JP4127104B2 - 光重合開始剤、新規化合物および光硬化性組成物 - Google Patents

光重合開始剤、新規化合物および光硬化性組成物 Download PDF

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Publication number
JP4127104B2
JP4127104B2 JP2003100650A JP2003100650A JP4127104B2 JP 4127104 B2 JP4127104 B2 JP 4127104B2 JP 2003100650 A JP2003100650 A JP 2003100650A JP 2003100650 A JP2003100650 A JP 2003100650A JP 4127104 B2 JP4127104 B2 JP 4127104B2
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group
structural formula
compound
ester
methyl
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JP2003327610A (ja
JP2003327610A5 (enExample
Inventor
アルター・ラホビッツ
カイウベ・ガウドル
ジェンス・フラビッツ
ゲルワルド・エフ・グラーエ
ユウ・ジン
ウ・グァンホイ
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DIC Corp
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DIC Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
JP2003100650A 2002-04-03 2003-04-03 光重合開始剤、新規化合物および光硬化性組成物 Expired - Fee Related JP4127104B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02007306.0 2002-04-03
EP02007306 2002-04-03

Publications (3)

Publication Number Publication Date
JP2003327610A JP2003327610A (ja) 2003-11-19
JP2003327610A5 JP2003327610A5 (enExample) 2006-05-18
JP4127104B2 true JP4127104B2 (ja) 2008-07-30

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JP2003100650A Expired - Fee Related JP4127104B2 (ja) 2002-04-03 2003-04-03 光重合開始剤、新規化合物および光硬化性組成物

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Country Link
US (1) US7166648B2 (enExample)
EP (1) EP1490412B1 (enExample)
JP (1) JP4127104B2 (enExample)
CN (1) CN100473667C (enExample)
CA (1) CA2479026C (enExample)
DE (1) DE60336306D1 (enExample)
ES (1) ES2359809T3 (enExample)
WO (1) WO2003082929A1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
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CA2563358A1 (en) * 2004-04-21 2005-11-17 Ashland Licensing And Intellectual Property Llc Radiation-curable michael addition resins having built-in photoinitiators
US7799943B2 (en) * 2005-06-24 2010-09-21 Rohm And Haas Company Method for promoting Michael addition reactions
JP4781048B2 (ja) * 2005-08-30 2011-09-28 日本曹達株式会社 ジ置換β−ケトエステル類の製造方法
JP4597145B2 (ja) * 2006-12-18 2010-12-15 ナトコ株式会社 活性エネルギー線重合開始剤、それを含有する重合性組成物及びその硬化物
US7705064B2 (en) * 2007-07-23 2010-04-27 Henkel Corporation Photosensitive compounds, photopolymerizable compositions including the same, and methods of making and using the same
JP5550814B2 (ja) * 2008-03-05 2014-07-16 株式会社Ａｄｅｋａ カルバゾリル基を有するβ−ジケトン化合物及び該化合物を用いた光重合開始剤
JP4726868B2 (ja) * 2007-08-01 2011-07-20 株式会社Ａｄｅｋａ アルカリ現像性感光性樹脂組成物
JP5065123B2 (ja) * 2008-03-31 2012-10-31 株式会社Ａｄｅｋａ アルカリ現像性感光性樹脂組成物
WO2009017064A1 (ja) * 2007-08-01 2009-02-05 Adeka Corporation アルカリ現像性感光性樹脂組成物及びβ－ジケトン化合物
JP2010218605A (ja) 2009-03-13 2010-09-30 Toshiba Corp パターン転写用紫外線硬化性樹脂材料、及びこれを用いた磁気記録媒体の製造方法
JP4543117B1 (ja) * 2009-03-13 2010-09-15 株式会社東芝 パターン転写用紫外線硬化性樹脂材料、及びこれを用いた磁気記録媒体の製造方法
JP2010218597A (ja) * 2009-03-13 2010-09-30 Toshiba Corp パターン転写用樹脂スタンパ、及びこれを用いた磁気記録媒体の製造方法
JP4729114B2 (ja) * 2009-03-18 2011-07-20 株式会社東芝 磁気記録媒体の製造方法
TW201224653A (en) * 2010-09-01 2012-06-16 Sumitomo Chemical Co Photosensitive resin composition
CN102079707B (zh) * 2011-01-25 2013-10-30 深圳市有为化学技术有限公司 均三甲苯基芳香酮化合物、其制备方法以及光引发剂
JP6150987B2 (ja) * 2012-05-24 2017-06-21 富士フイルム株式会社 非水二次電池用電解液及び二次電池
WO2015004566A2 (en) * 2013-07-08 2015-01-15 Basf Se Liquid bisacylphosphine oxide photoinitiator
WO2017106187A1 (en) * 2015-12-14 2017-06-22 University Of Maryland, College Park Multicolor photolithography materials and methods
TWI730037B (zh) * 2016-01-26 2021-06-11 日商富士軟片和光純藥股份有限公司 光硬化方法，及用於該光硬化方法之化合物和組成物
CN109103489B (zh) * 2017-06-21 2020-05-05 宁德时代新能源科技股份有限公司 一种电解液及电池
CN114127043A (zh) * 2019-07-17 2022-03-01 阿尔萨达股份公司 用于制备脱色的乙酰乙酰化乙二醇的方法
WO2021205326A1 (en) * 2020-04-08 2021-10-14 3M Innovative Properties Company Curable compositions and methods of using the same
US12209172B2 (en) 2020-04-08 2025-01-28 3M Innovative Properties Company Curable compositions and methods of using the same

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
US3974052A (en) * 1973-12-06 1976-08-10 Imperial Chemical Industries Limited Photopolymerizable compositions containing triketone/alcohol adducts as photosensitizers
CH598288A5 (enExample) * 1975-12-23 1978-04-28 Ciba Geigy Ag
US4151056A (en) * 1977-09-29 1979-04-24 Union Carbide Corporation Radiation curable coating compositions containing alkanediones or cycloalkanediones
JPH04264054A (ja) * 1990-10-15 1992-09-18 Lonza Ag ３−オキソカルボン酸エステルの製造方法
CH691970A5 (de) * 1996-03-04 2001-12-14 Ciba Sc Holding Ag Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.
US6025410A (en) * 1997-09-19 2000-02-15 Ashland Inc. Liquid oligomers containing acrylate unsaturation
US5945489A (en) * 1997-09-19 1999-08-31 Ashland, Inc. Liquid oligomers containing unsaturation
GB2335424A (en) * 1998-03-20 1999-09-22 Courtaulds Coatings Acrylic monomers and polymers prepared therefrom
KR20010075340A (ko) * 1998-09-25 2001-08-09 토마스 케플러, 자비네 루츠 6,6-디알콕시-5-히드록시-3-옥소-헥산산 에스테르의 제조방법
US6204302B1 (en) * 1998-11-20 2001-03-20 Bisco, Inc. Photosensitizers for free radical polymerization initiation resins and method of making the same
US6673851B2 (en) * 2001-10-12 2004-01-06 Ashland Inc. Self-photoinitiating multifunctional acrylates
DE60220637T2 (de) * 2002-03-07 2008-03-06 Dainippon Ink And Chemicals, Inc. Initiatorfreie vernetzbare Oligomere und Polymere

Also Published As

Publication number Publication date
US20050256218A1 (en) 2005-11-17
WO2003082929A1 (en) 2003-10-09
CN1642992A (zh) 2005-07-20
JP2003327610A (ja) 2003-11-19
CA2479026C (en) 2010-10-12
CA2479026A1 (en) 2003-10-09
DE60336306D1 (de) 2011-04-21
ES2359809T3 (es) 2011-05-27
US7166648B2 (en) 2007-01-23
EP1490412B1 (en) 2011-03-09
CN100473667C (zh) 2009-04-01
EP1490412A1 (en) 2004-12-29

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