JP3865978B2 - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
- Publication number
- JP3865978B2 JP3865978B2 JP27471399A JP27471399A JP3865978B2 JP 3865978 B2 JP3865978 B2 JP 3865978B2 JP 27471399 A JP27471399 A JP 27471399A JP 27471399 A JP27471399 A JP 27471399A JP 3865978 B2 JP3865978 B2 JP 3865978B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- processing apparatus
- transport
- processing liquid
- width direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 252
- 239000007788 liquid Substances 0.000 claims abstract description 86
- 238000000034 method Methods 0.000 claims description 18
- 238000007599 discharging Methods 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims description 4
- 230000003044 adaptive effect Effects 0.000 abstract 1
- 238000001035 drying Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000011295 pitch Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 4
- 206010034719 Personality change Diseases 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27471399A JP3865978B2 (ja) | 1999-09-28 | 1999-09-28 | 基板処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27471399A JP3865978B2 (ja) | 1999-09-28 | 1999-09-28 | 基板処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001102283A JP2001102283A (ja) | 2001-04-13 |
| JP2001102283A5 JP2001102283A5 (enExample) | 2005-06-16 |
| JP3865978B2 true JP3865978B2 (ja) | 2007-01-10 |
Family
ID=17545542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27471399A Expired - Fee Related JP3865978B2 (ja) | 1999-09-28 | 1999-09-28 | 基板処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3865978B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW569288B (en) * | 2001-06-19 | 2004-01-01 | Tokyo Electron Ltd | Substrate processing apparatus, liquid processing apparatus and liquid processing method |
| KR100699336B1 (ko) * | 2003-06-03 | 2007-03-26 | 다이닛뽕스크린 세이조오 가부시키가이샤 | 기판의 에칭 처리 방법 및 에칭 처리 장치 |
| JP4679403B2 (ja) * | 2006-03-20 | 2011-04-27 | 株式会社日立ハイテクノロジーズ | 基板乾燥装置、基板乾燥方法、及び基板の製造方法 |
| KR102056857B1 (ko) | 2012-10-23 | 2019-12-17 | 세메스 주식회사 | 셔틀 및 이를 가지는 기판처리장치 |
| CN104241541B (zh) | 2014-09-15 | 2016-12-14 | 京东方科技集团股份有限公司 | 有机电致发光器件及显示装置 |
| CN104923534B (zh) * | 2015-05-22 | 2017-11-14 | 合肥京东方光电科技有限公司 | 面板配向膜清除设备 |
-
1999
- 1999-09-28 JP JP27471399A patent/JP3865978B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001102283A (ja) | 2001-04-13 |
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