JP4130330B2 - 光微細加工及び多機能センサ用感光性高分子及びこれを含む感光性樹脂組成物 - Google Patents

光微細加工及び多機能センサ用感光性高分子及びこれを含む感光性樹脂組成物 Download PDF

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JP4130330B2
JP4130330B2 JP2002126938A JP2002126938A JP4130330B2 JP 4130330 B2 JP4130330 B2 JP 4130330B2 JP 2002126938 A JP2002126938 A JP 2002126938A JP 2002126938 A JP2002126938 A JP 2002126938A JP 4130330 B2 JP4130330 B2 JP 4130330B2
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Prior art keywords
polymer
photosensitive polymer
group
photosensitive
quinizarin
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JP2002126938A
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Japanese (ja)
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JP2003255543A (ja
Inventor
シュク ヒュン リー
チャン ウー リー
ホウ スン ユン
ヨン ブン キム
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シュク ヒュン リー
チャン ウー リー
ホウ スン ユン
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/18—Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
JP2002126938A 2002-02-27 2002-04-26 光微細加工及び多機能センサ用感光性高分子及びこれを含む感光性樹脂組成物 Expired - Fee Related JP4130330B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR2002-010431 2002-02-27
KR10-2002-0010431A KR100491893B1 (ko) 2002-02-27 2002-02-27 광미세가공 및 다기능 센서용 감광성 고분자 및 이를포함하는 감광성 수지 조성물

Publications (2)

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JP2003255543A JP2003255543A (ja) 2003-09-10
JP4130330B2 true JP4130330B2 (ja) 2008-08-06

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JP2002126938A Expired - Fee Related JP4130330B2 (ja) 2002-02-27 2002-04-26 光微細加工及び多機能センサ用感光性高分子及びこれを含む感光性樹脂組成物

Country Status (2)

Country Link
JP (1) JP4130330B2 (ko)
KR (1) KR100491893B1 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003115424A (ja) * 2001-10-03 2003-04-18 Nec Corp 半導体装置およびその識別方法、並びに半導体装置の製造装置
DE10245128A1 (de) * 2002-09-27 2004-04-08 Infineon Technologies Ag Fotoempfindlicher Lack zum Beschichten eines Substrates und Verfahren zum Belichten des mit dem Lack beschichteten Substrates
JP5402266B2 (ja) * 2008-06-10 2014-01-29 三菱化学株式会社 光反応性組成物、光学材料、ホログラム記録層形成用組成物、ホログラム記録材料およびホログラム記録媒体
KR101266298B1 (ko) * 2008-11-04 2013-05-22 제일모직주식회사 (메타)아크릴레이트계 화합물, 이를 포함하는 감광성 수지 조성물 및 이미지 센서
JP5954269B2 (ja) * 2013-07-10 2016-07-20 信越化学工業株式会社 ポジ型レジスト材料及びこれを用いたパターン形成方法
JP6520830B2 (ja) * 2016-05-31 2019-05-29 信越化学工業株式会社 ポリマー、ポジ型レジスト材料、及びパターン形成方法
JP6609225B2 (ja) * 2016-07-22 2019-11-20 信越化学工業株式会社 レジスト材料及びこれを用いたパターン形成方法
WO2018085372A1 (en) * 2016-11-01 2018-05-11 Milliken & Company Leuco polymers as bluing agents in laundry care compositions

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4455364A (en) * 1981-11-14 1984-06-19 Konishiroku Photo Industry Co., Ltd. Process for forming metallic image, composite material for the same
DE3269491D1 (en) * 1981-11-30 1986-04-03 Ciba Geigy Ag Photosensitive polymers
US4888263A (en) * 1985-12-19 1989-12-19 Ricoh Co., Ltd. Color toner for electrophotography
KR890003347A (ko) * 1987-08-11 1989-04-14 조남선 시력보호를 위한 명시거리 유지장치
JPH0421490A (ja) * 1990-05-16 1992-01-24 Nitto Denko Corp 熱転写シート
US5650399A (en) * 1993-08-23 1997-07-22 The Research Foundation Of State University Of New York Reactive anthraquinone derivatives and conjugates thereof
BR9610547A (pt) * 1995-09-12 1999-07-06 Dow Chemical Co Compostos aromáticos substituídos com etinila síntese polímeros e usos dos mesmos
JP3736221B2 (ja) * 1998-08-28 2006-01-18 凸版印刷株式会社 カラーフィルターおよびこれを備えた液晶表示装置
JP2002075646A (ja) * 2000-08-29 2002-03-15 Fuji Xerox Co Ltd 有機電界発光素子
KR100458498B1 (ko) * 2001-03-23 2004-12-03 이석현 전기전도도와 현상성을 향상시키는 산반응 분해성작용기가 치환된 전도성 고분자 및 그의 조성물
KR100491894B1 (ko) * 2002-02-27 2005-05-27 이석현 칼라이미지 및 센서용 감광성 고분자 및 이를 포함하는감광성 수지 조성물

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KR20030070957A (ko) 2003-09-03
JP2003255543A (ja) 2003-09-10
KR100491893B1 (ko) 2005-05-27

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