200425246 玖、發明說明： 【發明所屬之技術領域】 本發明係關於具有灰階部的灰階罩幕之灰階部的缺陷 判斷（檢查）、及缺陷修正方法等，該灰階部係調整穿透量 的區域，且以降低穿透此區域之光的穿透量，俾選擇性改 變光阻膜厚為目的。 【先前技術】 近年，在大型LCD用罩幕領域中，有嘗試採用灰階罩幕 來削減罩幕片數（參照非專利文獻1 )。 其中，灰階罩幕係如圖3 ( 1 )所示，在透明基板上設有： 遮光部1、穿透部2、及灰階部3。灰階部3係譬如形成使 用灰階罩幕之大型LCD用曝光機解析臨界以下的遮光圖案 3a之區域，且以降低穿透過此區域之光的穿透量而降低此 區域的照射量，用以選擇性改變光阻膜厚為目的。元件符 號3b係灰階部3中在曝光機解析臨界以下的細微穿透部。 遮光部1與遮光圖案3 a通常均由鉻或鉻化合物等相同材料 所構成之相同厚度膜形成。穿透部2與細微穿透部3 b均屬 在透明基板上，未形成遮光膜等的透明基板部分。 使用灰階罩幕的大型LCD用曝光機之解析臨界，係在分 級曝光機約為2. 5 μ m，而在投影式曝光機則約為3 μ m。所 以，例如在圖3 (1 )中將灰階部3的細微穿透部3 b隔間寬 度設為低於2. 5 μπι，將曝光機解析臨界以下的遮光圖案3 a 線寬設為低於2. 5 μιη。在利用上述大型LCD用曝光機進行 曝光之情況，因為通過灰階部3的曝光光將發生整體曝光 5 312/發明說明書(補件)/93-07/93109725 200425246 量嫌不足的情況，所以透過灰階部3進行曝光的正型光阻 僅以膜厚變薄的狀態殘留於基板上。即，光阻將隨曝光量 的不同而在對應通常遮光部1的部分與對應著灰階部3的 部分出現對顯影液之溶解差，所以，顯影後的光阻形狀便 將如圖3 ( 2 )所示，使得對應著通常遮光部1的部分1 ’成為 如約1 μ m，對應著灰階部3的部分3 ’成為約0 · 4〜0 · 5 μ丨n， 對應著穿透部2的部分成為無光阻部分2 ’。然後，在無光 阻部分2 ’處施行被加工基板的第1蝕刻，且利用灰化加工 等去除對應著灰階部3的較薄部分3’的光阻，再藉由對此 部分施行第2蝕刻，利用1片罩幕實施習知2片份罩幕的 步驟，以減少罩幕片數。 但是，如上述灰階罩幕的遮光部，就從細微圖案加工較 不易，且受在製造步驟中所發生灰塵等大幅影響等等理 由，將發生由遮光圖案3a的細、粗等CD誤差、或多餘圖 案[如：突起（凸）、短路（橋接）、點等]、或缺損圖案[如： 缺損（凹）、或斷線等]構成的圖案缺陷等等（以下將圖案過 粗、多餘圖案缺陷等現象稱為「黑缺陷」，將圖案過細或缺 才貝缺陷寻現象稱為「白缺陷」）。 所以，針對灰階部中所發生的缺陷，雖有施行圖案修 正，但是因為灰階部的圖案較細微，因而將發生各種問題。 第1 :例如在利用最小狹縫尺寸為2 μ m的修正裝置，對 2 μ in以上灰階圖案進行修正之情況，將因灰階部圖案屬於 細微（線寬較細）、受修正裝置造成修正精度存在有極限， 因此在相當於應形成修正圖案的部分與欲形成修正圖案的 6 312/發明說明書(補件)/93-07/93109725 200425246 部分間之偏差的對位精度方面，以及在相當於應形成修正 圖案的部分與實際形成修正圖案的部分間之差異的修正精 度方面，存在有極限。因而，利用與正常圖案相同形狀（正 常圖案的C D容許精度内）進行修正之事項，將因所發生的 缺陷而造成在技術層面上非常困難（例如：當在巨大缺損缺 陷部分形成細微修正膜圖案，並進行修正的情況），所以便 盡可能實施接近正常圖案的修正，即近似正常圖案的修正 (正常圖案的CD容許精度外）。 第2 :因為在技術上不可能利用最小狹縫尺寸2 μηι的修正 裝置，對如1 μπι灰階圖案進行修正，因此藉由不復原為近 似正常圖案的形狀，而是形成可獲得與正常圖案相同灰階 效果的修正圖案（不同於正常圖案的形狀及/或不同排列的 修正圖案），來執行灰階部修正的技術，相關此方面技術， 本案申請人在此之前已提出申請（專利文獻1)。 【非專利文獻1】月刊FPD Intelligence、 ρ.31-35、 1 9 9 9年5月 【專利文獻1】日本專利特開2 0 0 2 - 1 0 7 9 1 3號公報 【發明内容】 (發明所欲解決之問題） 上述習知技術存在有下述問題點。 第1 :在欲修正為與正常圖案相同形狀（正常圖案的C D容 許精度内）之圖案的情況時，雖執行通常圖案間之比較的比 較檢查，但是，在利用近似正常圖案形狀的圖案（正常圖案 之C D容許精度）之進行修正的情況時，或者利用不同於正 7 312/發明說明！：(補件)/93-07/93109725 200425246 常圖案形狀的圖案進行修正之情況時，因為無法施行通常 之比較檢查，因而存在有檢查較不易的問題。 第2 :在利用雷射修復裝置去除黑缺陷之情況，玻璃基板 較容易受損傷，因此即便在滿足設定修正後之遮光圖案3a 之規格（圖案線寬、形狀）之情況時，在細微穿透部（玻璃 部）3 b遭受損傷的情況，細微穿透部（玻璃部）3 b的穿透率 將降低，所以在使用者的曝光、轉印處理方面將發生問題。 具體而言，當遭受玻璃損傷之情況時，為彌補細微穿透部 (玻璃部）3 b的穿透率降低，有設定為較所設定規格（圖案 線寬、形狀）更細線寬的遮光圖案3 a的必要。此情況下， 僅在僅針對圖案形狀的檢查方面便將發生不夠完備的問 題。 第3 :即便為滿足應滿足使用者要求（當由使用者進行曝 光之際，設定為殘留既定光阻膜厚之狀態）而設定的規格 (圖案線寬、形狀）的正常圖案（當然在C D容許精度内）及正 常圖案之CD容許精度内的修正圖案，因為使用者實際使用 灰階罩幕，在待轉印基板的光阻上獲得轉印圖案時的曝光 條件，係依轉印時所使用曝光裝置的光學條件的設定條件 而有不同，所以在使用者的曝光、轉印處理中將存在問題。 具體而言，使用者所使用灰階罩幕的曝光條件，將有非屬 普通條件的情況（例如：刻意未解析灰階圖案的條件，或者 採用過度不足之照射條件的情況等）。由上述得知：（1 )即便 為符合所設定規格（圖案線寬、形狀）的正常圖案或修正圖 案（均在C D容許精度内），在使用者的曝光、轉印處理中仍 8 312/發明說明書(補件)/93-07/93109725 200425246 有出現問題的情況，（2 )即便為屬於近似正常圖案之修正圖 案（正常圖案的C D容許精度外），只要未在使用者的曝光、 轉印處理中出現問題的話便可（若判斷使用者曝光後的光 阻圖案是否合格的結果，屬於合格的話便可），（3 )在使用 者曝光、轉印處理中進行是否有問題的檢查（判斷）的必要 性、重要性。 本發明係為解決上述問題點而所構思，其第1目的在於 提供一種可輕易且精度高地施行灰階部在使用者的曝光、 轉印處理中，是否有問題的判斷（檢查）之灰階罩幕判斷（檢 查）方法。 再者，第2目的在於提供一種利用上述判斷方法的灰階 罩幕之缺陷修正方法。 (解決問題之手段） 本發明具有下述構造。 (方法1 ) 一種灰階罩幕之缺陷修正（判斷）方法，係具有 灰階部、遮光部及穿透部的灰階罩幕之缺陷修正（判斷）方 法，其中，灰階部係調整穿透量的區域，且以減低穿過此 區域之光穿透量而選擇性改變光阻膜厚為目的，其特徵為 包含有以下步驟： 修正上述灰階部中所發生缺陷的步驟； 對上述修正後的灰階部影像施行模糊處理，而製成轉印 影像的步驟；以及 根據上述轉印影像，評估上述修正後灰階部的步驟。 (方法2 )如方法1所述之灰階罩幕之缺陷修正方法，係 9 312/發明說明書(補件)/93-07/93109725 200425246 包含有：根據上述評估結果，再度修正上述修正後灰階部的 步驟。 (方法3 )如方法1或2所述之灰階罩幕之缺陷修正方 法，其中，上述灰階部係形成使用灰階罩幕之曝光機解析 臨界以下的遮光圖案之區域。 (方法4 )如方法1或2所述之灰階罩幕之缺陷修正方 法，其中，上述修正缺陷的步驟，與製成轉印影像的步驟， 係利用同一裝置實施。 (方法5 )如方法1或2所述之灰階罩幕之缺陷修正方 法，其中，上述修正後的灰階部係包含達成與正常圖案近 似形狀之圖案、或與正常圖案相同之灰階效果之不同形狀 及/或排列之修正圖案。 (方法6 )如方法1或2所述之灰階罩幕之缺陷修正方 法，其中，上述模糊處理係對含有上述修正後灰階部的影 像，施行散焦處理。 (方法7 )如方法1所述之灰階罩幕之缺陷修正方法，其 中，灰階罩幕係LCD製造用罩幕、或顯示裝置製造用罩幕。 【實施方式】 本發明的缺陷修正、判斷方法，係對含有灰階部的影像 (例如：含有修正後灰階部圖案的影像）施行模糊處理，而製 成可判斷使用者的曝光、轉印處理中的轉印狀況的轉印影 像，並根據此轉印影像評估修正後的灰階部（方法1 )。 依此藉由根據可判斷使用者之曝光、轉印處理中之轉印 狀況的轉印影像，進行修正部評估的構造，將具有下述效 10 312/發明說明書(補件)/93-07/93109725 200425246 果： (1)針對上述第1問題，即便為利用近似於正常圖案形 狀的圖案（正常圖案的C D容許精度外）進行修正的情況（方 法5 )、或利用不同於正常圖案的變形圖案進行修正的情況 (方法5 )(即，均無法施行尋常的比較檢查之情況），均可 藉由使用者曝光條件所對應的轉印影像，輕易地進行判斷。 (2 )針對上述第2問題，即便因修正而造成玻璃損傷， 導致玻璃基板穿透率降低的情況，仍可判斷在使用者的曝 光條件下，是否將造成問題。 (3 )針對上述第3問題，在使用者的曝光條件下，可判 斷灰階部圖案是否有缺陷。 本發明係對含有灰階部的影像（如：含有修正後灰階部 圖案的影像等）施行模糊處理，並製成可判斷在使用者的曝 光、轉印處理中之轉印狀況的轉印影像，且根據此轉印影 像施行修正後的灰階部評估，再根據此評估結果施行再修 正，以便使修正後圖案進入使用者許可範圍内（方法2 )。 此外，亦可預先儲存此種評估結果，並根據此所儲存的資 料，施行灰階部的缺陷修正（方法2之應用）。 在本發明中，施行模糊處理的轉印影像，例如可藉由對 修正後含有灰階部的影像施行散焦處理而獲得（方法6 )。 更具體而言，例如在利用顯微鏡獲得修正後含有灰階部的 影像之後，藉由施行顯微鏡的散焦處理（d e f 〇 c u s處理）（偏 移顯微鏡焦點（模糊）後再觀看），便可獲得。 其次，針對本發明的模糊處理之條件設定進行說明。模 11 312/發明說明書(補件)/93-07/93109725 200425246 糊處理之條件設定，係設定為可製成能判斷使用者曝 轉印處理中之轉印狀況的轉印影像之條件。例如，探 用者的曝光條件（例如：刻意未解析灰階圖案的條件、 度與不足之照射條件等），再施行相對應的模糊處理 但是，因為在灰階部中存在有重複圖案，因而將存 複圖案的CD偏差。在考慮該等CD偏差範圍的前提下 用者不管採取「上限（如：粗圖案）」、「下限（如：細圖； 均不受影響的條件施行曝光。所以，修正後的圖案便 達成進入上限〜下限（容許偏差範圍）之間的灰階效果。 一例係對應此上限〜下限（容許偏差範圍）而設定模糊ί 件。此模糊處理條件係判斷是否達成C D許可精度内之 效果的情況。 更具體而言，將顯微鏡焦點模糊至灰階部正常圖案 容許精度内）未完全解析程度的條件，設定為模糊處ϊ 件。此模糊處理條件可利用模擬確認到幾乎等於使用 曝光、轉印處理中之實際光轉印狀態。例如，當將顯 焦點模糊至未修正正常圖案上限（如··較粗圖案）未被角 為止，並進行觀看的情況時，由正常圖案所構成灰階 可觀看到大致均勻明亮度（大致均句灰色）。對由此可 到大致均勻明亮度（大致均勻灰色）的正常圖案所構成 部，針對包含有具有一定暗度（一定深度以上深灰色） 一定明亮度（一定薄度（淡度）以上淡灰色）部分之修正 的灰階部，綜合性判斷一定以上暗度（一定深度以上深 部分的暗度（濃度）、或一定明亮度（一定薄度（淡度）以 312/發明說明書(補件)/93-07/93109725 光、 討使 或過 〇 在重 ，使 营）J 需要 其中 灰階 (CD £條 者的 微鏡 Μ斤 部， 觀看 灰階 、或 圖案 灰色 上淡 12 200425246 灰色）、部分的明亮度（薄度）、面積、位置等，而評估修正 部〇 其他例子，有如：使用者所使用灰階罩幕的曝光條件， 就在非屬普通條件的情況（如：刻意未解析灰階圖案的條 件，或者採用過度或不足之照射條件的情況等），便將顯微 鏡焦點從正焦（焦點吻合狀態），偏移（模糊）成在正焦（焦點 吻合狀態）時，於使用者的曝光、轉印處理中將造成問題的 範圍或狀態之上限或下限，能突顯化狀態的條件，設定為 模糊處理條件。此模糊處理條件可利用模擬確認到幾乎等 於使用者的曝光、轉印處理中之實際光轉印相同狀態。 本發明的缺陷修正、判斷方法，特別適用於灰階部屬於 形成有使用灰階罩幕之曝光機，解析臨限以下遮光圖案之 區域的情況（方法3 )。此係因為線寬較粗的影響，將因模 糊處理而突顯化，所以在使用者的曝光條件中，可依較高 精度判斷灰階部圖案是否有缺陷的緣故所致。 再者，本發明的缺陷修正、判斷方法，亦有使用於灰階 部屬於形成半穿透光膜之區域的情況。 另外，修正上述缺陷的步驟、與製成轉印影像的步驟， 最好依同一裝置實施（方法4 )。此係因為在修正裝置上修 正後，便可極佳效率佳地對相同修正裝置上剛修正後的修 正地方進行評估之緣故。 本發明針對LCD製造用灰階罩幕、或顯示裝置製造用灰 階罩幕之缺陷修正、判斷方法將特別有效。此係因為近年 隨顯示裝置的高精細化，解決上述各項問題係為當務之急 13 312/發明說明書(補件)/93-07/93109725 200425246 的緣故。 (實施例） 圖2所示係實施例所使用雷射修正裝置（雷射C V D修復 裝置）概略構造說明示意圖。 在該等圖示中，雷射束1 1係光束擴徑器（b e a m expander)12而放大，並利用平凸透鏡13而形成平行光 線，且利用可變為矩形的長方形狹縫[可變矩形開口 (variable rectangle aperture)]14 進行整形，利用成像 透鏡（物鏡）1 5縮小而成像於光罩2 0上，形成屬於矩形開 口像的矩形雷射修正區域。在圖2中，指示燈1 6係供在雷 射照射前前，便利用顯微鏡1 7確認屬於長方形狹縫1 4光 罩2 0上之像的矩形雷射修正區域，以及供利用顯微鏡1 7 將雷射修正區域對位於缺陷位置用的照明系統，照明（鹵素 燈等）1 8係與成像透鏡（物鏡）1 5包夾光罩2 0，並位於成像 透鏡（物鏡）1 5的相反側，可利用顯微鏡1 7觀察光罩2 0穿 透光的照明系統。另外，缺陷位置與雷射修正區域的對位， 係先利用載置著罩幕的XY大動作平台進行大致性對位，然 後再利用XY微動平台進行正確地對位。 此裝置具有··可利用雷射照射去除膜（黑缺陷修正）的雷 射去除功能（雷射修復功能），以及可利用雷射照射而形成 膜（白缺陷修正）的雷射成膜功能（雷射光C V D功能）。 在本發明中，移動成像透鏡（物鏡）1 5，而施行模糊處理 (散焦處理）。 圖1所示係供說明本發明實施例之灰階部的白缺陷修 14 312/發明說明書(補件)/93-07/93109725 200425246 正、判斷方法用的部分俯視圖。 當對圖1 ( 1 )所示灰階部3的正常圖案，如圖1 ( 2 )所示， 在灰階部3的遮光圖案3 a中發生巨大圖案缺損的情況時， 藉由圖2所示的雷射修正裝置等，利用大致如同正常圖案 相同尺寸的狹縫，形成修正膜4，施行近似正常圖案的修 正（正常圖案的C D容許精度外）[圖1 ( 3 )]。此時，將線寬 較粗部分利用雷射修復裝置去除之事項，因會影響及相鄰 細微穿透部3 b (玻璃部圖案）、或遮光圖案3 a，所以不予實 施。 圖1 ( 4 )顯示對修正後的圖案施行某一定模糊處理（散焦 處理）的狀態。具體而言，移動圖2所示雷射修正裝置的成 像透鏡（物鏡）1 5，施行模糊處理（散焦處理）。此外，圖1 ( 4 ’） 顯示對正常圖案施行相同模糊處理（散焦處理）的狀態（或 相同視野内的正常圖案狀態）。此時，由正常圖案所構成灰 階部，將可觀看到大致均勻明亮度（大致均勻灰色）。對由 此可觀看到大致均勻明亮度（大致均勻灰色）的正常圖案所 構成灰階部，針對包含有具有一定暗度（一定深度以上深灰 色）部分之修正圖案的灰階部，綜合性判斷一定以上暗度 (一定深度以上深灰色）部分的暗度（濃度）、面積、位置等， 而評估修正部 在本實施例中，可依高精度判斷因模糊處理而突顯化的 線寬較粗影響，即判斷在使用者的條件中，灰階部圖案是 否有缺陷。 在本實施例中，在修正裝置上修正後，可對相同修正裝 15 312/發明說明書(補件)/93-07/93109725 200425246 置上剛修正後的修正地方進行評估。 圖4所示係供說明本發明比較例之灰階部的白缺陷修 正、判斷方法用的部分俯視圖。 當對圖4 ( 1 )所示灰階部3的正常圖案，如圖4 ( 2 )所示， 在灰階部3的遮光圖案3 a中發生巨大圖案缺損的情況時， 藉由圖2所示的雷射修正裝置，利用大致如同正常圖案相 同尺寸的狹縫，形成修正膜4，施行近似正常圖案的修正 (正常圖案的C D容許精度外）[圖4 ( 3 )]。此時，將線寬較 粗部分利用雷射修復裝置去除之事項，因為會影響及相鄰 細微穿透部3 b (玻璃部圖案）、或遮光圖案3 a，所以不予實 施。 圖4 ( 4 )顯示對修正後的圖案，經施行與普通所施行正常 圖案間之合成比較（取檢查圖案與正常圖案間之微分進行 比較）的狀態示意圖。在與正常圖案間之合成比較的結果， 僅強調修正部，頗難判斷是否合格。換句話說，通常的比 較檢查較難實施。 另外，本發明並不僅限於上述實施例。 在上述實施例1中，雖舉施行近似正常圖案的修正（正 常圖案之C D容許精度外）的情況，但是針對（1 )形成達到與 正常圖案相同灰階效果的不同形狀及/或排列之正常圖案 的情況，（2 )當因修正造成玻璃損傷，而降低玻璃基板穿透 率的情況，（3 )當施行正常圖案、或所謂修正圖案判斷之情 況時，在使用者的曝光條件下，均可判斷灰階部圖案是否 有缺陷。 16 312/發明說明書(補件)/93-07/93109725 200425246 再者，在上述（2 )的「因玻璃損傷所造成玻璃基板穿透 率降低」方面，藉由施'行穿透光觀察，便可判斷觸及上述 第2問題的缺陷修正判斷。 (發明效果） 如上述所說明，依照本發明的話，針對正常圖案、或所 謂修正圖案的判斷之情況時，提供可輕易地施行灰階部在 使用者曝光、轉印處理中，是否將造成問題的判斷（檢查） 之灰階罩幕判斷（檢查、保證）方法。 再者，可提供利用上述判斷方法的灰階罩幕之缺陷修正 方法，藉此便可提供含有修正圖案之灰階部，在使用者的 曝光、轉印處理中不致造成問題的灰階罩幕。 【圖式簡單說明】 圖1 ( 1 )〜（4 ’）為供說明本發明實施例的灰階部中，白缺 陷修正、判斷方法的部分俯視圖。 圖2為說明雷射修正裝置概略構造的示意圖。 圖3為灰階罩幕說明圖，（1 )部分俯視圖，（2 )部分剖視 圖。 圖4 ( 1 )〜（4 )為供說明比較例的灰階部中，白缺陷修 正、判斷方法的部分俯視圖。 (元件符號說明） 1 遮光部 2 穿透部 2 ’ 無光阻部分 3 灰階部 17 3〗2/發明說明書(補件)/93-07/93109725 200425246200425246 (1) Description of the invention: [Technical field to which the invention belongs] The present invention relates to the defect judgment (inspection) and defect correction methods of the grayscale part of a grayscale cover with a grayscale part. In the area of transmission, the purpose is to reduce the amount of light transmitted through this area and selectively change the thickness of the photoresist film. [Prior Art] In recent years, in the field of large-scale LCD masks, attempts have been made to reduce the number of masks by using gray-scale masks (see Non-Patent Document 1). The gray scale cover is shown in FIG. 3 (1), and the transparent substrate is provided with a light shielding portion 1, a penetration portion 2, and a gray scale portion 3. The gray-scale part 3 is, for example, a region where the light-shielding pattern 3a below the critical limit is analyzed by a large LCD exposure machine using a gray-scale mask. The purpose is to selectively change the thickness of the photoresist film. The element symbol 3b is a fine penetrating portion of the gray scale portion 3 below the exposure machine analysis threshold. The light-shielding portion 1 and the light-shielding pattern 3a are usually formed of films of the same thickness made of the same material, such as chromium or a chromium compound. Both the penetrating portion 2 and the minute penetrating portion 3 b belong to a transparent substrate portion on which the light-shielding film or the like is not formed on the transparent substrate. The critical resolution of a large LCD exposure machine using a gray scale mask is about 2.5 μm in a graded exposure machine and about 3 μm in a projection exposure machine. Therefore, for example, in FIG. 3 (1), the width of the fine penetrating portion 3b of the gray-scale portion 3 is less than 2.5 μm, and the light-shielding pattern 3a below the critical limit of the exposure machine is set to a low line width. At 2. 5 μιη. In the case of using the above-mentioned large LCD exposure machine for exposure, because the exposure light passing through the gray-scale portion 3 will cause overall exposure 5 312 / Invention Specification (Supplement) / 93-07 / 93109725 200425246 the amount may be insufficient, so The positive-type photoresist exposed by the gray scale portion 3 remains on the substrate only in a state where the film thickness becomes thin. That is, the photoresist will have a poor dissolution of the developing solution in the portion corresponding to the normal light-shielding portion 1 and the portion corresponding to the gray-scale portion 3 depending on the exposure amount. Therefore, the shape of the photoresist after development will be as shown in FIG. 3 ( 2), so that the portion 1 ′ corresponding to the normal light-shielding portion 1 is approximately 1 μm, and the portion 3 ′ corresponding to the gray-scale portion 3 is approximately 0 · 4 ~ 0 · 5 μn, corresponding to penetration. The portion of the portion 2 becomes the photoresist-free portion 2 '. Then, the first etching of the substrate to be processed is performed at the photoresist-free portion 2 ′, and the photoresist of the thinner portion 3 ′ corresponding to the gray-scale portion 3 is removed by ashing or the like. 2 etching, using a single mask to implement the steps of the conventional two-piece mask to reduce the number of masks. However, such as the light-shielding part of the gray-scale mask, it is difficult to process from a fine pattern, and due to the large influence of dust and the like during the manufacturing process, CD errors such as the thinness and thickness of the light-shielding pattern 3a, Or excessive patterns [such as: protrusions (convex), short (bridge), dots, etc.], or defective patterns [such as: defects (concave), or broken lines, etc.) Phenomenon such as pattern defect is called "black defect", and the phenomenon that the pattern is too thin or missing is called "white defect"). Therefore, although a pattern correction is performed for defects occurring in the gray scale portion, various problems occur because the pattern of the gray scale portion is relatively fine. First: For example, when a correction device with a minimum slit size of 2 μm is used to correct a grayscale pattern of 2 μin or more, the grayscale portion pattern is fine (the line width is thin) and caused by the correction device. There is a limit to the accuracy of correction. Therefore, in terms of the alignment accuracy of the deviation between the portion corresponding to the correction pattern and 6 312 / Instruction Manual (Supplement) / 93-07 / 93109725 200425246 where the correction pattern is to be formed, and There is a limit to the accuracy of correction corresponding to the difference between the portion where the correction pattern should be formed and the portion where the correction pattern is actually formed. Therefore, using the same shape as the normal pattern (within the allowable accuracy of the CD of the normal pattern) to make corrections will cause technical difficulties due to the defects that occur (for example, when a fine correction film pattern is formed on a large defect defect part) , And the case of correction), so as to implement as close to the normal pattern as possible, that is, the correction of the approximate normal pattern (outside of the CD tolerance of the normal pattern). Second: Because it is technically impossible to use a correction device with a minimum slit size of 2 μηι to correct a grayscale pattern such as 1 μπι, the shape can be obtained by normalizing the normal pattern without restoring it to a shape close to a normal pattern. The same grayscale effect correction pattern (different from the normal pattern shape and / or different arrangement of correction patterns) to perform the technology of grayscale correction. Related to this technology, the applicant of this case has applied for this before (Patent Literature 1). [Non-Patent Document 1] Monthly FPD Intelligence, ρ.31-35, May 1989 [Patent Document 1] Japanese Patent Laid-Open No. 2 0 0 2-1 0 7 9 1 [Content of the Invention] ( Problems to be Solved by the Invention) The above conventional techniques have the following problems. Step 1: When a pattern with the same shape as the normal pattern (within the allowable accuracy of the CD of the normal pattern) is to be corrected, a comparison check between comparison of the normal patterns is performed. When the pattern's CD allowable accuracy) is corrected, or it is different from the positive 7 312 / invention description! : (Supplement) / 93-07 / 93109725 200425246 When the pattern with the regular pattern shape is corrected, there is a problem that the inspection is not easy because the normal comparison inspection cannot be performed. Second: When the black defect is removed by the laser repair device, the glass substrate is more likely to be damaged. Therefore, even when the specifications (pattern line width and shape) of the light-shielding pattern 3a that meets the setting and correction are met, it penetrates slightly. If the part (glass part) 3 b is damaged, the fine penetrating part (glass part) 3 b will have a reduced transmittance, so problems will occur in the user's exposure and transfer processing. Specifically, in the case of glass damage, there is a light-shielding pattern set to a finer line width than the set specifications (pattern line width, shape) in order to compensate for the decrease in the transmittance of the fine penetrating portion (glass portion) 3 b. 3 a necessary. In this case, an incomplete problem occurs only in the inspection of the pattern shape only. Part 3: Normal patterns (pattern line width, shape) set to meet user requirements (when exposed by the user, set to a state where the predetermined photoresist film thickness is left) Within the allowable accuracy) and the correct pattern within the CD allowable accuracy of the normal pattern, because the user actually uses the gray scale mask to obtain the exposure conditions when transferring the pattern on the photoresist of the substrate to be transferred, depending on the conditions at the time of transfer The setting conditions of the optical conditions using the exposure device are different, so there will be problems in the exposure and transfer processing of the user. Specifically, the exposure conditions of the grayscale mask used by the user may be non-common conditions (for example, the condition of deliberately not analyzing the grayscale pattern, or the use of excessively insufficient irradiation conditions, etc.). It is known from the above: (1) Even if it is a normal pattern or a correction pattern (both within the allowable accuracy of the CD) that meets the set specifications (pattern line width and shape), it is still 8 312 / Invention Specification (Supplement) / 93-07 / 93109725 200425246 There are cases where problems occur. (2) Even if it is a correction pattern that is close to a normal pattern (except the CD tolerance of the normal pattern), as long as it is not exposed to the user, If there is a problem in the printing process (if the result of determining whether the photoresist pattern exposed by the user is qualified is acceptable), (3) check whether there is a problem in the user's exposure and transfer processing ( Judgment) the necessity and importance. The present invention is conceived in order to solve the above-mentioned problems. A first object of the present invention is to provide a gray scale that can easily and accurately implement a gray scale portion to determine (check) whether there is a problem in the user's exposure and transfer processing. Mask judgment (inspection) method. Furthermore, a second object is to provide a defect correction method for a gray scale mask using the above-mentioned determination method. (Means for Solving the Problems) The present invention has the following structure. (Method 1) A defect correction (judgment) method of a gray scale cover, which is a defect correction (judgment) method of a gray scale cover having a gray level portion, a light shielding portion, and a penetration portion, wherein the gray level portion is adjusted through The area of transmission, and the purpose of selectively changing the thickness of the photoresist film is to reduce the amount of light passing through this area, and is characterized by including the following steps: a step of correcting the defects occurring in the grayscale portion; A step of applying a blurring process to the corrected grayscale portion image to prepare a transfer image; and a step of evaluating the corrected grayscale portion based on the transfer image. (Method 2) The defect correction method of the gray scale cover as described in Method 1, which is 9 312 / Invention Specification (Supplement) / 93-07 / 93109725 200425246 includes: According to the above evaluation results, the gray after the correction is corrected again. Steps. (Method 3) The method for correcting a defect of a gray scale mask according to the method 1 or 2, wherein the gray scale portion forms a region of a light-shielding pattern below a critical limit that is analyzed by an exposure machine using the gray scale mask. (Method 4) The method for correcting a defect of a gray scale mask according to the method 1 or 2, wherein the step of correcting the defect and the step of preparing a transferred image are performed using the same device. (Method 5) The method for correcting a defect of a grayscale mask according to method 1 or 2, wherein the corrected grayscale part includes a pattern that achieves an approximate shape to a normal pattern, or the same grayscale effect as a normal pattern Different shapes and / or arrangements of correction patterns. (Method 6) The defect correction method for a grayscale mask according to method 1 or 2, wherein the blurring processing is a defocusing process for an image containing the grayscale portion after the correction. (Method 7) The method for correcting a defect of a gray scale mask according to Method 1, wherein the gray scale mask is a mask for manufacturing an LCD or a mask for manufacturing a display device. [Embodiment] The defect correction and judgment method of the present invention is to perform blur processing on an image containing a grayscale portion (for example, an image containing a corrected grayscale portion pattern) to make an exposure and transfer that can judge a user A transfer image of the transfer condition in process, and a corrected gray scale portion is evaluated based on the transfer image (method 1). Based on this, the structure that evaluates the correction section based on the transfer image that can determine the user's exposure and transfer status during the transfer process will have the following effects 10 312 / Invention Manual (Supplement) / 93-07 / 93109725 200425246 Fruit: (1) Regarding the above first problem, even if the correction is made by using a pattern that approximates the shape of a normal pattern (outside of the allowable accuracy of the CD of the normal pattern) (Method 5), or a deformation different from the normal pattern The case where the pattern is corrected (Method 5) (that is, the case where ordinary comparison checks cannot be performed) can be easily judged by the transfer image corresponding to the exposure conditions of the user. (2) Regarding the above-mentioned second problem, even if the glass is damaged due to correction and the transmittance of the glass substrate is reduced, it can still be determined whether the problem will be caused by the user's exposure conditions. (3) In response to the third problem described above, it can be judged whether or not the grayscale portion pattern is defective under the user's exposure conditions. The present invention applies blur processing to an image containing a grayscale portion (such as an image containing a corrected grayscale portion pattern, etc.), and creates a transfer image that can judge the transfer status in the user's exposure and transfer processing. , And perform a revised gray-scale evaluation based on the transferred image, and then perform a further correction based on the result of this evaluation, so that the corrected pattern falls within the user's permitted range (Method 2). In addition, such evaluation results can be stored in advance, and defects in the gray scale can be corrected based on the stored data (application of method 2). In the present invention, the transfer image subjected to the blurring process can be obtained, for example, by performing a defocusing process on the corrected image containing the gray scale portion (Method 6). More specifically, for example, after obtaining a corrected image containing a gray scale portion with a microscope, and then performing defocus processing (def occus processing) of the microscope (shifting the focus of the microscope (blurring) and then viewing), it can be obtained . Next, the condition setting of the blur processing of the present invention will be described. Mould 11 312 / Invention Manual (Supplement) / 93-07 / 93109725 200425246 The condition setting for paste processing is set to a condition that can be used to create a transfer image that can judge the user's exposure to the transfer condition during the transfer processing. For example, the exposure conditions of the user (for example, the conditions for deliberately not analyzing the grayscale pattern, the degree of illumination and the insufficient irradiation conditions, etc.), and then the corresponding blurring processing is performed. However, because there are repeated patterns in the grayscale part, The CD deviation of the complex pattern will be stored. Taking into account the range of these CD deviations, users will be exposed regardless of the "upper limit (such as: coarse pattern)" and "lower limit (such as: fine image; unaffected conditions). Therefore, the revised pattern will be entered. The gray scale effect between the upper limit and the lower limit (permissible deviation range). An example is to set a fuzzy part corresponding to the upper limit to the lower limit (permissible deviation range). This blurring condition is a condition for judging whether or not the effect within the allowed accuracy of the CD is achieved. More specifically, the microscope focus is blurred to within the allowable accuracy of the normal pattern in the gray scale.) The condition of incomplete analysis is set as the blurring file. This blurring processing condition can be confirmed by simulation to almost equal to the exposure and transfer processing. The actual state of the light transfer. For example, when the apparent focus is blurred until the upper limit of the normal pattern (such as a thicker pattern) is not corrected and the corner is viewed, the gray scale composed of the normal pattern can be viewed. To approximately uniform brightness (approximately uniform gray). For normal patterns with approximately uniform brightness (approximately uniform gray) For the gray scale part that contains a correction of a certain darkness (dark gray above a certain depth) and a certain brightness (light gray above a certain thinness (lightness)), comprehensively judge the darkness above a certain level (a certain depth) The darkness (concentration) or certain brightness (certain thinness (lightness) of the above deep part is determined by 312 / Invention Specification (Supplement) / 93-07 / 93109725, and it is necessary to make use of it.) J needs the gray scale (the micro-mirror of the CD player, see the gray scale, or the pattern is lighter on 2004 2004246246 gray), the brightness (thinness), area, position, etc. of the part, and evaluate the correction department. Other examples are: the exposure conditions of the grayscale mask used by the user are in non-common conditions (such as the condition of deliberately not analyzing the grayscale pattern, or the use of excessive or insufficient irradiation conditions, etc.), The focus of the microscope will be shifted (blurred) from the positive focus (focal coincidence state) to the range that will cause problems in the user's exposure or transfer process when the positive focus (focal coincidence state). The upper or lower limit of the state can highlight the condition of the state and set it as the blurring condition. This blurring condition can be confirmed by simulation to almost the same state as the actual light transfer in the user's exposure and transfer processing. The present invention The method of defect correction and judgment is especially suitable for the case where the grayscale part belongs to an exposure machine using a grayscale mask to analyze the area of the shading pattern below the threshold (Method 3). This is due to the effect of the thicker line width. It is highlighted due to blur processing, so in the user's exposure conditions, it can be judged with high accuracy whether the grayscale part pattern is defective. Furthermore, the defect correction and judgment method of the present invention is also used in The gray-scale part belongs to a region where a semi-transmissive light film is formed. In addition, the step of correcting the above-mentioned defects and the step of preparing a transferred image are preferably implemented by the same device (Method 4). This is because after the correction on the correction device, the correction place immediately after the correction on the same correction device can be evaluated with great efficiency. The method of the present invention is particularly effective for the defect correction and judgment method of the gray scale cover for LCD manufacturing or the gray scale cover for display device manufacturing. This is because in recent years, with the high definition of the display device, it is urgent to solve the above problems 13 312 / Invention Specification (Supplement) / 93-07 / 93109725 200425246. (Embodiment) FIG. 2 is a schematic diagram illustrating a schematic structure of a laser correction device (laser C V D repair device) used in the embodiment. In these illustrations, the laser beam 11 is enlarged by a beam expander 12 and a parallel light is formed using a plano-convex lens 13. A rectangular slit [variable rectangular opening] (variable rectangle aperture)] 14. Shaping is performed, and the imaging lens (objective lens) 15 is reduced to form an image on the mask 20 to form a rectangular laser correction area belonging to a rectangular opening image. In FIG. 2, the indicator light 16 is provided before the laser irradiation, and it is convenient to use a microscope 17 to confirm that the rectangular laser correction area belonging to the image on the rectangular slit 14, the mask 20, and the microscope 17 are used. Place the laser correction area on the illumination system for the defect location. The illumination (halogen lamp, etc.) 1 8 series and imaging lens (objective lens) 15 wrap the reticle 20 and are located on the opposite side of the imaging lens (objective lens) 15 You can use the microscope 17 to observe the illumination system of the photomask 20 penetrating light. In addition, the alignment of the defect position with the laser correction area is first roughly aligned using the XY large motion platform on which the mask is placed, and then the XY micromotion platform is used for accurate alignment. This device has a laser removal function (laser repair function) that can remove the film (black defect correction) by laser irradiation, and a laser film formation function that can form a film (white defect correction) by laser irradiation ( Laser CVD function). In the present invention, the imaging lens (objective lens) 15 is moved, and a blurring process (defocusing process) is performed. Fig. 1 is a partial plan view for explaining the white defect repair of the gray-scale portion of the embodiment of the present invention. 14 312 / Invention Specification (Supplement) / 93-07 / 93109725 200425246 Positive and judging method. When the normal pattern of the gray scale portion 3 shown in FIG. 1 (1) is shown in FIG. 1 (2), a large pattern defect occurs in the light-shielding pattern 3a of the gray scale portion 3, as shown in FIG. 2 The laser correction device shown in the figure uses slits of approximately the same size as the normal pattern to form a correction film 4 to perform corrections similar to the normal pattern (except for the CD-accuracy of the normal pattern) [Fig. 1 (3)]. At this time, the matter of removing the thicker line width by the laser repair device will affect the adjacent fine penetrating portion 3 b (the pattern of the glass portion) or the shading pattern 3 a, so it is not implemented. Fig. 1 (4) shows a state where a certain blur processing (defocus processing) is performed on the corrected pattern. Specifically, the imaging lens (objective lens) 15 of the laser correction device shown in FIG. 2 is moved, and a blurring process (defocusing process) is performed. In addition, FIG. 1 (4 ′) shows a state in which the same blur processing (defocus processing) is performed on a normal pattern (or a normal pattern state in the same field of view). At this time, the gray scale portion composed of the normal pattern can be viewed with approximately uniform brightness (approximately uniform gray). For gray scales composed of normal patterns with approximately uniform brightness (approximately uniform gray), gray scales containing correction patterns with a certain degree of darkness (dark gray above a certain depth) are comprehensively judged. The darkness (concentration), area, position, etc. of the dark part above a certain degree (dark gray above a certain depth), etc., and the evaluation and correction section in this embodiment can judge the line width highlighted by the blurring process with a high degree of accuracy based on high accuracy The effect is to judge whether the grayscale part pattern is defective in the conditions of the user. In this embodiment, after the correction is performed on the correction device, the same correction device 15 312 / Invention Specification (Supplement) / 93-07 / 93109725 200425246 can be evaluated on the correction place immediately after the correction. Fig. 4 is a partial plan view for explaining a method for correcting and determining white defects in a gray-scale portion of a comparative example of the present invention. When the normal pattern of the grayscale portion 3 shown in FIG. 4 (1) is shown in FIG. 4 (2), a large pattern defect occurs in the light-shielding pattern 3a of the grayscale portion 3, as shown in FIG. The laser correction device shown in the figure uses slits of approximately the same size as the normal pattern to form a correction film 4 to perform corrections similar to the normal pattern (except for the CD-accuracy of the normal pattern) [Fig. 4 (3)]. At this time, the matter of removing the thicker line width by the laser repair device will not affect the adjacent fine penetrating portion 3 b (glass portion pattern) or the light-shielding pattern 3 a, so it is not implemented. Fig. 4 (4) shows the state comparison of the corrected pattern (comparison between the inspection pattern and the normal pattern) between the normal pattern and the normal pattern applied. As a result of the comparison with the normal pattern, only the correction part is emphasized, and it is difficult to judge whether it is acceptable. In other words, comparison checks are often more difficult to implement. The present invention is not limited to the embodiments described above. In the first embodiment described above, although the correction of the approximate normal pattern (except the CD allowable accuracy of the normal pattern) is performed, the normal (1) formation of different shapes and / or arrangements that achieve the same grayscale effect as the normal pattern is normal. In the case of patterns, (2) when the glass substrate is damaged due to correction and the transmittance of the glass substrate is reduced, (3) when the normal pattern or the so-called correction pattern judgment is performed, the user's exposure conditions are all equal. It can be judged whether the grayscale part pattern is defective. 16 312 / Invention Specification (Supplement) / 93-07 / 93109725 200425246 Furthermore, in the aspect of "reduction of transmittance of glass substrate due to glass damage" in (2) above, the observation was made by applying a penetrating light, It can be judged that the defect correction judgment that touched the above-mentioned second problem can be determined. (Effects of the Invention) As described above, according to the present invention, in the case of a judgment of a normal pattern or a so-called correction pattern, it is provided whether the grayscale portion can be easily implemented in a user exposure or transfer process, which will cause a problem. Judgment (inspection) gray-scale mask judgment (inspection, assurance) method. In addition, a defect correction method of a gray scale mask using the above-mentioned judgment method can be provided, so that a gray scale portion containing a correction pattern can be provided, and a gray scale mask that does not cause a problem in the user's exposure and transfer processing can be provided. . [Brief description of the drawings] Figs. 1 (1) to (4 ') are partial top views for explaining a method for correcting and determining a white defect in a grayscale section according to an embodiment of the present invention. FIG. 2 is a schematic diagram illustrating a schematic structure of a laser correction device. Fig. 3 is an explanatory view of a gray scale mask, (1) a partial plan view, and (2) a sectional view. Figs. 4 (1) to (4) are partial plan views for explaining a method for correcting and determining white defects in a gray scale portion of a comparative example. (Explanation of component symbols) 1 Light-shielding section 2 Penetrating section 2 ′ No photoresistive section 3 Gray-scale section 17 3 2 / Invention specification (Supplement) / 93-07 / 93109725 200425246
3a 遮 光 圖 案 3b 細 微 穿 透 部 4 修 正 膜 11 雷 射 束 12 光 束 擴 徑 器 13 平 凸 透 鏡 14 長 方 形 狹 縫 15 成 像 透 鏡 (物鏡） 16 指 示 燈 17 顯 微 鏡 18 照 明 20 光 罩 312/發明說明書(補件)/93-07/93109725 183a Light-shielding pattern 3b Micro penetration 4 Correction film 11 Laser beam 12 Beam expander 13 Plano-convex lens 14 Rectangular slit 15 Imaging lens (objective lens) 16 Indicator light 17 Microscope 18 Lighting 20 Photomask 312 / Invention Manual (Supplement) ) / 93-07 / 93109725 18