JP4208051B2 - 高屈折率金属酸化物薄膜の製造方法 - Google Patents

高屈折率金属酸化物薄膜の製造方法 Download PDF

Info

Publication number
JP4208051B2
JP4208051B2 JP2003083916A JP2003083916A JP4208051B2 JP 4208051 B2 JP4208051 B2 JP 4208051B2 JP 2003083916 A JP2003083916 A JP 2003083916A JP 2003083916 A JP2003083916 A JP 2003083916A JP 4208051 B2 JP4208051 B2 JP 4208051B2
Authority
JP
Japan
Prior art keywords
thin film
refractive index
sol
metal oxide
high refractive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003083916A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004292191A (ja
JP2004292191A5 (https=
Inventor
泰 村上
正幸 原野
芳雄 高須
彬雄 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinshu University NUC
Hioki EE Corp
Original Assignee
Shinshu University NUC
Hioki EE Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinshu University NUC, Hioki EE Corp filed Critical Shinshu University NUC
Priority to JP2003083916A priority Critical patent/JP4208051B2/ja
Publication of JP2004292191A publication Critical patent/JP2004292191A/ja
Publication of JP2004292191A5 publication Critical patent/JP2004292191A5/ja
Application granted granted Critical
Publication of JP4208051B2 publication Critical patent/JP4208051B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Inorganic Compounds Of Heavy Metals (AREA)
  • Silicon Compounds (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP2003083916A 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法 Expired - Fee Related JP4208051B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003083916A JP4208051B2 (ja) 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003083916A JP4208051B2 (ja) 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法

Publications (3)

Publication Number Publication Date
JP2004292191A JP2004292191A (ja) 2004-10-21
JP2004292191A5 JP2004292191A5 (https=) 2006-04-06
JP4208051B2 true JP4208051B2 (ja) 2009-01-14

Family

ID=33399220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003083916A Expired - Fee Related JP4208051B2 (ja) 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法

Country Status (1)

Country Link
JP (1) JP4208051B2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011043018A1 (ja) * 2009-10-09 2011-04-14 国立大学法人信州大学 高屈折率材料の製造方法および当該材料と高分子材料との複合体

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITFI20040252A1 (it) * 2004-12-06 2005-03-06 Colorobbia Italiana Spa Processo per la preparazione di dispersioni di ti02 in forma di nanoparticelle, e dispersioni ottenibili con questo processo
JP5039970B2 (ja) * 2007-01-19 2012-10-03 国立大学法人信州大学 チタニアミクロ多孔膜の製造方法
JP5527868B2 (ja) * 2008-02-06 2014-06-25 国立大学法人信州大学 レンズの製造方法
JP6101897B2 (ja) * 2012-05-14 2017-03-29 富山県 焼成体の製造方法
JP6175320B2 (ja) * 2013-05-24 2017-08-02 マツモトファインケミカル株式会社 高屈折率膜材料の製造方法
JP2026017032A (ja) * 2024-07-23 2026-02-04 日東電工株式会社 低屈折率膜形成用ゲルの製造方法、低屈折率膜形成用塗工液の製造方法、および低屈折率膜の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011043018A1 (ja) * 2009-10-09 2011-04-14 国立大学法人信州大学 高屈折率材料の製造方法および当該材料と高分子材料との複合体
JP2011080007A (ja) * 2009-10-09 2011-04-21 Shinshu Univ 高屈折率材料の製造方法および当該材料と高分子材料との複合体

Also Published As

Publication number Publication date
JP2004292191A (ja) 2004-10-21

Similar Documents

Publication Publication Date Title
JP6603916B2 (ja) 無機酸化物被膜
EP1693689B1 (en) Optical transparent member and optical system using the same
EP1574881B1 (en) Optical member with an antireflection film having fine irregularities on the surface, production method for the same
EP2645136B1 (en) Optical member having textured structure and method of producing same
JP4883383B2 (ja) 中空状ＳｉＯ２を含有する分散液、塗料組成物及び反射防止塗膜付き基材
JPH03188938A (ja) 無機ポリマ薄膜の形成方法
JP5279344B2 (ja) 光学素子の製造方法
JP2004292190A (ja) 二酸化ケイ素薄膜とその製造法
CN1168980A (zh) 不起雾抗反射膜和光学元件及其制造方法
JP2009098305A (ja) 光学膜の形成方法及びこれを有する光学素子
JP4208051B2 (ja) 高屈折率金属酸化物薄膜の製造方法
JP2004294565A (ja) 反射防止膜
JP5235315B2 (ja) 透明電極付き基板の製造方法
CN101241199A (zh) 光学透明部件和使用该光学透明部件的光学系统
JP2011046595A (ja) フッ化マグネシウム膜の製造方法、反射防止膜および光学素子
JP2004294566A (ja) フォトニック結晶
US8501270B2 (en) Optical transparent member and optical system using the same
JP2005234447A (ja) 表面に微細な凹凸を有する膜、透明反射防止膜、それらの製造方法および光学部材
JP2004294564A (ja) 多層反射膜
JP2004292191A5 (https=)
CN100392435C (zh) 形成突起膜的方法
US20070166872A1 (en) Process for producing thin photosensitized semiconducting films
TWI910933B (zh) 抗反射薄膜的製造方法
JP3491952B2 (ja) 無機質組成物の製造方法、積層体の製造方法及びペン入力パネル用保護材料の製造方法
JPH08301633A (ja) 液晶表示装置及びその製造方法

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20040715

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041214

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20041216

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060125

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060125

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20060125

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20060301

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080222

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080417

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080516

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080613

A911 Transfer of reconsideration by examiner before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20080902

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20081003

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20081014

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111031

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111031

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111031

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121031

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131031

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees