JP2004101811A5 - - Google Patents
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- Publication number
- JP2004101811A5 JP2004101811A5 JP2002262775A JP2002262775A JP2004101811A5 JP 2004101811 A5 JP2004101811 A5 JP 2004101811A5 JP 2002262775 A JP2002262775 A JP 2002262775A JP 2002262775 A JP2002262775 A JP 2002262775A JP 2004101811 A5 JP2004101811 A5 JP 2004101811A5
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- JP
- Japan
- Prior art keywords
- group
- block unit
- alkali
- unit
- block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000003118 aryl group Chemical group 0.000 claims 8
- 229920002120 photoresistant polymer Polymers 0.000 claims 7
- 239000011347 resin Substances 0.000 claims 7
- 229920005989 resin Polymers 0.000 claims 7
- 229920001400 block copolymer Polymers 0.000 claims 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 125000003710 aryl alkyl group Chemical group 0.000 claims 4
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 239000003431 cross linking reagent Substances 0.000 claims 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000004450 alkenylene group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 125000002993 cycloalkylene group Chemical group 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000003302 alkenyloxy group Chemical group 0.000 claims 1
- 150000001408 amides Chemical group 0.000 claims 1
- 125000002102 aryl alkyloxo group Chemical group 0.000 claims 1
- 125000004104 aryloxy group Chemical group 0.000 claims 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000000470 constituent Substances 0.000 claims 1
- 150000002148 esters Chemical group 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002262775A JP4139655B2 (ja) | 2002-09-09 | 2002-09-09 | ネガ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002262775A JP4139655B2 (ja) | 2002-09-09 | 2002-09-09 | ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004101811A JP2004101811A (ja) | 2004-04-02 |
| JP2004101811A5 true JP2004101811A5 (https=) | 2005-09-22 |
| JP4139655B2 JP4139655B2 (ja) | 2008-08-27 |
Family
ID=32262731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002262775A Expired - Fee Related JP4139655B2 (ja) | 2002-09-09 | 2002-09-09 | ネガ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4139655B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4614089B2 (ja) * | 2005-11-17 | 2011-01-19 | 信越化学工業株式会社 | ネガ型レジスト材料及びパターン形成方法 |
| JP4546393B2 (ja) * | 2005-12-22 | 2010-09-15 | 富士フイルム株式会社 | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
| JP4678383B2 (ja) | 2007-03-29 | 2011-04-27 | 信越化学工業株式会社 | 化学増幅ネガ型レジスト組成物及びパターン形成方法 |
| JP5887244B2 (ja) * | 2012-09-28 | 2016-03-16 | 富士フイルム株式会社 | パターン形成用自己組織化組成物、それを用いたブロックコポリマーの自己組織化によるパターン形成方法、及び自己組織化パターン、並びに電子デバイスの製造方法 |
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2002
- 2002-09-09 JP JP2002262775A patent/JP4139655B2/ja not_active Expired - Fee Related