JP4294359B2 - グレートーンマスクの欠陥修正方法 - Google Patents

グレートーンマスクの欠陥修正方法 Download PDF

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Publication number
JP4294359B2
JP4294359B2 JP2003103784A JP2003103784A JP4294359B2 JP 4294359 B2 JP4294359 B2 JP 4294359B2 JP 2003103784 A JP2003103784 A JP 2003103784A JP 2003103784 A JP2003103784 A JP 2003103784A JP 4294359 B2 JP4294359 B2 JP 4294359B2
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JP
Japan
Prior art keywords
gray
pattern
gray tone
defect
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2003103784A
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English (en)
Japanese (ja)
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JP2004309826A (ja
Inventor
憲治 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2003103784A priority Critical patent/JP4294359B2/ja
Priority to TW093109725A priority patent/TWI232488B/zh
Priority to CNB200410033705XA priority patent/CN1261818C/zh
Priority to KR1020040024060A priority patent/KR100650365B1/ko
Publication of JP2004309826A publication Critical patent/JP2004309826A/ja
Application granted granted Critical
Publication of JP4294359B2 publication Critical patent/JP4294359B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Liquid Crystal (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2003103784A 2003-04-08 2003-04-08 グレートーンマスクの欠陥修正方法 Expired - Lifetime JP4294359B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003103784A JP4294359B2 (ja) 2003-04-08 2003-04-08 グレートーンマスクの欠陥修正方法
TW093109725A TWI232488B (en) 2003-04-08 2004-04-08 Method of checking a defect and evaluating the repaired defect in a graytone mask
CNB200410033705XA CN1261818C (zh) 2003-04-08 2004-04-08 灰色调掩模的缺陷校正方法
KR1020040024060A KR100650365B1 (ko) 2003-04-08 2004-04-08 그레이톤 마스크의 결함 수정 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003103784A JP4294359B2 (ja) 2003-04-08 2003-04-08 グレートーンマスクの欠陥修正方法

Publications (2)

Publication Number Publication Date
JP2004309826A JP2004309826A (ja) 2004-11-04
JP4294359B2 true JP4294359B2 (ja) 2009-07-08

Family

ID=33466787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003103784A Expired - Lifetime JP4294359B2 (ja) 2003-04-08 2003-04-08 グレートーンマスクの欠陥修正方法

Country Status (4)

Country Link
JP (1) JP4294359B2 (ko)
KR (1) KR100650365B1 (ko)
CN (1) CN1261818C (ko)
TW (1) TWI232488B (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4704793B2 (ja) * 2005-04-06 2011-06-22 オリンパス株式会社 外観検査装置
JP4736818B2 (ja) * 2006-01-20 2011-07-27 大日本印刷株式会社 階調をもつフォトマスクの欠陥修正方法および階調をもつフォトマスク
TWI388923B (zh) * 2006-02-02 2013-03-11 Hoya Corp 灰階光罩的缺陷修正方法以及灰階光罩
JP5036349B2 (ja) * 2007-02-28 2012-09-26 Ｈｏｙａ株式会社 グレートーンマスクの欠陥修正方法及びグレートーンマスクの製造方法
JP2008216590A (ja) * 2007-03-02 2008-09-18 Hoya Corp グレートーンマスクの欠陥検査方法及び欠陥検査装置、フォトマスクの欠陥検査方法、グレートーンマスクの製造方法、並びにパターン転写方法
TWI431408B (zh) * 2007-07-23 2014-03-21 Hoya Corp 光罩資訊之取得方法、光罩之品質顯示方法、顯示裝置之製造方法以及光罩製品
TWI446105B (zh) * 2007-07-23 2014-07-21 Hoya Corp 光罩之製造方法、圖案轉印方法、光罩以及資料庫
KR101264114B1 (ko) 2007-08-31 2013-05-13 삼성전자주식회사 포토마스크 레이아웃의 생성 방법 및 이를 수행하는프로그래밍된 명령을 저장하는 컴퓨터에서 판독 가능한저장 매체 및 마스크 이미징 시스템
JP5045394B2 (ja) * 2007-11-28 2012-10-10 大日本印刷株式会社 階調マスクの欠陥修正方法
TWI440964B (zh) * 2009-01-27 2014-06-11 Hoya Corp 多調式光罩、多調式光罩之製造方法及圖案轉印方法
JP2012073553A (ja) * 2010-09-30 2012-04-12 Hoya Corp フォトマスクの欠陥修正方法、フォトマスクの製造方法、及びフォトマスク、並びにパターン転写方法
CN109119375A (zh) * 2018-07-30 2019-01-01 惠科股份有限公司 阵列面板的检测修复方法和光阻修补装置
JP7244067B2 (ja) * 2019-03-25 2023-03-22 株式会社日立ハイテクサイエンス マスク欠陥修正装置、及びマスク欠陥修正方法

Also Published As

Publication number Publication date
TW200425246A (en) 2004-11-16
KR100650365B1 (ko) 2006-11-27
CN1261818C (zh) 2006-06-28
CN1536439A (zh) 2004-10-13
TWI232488B (en) 2005-05-11
KR20040087947A (ko) 2004-10-15
JP2004309826A (ja) 2004-11-04

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