JP3936492B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3936492B2
JP3936492B2 JP15869899A JP15869899A JP3936492B2 JP 3936492 B2 JP3936492 B2 JP 3936492B2 JP 15869899 A JP15869899 A JP 15869899A JP 15869899 A JP15869899 A JP 15869899A JP 3936492 B2 JP3936492 B2 JP 3936492B2
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JP
Japan
Prior art keywords
group
acid
positive photosensitive
resin
photosensitive composition
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Expired - Fee Related
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JP15869899A
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English (en)
Japanese (ja)
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JP2000347410A5 (enExample
JP2000347410A (ja
Inventor
邦彦 児玉
健一郎 佐藤
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Priority to JP15869899A priority Critical patent/JP3936492B2/ja
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Publication of JP2000347410A5 publication Critical patent/JP2000347410A5/ja
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Publication of JP3936492B2 publication Critical patent/JP3936492B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP15869899A 1999-06-04 1999-06-04 ポジ型感光性組成物 Expired - Fee Related JP3936492B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15869899A JP3936492B2 (ja) 1999-06-04 1999-06-04 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15869899A JP3936492B2 (ja) 1999-06-04 1999-06-04 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2000347410A JP2000347410A (ja) 2000-12-15
JP2000347410A5 JP2000347410A5 (enExample) 2005-07-07
JP3936492B2 true JP3936492B2 (ja) 2007-06-27

Family

ID=15677414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15869899A Expired - Fee Related JP3936492B2 (ja) 1999-06-04 1999-06-04 ポジ型感光性組成物

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JP (1) JP3936492B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4512340B2 (ja) * 2003-10-20 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4300131B2 (ja) * 2004-02-16 2009-07-22 富士フイルム株式会社 液浸プロセス用化学増幅型レジスト組成物及びそれを用いたパターン形成方法
JP4801477B2 (ja) * 2006-03-24 2011-10-26 富士通株式会社 レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法
JP5305890B2 (ja) * 2008-12-22 2013-10-02 住友ゴム工業株式会社 二輪自動車用タイヤ
JP5556522B2 (ja) * 2009-09-17 2014-07-23 住友化学株式会社 レジスト組成物
JP5621432B2 (ja) * 2009-09-17 2014-11-12 住友化学株式会社 レジスト組成物
JP2011075750A (ja) * 2009-09-30 2011-04-14 Jsr Corp 化学増幅型レジスト用感放射線性樹脂組成物および重合体
DE102009046194A1 (de) 2009-10-30 2011-05-05 Evonik Röhm Gmbh Verfahren zur Herstellung von (1-Alkoxy-2-methyl-1-oxopropan--2yl)-(meth)acrylat
DE102009046197A1 (de) 2009-10-30 2011-05-05 Evonik Röhm Gmbh Homopolymere und Copolymere der Hydroxyisobuttersäure(ester)(meth)acrylate
JP5572570B2 (ja) * 2011-02-28 2014-08-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、この組成物を用いた感活性光線性又は感放射線性膜及びパターン形成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100219573B1 (ko) * 1996-08-05 1999-09-01 윤종용 감광성 고분자 화합물 및 이를 포함하는 포토레지스트 조성물
JPH10221852A (ja) * 1997-02-06 1998-08-21 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP3948795B2 (ja) * 1997-09-30 2007-07-25 ダイセル化学工業株式会社 放射線感光材料及びそれを用いたパターン形成方法
JP3237605B2 (ja) * 1998-04-06 2001-12-10 日本電気株式会社 １，２−ジオール構造を有する脂環式（メタ）アクリレート誘導体、およびその重合体
JP4434358B2 (ja) * 1998-05-25 2010-03-17 ダイセル化学工業株式会社 フォトレジスト用化合物およびフォトレジスト用樹脂組成物
JP3353825B2 (ja) * 1999-05-10 2002-12-03 日本電気株式会社 化学増幅ポジ型レジスト、およびそれを用いたパターン形成方法

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Publication number Publication date
JP2000347410A (ja) 2000-12-15

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