JP4134566B2 - 光学要素の位置決め方法及び装置、投影光学系、並びに露光装置 - Google Patents
光学要素の位置決め方法及び装置、投影光学系、並びに露光装置 Download PDFInfo
- Publication number
- JP4134566B2 JP4134566B2 JP2002026589A JP2002026589A JP4134566B2 JP 4134566 B2 JP4134566 B2 JP 4134566B2 JP 2002026589 A JP2002026589 A JP 2002026589A JP 2002026589 A JP2002026589 A JP 2002026589A JP 4134566 B2 JP4134566 B2 JP 4134566B2
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- support mechanisms
- lens
- optical system
- displaced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Lens Barrels (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002026589A JP4134566B2 (ja) | 2002-02-04 | 2002-02-04 | 光学要素の位置決め方法及び装置、投影光学系、並びに露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002026589A JP4134566B2 (ja) | 2002-02-04 | 2002-02-04 | 光学要素の位置決め方法及び装置、投影光学系、並びに露光装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003227986A JP2003227986A (ja) | 2003-08-15 |
JP2003227986A5 JP2003227986A5 (enrdf_load_stackoverflow) | 2005-08-18 |
JP4134566B2 true JP4134566B2 (ja) | 2008-08-20 |
Family
ID=27748375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002026589A Expired - Lifetime JP4134566B2 (ja) | 2002-02-04 | 2002-02-04 | 光学要素の位置決め方法及び装置、投影光学系、並びに露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4134566B2 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105934696A (zh) * | 2014-01-25 | 2016-09-07 | 柯尼卡美能达株式会社 | 透镜组件以及摄像装置 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4378938B2 (ja) * | 2002-11-25 | 2009-12-09 | 株式会社ニコン | 露光装置、及びデバイス製造方法 |
DE10342529B4 (de) * | 2003-09-12 | 2017-02-02 | Robert Bosch Gmbh | Kameraanordnung |
WO2005083487A1 (en) * | 2004-02-26 | 2005-09-09 | Carl Zeiss Smt Ag | Housing structure |
EP1767972B1 (en) * | 2004-07-14 | 2011-11-02 | Mitsubishi Denki Kabushiki Kaisha | Reflecting mirror apparatus |
JP4591136B2 (ja) * | 2005-03-14 | 2010-12-01 | 株式会社安川電機 | 2次元位置決め装置 |
JP2007147760A (ja) * | 2005-11-24 | 2007-06-14 | Fujitsu Ten Ltd | レンズ構造および調整治具構造 |
JP5055384B2 (ja) * | 2007-02-27 | 2012-10-24 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学結像装置 |
JP2010080754A (ja) * | 2008-09-26 | 2010-04-08 | Nikon Corp | 照明光学系及び露光装置 |
JP5535108B2 (ja) | 2011-02-18 | 2014-07-02 | ギガフォトン株式会社 | 極端紫外光源装置 |
JP2016508626A (ja) * | 2013-02-13 | 2016-03-22 | ザイゴ コーポレーションZygo Corporation | 一体化されたフレクシャを有するモノリシック光学構成要素 |
CN103472560B (zh) * | 2013-09-25 | 2016-11-23 | 中国科学院长春光学精密机械与物理研究所 | 透镜X、Y、θZ三自由度微动调整装置 |
CN106547065B (zh) * | 2015-09-17 | 2019-04-12 | 上海微电子装备(集团)股份有限公司 | 一种可动镜片调整机构 |
CN106547063B (zh) * | 2015-09-17 | 2019-03-26 | 上海微电子装备(集团)股份有限公司 | 一种可动镜片调整机构 |
CN106547064B (zh) * | 2015-09-17 | 2019-04-12 | 上海微电子装备(集团)股份有限公司 | 一种可动镜片调整机构 |
JP7227810B2 (ja) * | 2019-03-25 | 2023-02-22 | キヤノン株式会社 | 光学装置、露光装置および物品製造方法 |
CN115755530B (zh) * | 2022-10-31 | 2025-05-06 | 中国科学院光电技术研究所 | 一种铰链驱动式可动镜片微调装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2891074B2 (ja) * | 1993-12-10 | 1999-05-17 | 三菱電機株式会社 | 反射鏡固定装置 |
JPH10253872A (ja) * | 1997-03-13 | 1998-09-25 | Nikon Corp | 反射光学部材の保持装置及び露光装置 |
DE19905779A1 (de) * | 1999-02-12 | 2000-08-17 | Zeiss Carl Fa | Vorrichtung zum Kippen eines Gegenstandes um wenigstens eine Achse, insbesondere eines optischen Elementes |
JP3814460B2 (ja) * | 2000-04-13 | 2006-08-30 | 三菱電機株式会社 | 反射鏡調整機構 |
-
2002
- 2002-02-04 JP JP2002026589A patent/JP4134566B2/ja not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105934696A (zh) * | 2014-01-25 | 2016-09-07 | 柯尼卡美能达株式会社 | 透镜组件以及摄像装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2003227986A (ja) | 2003-08-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4134566B2 (ja) | 光学要素の位置決め方法及び装置、投影光学系、並びに露光装置 | |
US5973863A (en) | Exposure projection apparatus | |
US6235438B1 (en) | Projection exposure method and apparatus | |
JP4552337B2 (ja) | 投影光学系の製造方法及び露光装置の製造方法 | |
US6891603B2 (en) | Manufacturing method in manufacturing line, manufacturing method for exposure apparatus, and exposure apparatus | |
JP3931039B2 (ja) | リソグラフィ投影装置およびこれを使ったデバイスの製造方法 | |
WO1999060361A1 (fr) | Instrument et procede de mesure d'aberrations, appareil et procede de sensibilisation par projection incorporant cet instrument, et procede de fabrication de dispositifs associe | |
US20040042094A1 (en) | Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice | |
US6819414B1 (en) | Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method | |
JP2004064076A (ja) | 変形ミラー構造体、変形ミラーの制御方法及び露光装置 | |
JP2003092253A (ja) | 照明光学系、露光装置、及びマイクロデバイスの製造方法 | |
JP2004266264A (ja) | 光学系、露光装置、デバイス製造方法 | |
JP2010267966A (ja) | 光学装置、露光方法及び装置、並びにデバイス製造方法 | |
JP2013161992A (ja) | 変形可能な反射光学素子、光学系、及び露光装置 | |
JPWO2007086557A1 (ja) | 光学部材保持装置、光学部材の位置調整方法、及び露光装置 | |
JP2005175177A (ja) | 光学装置及び露光装置 | |
US20120105818A1 (en) | Lithographic apparatus and method | |
JP4650619B2 (ja) | 駆動ユニット、光学ユニット、光学装置、並びに露光装置 | |
WO2002025711A1 (fr) | Procede de mesure des caracteristiques d'une image, et procede d'exposition | |
US7589911B2 (en) | Technique for positioning optical system element | |
JP3708075B2 (ja) | リソグラフィ装置およびデバイス製造方法 | |
WO1999018604A1 (fr) | Procede et appareil d'exposition par projection | |
WO2002042728A1 (fr) | Procede et dispositif permettant de mesurer les aberrations d'un systeme optique de projection et procede et dispositif d'exposition | |
JP4582306B2 (ja) | 光学系及び露光装置 | |
JP2013106017A (ja) | 光学素子保持装置、光学装置、及び露光装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050202 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050204 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080402 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080507 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080520 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4134566 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110613 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110613 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20220613 Year of fee payment: 14 |
|
EXPY | Cancellation because of completion of term |