JP4139655B2 - ネガ型レジスト組成物 - Google Patents

ネガ型レジスト組成物 Download PDF

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Publication number
JP4139655B2
JP4139655B2 JP2002262775A JP2002262775A JP4139655B2 JP 4139655 B2 JP4139655 B2 JP 4139655B2 JP 2002262775 A JP2002262775 A JP 2002262775A JP 2002262775 A JP2002262775 A JP 2002262775A JP 4139655 B2 JP4139655 B2 JP 4139655B2
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Japan
Prior art keywords
group
alkali
block unit
soluble
block
Prior art date
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Expired - Fee Related
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JP2002262775A
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English (en)
Japanese (ja)
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JP2004101811A5 (https=
JP2004101811A (ja
Inventor
豊 阿出川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Priority to JP2002262775A priority Critical patent/JP4139655B2/ja
Publication of JP2004101811A publication Critical patent/JP2004101811A/ja
Publication of JP2004101811A5 publication Critical patent/JP2004101811A5/ja
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Publication of JP4139655B2 publication Critical patent/JP4139655B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
JP2002262775A 2002-09-09 2002-09-09 ネガ型レジスト組成物 Expired - Fee Related JP4139655B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002262775A JP4139655B2 (ja) 2002-09-09 2002-09-09 ネガ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002262775A JP4139655B2 (ja) 2002-09-09 2002-09-09 ネガ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004101811A JP2004101811A (ja) 2004-04-02
JP2004101811A5 JP2004101811A5 (https=) 2005-09-22
JP4139655B2 true JP4139655B2 (ja) 2008-08-27

Family

ID=32262731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002262775A Expired - Fee Related JP4139655B2 (ja) 2002-09-09 2002-09-09 ネガ型レジスト組成物

Country Status (1)

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JP (1) JP4139655B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4614089B2 (ja) * 2005-11-17 2011-01-19 信越化学工業株式会社 ネガ型レジスト材料及びパターン形成方法
JP4546393B2 (ja) * 2005-12-22 2010-09-15 富士フイルム株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP4678383B2 (ja) 2007-03-29 2011-04-27 信越化学工業株式会社 化学増幅ネガ型レジスト組成物及びパターン形成方法
JP5887244B2 (ja) * 2012-09-28 2016-03-16 富士フイルム株式会社 パターン形成用自己組織化組成物、それを用いたブロックコポリマーの自己組織化によるパターン形成方法、及び自己組織化パターン、並びに電子デバイスの製造方法

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Publication number Publication date
JP2004101811A (ja) 2004-04-02

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