JP2005242083A5 - - Google Patents

Download PDF

Info

Publication number
JP2005242083A5
JP2005242083A5 JP2004053252A JP2004053252A JP2005242083A5 JP 2005242083 A5 JP2005242083 A5 JP 2005242083A5 JP 2004053252 A JP2004053252 A JP 2004053252A JP 2004053252 A JP2004053252 A JP 2004053252A JP 2005242083 A5 JP2005242083 A5 JP 2005242083A5
Authority
JP
Japan
Prior art keywords
dielectric medium
concavo
optical wavelength
heat treatment
wavelength plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004053252A
Other languages
English (en)
Japanese (ja)
Other versions
JP4444693B2 (ja
JP2005242083A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004053252A priority Critical patent/JP4444693B2/ja
Priority claimed from JP2004053252A external-priority patent/JP4444693B2/ja
Priority to US11/064,602 priority patent/US7428101B2/en
Priority to EP05251146A priority patent/EP1569014B1/en
Priority to DE602005007782T priority patent/DE602005007782D1/de
Publication of JP2005242083A publication Critical patent/JP2005242083A/ja
Publication of JP2005242083A5 publication Critical patent/JP2005242083A5/ja
Application granted granted Critical
Publication of JP4444693B2 publication Critical patent/JP4444693B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004053252A 2004-02-27 2004-02-27 光学波長板の製造方法 Expired - Fee Related JP4444693B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004053252A JP4444693B2 (ja) 2004-02-27 2004-02-27 光学波長板の製造方法
US11/064,602 US7428101B2 (en) 2004-02-27 2005-02-24 Optical retardation plate and method of manufacturing the same
EP05251146A EP1569014B1 (en) 2004-02-27 2005-02-25 Optical retardation plate and method of manufacturing the same
DE602005007782T DE602005007782D1 (de) 2004-02-27 2005-02-25 Optische Verzögerungsplatte und Verfahren zu ihrer Herstellung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004053252A JP4444693B2 (ja) 2004-02-27 2004-02-27 光学波長板の製造方法

Publications (3)

Publication Number Publication Date
JP2005242083A JP2005242083A (ja) 2005-09-08
JP2005242083A5 true JP2005242083A5 (https=) 2007-04-12
JP4444693B2 JP4444693B2 (ja) 2010-03-31

Family

ID=34747536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004053252A Expired - Fee Related JP4444693B2 (ja) 2004-02-27 2004-02-27 光学波長板の製造方法

Country Status (4)

Country Link
US (1) US7428101B2 (https=)
EP (1) EP1569014B1 (https=)
JP (1) JP4444693B2 (https=)
DE (1) DE602005007782D1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4814002B2 (ja) * 2005-09-30 2011-11-09 株式会社リコー 位相板の製造方法・光学素子および画像投射装置
JP4597848B2 (ja) * 2005-11-30 2010-12-15 京セラキンセキ株式会社 偏光変換素子
JP2008008990A (ja) * 2006-06-27 2008-01-17 Ricoh Co Ltd 波長板、画像投射装置、及び光ピックアップ装置
JP2008164680A (ja) * 2006-12-27 2008-07-17 Canon Inc 光学波長板及び該波長板の製造方法
US7635634B2 (en) * 2007-04-16 2009-12-22 Infineon Technologies Ag Dielectric apparatus and associated methods
KR101584383B1 (ko) 2008-03-31 2016-01-11 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 및 포토마스크 블랭크의 제조 방법
CN103033862A (zh) * 2012-12-17 2013-04-10 武汉电信器件有限公司 一种用于制备dfb激光器相移光栅的反射镜装置及其制备方法
KR102501643B1 (ko) * 2015-09-24 2023-02-20 삼성전자주식회사 고굴절률 광학 기능층을 포함하는 광학 장치 및 상기 광학 장치의 제조 방법
US11740399B2 (en) * 2018-02-06 2023-08-29 Raytheon Company Low cost dispersive optical elements

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2909363B2 (ja) 1993-09-28 1999-06-23 日立金属株式会社 静磁波マイクロ波装置
DE19502727A1 (de) * 1995-01-28 1996-08-01 Heidenhain Gmbh Dr Johannes Phasengitter
JP2002182003A (ja) * 2000-12-14 2002-06-26 Canon Inc 反射防止機能素子、光学素子、光学系および光学機器
US6947215B2 (en) * 2001-12-27 2005-09-20 Canon Kabushiki Kaisha Optical element, optical functional device, polarization conversion device, image display apparatus, and image display system
US6930326B2 (en) * 2002-03-26 2005-08-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor circuit and method of fabricating the same

Similar Documents

Publication Publication Date Title
TWI294648B (en) Method for manufacturing polysilicon film
JP2000228361A5 (https=)
JP2005242083A5 (https=)
CN111965849B (zh) 基于gst相变材料温度控制的可控手性结构及控制方法
TW200832714A (en) Fabricating method for low temperatyue polysilicon thin film
WO2011162331A1 (ja) 波長板の製造方法
JP2022514035A (ja) パターン化されたＳｒＢ４ＢＯ７及びＰｂＢ４Ｏ７結晶の製造方法
JP2004006836A (ja) 結晶化処理された、モノリシック積層／多層型機械デバイス、機械デバイスと電子デバイスとの組み合わせ、ならびにその製造方法およびシステム
KR950024009A (ko) 액정 배향 제어막의 제조방법 및 장치
JP2002083824A5 (https=)
JP4444693B2 (ja) 光学波長板の製造方法
JP2000260709A (ja) 半導体薄膜の結晶化方法及びそれを用いた半導体装置
US9589796B2 (en) Method of defining poly-silicon growth direction
JP2004292191A5 (https=)
JP4617329B2 (ja) ワイヤグリッド偏光板の製造方法
WO2016155149A1 (zh) 多晶硅薄膜制备方法、半导体器件、显示基板及显示装置
JP2006338787A5 (https=)
CN106229254B (zh) 一种多晶硅的制作方法及多晶硅薄膜
CN107703672A (zh) 阵列基板及其制作方法、柔性显示面板、柔性显示器
JP5632760B2 (ja) 無機偏光ブレーズド回折格子
JP4078415B2 (ja) マイクロレンズ、マイクロレンズアレーおよびその製造方法
JP4832423B2 (ja) 表面構造化レーザ加工により光学部品の製造をするための方法
CN219245798U (zh) 一种透射式衍射光栅
JP2004117774A (ja) 回折格子およびその製造方法
JP5235208B2 (ja) ワイヤグリッド偏光板