JP3991166B2 - 照明光学装置および該照明光学装置を備えた露光装置 - Google Patents

照明光学装置および該照明光学装置を備えた露光装置 Download PDF

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Publication number
JP3991166B2
JP3991166B2 JP35302396A JP35302396A JP3991166B2 JP 3991166 B2 JP3991166 B2 JP 3991166B2 JP 35302396 A JP35302396 A JP 35302396A JP 35302396 A JP35302396 A JP 35302396A JP 3991166 B2 JP3991166 B2 JP 3991166B2
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Japan
Prior art keywords
optical
illumination
light source
changing
optical system
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Expired - Lifetime
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JP35302396A
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English (en)
Japanese (ja)
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JPH10189427A5 (enExample
JPH10189427A (ja
Inventor
香葉 杉山
修 谷津
祐司 工藤
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Nikon Corp
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Nikon Corp
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Priority to JP35302396A priority Critical patent/JP3991166B2/ja
Priority to KR1019970005135A priority patent/KR19980032037A/ko
Priority to US08/803,929 priority patent/US5867319A/en
Publication of JPH10189427A publication Critical patent/JPH10189427A/ja
Publication of JPH10189427A5 publication Critical patent/JPH10189427A5/ja
Application granted granted Critical
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP35302396A 1996-10-25 1996-12-13 照明光学装置および該照明光学装置を備えた露光装置 Expired - Lifetime JP3991166B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP35302396A JP3991166B2 (ja) 1996-10-25 1996-12-13 照明光学装置および該照明光学装置を備えた露光装置
KR1019970005135A KR19980032037A (ko) 1996-10-25 1997-02-20 조명광학장치 및 그 장치를 갖춘 노광장치
US08/803,929 US5867319A (en) 1996-10-25 1997-02-21 Illumination optical system, an exposure apparatus having the illumination system, and a method for manufacturing a semiconductor device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8-301086 1996-10-25
JP30108696 1996-10-25
JP35302396A JP3991166B2 (ja) 1996-10-25 1996-12-13 照明光学装置および該照明光学装置を備えた露光装置

Publications (3)

Publication Number Publication Date
JPH10189427A JPH10189427A (ja) 1998-07-21
JPH10189427A5 JPH10189427A5 (enExample) 2005-01-06
JP3991166B2 true JP3991166B2 (ja) 2007-10-17

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JP35302396A Expired - Lifetime JP3991166B2 (ja) 1996-10-25 1996-12-13 照明光学装置および該照明光学装置を備えた露光装置

Country Status (3)

Country Link
US (1) US5867319A (enExample)
JP (1) JP3991166B2 (enExample)
KR (1) KR19980032037A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
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WO2017135035A1 (ja) * 2016-02-03 2017-08-10 株式会社ニデック 眼科用レーザ屈折矯正装置、眼科用フォトチューニング設定装置、眼科用フォトチューニングシステム、眼鏡用フォトチューニング設定装置、及びこれらに用いられるプログラム、眼科用レーザ手術装置

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JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
FR2789068B1 (fr) * 1999-02-03 2001-03-16 Optique Et Microsystemes Sa Dispositif d'alignement pour l'assemblage de microsystemes et pour la micro distribution sur microsystemes ou sur microcomposants biotechnologiques
US6178046B1 (en) 1999-04-21 2001-01-23 Intel Corporation Anti-aliasing diffractive aperture and method of using same
US6307682B1 (en) 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
KR20010085493A (ko) * 2000-02-25 2001-09-07 시마무라 기로 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법
JP3599629B2 (ja) 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP4505666B2 (ja) * 2000-04-19 2010-07-21 株式会社ニコン 露光装置、照明装置及びマイクロデバイスの製造方法
JP4528464B2 (ja) * 2000-06-08 2010-08-18 株式会社東芝 アライメント方法、重ね合わせ検査方法及びフォトマスク
SE518170C2 (sv) * 2000-06-27 2002-09-03 Micronic Laser Systems Ab Flerstrålemönstergenerator och metod för skannande
TW200301848A (en) * 2002-01-09 2003-07-16 Nikon Corp Exposure apparatus and exposure method
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2005017483A1 (ja) 2003-08-18 2005-02-24 Nikon Corporation 照度分布の評価方法、光学部材の製造方法、照明光学装置、露光装置および露光方法
JP4617650B2 (ja) * 2003-09-26 2011-01-26 セイコーエプソン株式会社 多面取り用フォトマスク、電気光学装置の製造方法
EP1670043B1 (en) * 2003-09-29 2013-02-27 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
WO2005119368A2 (en) 2004-06-04 2005-12-15 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
JP4309332B2 (ja) * 2004-11-29 2009-08-05 京セラ株式会社 投射型表示装置
US7508489B2 (en) * 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
JP4765314B2 (ja) * 2004-12-27 2011-09-07 株式会社ニコン 照明光学装置
US20080192224A1 (en) * 2005-02-12 2008-08-14 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101762083B1 (ko) 2005-05-12 2017-07-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
TWI570520B (zh) * 2006-03-27 2017-02-11 尼康股份有限公司 照明光學裝置、曝光裝置以及元件製造方法
TW200903138A (en) * 2007-07-12 2009-01-16 Young Optics Inc Illumination system
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US7926994B2 (en) * 2008-01-16 2011-04-19 Christie Digital Systems Usa, Inc. Uniform light production system and apparatus
JP5315711B2 (ja) * 2008-02-08 2013-10-16 ソニー株式会社 照明装置及び画像投影装置
DE102008011501A1 (de) 2008-02-25 2009-08-27 Carl Zeiss Smt Ag Verfahren zum Betreiben eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage
JP5544894B2 (ja) * 2010-01-21 2014-07-09 カシオ計算機株式会社 ウエハ検査装置及びウエハ検査方法
CN101846890B (zh) 2010-05-13 2012-08-22 苏州苏大维格光电科技股份有限公司 并行光刻直写系统
JP5703069B2 (ja) * 2010-09-30 2015-04-15 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
EP3112745B1 (en) * 2015-06-29 2018-08-01 Martin Professional ApS Prism effect system for light fixture with inverted multi-facet prisms
CN104932173B (zh) * 2015-07-02 2017-10-20 中国科学院光电技术研究所 一种转换式光学成像系统
JP7227775B2 (ja) * 2019-01-31 2023-02-22 キヤノン株式会社 照明光学系、露光装置および物品製造方法
JP7410701B2 (ja) * 2019-12-09 2024-01-10 株式会社ミツトヨ アダプタ光学系および焦点距離可変光学系
CN121057979A (zh) * 2023-05-04 2025-12-02 卡尔蔡司Smt有限责任公司 用于调整微光刻的投射曝光系统中的远心的方法

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US4947030A (en) * 1985-05-22 1990-08-07 Canon Kabushiki Kaisha Illuminating optical device
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JP3630189B2 (ja) * 1995-01-26 2005-03-16 株式会社ニコン アライメント方法、露光方法、及び露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017135035A1 (ja) * 2016-02-03 2017-08-10 株式会社ニデック 眼科用レーザ屈折矯正装置、眼科用フォトチューニング設定装置、眼科用フォトチューニングシステム、眼鏡用フォトチューニング設定装置、及びこれらに用いられるプログラム、眼科用レーザ手術装置

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Publication number Publication date
KR19980032037A (ko) 1998-07-25
JPH10189427A (ja) 1998-07-21
US5867319A (en) 1999-02-02

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