JP4134566B2 - Optical element positioning method and apparatus, projection optical system, and exposure apparatus - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method and apparatus for positioning optical elements such as lenses and mirrors, for example, and is provided in a projection exposure apparatus used in a lithography process for manufacturing devices such as semiconductor elements, liquid crystal display elements, or plasma display elements. It is suitable for use in a lens barrel structure of a projection optical system, particularly a decentering adjustment mechanism of a lens constituting the projection optical system.
[0002]
[Prior art]
In recent projection exposure apparatuses, with the miniaturization of patterns, a projection optical system with less wavefront aberration and distortion is required. In the projection optical system of the projection exposure apparatus, since the accuracy of orders of magnitude is required compared to a general optical system such as a camera lens, even if the tolerance of optical elements such as lens elements and mirrors is strictly managed, It is difficult to achieve the desired imaging performance simply by assembling the optical elements. Therefore, when a projection optical system is manufactured, after the optical elements (lens elements, etc.) are assembled and image formation becomes possible, the measurement of aberration and the adjustment thereof, for example, the adjustment of the distance between the optical elements, and the optical It is necessary to improve the imaging performance by repeatedly adjusting the eccentricity of the elements. That is, when manufacturing the projection optical system of the projection exposure apparatus, it is necessary to adjust the interval between the plurality of optical elements constituting the projection optical system and the eccentricity of each optical element with extremely high accuracy.
[0003]
In order to perform such adjustment, conventionally, the following method has been generally used. The first conventional adjustment method is a method for adjusting decentration aberrations in the projection optical system, and the projection optical system is configured by connecting a plurality of divided lens barrels in the optical axis direction. This is a method in which the relative position between adjacent divided lens barrels is finely adjusted and then fastened again.
[0004]
The second conventional adjustment method is a fine adjustment method for decentration aberrations in the projection optical system. A lens chamber (lens frame) holding a lens element effective for correcting a specific aberration is adjusted from the outside. In this method, a screw can be finely moved in a plane perpendicular to the optical axis, and a specific aberration is finely adjusted by finely moving the lens chamber. In this case, the adjustment screw is arranged so as to be pressed against the reference surface while sandwiching the lens chamber from four directions, and the adjustment screw serves as both the adjustment (fine movement) means and the fixing means. On the other hand, the displacement of the lens chamber to be driven can be measured from the outside by a displacement sensor (capacitance sensor, etc.). When the value indicated a predetermined value, the adjustment screw was tightened from four directions to fix the lens chamber.
[0005]
[Problems to be solved by the invention]
As described above, the adjustment method of the optical elements of the conventional projection optical system includes the first adjustment method for finely adjusting the relative position between the divided lens barrels and the second adjustment method for finely adjusting the position of the lens chamber. It was used.
Among these methods, in the first adjustment method of the former, it is difficult to finely move the projection optical system, which is generally a heavy object of several hundred kg, with sub-μm accuracy. Due to the presence of elasticity, there is a disadvantage that the displacement measured at the outer diameter of the divided lens barrel does not necessarily represent the displacement of the internal lens element group. That is, such a method is effective as a rough adjustment method for aberrations, but as a final adjustment (fine adjustment) method near the completion of assembly adjustment of a projection optical system that requires a higher resolution recently. It is insufficient.
[0006]
Further, the latter second adjustment method has disadvantages that workability is poor, adjustment accuracy is low, and the lens element may be deformed or distorted. That is, it is difficult to obtain a sub-μm drive resolution by using an adjustment screw that moves about several hundreds of μm per rotation, and it is inevitable that the lens chamber is slightly displaced at the moment when the adjustment screw is finally tightened. Yes, work requires advanced skills. Further, by tightening the adjusting screw, a certain degree of deformation occurs in the lens chamber. In this case, since the displacement sensor is measuring the outer periphery of the deformed lens chamber, it can be said that the measured value of the displacement sensor indicates the correct displacement of the lens element in the sub-μm region. hard. Furthermore, the deformation of the lens chamber leads to deformation / distortion of the enclosing lens element, which may cause side effects such as higher-order aberrations and birefringence.
[0007]
As described above, in the conventional adjustment method, it is difficult to perform final fine adjustment of the projection optical system with high accuracy and without side effects such as lens deformation and distortion.
In view of the above, the present invention provides an optical element positioning technique capable of adjusting the position of an optical element such as a specific lens element constituting a projection optical system of a projection exposure apparatus with high accuracy and without side effects. For the purpose.
[0008]
[Means for Solving the Problems]
An optical element positioning method according to the present invention is a positioning method in which a first member (2) holding an optical element is moved with respect to a second member (1), and the optical element is positioned at a predetermined position. For the second member, the first member is supported via three support mechanisms (5A to 5C, 9) that are respectively displaced in the one-dimensional direction (D2, D4, D6), and among the three support mechanisms, One support mechanism is displaced in the direction (D1) intersecting the one-dimensional direction, and as the one support mechanism is displaced in the intersecting direction, the remaining two support mechanisms are moved in the one-dimensional direction. Each optical element is displaced to position the optical element at the predetermined position.
[0009]
According to the present invention, as shown in FIG. 4, for example, the three support mechanisms (5A to 5C, 9) are respectively movable in the one-dimensional direction, that is, restricted in the two-dimensional direction. Therefore, the first member is supported in a state of being restrained with a degree of freedom that is not excessive or insufficient with respect to the second member, that is, substantially in a so-called kinematic restraint state. In this state, when one support mechanism (5A, 9) is actively driven, the first member (2) holding the optical element rotates about a certain point B in the space. The center B is an intersection of straight lines passing through the other two support mechanisms and perpendicular to the one-dimensional displacement direction of each. In addition, when the one support mechanism is actively driven, the other two support mechanisms move passively in the one-dimensional direction, so that the first member is not deformed or distorted. By measuring the displacement of the outer shape of the first member with a sensor or the like and controlling the driving amount based on the measurement result, the first member, and thus the optical element can be positioned at the target position with high accuracy. . In this way, the problem of adjustment accuracy and the problem of side effects such as deformation / distortion of the optical element are solved simultaneously.
[0010]
In this case, two of the three support mechanisms may be actively driven in a direction intersecting the one-dimensional direction. Accordingly, the first member (optical element) can be positioned with respect to the second member with two degrees of freedom in the translational direction, for example. Even in this case, the first member is not deformed or distorted. In particular, in the adjustment of the lens of the optical system, the necessity for fine adjustment of the rotation angle is small, and when the adjustment of the rotation angle is unnecessary, the necessary positioning can be performed only by fine adjustment of the two support mechanisms.
[0011]
  As an example, the one-dimensional direction is a direction toward the center of the second member.
  In addition, the three support mechanisms are arranged at positions that substantially divide the circumference into three equal parts, and the three support mechanismsIs displacedThe one-dimensional direction (D2, D4, D6) is preferably a direction toward the center of the circumference. In this case, for example, as shown in FIG. 4, the drive amount δs of the one support mechanism (5A, 9) and the displacement amount δc of the first member (2) are approximately 3: 2, and the direction is Are the same. Therefore, since the driving amount of the support mechanism is reduced and the first member is displaced, the first member can be positioned with higher accuracy.
[0012]
Further, the three support mechanisms are respectively displaced in directions (D1, D3, D5) intersecting the one-dimensional direction, and the first member is translated and rotated in a predetermined plane with respect to the second member. It is desirable to position with 3 degrees of freedom in direction. Thereby, for example, the first member (optical element) can be positioned in an arbitrary state on a plane perpendicular to the optical axis.
[0013]
Next, the optical element positioning apparatus of the present invention is a positioning apparatus that moves the first member (2) holding the optical element relative to the second member (1) and positions the optical element at a predetermined position. The three support mechanisms (5A to 5C, 9) that are arranged between the second member and the first member and are each displaced in a one-dimensional direction, and at least one of the three support mechanisms And a displacement mechanism (3A) for displacing the mechanism in a direction intersecting the one-dimensional direction. According to this positioning device, the first member is supported in a substantially kinematic restrained state with respect to the second member, so that the positioning method of the present invention can be implemented.
[0014]
  In this case, as an example, the one-dimensional direction is a direction toward the center of the second member.
  AlsoThe three support mechanisms are arranged at positions substantially dividing the circumference into three equal parts, and the three support mechanismsIs displacedThe one-dimensional direction is preferably a direction toward the center of the circumference.
  The displacement member is preferably provided in each of the three support mechanisms. Thereby, the first member can be positioned with three degrees of freedom.
[0015]
Further, the first member (23), the second member (22), and the three support mechanisms (25A to 25C) are configured substantially integrally, and the three support mechanisms and the corresponding ones thereof You may comprise a displacement member from the link mechanism using an elastic hinge. Thereby, the positioning device can be miniaturized.
Further, the support mechanism is disposed in the first V-groove block (53) fixed to the first member (42) and having a groove along the one-dimensional direction, and the first V-groove block. A second V-groove block (46) having a ball (50) and a groove fixed to the second member (41) and extending in a direction intersecting the one-dimensional direction, and the ball is disposed in the groove. And the displacement mechanism may have a drive member (51, 52, 55, 56) that moves the ball relative to the second V-groove block. Thereby, the movable range of the first member can be widened.
[0016]
Next, a projection optical system of the present invention is a projection optical system (PL) that includes a plurality of optical elements and projects an image of a pattern of a first object onto a second object. An element positioning device is provided, and at least one of a plurality of optical elements constituting the projection optical system is positioned by the positioning device. By applying the present invention, the optical element can be positioned with high accuracy without giving deformation or distortion to the optical element.
[0017]
The exposure apparatus of the present invention includes the projection optical system of the present invention, and transfers the pattern image formed on the mask onto the substrate via the projection optical system. By applying the present invention, an image of a mask pattern can be transferred onto a substrate with high accuracy.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
A first embodiment of the present invention will be described below with reference to FIGS. In this example, the present invention is applied to a holding mechanism for holding an optical element such as a projection optical system of a projection exposure apparatus or a lens element for optical equipment.
FIG. 1 is a perspective view showing a holding mechanism of this example, and FIG. 2 is an exploded perspective view showing the holding mechanism. In FIGS. 1 and 2, a circular flat plate-like fixed table 1 (second member) is shown. A circular flat plate disposed above the fixed table 1 with connecting portions 3A, 3B, 3C (displacement mechanisms) having the same structure installed at three positions arranged at equiangular intervals (120 ° intervals) on the outer periphery of the upper surface. Conical pivots 4A to 4C each having a front end portion 5A to 5C processed into a spherical surface are provided at positions facing the connecting portions 3A to 3C on the bottom surface of the movable table 2 (first member). The movable table 2 is supported on the fixed table 1 via the connecting portions 3A to 3C by supporting the tip portions 5A to 5C of the pivots 4A to 4C with the concave portions on the upper surfaces of the connecting portions 3A to 3C. In this case, the fixed table 1 is installed on a substantially horizontal plane, and the movable table 2 is stably placed on the fixed table 1 by its own weight. When this holding mechanism is applied to the projection optical system of the projection exposure apparatus, as an example, the fixed table 1 is fixed to the lens barrel of the projection optical system, and the lens or the lens chamber for housing the lens is fixed to the movable table 2. Is done.
[0019]
Next, FIG. 3 shows a connecting portion 3A. In FIG. 3, the connecting portion 3A has a fixed stage 6 fixed to the fixed table 1 of FIG. 1, and a direction D1 along the groove 6a with respect to the fixed stage 6. The movable stage 8 is movably mounted on the movable stage 8, the adjusting screw 7 drives the fixed stage 6 in the direction D 1, and the groove 8 a extends in the direction D 2 perpendicular to the direction D 1 with respect to the active stage 8. And a passive stage 9 mounted so as to be movable along the axis. Further, a hemispherical concave portion (hereinafter referred to as “connecting pivot”) 10 that is applied to the tip 5A of the pivot 4A of FIG. 2 is formed on the passive stage 9, and in FIG. The portion 3A is detachably and rotatably connected via the distal end portion 5A and the connecting pivot 10. The tip portions 5A to 5C of the pivots 4A to 4C and the corresponding passive stage 9 correspond to three support mechanisms.
[0020]
The direction D1 in FIG. 3 corresponds to the circumferential direction along the outer periphery of the fixed table 1 in FIGS. 1 and 2, and the direction D2 orthogonal to the direction D1 is a direction connecting the center of the fixed table 1 and the connecting portion 3A. It corresponds to. Therefore, in FIGS. 1 and 2, the pivot 4A on the bottom surface of the movable table 2 can adjust the position of the fixed table 1 in the circumferential direction by the adjusting screw 7 of the connecting portion 3A, and in a direction orthogonal to the circumferential direction. It is supported so that it can move freely. Similarly, the other pivots 4B and 4C of the movable table 2 and the connecting portions 3B and 3C are detachably and rotatably connected via the connecting pivots on the front end portions 5B and 5C and the passive stage 9, respectively. Yes. The pivots 4B and 4C are also supported so that the position of the fixed table 1 in the circumferential direction can be adjusted by the adjusting screws 7 of the connecting portions 3B and 3C, respectively, and can be freely moved in a direction perpendicular to the circumferential direction. Has been.
[0021]
As a result, the movable table 2 is restrained by two degrees of freedom (circumferential direction, height direction of the fixed table 1) at three positions (tips 5A to 5C of the pivots 4A to 4C) with respect to the fixed table 1. In accordance with the principle of mechanics, the movable table 2 is in a state where the degree of freedom of the movable table 2 is restrained without excess or deficiency, so-called kinematic restraint. And the movable table 2 is supported with respect to the fixed table 1 in a state where it is not restricted in the radial direction of the fixed table 1 at three locations. Accordingly, even if the position of any of the three pivots 4A to 4C is moved in the circumferential direction in order to adjust the position of the movable table 2 with respect to the fixed table 1, no reaction force is generated on the movable table 2. The deformation of the movable table 2 does not occur at all. Therefore, for example, when the lens element is held by the movable table 2, the two-dimensional position and the rotation angle of the lens element can be finely adjusted with high accuracy without deforming the lens element. This will be described in detail with reference to FIG.
[0022]
FIG. 4 is a plan view showing the relationship between the connecting portions 3A to 3C on the fixed table 1 in FIG. 1 and the movable table 2 thereon. In FIG. 4, equiangular intervals (120 ° intervals) are arranged on the circumference. ), The three connecting portions 3A to 3C are installed, and the distal ends 5A to 5C of the three pivots 4A to 4C of the movable table 2 are installed on the connecting pivot 10 on the passive stage 9 of the connecting portions 3A to 3C. ing. In this case, the tip portions 5A to 5C can be driven in the movable directions D1, D3, and D5 (circumferential direction) of the active stage 8 of the connecting portions 3A to 3C, respectively, and the tip portions 5A to 5C are connected to the connecting portions, respectively. The movable stage 3A to 3C of the passive stage 9 can move without being restricted by the movable directions (radial directions along the straight lines 11A, 11B, and 11C connecting the center A of the fixed table 1 and the connecting pivot 10) D2, D4, and D6. It is supported by. In this case, the directions D1, D3, and D5 sequentially cross at an intersection angle of 60 °, and the directions D2, D4, and D6 are orthogonal to the directions D1, D3, and D5, respectively.
[0023]
In FIG. 4, when the adjusting screw 7 of one connecting portion (for example, connecting portion 3A) is driven, the movable table 2 rotates about a certain point B in the space. The center B is an intersection of straight lines that pass through the connecting pivot 10 of the passive stage 9 of the remaining two connecting portions 3B and 3C and are perpendicular to the movable directions D4 and D6 of each passive stage 9. In this example, the movable directions D1, D3, D5 of the active stage 8 and the movable directions D2, D4, D6 of the passive stage 9 are orthogonal to each other, and the movable directions D1, D3, D5 of each active stage 8 are the same circumference. It faces in the tangential direction, and three active stages 8 are arranged at intervals of 120 °. Therefore, in FIG. 4, the triangle having the points A, B, and the tip 5B (or 5C) as vertices is a right triangle obtained by dividing an equilateral triangle into two, and therefore a line connecting the points A and B The length of the minute is twice the line segment (circumferential radius) connecting the point A and the tip 5B (or 5C).
[0024]
As a result, the driving amount δs of the active stage 8 in the direction D1 by the adjusting screw 7 of the connecting portion 3A and the moving amount δc of the center of the movable table 2 thereby have the same direction and a 3: 2 relationship. That is, the following relationship is established.
δc = (2/3) δs (1)
Further, when the active stage 8 of the connecting portion 3A is driven in the direction D1 in this way, the passive stage 9 moves in the directions D4 and D6 in the other two connecting portions 3B and 3C, respectively. 2 is not deformed or stressed. Similarly, by driving the active stages 8 of the other connecting portions 3B and 3C in the directions D3 and D5, the center of the movable table 2 is moved in the directions D3 and D5, respectively, without causing deformation or stress in the movable table 2. can do. The directions in which the movable table 2 is driven by the three connecting portions 3A to 3C are independent from each other, and the movable table 2 is orthogonal to each other by appropriately combining the driving amounts of the three connecting portions 3A to 3C. The amount of displacement in the two directions and the rotation angle about the axis perpendicular to the upper surface of the fixed table 1 can be freely determined. In addition, since the movable table 2 is in a kinematic restraint state with respect to the fixed table 1, there is an advantage that when the movable table 2 is driven in such a manner, deformation / strain or stress is not generated in the movable table 2. is there.
[0025]
When adjusting a predetermined lens of the projection optical system of the exposure apparatus using the holding mechanism of this example, the necessity for fine adjustment of the rotation angle is small in adjusting the lens. Therefore, when it is not necessary to finely adjust the rotation angle, a drive mechanism for the active stage 8 by the adjusting screw 7 is provided at two positions of the three connecting portions 3A to 3C in FIG. The drive mechanism for the active stage 8 may be omitted at one place. As a result, the drive mechanism can be simplified.
[0026]
Moreover, you may make it provide the encoder (for example, rotary encoder) for measuring the drive amount of the adjustment screw 7 of three connection parts 3A-3C of FIG. At this time, since there is no deformation of the movable table 2 in this example, the position and rotation angle of the movable table 2 (and thus the optical element such as a lens being held) are highly accurately determined from the driving amounts of the three adjustment screws 7. Can be requested. Therefore, the position and rotation angle of the movable table 2 can be adjusted to a desired state with high accuracy.
[0027]
[Second Embodiment]
Next, a second embodiment of the present invention will be described with reference to FIGS. In this example, the present invention is applied to a lens chamber that holds a predetermined lens (optical element) constituting a projection optical system of a projection exposure apparatus.
5 is a perspective view showing the lens chamber 24 of this example, FIG. 6 is a plan view showing the lens chamber 24, FIG. 7 is a front view of the lens chamber 24 in FIG. 6, and FIG. 8 is taken along the line AA in FIG. FIG. 5 is a cross-sectional view. In FIG. 5, the lens chamber 24 is configured by disposing a ring-shaped movable link portion 23 (first member) inside a ring-shaped fixed link portion 22 (second member). A lens 21 as a holding object is held inside the portion 23. In this case, the fixed link part 22 is supported substantially parallel to the horizontal plane. The fixed link portion 22 and the movable link portion 23 are each formed in a radial direction by three ring-shaped members 24a to 24c and narrow slit-shaped notches therebetween. It is a separated structure, and the fixed link portion 22 and the movable link portion 23 can be regarded as a substantially integrated structure. Further, three link mechanism portions 25A to 25C as support mechanisms are provided inside the fixed link portion 22 at intervals of 120 °, and the movable link portion 23 is supported by the link mechanism portions 25A to 25C so as to be displaceable with a predetermined degree of freedom. Has been. Furthermore, adjustment portions 26A to 26C as displacement mechanisms for finely moving the movable link portion 23 via the link mechanism portions 25A to 25C are installed on the fixed link portion 22 near the link mechanism portions 25A to 25C, respectively. .
[0028]
FIG. 9 is a plan view in which a part of the lens chamber 24 of the present example is a cross-section taken along the line AA in FIG. 7, and in FIG. Holding portions 23a to 23c are provided, and link mechanism portions 25A to 25C are provided between the holding portions 23a to 23c and the fixed link portion 22, respectively. And the front-end | tip part of the adjustment lever 34 of adjustment part 26A-26C provided in the fixed link part 22 is each screwed (screwed) to link mechanism part 25A-25C, and adjustment lever 34 and link mechanism part 25A-. By displacing the three holding portions 23a to 23c via 25C, the two-dimensional positions and rotation angles of the movable link portion 23 and the lens 21 can be finely adjusted.
[0029]
10 is a partially enlarged view showing the structure of the link mechanism portion 25A and the adjustment portion 26A in FIG. 9. In FIG. 10, the link mechanism portion 25A is formed to face the inside of the fixed link portion 22. It is arrange | positioned between a pair of fulcrum parts 22a and 22b. The link mechanism portion 25A includes a pair of link members 27A and 27B that are rotatably connected to the fulcrum portions 22a and 22b via hinges 29A and 29B, respectively, and between the link members 27A and 27B and the holding portion 23a. Link members 28A and 28B arranged in The outer ends of the link members 28A and 28B are rotatably connected to the link members 27A and 27B via the hinges 30A and 30B, respectively, and the inner ends of the link members 28A and 28B respectively connect the hinges 31A and 31B. Via the holding portion 23a.
[0030]
On the other hand, the adjustment portion 26A is fixed to the outer surface of the fixed link portion 22 so as to cover the adjustment lever 34 screwed into the link member 27A through the through hole 22c provided in the fixed link portion 22 and the through hole 22c. And a pair of adjustment screws 35 and 36 screwed so that the adjustment lever 34 is sandwiched between the support member 32 and the adjustment member 34. In this case, the inner diameter of the through hole 22c is formed wider than the outer diameter of the adjustment lever 34, and the adjustment lever 34 is fixedly linked within the range of play of the through hole 22c by pushing and pulling the adjustment screws 35 and 36. It is configured to be able to finely move in the direction along the outer periphery of the portion 22 (the direction along the paper surface of FIG. 10). In this way, by driving a predetermined amount of one end of the adjustment lever 34 in the outer peripheral direction (circumferential direction) of the fixed link portion 22 in the adjustment portion 26A, the other end of the adjustment lever 34, that is, the link member 27A of the link mechanism portion 25A also becomes. The outer circumferential direction is driven by an amount smaller than the predetermined amount, and following this, the holding portion 23a of the movable link portion 23 is also driven by the same amount in the same direction. In this sense, the link member 27A can be regarded as a part of the displacement mechanism.
[0031]
In this way, the holding portion 23a of the movable link portion 23 can be driven by a small amount by the adjusting portion 26A. The other link mechanism units 25B and 25C and the adjustment units 26B and 26C in FIG. 9 have the same structure as the link mechanism unit 25A and the adjustment unit 26A in FIG. 10, respectively, and the movable link unit 23 is held by the adjustment units 26B and 26C, respectively. The portions 23 b and 23 c can be driven in a minute amount in the outer peripheral direction (circumferential direction) of the fixed link portion 22. In addition, the three holding portions 23a to 23c of the movable link portion 23 can be freely displaced in a direction along a straight line passing through the center and the outer peripheral portion of the fixed link portion 22 by the action of the link mechanism portions 25A to 25C. It is supported by. That is, the movable link portion 23 is restrained by two degrees of freedom (circumferential direction, height direction of the fixed link portion 22) at three locations (support portions 23a to 23c) with respect to the fixed link portion 22, The movable link portion 23 is substantially in a kinematic restraint state with respect to the fixed link portion 22.
[0032]
FIG. 11 is a conceptual diagram showing the degree of freedom of displacement of the movable link portion 23 (holding the lens 21) with respect to the fixed link portion 22 of FIG. 9, and FIG. 12 shows the link mechanism portion 25A and the adjustment portion 26A in FIG. In FIG. 12, by moving the adjustment lever 34 of the adjustment portion 26A, the link mechanism portion 25A is displaced with reference to the fulcrum portions 22a and 22b, and the holding portion 23a of the movable link portion 23 is The fixed link portion 22 actively moves in the outer peripheral direction (circumferential direction) D1. Further, since the link mechanism portion 25A includes the hinges 30A, 30B and 31A, 31B, the holding portion 23a is in a direction D2 orthogonal to the direction D1 (a straight line 11A connecting the center A of the fixed link portion 22 and the holding portion 23a ( It can move without being constrained, ie passively (in the radial direction along FIG. 11).
[0033]
In FIG. 11, the other holding portions 23b and 23c of the movable link portion 23 can passively move in the radial direction along the straight lines 11B and 11C connecting the center A of the fixed link portion 22 and the holding portions 23b and 23c, respectively. At the same time, it is actively moved by the adjusting portions 26B and 26C in the circumferential direction perpendicular to the radial direction. The straight lines 11A, 11B, and 11C sequentially intersect at an intersection angle of 120 ° (or 60 °).
[0034]
In this case, the distance between the fulcrum part 22a and the link member 27A (exactly the distance between the hinge 29A and the hinge 30A in FIG. 12) is a, and the distance from the fulcrum part 22a to the end of the adjustment lever 34 (exactly 10) (space between the hinge 29A and the adjusting screws 35 and 36) is b, and the moving amount of the end of the adjusting lever 34 in the circumferential direction is s1, the moving amount s2 of the holding portion 23a of the movable link portion 23 is It becomes as follows. In the state of FIG. 11, a / b is approximately 1/3.
[0035]
s2 = (a / b) s1 (2)
If the intersection of two straight lines along the direction in which the holding portions 23b and 23c are actively moved is B, the movable link portion 23 is rotated around the point B by the movement of the adjustment lever 34 of the adjustment portion 26A. Exercise. Also in this example, in FIG. 11, the triangle having the points A, B, and the holding unit 23 b (or 23 c) as vertices is a right triangle obtained by dividing an equilateral triangle into two equal parts. The length of the connecting line segment is twice the line segment (circumferential radius) connecting the point A and the holding portion 23b (or 23c). Therefore, when the movement amount of the holding portion 23a is s2, the movement amount s3 of the center of the movable link portion 23 is the same direction and is 2/3. That is, the following relationship is established using the equation (2).
[0036]
s3 = (2/3) s2
= (2/3) (a / b) s1 (3)
That is, in this example as compared with the embodiment of FIG. 4, the movable link portion with respect to the moving amount s1 of the adjusting lever 34 (the moving amount of the active stage 8 in FIG. 4) by the reduction ratio (a / b) of the adjusting lever 34. 23 (movable table 2 in FIG. 4) has a smaller amount of movement s3 at the center. For this reason, in this example, the movable link portion 23 and the lens 21 can be positioned with a smaller resolution and higher accuracy.
[0037]
Further, when the holding portion 23a is driven in the circumferential direction in this way, as shown in FIG. 13, the other two holding portions 23b and 23c are turned into straight lines 11B and 11C by the action of the link mechanism portions 25B and 25C. Move along.
13 is a view showing a state where the holding portion 23a is moved in the circumferential direction by s2 from the state shown in FIG. 11, and FIG. 14 is a view showing a state where the adjustment lever 34 is moved from the state shown in FIG. 14, the adjustment lever 34 of the adjustment portion 26A is moved to the position P1, so that the link mechanism portion 25A is displaced in a parallelogram shape, and the holding portion 23a is moved to the position P2 along the circumferential direction. Next, in FIG. 13, as the holding part 23a moves to the position P2, the other holding parts 23b and 23c move to the position P3 along the straight line 11B and the position P4 along the straight line 11C, respectively. The movable link portion 23 as a whole has moved to position P5 by s3.
[0038]
Since the movable link portion 23 is in a kinematic restraint state with respect to the fixed link portion 22 in this way, even if the movable link portion 23 is moved in the direction orthogonal to the straight line 11A using the adjustment portion 26A, the movable link portion 23 is used. There will be no deformation or stress. Similarly, even when the movable link portion 23 is moved in the direction orthogonal to the straight lines 11B and 11C using the other adjustment portions 26B and 26C, no deformation or stress occurs in the movable link portion 23. For this reason, no deformation / distortion or stress occurs in the lens 21 held by the movable link portion 23. Further, the directions in which the movable link unit 23 is driven by the adjusting units 26A to 26C are independent of each other, and the orthogonality of the movable link unit 23 is obtained by appropriately combining the driving amounts of the three adjusting units 26A to 26C. The amount of displacement in the two directions and the rotation angle about the axis perpendicular to the upper surface of the fixed link portion 22 can be freely determined.
[0039]
In this example as well, when it is not necessary to finely adjust the rotation angle of the lens 21, a drive mechanism by the adjustment lever 34 is provided at two of the three link mechanism portions 25A to 25C in FIG. Thus, the drive mechanism may be omitted at the remaining one location. As a result, the drive mechanism can be simplified.
Moreover, you may make it provide the encoder (for example, rotary encoder connected with the adjustment screw 35) for measuring the drive amount of the adjustment lever 34 of three adjustment parts 26A-26C of FIG. In addition, in FIG. 9, a high-resolution gap sensor such as a capacitance type is installed in the three slit sections 24 a to 24 c, and the displacement of the movable link section 23 with respect to the fixed link section 22 with three degrees of freedom is performed. May be directly measured. At this time, since there is no deformation of the movable link portion 23 in this example, the position and rotation angle of the movable link portion 23 (and thus the lens 21) can be measured with high accuracy from three gaps. Therefore, the position and rotation angle of the lens 21 can be adjusted to a desired state with high accuracy.
[0040]
[Third Embodiment]
Next, a third embodiment of the present invention will be described with reference to FIGS. In this example, the present invention is applied to a holding mechanism having high rigidity for holding a lens (optical element) at the tip of a projection optical system mounted on a projection exposure apparatus.
15 is a perspective view showing the holding mechanism of this example, and FIG. 16 is an exploded perspective view showing the holding mechanism. In FIGS. 15 and 16, the flat ring-shaped fixing table 41 (second member) is shown in FIG. Three connecting portions 45A, 45B, and 45C are installed at equal angular intervals (120 ° intervals) on the outer peripheral portion of the upper surface, and a ring-shaped movable table 42 (first member) via bolts 54 on the connecting portions 45A to 45C. The lens chamber 43 holding the lens 44 is fixed on the movable table 42. The fixed table 41 is supported on the upper end of a lens barrel (not shown) so as to be substantially parallel to the horizontal plane. Of the three connecting portions 45A to 45C in this example, two connecting portions 45A and 45B are active connecting portions each having a micrometer head and capable of moving the movable table 42 in a predetermined direction. The part 45C is a passive connection part (details will be described later).
[0041]
17A is a plan view showing the first connecting portion 45A of FIG. 16, and FIG. 17B is a front view of FIG. 17A (however, the fixed table 41 and the movable table 42 are shown in a sectional view). 17 (A) and 17 (B), the connecting portion 45A includes a first V-groove block 46 fixed on the fixing table 41 via a bolt 49, and the V-groove block 46. And a pair of base members 47 and 48 fixed on the fixed table 41 via bolts 49 so as to sandwich each other, and formed on the V groove block 46 in a one-dimensional direction (referred to as “direction D1”). And a ceramic high-rigidity sphere 50 placed rotatably in the V-groove portion. Further, the connecting portion 45A attaches the micrometer head 51 and the reaction force rod 52 fixed to the base members 47 and 48 so as to sandwich the sphere 50 along the direction D1, respectively, and the reaction force rod 52 on the micrometer head 51 side. A compression coil spring 55 and a stopper 56 (see FIG. 18A) attached to the base member 48 for urging, and a slidable installation along the direction D2 perpendicular to the direction D1 on the upper surface of the sphere 50. A second V-groove block 53, and the V-groove block 53 is fixed to the movable table 42 via a bolt 54.
[0042]
18A is a cross-sectional view taken along line CC in FIG. 17A, and FIG. 18B is a cross-sectional view taken along line DD in FIG. 17B. FIG. As shown, a V-groove along the direction perpendicular to the direction D1 (direction D2 in FIG. 18B) is formed at the contact portion of the connecting portion 45A with the sphere 50 of the second V-groove block 53. As shown in FIG. 18B, the second V-groove block 53 and the movable table 42 can freely move on the upper surface of the sphere 50 in the direction D2 without any restraining force. In FIG. 18A, the reaction force rod 52 is constantly urged toward the micrometer head 51 by the compression coil spring 55, so that the sphere 50 is moved by pushing and pulling the spindle of the micrometer head 51. It can be actively moved along the first V-groove block 46 in the direction D1. In this case, since the second V-groove block 53 and the sphere 50 are arranged so as not to be relatively displaced in the direction D1, when the sphere 50 moves in the direction D1, at the same time, the second V-groove block 53 and the sphere 50 are interposed via the second V-groove block 53. The movable table 42 also moves in the direction D1 with respect to the fixed table 41.
[0043]
In this example, the V-groove block 53 connected to the movable table 42, the sphere 50, and the V-groove block 46 connected to the fixed table 41 are regarded as one “support mechanism”, and the sphere 50 is pushed and pulled. The micrometer head 51, the reaction force rod 52, the compression coil spring 52, and the stopper 56 can be regarded as one “displacement mechanism”.
[0044]
Returning to FIGS. 17A and 17B, the connecting portion 45 </ b> A is movable with respect to the fixed table 41 via the sphere 50 and the V-groove block 53 by pushing and pulling the sphere 50 with the micrometer head 51. The table 42 can be actively moved along the direction D1. Further, since the V-groove block 53 can freely move in the direction D2 with respect to the sphere 50, the movable table 42 is passively moved without any restraining force along the direction D2 orthogonal to the direction D1. Is supported so that it can be moved. The direction D1 and the direction D2 correspond to the circumferential direction along the outer periphery of the fixed table 41 in FIG. 16 and the radial direction along the straight line connecting the center of the fixed table 41 and the connecting portion 45A, respectively.
[0045]
Returning to FIG. 16, the second connecting portion 45B is configured in the same manner as the first connecting portion 45A. In the second connecting portion 45B, the movable table 42 is moved in the circumferential direction with respect to the fixed table 41 by the micrometer head. The movable table 42 can be passively moved in the radial direction with respect to the fixed table 41 without any restraining force. On the other hand, the third connecting portion 45C has a configuration in which the head portion of the micrometer head 51 is removed from the connecting portion 45A in FIG. 17. In the third connecting portion 45C, the movable table 42 is located with respect to the fixed table 41. Although it can move passively without any restraining force in the radial direction, the movable table 42 is fixed in the circumferential direction. As a result, in the holding mechanism of this example, the movable table 42 and the lens chamber 43 can be actively moved in the circumferential direction at two locations with respect to the fixed table 41 via the connecting portions 45A to 45C, and at three locations. Since the movable table 42 and the lens chamber 43 can be passively moved in the radial direction, the position of the movable table 42 and the lens chamber 43 in the two orthogonal directions can be set with respect to the fixed table 41 without applying deformation and stress to the movable table 42 and the lens chamber 43. It can be adjusted with high accuracy.
[0046]
In this example as well, rotary encoders are installed in the micrometer heads 51 of the two connecting portions 45A and 45B, and the amount of movement of the movable table 42 in the circumferential direction is monitored. It is desirable to obtain the amount of displacement of the center of the movable table 42 with respect to the center of 41. By setting the displacement amount as a target value, the position of the movable table 42 and thus the lens chamber 43 can be accurately set as the target value.
[0047]
In FIG. 16, the third connecting portion 45C may also be provided with a function capable of actively moving the movable table 42 in the circumferential direction. Thereby, not only the position of the movable table 42 in two orthogonal directions with respect to the fixed table 41 but also the rotation angle can be adjusted.
Next, an example of a projection exposure apparatus to which the holding mechanism of the embodiment of FIGS. 15 and 16 is applied will be described with reference to FIG.
[0048]
FIG. 19 shows a schematic configuration of the projection exposure apparatus of this example. In FIG. 19, an ultraviolet pulse light IL as an exposure beam from an ArF excimer laser light source 61 (exposure light source) narrowed with an oscillation wavelength of 193 nm. Enters a variable dimmer 66 as an optical attenuator through a beam matching unit (BMU) 62 and a light shielding pipe 63. An exposure controller 87 for controlling the exposure amount of the resist on the wafer controls the start and stop of the light emission of the ArF excimer laser light source 61 and the output determined by the oscillation frequency and the pulse energy. The light rate is adjusted stepwise or continuously. As an exposure light source, F₂A laser (wavelength 157 nm), a KrF excimer laser (wavelength 248 nm), a semiconductor laser harmonic generator, or the like can also be used.
[0049]
The ultraviolet pulse light IL that has passed through the variable dimmer 66 enters a fly-eye lens 71 as an optical integrator through a beam shaping optical system including lens systems 67A and 67B. An aperture stop system 72 of an illumination system is disposed on the exit surface of the fly eye lens 71. In the aperture stop system 72, a circular aperture stop for normal illumination, an aperture stop for modified illumination composed of a plurality of eccentric small apertures, an aperture stop for annular illumination, and the like are switchably disposed. The ultraviolet pulse light IL emitted from the fly-eye lens 71 and passing through a predetermined aperture stop in the aperture stop system 72 is incident on the beam splitter 68 having a high transmittance and a low reflectivity. The ultraviolet pulse light reflected by the beam splitter 68 is incident on an integrator sensor 69 composed of a photoelectric detector, and the detection signal of the integrator sensor 69 is supplied to the exposure controller 87. The incident light amount of the ultraviolet pulse light IL to the projection optical system PL and its integrated value are monitored indirectly.
[0050]
The ultraviolet pulse light IL transmitted through the beam splitter 68 is incident on a fixed illumination field stop (fixed blind) 75A in the reticle blind mechanism 76 via the mirror 73 and the imaging lens system 74. The fixed blind 75A, for example, as disclosed in Japanese Patent Laid-Open No. 4-196513, has a linear slit shape or a rectangular shape (hereinafter, referred to as a direction perpendicular to the scanning exposure direction at the center in the circular field of the projection optical system PL). (It is collectively referred to as a “slit shape”). Further, in the reticle blind mechanism 76, a movable blind 75B is provided that can change the width of the illumination area in the scanning direction in order to prevent unnecessary exposure at the start and end of scanning exposure, in addition to the fixed blind 75A. This movable blind 75B reduces the scanning movement stroke of the reticle stage and the width of the light shielding band of the reticle R.
[0051]
The ultraviolet pulse light IL shaped into a slit shape by the fixed blind 75A of the reticle blind mechanism 76 is fixed on the circuit pattern region of the reticle R via the sub condenser lens system 77, the reflecting mirror 78, and the main condenser lens system 79. An illumination area similar to the slit-like opening of the blind 75A is irradiated with a uniform intensity distribution. That is, the arrangement surface of the opening of the fixed blind 75A or the opening of the movable blind 75B is substantially conjugated with the pattern surface of the reticle R by the synthesis system of the sub-condenser lens system 77 and the main condenser lens system 79.
[0052]
Under the ultraviolet pulsed light IL, an image of the circuit pattern in the illumination area of the reticle R is projected at a predetermined projection magnification β (β is, for example, 1/4, 1/5, etc.) via the bilateral telecentric projection optical system PL. Then, the image is transferred to the slit-shaped exposure region of the resist layer on the wafer W arranged on the imaging surface of the projection optical system PL. Reticle R and wafer W can also be referred to as a first object and a second object, respectively. The projection optical system PL of this example is a dioptric system (refractive system), but a plurality of refractions along one optical axis as disclosed in, for example, International Publication (WO) 00/39623. Needless to say, a straight cylindrical catadioptric system (catadioptric system) configured by arranging a lens and two concave mirrors each having an opening in the vicinity of the optical axis can also be used. Hereinafter, the Z-axis is taken in parallel to the optical axis AX of the projection optical system PL, and in the scanning direction of the reticle R and the wafer W during exposure in a plane perpendicular to the Z-axis (here, the direction parallel to the paper surface of FIG. 19). A description will be given by taking the X axis and taking the Y axis in the non-scanning direction (here, the direction perpendicular to the paper surface of FIG. 19) orthogonal to the scanning direction.
[0053]
The holding mechanism of the embodiment shown in FIGS. 15 and 16 is used to hold the lens at the tip end on the reticle side of the projection optical system PL of this example. That is, the movable table 42 is supported on the tip of the lens barrel 88 of the projection optical system PL via the connecting portions 45A to 45C, and the lens chamber 43 in which the lens is housed is held on the movable table 42. In other words, the lens barrel 88 of this example also serves as the fixed table 41 of FIG. 16, and the circumferential direction (outer peripheral direction) of the movable table 42 with respect to the lens barrel 88 at each of the two connection portions 45A and 45B. Can be finely adjusted in the X and Y positions of the movable table 42 and the lens chamber 43 with respect to the lens barrel 88. That is, the eccentric state of the lens in the lens chamber 43 can be adjusted. In the connecting portions 45A to 45C of the present example, the movable table 42 can passively move in the radial direction around the optical axis AX. Therefore, when adjusting the position of the movable table 42 (lens chamber 43) as such, The movable table 42 and the lens chamber 43 are not deformed or stressed. Therefore, the position of the lens in the lens chamber 43 can be adjusted to the target position with high accuracy. This adjustment is performed, for example, during assembly adjustment of the projection optical system PL of this example and during maintenance.
[0054]
Next, the reticle R is sucked and held on the reticle stage 80, and the reticle stage 80 is placed on the reticle base 81 so that it can move at a constant speed in the X direction, and can finely move in the X, Y, and rotational directions. Has been. The two-dimensional position and rotation angle of reticle stage 80 (reticle R) are measured in real time by a laser interferometer in drive control unit 82. Based on this measurement result and control information from the main control system 83 comprising a computer that controls the overall operation of the apparatus, the drive motor (linear motor, voice coil motor, etc.) in the drive control unit 82 is moved to the reticle stage 80. The scanning speed and position are controlled.
[0055]
On the other hand, the wafer W is sucked and held on the Z tilt stage 84Z via the wafer holder WH, and the Z tilt stage 84Z moves on the XY stage 84XY that moves two-dimensionally along the XY plane parallel to the image plane of the projection optical system PL. The wafer stage 84 is composed of the Z tilt stage 84Z and the XY stage 84XY. The Z tilt stage 84Z controls the focus position (Z direction position) and tilt angle of the wafer W to adjust the surface of the wafer W to the image plane of the projection optical system PL by the auto focus method and the auto leveling method. The XY stage 84XY performs constant speed scanning of the wafer W in the X direction and stepping in the X direction and the Y direction. The two-dimensional position and rotation angle of the Z tilt stage 84Z (wafer W) are measured in real time by a laser interferometer in the drive control unit 85. Based on this measurement result and control information from the main control system 83, a drive motor (such as a linear motor) in the drive control unit 85 controls the scanning speed and position of the XY stage 84XY.
[0056]
At the time of scanning exposure, the XY stage 84XY is moved in synchronization with the reticle R being scanned in the + X direction (or -X direction) at the speed Vr with respect to the illumination region of the ultraviolet pulsed light IL through the reticle stage 80. Then, the wafer W is scanned in the −X direction (or + X direction) at a speed β · Vr (β is the projection magnification from the reticle R to the wafer W) with respect to the exposure area of the pattern image of the reticle R. The scanning directions of the reticle R and the wafer W are opposite because the projection optical system PL of this example performs reverse projection.
[0057]
Further, an irradiation amount monitor 86 composed of a photoelectric detector is installed in the vicinity of the wafer holder WH on the Z tilt stage 84Z of this example, and a detection signal of the irradiation amount monitor 86 is also supplied to the exposure controller 87. The irradiation amount monitor 86 includes a light receiving surface large enough to cover the entire exposure area by the projection optical system PL, and drives the XY stage 84XY to set the light receiving surface at a position covering the exposure area of the projection optical system PL. Thus, the amount of ultraviolet pulsed light IL that has passed through the projection optical system PL can be measured. In this example, the transmittance of the projection optical system PL is measured using detection signals from the integrator sensor 69 and the dose monitor 86.
[0058]
In this example, since the ArF excimer laser light source 61 is used, each illumination light path from the pipe 63 to the variable dimmer 66, the lens systems 67A and 67B, and further from the fly-eye lens 71 to the main condenser lens system 79 is provided. A sub-chamber 64 is provided for shielding from the outside air, and the entire inside of the sub-chamber 64 is dry nitrogen gas (N₂) Or a gas that transmits the exposure beam such as helium gas (hereinafter referred to as “purge gas”). Similarly, the purge gas is also supplied to the space inside the lens barrel of the projection optical system PL (the space between the plurality of lens elements), the space surrounding the reticle R (reticle chamber), and the space surrounding the wafer W (wafer chamber). The As a result, high illuminance can be obtained on the wafer W even when substantially vacuum ultraviolet light is used as the exposure beam, such as ArF excimer laser light.
[0059]
Moreover, although the above embodiment is applied to the case where the present invention supports a lens as a refractive member, the present invention also applies to a case where a reflecting member such as a concave mirror or a mirror for bending an optical path is supported. Needless to say, it can be applied. For this reason, when the present invention is applied to a mechanism for supporting an optical member of an exposure apparatus, the exposure light (exposure beam) is not limited to the above-described ultraviolet light. For example, a laser plasma light source or an SOR (Synchrotron Orbital Radiation) ring EUV light in the soft X-ray region (wavelength 5 to 50 nm) generated from the laser beam may be used. In the EUV exposure apparatus, the illumination optical system and the projection optical system are each composed of only a plurality of reflective optical elements, and the support object is also a reflective optical element.
[0060]
And a semiconductor device can be manufactured from the wafer W of FIG. The semiconductor device includes a step of performing functional / performance design of the device, a step of manufacturing a reticle based on this step, a step of producing a wafer from a silicon material, and a reticle pattern by the projection exposure apparatus of the above-described embodiment. It is manufactured through an exposure step, a device assembly step (including a dicing process, a bonding process, and a packaging process), an inspection step, and the like.
[0061]
The application of the exposure apparatus is not limited to an exposure apparatus for manufacturing semiconductor elements, for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display, The present invention can be widely applied to an exposure apparatus for manufacturing various devices such as an image sensor (CCD or the like), a micromachine, a thin film magnetic head, or a DNA chip. Furthermore, the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a photolithographic process.
[0062]
In addition, this invention is not limited to the above-mentioned embodiment, Of course, a various structure can be taken in the range which does not deviate from the summary of this invention.
[0063]
【The invention's effect】
According to the present invention, since the movable part is substantially in a kinematic constrained state with respect to the fixed part, the position of an optical element such as an illumination optical system of the projection exposure apparatus or a specific lens element constituting the projection optical system is determined. There is an advantage that adjustment can be performed with high accuracy and without side effects such as deformation and distortion of the optical element.
[0064]
Further, according to the projection optical system and the exposure apparatus of the present invention, the position of the optical element in the projection optical system can be finely adjusted with high accuracy, so that a finer pattern can be projected and exposed more accurately, and the degree of integration is high. Various devices can be manufactured with high accuracy.
[Brief description of the drawings]
FIG. 1 is a perspective view showing an optical element holding mechanism according to a first embodiment of the present invention.
2 is an exploded perspective view showing the holding mechanism of FIG. 1. FIG.
3 is a perspective view showing a connecting portion 3A in FIG. 2. FIG.
4 is a plan view showing a relationship between connecting portions 3A to 3C on the fixed table 1 in FIG. 1 and a movable table 2 thereon. FIG.
FIG. 5 is a perspective view showing a lens chamber according to a second embodiment of the present invention.
6 is a plan view showing the lens chamber of FIG. 5. FIG.
7 is a front view showing the lens chamber of FIG. 6. FIG.
8 is a cross-sectional view taken along line AA in FIG.
9 is a plan view showing a part of the lens chamber of FIG. 6 cut out along the line BB of FIG. 7;
10 is a partially enlarged view showing the link mechanism portion 25A and the adjustment portion 26A of FIG.
11 is a conceptual diagram showing the degree of freedom of displacement of the movable link portion 23 (holding the lens 21) with respect to the fixed link portion 22 of FIG.
12 is a partially enlarged view showing the link mechanism section 25A and the adjusting section 26A in FIG.
13 is a view showing a state in which the holding portion 23a is moved in the circumferential direction from the state shown in FIG.
14 is a view showing a state in which the adjustment lever 34 is moved from the state of FIG.
FIG. 15 is a perspective view showing a holding mechanism according to a third embodiment of the present invention.
16 is an exploded perspective view showing the holding mechanism of FIG. 15;
17A is a plan view showing the connecting portion 45A of FIG. 16, and FIG. 17B is a front view showing the connecting portion 45A of FIG. 17A.
18A is a cross-sectional view taken along line CC in FIG. 17A, and FIG. 18B is a cross-sectional view taken along line DD in FIG. 17B.
FIG. 19 is a block diagram showing an example of a projection exposure apparatus provided with a holding mechanism according to an embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Fixed table, 2 ... Movable table, 3A-3C ... Connection part, 4A-4C ... Pivot, 5A-5C ... Tip part, 6 ... Fixed stage, 7 ... Adjustment screw, 8 ... Active stage, 9 ... Passive stage, DESCRIPTION OF SYMBOLS 10 ... Connection pivot, 21 ... Lens, 22 ... Fixed link part, 23 ... Movable link part, 24 ... Lens chamber, 25A-25C ... Link mechanism part, 26A-26C ... Adjustment part, 34 ... Adjustment lever, 41 ... Fixed table 42 ... movable table, 43 ... lens chamber, 45A to 45C ... connecting part, 46, 53 ... V groove block, 50 ... sphere

Claims (12)

A positioning method for moving a first member holding an optical element relative to a second member and positioning the optical element at a predetermined position,
The first member is supported via three support mechanisms that are displaced in a one-dimensional direction with respect to the second member,
Of the three support mechanisms, one support mechanism is displaced in a direction intersecting the one-dimensional direction,
As the one support mechanism is displaced in the intersecting direction, the remaining two support mechanisms are respectively displaced in the one-dimensional direction to position the optical element at the predetermined position. Optical element positioning method. The optical element positioning method according to claim 1, wherein the one-dimensional direction is a direction toward a center of the second member. The three support mechanisms are arranged at positions that substantially divide the circumference into three equal parts,
The optical element positioning method according to claim 1, wherein the one-dimensional direction in which the three support mechanisms are displaced is a direction toward the center of the circumference. The three support mechanisms are each displaced in a direction intersecting the one-dimensional direction, and the first member is positioned with respect to the second member with three degrees of freedom in a translational direction and a rotational direction within a predetermined plane. the method of positioning an optical element according to any one of claims 1 to 3, characterized in. A positioning device that moves a first member holding an optical element with respect to a second member and positions the optical element at a predetermined position,
Three support mechanisms disposed between the second member and the first member, each displaced in a one-dimensional direction;
An optical element positioning apparatus comprising: a displacement mechanism that displaces at least one of the three support mechanisms in a direction intersecting the one-dimensional direction. 6. The optical element positioning apparatus according to claim 5, wherein the one-dimensional direction is a direction toward the center of the second member. The three support mechanisms are arranged at positions that substantially divide the circumference into three equal parts,
6. The optical element positioning device according to claim 5 , wherein the one-dimensional direction in which the three support mechanisms are displaced is a direction toward the center of the circumference. The optical element positioning device according to claim 5 , wherein the displacement member is provided in each of the three support mechanisms. The first member, the second member, and the three support mechanisms are configured substantially integrally,
9. The optical element positioning device according to claim 5, wherein the three support mechanisms and the displacement member corresponding to the three support mechanisms are configured by a link mechanism using an elastic hinge. The support mechanism includes a first V-groove block fixed to the first member and having a groove along the one-dimensional direction;
A ball disposed in the first V-groove block;
A second V-groove block fixed to the second member and provided with a groove along a direction intersecting the one-dimensional direction, and the ball is disposed in the groove;
9. The optical element positioning device according to claim 5 , wherein the displacement mechanism includes a drive member that moves the ball with respect to the second V-groove block. 10. A projection optical system comprising a plurality of optical elements and projecting an image of a pattern of a first object onto a second object,
A device for positioning an optical element according to any one of claims 5 to 10 ,
A projection optical system, wherein at least one of a plurality of optical elements constituting the projection optical system is positioned by the positioning device. An exposure apparatus comprising the projection optical system according to claim 11 , wherein an image of a pattern formed on a mask is transferred onto a substrate via the projection optical system.

Images