KR19980032037A - 조명광학장치 및 그 장치를 갖춘 노광장치 - Google Patents

조명광학장치 및 그 장치를 갖춘 노광장치 Download PDF

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Publication number
KR19980032037A
KR19980032037A KR1019970005135A KR19970005135A KR19980032037A KR 19980032037 A KR19980032037 A KR 19980032037A KR 1019970005135 A KR1019970005135 A KR 1019970005135A KR 19970005135 A KR19970005135 A KR 19970005135A KR 19980032037 A KR19980032037 A KR 19980032037A
Authority
KR
South Korea
Prior art keywords
optical
light source
optical system
illumination
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1019970005135A
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English (en)
Korean (ko)
Inventor
가요 스기야마
유찌 구도
오사무 다니쯔
Original Assignee
고노 시게오
니콘 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 고노 시게오, 니콘 코포레이션 filed Critical 고노 시게오
Publication of KR19980032037A publication Critical patent/KR19980032037A/ko
Abandoned legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019970005135A 1996-10-25 1997-02-20 조명광학장치 및 그 장치를 갖춘 노광장치 Abandoned KR19980032037A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP301086/1996 1996-10-25
JP30108696 1996-10-25
JP35302396A JP3991166B2 (ja) 1996-10-25 1996-12-13 照明光学装置および該照明光学装置を備えた露光装置
JP353023/1996 1996-12-13

Publications (1)

Publication Number Publication Date
KR19980032037A true KR19980032037A (ko) 1998-07-25

Family

ID=26562555

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970005135A Abandoned KR19980032037A (ko) 1996-10-25 1997-02-20 조명광학장치 및 그 장치를 갖춘 노광장치

Country Status (3)

Country Link
US (1) US5867319A (enExample)
JP (1) JP3991166B2 (enExample)
KR (1) KR19980032037A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101245396B1 (ko) * 2010-09-30 2013-03-19 다이닛뽕스크린 세이조오 가부시키가이샤 묘화 장치 및 묘화 방법

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JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
FR2789068B1 (fr) * 1999-02-03 2001-03-16 Optique Et Microsystemes Sa Dispositif d'alignement pour l'assemblage de microsystemes et pour la micro distribution sur microsystemes ou sur microcomposants biotechnologiques
US6178046B1 (en) 1999-04-21 2001-01-23 Intel Corporation Anti-aliasing diffractive aperture and method of using same
US6307682B1 (en) 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
KR20010085493A (ko) * 2000-02-25 2001-09-07 시마무라 기로 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법
JP3599629B2 (ja) 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP4505666B2 (ja) * 2000-04-19 2010-07-21 株式会社ニコン 露光装置、照明装置及びマイクロデバイスの製造方法
JP4528464B2 (ja) * 2000-06-08 2010-08-18 株式会社東芝 アライメント方法、重ね合わせ検査方法及びフォトマスク
SE518170C2 (sv) * 2000-06-27 2002-09-03 Micronic Laser Systems Ab Flerstrålemönstergenerator och metod för skannande
TW200301848A (en) * 2002-01-09 2003-07-16 Nikon Corp Exposure apparatus and exposure method
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2005017483A1 (ja) 2003-08-18 2005-02-24 Nikon Corporation 照度分布の評価方法、光学部材の製造方法、照明光学装置、露光装置および露光方法
JP4617650B2 (ja) * 2003-09-26 2011-01-26 セイコーエプソン株式会社 多面取り用フォトマスク、電気光学装置の製造方法
EP1670043B1 (en) * 2003-09-29 2013-02-27 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
WO2005119368A2 (en) 2004-06-04 2005-12-15 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
JP4309332B2 (ja) * 2004-11-29 2009-08-05 京セラ株式会社 投射型表示装置
US7508489B2 (en) * 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
JP4765314B2 (ja) * 2004-12-27 2011-09-07 株式会社ニコン 照明光学装置
US20080192224A1 (en) * 2005-02-12 2008-08-14 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101762083B1 (ko) 2005-05-12 2017-07-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
TWI570520B (zh) * 2006-03-27 2017-02-11 尼康股份有限公司 照明光學裝置、曝光裝置以及元件製造方法
TW200903138A (en) * 2007-07-12 2009-01-16 Young Optics Inc Illumination system
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US7926994B2 (en) * 2008-01-16 2011-04-19 Christie Digital Systems Usa, Inc. Uniform light production system and apparatus
JP5315711B2 (ja) * 2008-02-08 2013-10-16 ソニー株式会社 照明装置及び画像投影装置
DE102008011501A1 (de) 2008-02-25 2009-08-27 Carl Zeiss Smt Ag Verfahren zum Betreiben eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage
JP5544894B2 (ja) * 2010-01-21 2014-07-09 カシオ計算機株式会社 ウエハ検査装置及びウエハ検査方法
CN101846890B (zh) 2010-05-13 2012-08-22 苏州苏大维格光电科技股份有限公司 并行光刻直写系统
EP3112745B1 (en) * 2015-06-29 2018-08-01 Martin Professional ApS Prism effect system for light fixture with inverted multi-facet prisms
CN104932173B (zh) * 2015-07-02 2017-10-20 中国科学院光电技术研究所 一种转换式光学成像系统
WO2017135035A1 (ja) * 2016-02-03 2017-08-10 株式会社ニデック 眼科用レーザ屈折矯正装置、眼科用フォトチューニング設定装置、眼科用フォトチューニングシステム、眼鏡用フォトチューニング設定装置、及びこれらに用いられるプログラム、眼科用レーザ手術装置
JP7227775B2 (ja) * 2019-01-31 2023-02-22 キヤノン株式会社 照明光学系、露光装置および物品製造方法
JP7410701B2 (ja) * 2019-12-09 2024-01-10 株式会社ミツトヨ アダプタ光学系および焦点距離可変光学系
CN121057979A (zh) * 2023-05-04 2025-12-02 卡尔蔡司Smt有限责任公司 用于调整微光刻的投射曝光系统中的远心的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947030A (en) * 1985-05-22 1990-08-07 Canon Kabushiki Kaisha Illuminating optical device
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JP3630189B2 (ja) * 1995-01-26 2005-03-16 株式会社ニコン アライメント方法、露光方法、及び露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101245396B1 (ko) * 2010-09-30 2013-03-19 다이닛뽕스크린 세이조오 가부시키가이샤 묘화 장치 및 묘화 방법
US9041907B2 (en) 2010-09-30 2015-05-26 SCREEN Holdings Co., Ltd. Drawing device and drawing method

Also Published As

Publication number Publication date
JPH10189427A (ja) 1998-07-21
JP3991166B2 (ja) 2007-10-17
US5867319A (en) 1999-02-02

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