JP4038599B2 - クリーニング方法 - Google Patents
クリーニング方法 Download PDFInfo
- Publication number
- JP4038599B2 JP4038599B2 JP14087497A JP14087497A JP4038599B2 JP 4038599 B2 JP4038599 B2 JP 4038599B2 JP 14087497 A JP14087497 A JP 14087497A JP 14087497 A JP14087497 A JP 14087497A JP 4038599 B2 JP4038599 B2 JP 4038599B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- cleaning
- clf
- shower head
- processing container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- A—HUMAN NECESSITIES
- A42—HEADWEAR
- A42B—HATS; HEAD COVERINGS
- A42B1/00—Hats; Caps; Hoods
- A42B1/24—Hats; Caps; Hoods with means for attaching articles thereto, e.g. memorandum tablets or mirrors
-
- A—HUMAN NECESSITIES
- A42—HEADWEAR
- A42B—HATS; HEAD COVERINGS
- A42B1/00—Hats; Caps; Hoods
- A42B1/004—Decorative arrangements or effects
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
- A44B1/00—Buttons
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
- A44B17/00—Press-button or snap fasteners
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
- A44B18/00—Fasteners of the touch-and-close type; Making such fasteners
-
- A—HUMAN NECESSITIES
- A63—SPORTS; GAMES; AMUSEMENTS
- A63H—TOYS, e.g. TOPS, DOLLS, HOOPS OR BUILDING BLOCKS
- A63H3/00—Dolls
- A63H3/14—Dolls into which the fingers of the hand can be inserted, e.g. hand-puppets
-
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44D—INDEXING SCHEME RELATING TO BUTTONS, PINS, BUCKLES OR SLIDE FASTENERS, AND TO JEWELLERY, BRACELETS OR OTHER PERSONAL ADORNMENTS
- A44D2203/00—Fastening by use of magnets
Landscapes
- Chemical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14087497A JP4038599B2 (ja) | 1997-05-15 | 1997-05-15 | クリーニング方法 |
TW087107130A TW375780B (en) | 1997-05-15 | 1998-05-08 | Process for cleaning a film forming device |
KR1019980017329A KR100628607B1 (ko) | 1997-05-15 | 1998-05-14 | 클리닝방법,성막장치및성막방법 |
KR1020060026867A KR100727733B1 (ko) | 1997-05-15 | 2006-03-24 | 성막 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14087497A JP4038599B2 (ja) | 1997-05-15 | 1997-05-15 | クリーニング方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007133570A Division JP2007204855A (ja) | 2007-05-20 | 2007-05-20 | 成膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10317142A JPH10317142A (ja) | 1998-12-02 |
JP4038599B2 true JP4038599B2 (ja) | 2008-01-30 |
Family
ID=15278774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14087497A Expired - Fee Related JP4038599B2 (ja) | 1997-05-15 | 1997-05-15 | クリーニング方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4038599B2 (ko) |
KR (2) | KR100628607B1 (ko) |
TW (1) | TW375780B (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200819555A (en) * | 2000-09-08 | 2008-05-01 | Tokyo Electron Ltd | Shower head structure, device and method for film formation, and method for cleaning |
JP4720019B2 (ja) | 2001-05-18 | 2011-07-13 | 東京エレクトロン株式会社 | 冷却機構及び処理装置 |
KR100425789B1 (ko) * | 2001-12-07 | 2004-04-06 | 주성엔지니어링(주) | 인젝터 및 인젝터 히팅장치 |
KR100828522B1 (ko) * | 2002-07-06 | 2008-05-13 | 삼성전자주식회사 | 패턴 마스크 클리닝 장치 및 이를 갖는 노광 설비 |
KR100447284B1 (ko) | 2002-07-19 | 2004-09-07 | 삼성전자주식회사 | 화학기상증착 챔버의 세정 방법 |
US20050221020A1 (en) * | 2004-03-30 | 2005-10-06 | Tokyo Electron Limited | Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric film |
WO2007026762A1 (ja) * | 2005-08-31 | 2007-03-08 | Tokyo Electron Limited | クリーニング方法 |
KR100706810B1 (ko) * | 2006-02-07 | 2007-04-12 | 삼성전자주식회사 | 박박 형성 장치의 세정 방법 및 이를 이용한 박막 형성방법 |
KR100766342B1 (ko) * | 2006-05-16 | 2007-10-11 | 세메스 주식회사 | 웨트 스테이션 및 웨트 스테이션 세척방법 |
KR100761757B1 (ko) * | 2006-08-17 | 2007-09-28 | 삼성전자주식회사 | 막 형성 방법 |
JP5439771B2 (ja) * | 2008-09-05 | 2014-03-12 | 東京エレクトロン株式会社 | 成膜装置 |
JP7422531B2 (ja) * | 2019-12-17 | 2024-01-26 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3247270B2 (ja) * | 1994-08-25 | 2002-01-15 | 東京エレクトロン株式会社 | 処理装置及びドライクリーニング方法 |
-
1997
- 1997-05-15 JP JP14087497A patent/JP4038599B2/ja not_active Expired - Fee Related
-
1998
- 1998-05-08 TW TW087107130A patent/TW375780B/zh not_active IP Right Cessation
- 1998-05-14 KR KR1019980017329A patent/KR100628607B1/ko not_active IP Right Cessation
-
2006
- 2006-03-24 KR KR1020060026867A patent/KR100727733B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR19980087036A (ko) | 1998-12-05 |
KR20060086893A (ko) | 2006-08-01 |
KR100628607B1 (ko) | 2006-11-30 |
KR100727733B1 (ko) | 2007-06-13 |
TW375780B (en) | 1999-12-01 |
JPH10317142A (ja) | 1998-12-02 |
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