法 | |
| JP3717255B2 (ja) | 3族窒化物半導体レーザ素子 | |
| JP4720519B2 (ja) | p型窒化物半導体の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20041222 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20050111 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050719 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050719 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070419 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070424 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070622 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090414 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090427 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120515 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130515 Year of fee payment: 4 |
|
| LAPS | Cancellation because of no payment of annual fees |