JP4079729B2 - ネガ型レジスト組成物 - Google Patents

ネガ型レジスト組成物 Download PDF

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Publication number
JP4079729B2
JP4079729B2 JP2002262880A JP2002262880A JP4079729B2 JP 4079729 B2 JP4079729 B2 JP 4079729B2 JP 2002262880 A JP2002262880 A JP 2002262880A JP 2002262880 A JP2002262880 A JP 2002262880A JP 4079729 B2 JP4079729 B2 JP 4079729B2
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JP
Japan
Prior art keywords
group
hydroxyethyl
groups
acid
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2002262880A
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English (en)
Japanese (ja)
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JP2004101819A (ja
JP2004101819A5 (https=
Inventor
豊 阿出川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002262880A priority Critical patent/JP4079729B2/ja
Publication of JP2004101819A publication Critical patent/JP2004101819A/ja
Publication of JP2004101819A5 publication Critical patent/JP2004101819A5/ja
Application granted granted Critical
Publication of JP4079729B2 publication Critical patent/JP4079729B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2002262880A 2002-09-09 2002-09-09 ネガ型レジスト組成物 Expired - Lifetime JP4079729B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002262880A JP4079729B2 (ja) 2002-09-09 2002-09-09 ネガ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002262880A JP4079729B2 (ja) 2002-09-09 2002-09-09 ネガ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004101819A JP2004101819A (ja) 2004-04-02
JP2004101819A5 JP2004101819A5 (https=) 2005-09-22
JP4079729B2 true JP4079729B2 (ja) 2008-04-23

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ID=32262803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002262880A Expired - Lifetime JP4079729B2 (ja) 2002-09-09 2002-09-09 ネガ型レジスト組成物

Country Status (1)

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JP (1) JP4079729B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010271686A (ja) * 2009-04-24 2010-12-02 Jsr Corp 感放射線性樹脂組成物
JP5472072B2 (ja) * 2010-01-13 2014-04-16 信越化学工業株式会社 ネガ型レジスト組成物及びパターン形成方法
JP5453358B2 (ja) * 2011-07-26 2014-03-26 富士フイルム株式会社 化学増幅型レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
US9650357B2 (en) 2013-06-24 2017-05-16 Toyo Gosei Co., Ltd. Reagent for enhancing generation of chemical species
KR101920235B1 (ko) * 2015-01-27 2018-11-20 후지필름 가부시키가이샤 감방사선성 또는 감활성광선성 조성물과, 그것을 이용한 막, 마스크 블랭크, 레지스트 패턴 형성 방법, 및 전자 디바이스의 제조 방법
JP7248956B2 (ja) * 2018-01-31 2023-03-30 三菱瓦斯化学株式会社 組成物、並びに、レジストパターンの形成方法及び絶縁膜の形成方法

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Publication number Publication date
JP2004101819A (ja) 2004-04-02

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