JP3686241B2 - 処理方法及び処理装置 - Google Patents

処理方法及び処理装置 Download PDF

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Publication number
JP3686241B2
JP3686241B2 JP33228997A JP33228997A JP3686241B2 JP 3686241 B2 JP3686241 B2 JP 3686241B2 JP 33228997 A JP33228997 A JP 33228997A JP 33228997 A JP33228997 A JP 33228997A JP 3686241 B2 JP3686241 B2 JP 3686241B2
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JP
Japan
Prior art keywords
substrate
holding means
processing
lcd substrate
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP33228997A
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English (en)
Japanese (ja)
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JPH11150064A5 (enExample
JPH11150064A (ja
Inventor
秀之 高森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
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Tokyo Electron Ltd
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Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP33228997A priority Critical patent/JP3686241B2/ja
Publication of JPH11150064A publication Critical patent/JPH11150064A/ja
Publication of JPH11150064A5 publication Critical patent/JPH11150064A5/ja
Application granted granted Critical
Publication of JP3686241B2 publication Critical patent/JP3686241B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP33228997A 1997-11-18 1997-11-18 処理方法及び処理装置 Expired - Fee Related JP3686241B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33228997A JP3686241B2 (ja) 1997-11-18 1997-11-18 処理方法及び処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33228997A JP3686241B2 (ja) 1997-11-18 1997-11-18 処理方法及び処理装置

Publications (3)

Publication Number Publication Date
JPH11150064A JPH11150064A (ja) 1999-06-02
JPH11150064A5 JPH11150064A5 (enExample) 2004-08-26
JP3686241B2 true JP3686241B2 (ja) 2005-08-24

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JP33228997A Expired - Fee Related JP3686241B2 (ja) 1997-11-18 1997-11-18 処理方法及び処理装置

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JP (1) JP3686241B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100488753B1 (ko) * 2001-07-23 2005-05-11 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리방법 및 그 장치
JP4718061B2 (ja) * 2001-09-11 2011-07-06 東京エレクトロン株式会社 液処理装置および液処理方法ならびに現像処理装置
JP4343025B2 (ja) 2004-05-18 2009-10-14 東京エレクトロン株式会社 現像装置及び現像方法

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Publication number Publication date
JPH11150064A (ja) 1999-06-02

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