JP3865890B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3865890B2
JP3865890B2 JP26702497A JP26702497A JP3865890B2 JP 3865890 B2 JP3865890 B2 JP 3865890B2 JP 26702497 A JP26702497 A JP 26702497A JP 26702497 A JP26702497 A JP 26702497A JP 3865890 B2 JP3865890 B2 JP 3865890B2
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JP
Japan
Prior art keywords
group
resin
acid
photosensitive composition
positive photosensitive
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP26702497A
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English (en)
Japanese (ja)
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JPH11109628A5 (enExample
JPH11109628A (ja
Inventor
利明 青合
健一郎 佐藤
Original Assignee
富士フイルムホールディングス株式会社
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Priority to JP26702497A priority Critical patent/JP3865890B2/ja
Publication of JPH11109628A publication Critical patent/JPH11109628A/ja
Publication of JPH11109628A5 publication Critical patent/JPH11109628A5/ja
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Publication of JP3865890B2 publication Critical patent/JP3865890B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP26702497A 1997-09-30 1997-09-30 ポジ型感光性組成物 Expired - Fee Related JP3865890B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26702497A JP3865890B2 (ja) 1997-09-30 1997-09-30 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26702497A JP3865890B2 (ja) 1997-09-30 1997-09-30 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH11109628A JPH11109628A (ja) 1999-04-23
JPH11109628A5 JPH11109628A5 (enExample) 2004-10-14
JP3865890B2 true JP3865890B2 (ja) 2007-01-10

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ID=17439004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26702497A Expired - Fee Related JP3865890B2 (ja) 1997-09-30 1997-09-30 ポジ型感光性組成物

Country Status (1)

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JP (1) JP3865890B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100583092B1 (ko) * 2000-06-15 2006-05-24 주식회사 하이닉스반도체 레지스트 플로우 공정용 포토레지스트 조성물의 첨가제
EP1991910A4 (en) * 2006-02-16 2010-12-01 Cornell Res Foundation Inc MOLECULAR GLASS PHOTORESISTS BASED ON ADAMANTANE FOR SUB-200 NM LITHOGRAPHY
KR20130138732A (ko) 2010-09-08 2013-12-19 가부시키가이샤 구라레 아크릴산에스테르 유도체, 고분자 화합물 및 포토 레지스트 조성물
KR102076529B1 (ko) * 2012-06-29 2020-02-13 주식회사 다이셀 고분자 화합물, 포토레지스트용 수지 조성물, 및 반도체의 제조 방법
JP5986826B2 (ja) * 2012-06-29 2016-09-06 株式会社ダイセル 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法
JP5986825B2 (ja) * 2012-06-29 2016-09-06 株式会社ダイセル 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法
JP6140496B2 (ja) * 2013-03-25 2017-05-31 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法
EP3215179A4 (en) 2014-11-06 2018-07-25 Enanta Pharmaceuticals, Inc. Bile acid analogs an fxr/tgr5 agonists and methods of use thereof
JP6222057B2 (ja) * 2014-11-25 2017-11-01 信越化学工業株式会社 化学増幅レジスト材料及びパターン形成方法
JP2017535570A (ja) 2014-11-26 2017-11-30 エナンタ ファーマシューティカルズ インコーポレイテッド Ｆｘｒ／ｔｇｒ５アゴニストとしての胆汁酸類似体およびその使用方法
US11578097B2 (en) 2014-11-26 2023-02-14 Enanta Pharmaceuticals, Inc. Tetrazole derivatives of bile acids as FXR/TGR5 agonists and methods of use thereof
US10208081B2 (en) 2014-11-26 2019-02-19 Enanta Pharmaceuticals, Inc. Bile acid derivatives as FXR/TGR5 agonists and methods of use thereof
MX2017010376A (es) 2015-02-11 2017-12-20 Enanta Pharm Inc Análogos de ácido biliar como agonistas de fxr/tgr5 y métodos para el uso de los mismos.
WO2016161003A1 (en) 2015-03-31 2016-10-06 Enanta Phamraceuticals, Inc. Bile acid derivatives as fxr/tgr5 agonists and methods of use thereof
WO2017147137A1 (en) 2016-02-23 2017-08-31 Enanta Pharmaceuticals, Inc. Benzoic acid derivatives of bile acid as fxr/tgr5 agonists and methods of use thereof
KR102499441B1 (ko) 2016-11-29 2023-02-13 이난타 파마슈티칼스, 인코포레이티드 술포닐우레아 담즙산 유도체의 제조 방법
US10676500B2 (en) 2017-04-07 2020-06-09 Enanta Pharmaceuticals, Inc. Process for preparation of sulfonyl carbamate bile acid derivatives

Also Published As

Publication number Publication date
JPH11109628A (ja) 1999-04-23

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