JP2004292191A5 - - Google Patents

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Publication number
JP2004292191A5
JP2004292191A5 JP2003083916A JP2003083916A JP2004292191A5 JP 2004292191 A5 JP2004292191 A5 JP 2004292191A5 JP 2003083916 A JP2003083916 A JP 2003083916A JP 2003083916 A JP2003083916 A JP 2003083916A JP 2004292191 A5 JP2004292191 A5 JP 2004292191A5
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JP
Japan
Prior art keywords
thin film
photonic crystal
sol
refractive index
mold
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Granted
Application number
JP2003083916A
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English (en)
Japanese (ja)
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JP2004292191A (ja
JP4208051B2 (ja
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Priority to JP2003083916A priority Critical patent/JP4208051B2/ja
Priority claimed from JP2003083916A external-priority patent/JP4208051B2/ja
Publication of JP2004292191A publication Critical patent/JP2004292191A/ja
Publication of JP2004292191A5 publication Critical patent/JP2004292191A5/ja
Application granted granted Critical
Publication of JP4208051B2 publication Critical patent/JP4208051B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003083916A 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法 Expired - Fee Related JP4208051B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003083916A JP4208051B2 (ja) 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003083916A JP4208051B2 (ja) 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法

Publications (3)

Publication Number Publication Date
JP2004292191A JP2004292191A (ja) 2004-10-21
JP2004292191A5 true JP2004292191A5 (https=) 2006-04-06
JP4208051B2 JP4208051B2 (ja) 2009-01-14

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ID=33399220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003083916A Expired - Fee Related JP4208051B2 (ja) 2003-03-25 2003-03-25 高屈折率金属酸化物薄膜の製造方法

Country Status (1)

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JP (1) JP4208051B2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITFI20040252A1 (it) * 2004-12-06 2005-03-06 Colorobbia Italiana Spa Processo per la preparazione di dispersioni di ti02 in forma di nanoparticelle, e dispersioni ottenibili con questo processo
JP5039970B2 (ja) * 2007-01-19 2012-10-03 国立大学法人信州大学 チタニアミクロ多孔膜の製造方法
JP5527868B2 (ja) * 2008-02-06 2014-06-25 国立大学法人信州大学 レンズの製造方法
JP4942053B2 (ja) * 2009-10-09 2012-05-30 国立大学法人信州大学 高屈折率材料の製造方法
JP6101897B2 (ja) * 2012-05-14 2017-03-29 富山県 焼成体の製造方法
JP6175320B2 (ja) * 2013-05-24 2017-08-02 マツモトファインケミカル株式会社 高屈折率膜材料の製造方法
JP2026017032A (ja) * 2024-07-23 2026-02-04 日東電工株式会社 低屈折率膜形成用ゲルの製造方法、低屈折率膜形成用塗工液の製造方法、および低屈折率膜の製造方法

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